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    • 2. 发明授权
    • Magnetic recording medium
    • 磁记录介质
    • US5720861A
    • 1998-02-24
    • US516046
    • 1995-08-17
    • Hideo KanekoKatsushi TokunagaYoshio Tawara
    • Hideo KanekoKatsushi TokunagaYoshio Tawara
    • G11B5/73G11B5/851C23C14/34
    • G11B5/7315G11B5/851
    • An improvement is proposed in the method for the preparation of a magnetic recording medium comprising a non-magnetic substrate plate of silicon and a magnetic recording layer formed on the substrate surface by the method of bias-sputtering, by which the magnetic recording layer can be imparted with an unexpectedly large coercive force. The improvement can be accomplished by the use of a silicon substrate plate which has a volume resistivity not exceeding 2 ohm-cm at room temperature. The improvement is more remarkable when the contact resistance between the silicon substrate plate and the substrate holder is kept not to exceed 10 kohm during the bias-sputtering for the formation of the magnetic recording layer on the substrate surface.
    • 在通过偏置溅射的方法制备磁记录介质的方法中提出了一种磁记录介质的方法,所述磁记录介质包括硅非磁性基板和形成在基板表面上的磁记录层,通过该方法磁记录层可以 赋予了意想不到的大矫顽力。 可以通过使用在室温下体积电阻率不超过2欧姆 - 厘米的硅衬底板来实现改进。 当在衬底表面上形成磁记录层的偏压溅射期间,当硅衬底板和衬底保持器之间的接触电阻保持不超过10Kohm时,这种改进是更显着的。
    • 4. 发明授权
    • Magnetic recording medium preparation
    • 磁记录介质制备
    • US5554303A
    • 1996-09-10
    • US397564
    • 1995-03-02
    • Hideo KanekoKatsushi TokunagaYoshio TawaraNoboru TamaiYasuaki Nakazato
    • Hideo KanekoKatsushi TokunagaYoshio TawaraNoboru TamaiYasuaki Nakazato
    • G11B5/84B44C1/22H01L21/00
    • G11B5/8404
    • An improvement is proposed in the method for the preparation of a magnetic recording medium by forming a magnetic recording layer of a magnetic alloy on the surface of a non-magnetic substrate plate of, e.g., silicon so as to impart the magnetic recording medium with improved CSS (contact-start-stop) characteristics still without affecting the magnetic recording density. The improvement can be obtained by subjecting the surface of the substrate plate, prior to the formation of the magnetic recording layer, to a surface-roughening treatment which is performed either by a dry-process such as plasma etching and reactive ion etching or by a wet-process of anisotropic etching by using an aqueous solution of sodium or potassium hydroxide as the anisotropic etching solution. In particular, the plasma etching or reactive ion etching is conducted in the presence of a particulate scattering source body of aluminum, etc. placed in the vicinity of the CSS zone so that the surface-roughening effect is limited to the CSS zone by the deposition of particulates scattered therefrom leaving the recording zone unroughened not to decrease the recording density.
    • 通过在例如硅的非磁性基板的表面上形成磁性合金的磁记录层,在制备磁记录介质的方法中提出了一种改进,以使磁记录介质具有改进的 CSS(接触开始 - 停止)特性仍然不影响磁记录密度。 可以通过在形成磁记录层之前将基板的表面进行表面粗糙化处理来获得改进,所述表面粗糙化处理通过诸如等离子体蚀刻和反应离子蚀刻之类的干法进行,或通过 通过使用氢氧化钠或氢氧化钾的水溶液作为各向异性蚀刻溶液进行各向异性蚀刻的湿法。 特别地,等离子体蚀刻或反应离子蚀刻在放置在CSS区域附近的铝等微粒散射源体的存在下进行,使得表面粗糙化效果通过沉积被限制到CSS区域 从而离开记录区未变粗糙的颗粒不会降低记录密度。
    • 6. 发明授权
    • Magneto-optical recording medium
    • 磁光记录介质
    • US5514468A
    • 1996-05-07
    • US145173
    • 1993-11-03
    • Hideo KanekoKatsushi TokunagaYoshio TawaraYoshiaki ShimizuTadao Nomura
    • Hideo KanekoKatsushi TokunagaYoshio TawaraYoshiaki ShimizuTadao Nomura
    • G11B11/105B32B3/02B32B5/16G11B5/66
    • G11B11/10584G11B11/10593Y10S428/90Y10T428/26Y10T428/265
    • A magneto-optical recording medium having a layered structure consisting of a first dielectric layer, magnetic recording layer, second dielectric layer and reflecting layer successively formed on a transparent substrate plate can be imparted with improved performance relative to the recording sensitivity and the C/N ratio when the recording layer and the second dielectric layer each have such a thickness that the angle .delta. given by the equation .delta.=tan.sup.-1 (.epsilon./.theta.k), in which .epsilon. is the Kerr ellipticity of the regenerative light and .theta.k is the Kerr rotation angle, does not exceed 10.degree., the thickness of the recording layer being in the range from 8 nm to 13.5 nm and the thickness of the second dielectric layer satisfying the relationship given by the inequality0.06.ltoreq.nd/.lambda..ltoreq.0.14,in which d is the thickness of the second dielectric layer, .lambda. is the wavelength of the regenerative light for reading-out of the recorded signals and n is the refractive index of the material forming the second dielectric layer to the regenerative light of wavelength .lambda..
    • 具有由第一电介质层,磁记录层,第二电介质层和连续形成在透明基板上的反射层组成的层状结构的磁光记录介质可以相对于记录灵敏度和C / N 当记录层和第二介电层各自具有这样的厚度,即由等式delta = tan-1(epsilon /θk)给出的角度δ,其中ε是再生光的Kerr椭圆率和θk是 克尔旋转角不超过10°,记录层的厚度在8nm至13.5nm的范围内,第二介电层的厚度满足不等式0.06