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51. 发明授权

US07261974B2 Battery-driven power source apparatus 失效
标题翻译：电池驱动电源装置
公开(公告)号：US07261974B2
公开(公告)日：2007-08-28
申请号：US10493055
申请日：2002-10-23
申请人： Kenji Watanabe , Noboru Sato , Junichi Kikuchi , Atsuhiro Naganuma , Satoyoshi Ohya
发明人： Kenji Watanabe , Noboru Sato , Junichi Kikuchi , Atsuhiro Naganuma , Satoyoshi Ohya
IPC分类号： H01M10/50
CPC分类号： B60K1/04 , B60K2001/005 , H01M2/105 , H01M2/1072 , H01M10/613 , H01M10/643 , H01M10/651 , H01M10/6557 , H01M10/6563
摘要： A battery power supply system (1) for suppressing the overall temperature variation of a plurality of battery module groups (61 to 65) includes a box (2) having a cooling air inlet (3) on one end face and a suction fan (4) within a section at the other end, and a battery assembly (5) installed in an intermediate section within the box (2). The battery assembly (5) includes a plurality of battery module groups (61 to 65). Each of the battery module groups (61 to 65) includes a plurality of rod-shaped battery modules (7). When a gap between outer peripheral faces of two adjacent rod-shaped battery modules (7) of the first battery module group (61), which is closest to the cooling air inlet (3), is a, and a gap between the outer peripheral face of the rod-shaped battery modules (7) of the first battery module group (61) and the outer peripheral face of the adjacent rod-shaped battery modules (7) of the second battery module group (62) is b, the ratio a/b of the gaps a and b is set so that 1.0
摘要翻译：用于抑制多个电池模块组（6 1至6 5 5）的整体温度变化的电池电源系统（1）包括：盒（2），其具有一端面的冷却空气入口（3）和另一端部分内的吸风扇（4），以及安装在箱体（2）内的中间部分的电池组件（5）。电池组件（5）包括多个电池模块组（6＆lt; 1＆gt;〜＆lt; 5＆gt; 5＆gt;）。每个电池模块组（6＆gt; 1＆lt; 5＆gt; 5＆gt;）包括多个棒状电池模块（7）。当最靠近冷却空气入口（3）的第一电池模块组（6 >1）的两个相邻的棒状电池模块（7）的外周面之间的间隙为，并且第一电池模块组（6 >1）的棒状电池模块（7）的外周面与相邻的棒状电池模块（6）的外周面之间的间隙第二电池模块组（6＆gt; 2＆gt;）的b）的比率a / b设定为1.0

52. 发明申请

US20070194235A1 Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former 有权
标题翻译：用于电子束检查的装置，其操作方法以及使用前者制造半导体器件的方法
公开(公告)号：US20070194235A1
公开(公告)日：2007-08-23
申请号：US11783780
申请日：2007-04-12
申请人： Toshifumi Kimba , Tohru Satake , Tsutomu Karimata , Kenji Watanabe , Nobuharu Noji , Takeshi Murakami , Masahiro Hatakeyama , Mamoru Nakasuji , Hirosi Sobukawa , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito
发明人： Toshifumi Kimba , Tohru Satake , Tsutomu Karimata , Kenji Watanabe , Nobuharu Noji , Takeshi Murakami , Masahiro Hatakeyama , Mamoru Nakasuji , Hirosi Sobukawa , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito
IPC分类号： G01N23/00
CPC分类号： H01J37/222 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/0216 , H01J2237/082 , H01J2237/2002 , H01J2237/2007 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2813 , H01J2237/2816 , H01J2237/2817 , H01L2224/48227 , H01L2924/01019 , H01L2924/01025 , H01L2924/01057 , H01L2924/01067 , H01L2924/01078 , H01L2924/10253 , H01L2924/12032 , H01L2924/3025 , H01L2924/00
摘要： A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.
摘要翻译：本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到检查室23-1中; 在所述检查室中保持真空; 将所述检查室与振动隔离; 通过至少一个自由度的阶段26-1连续地移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

53. 发明授权

US07220604B2 Method and apparatus for repairing shape, and method for manufacturing semiconductor device using those 有权
公开(公告)号：US07220604B2
公开(公告)日：2007-05-22
申请号：US11091704
申请日：2005-03-29
申请人： Tohru Satake , Nobuharu Noji , Masahiro Hatakeyama , Kenji Watanabe
发明人： Tohru Satake , Nobuharu Noji , Masahiro Hatakeyama , Kenji Watanabe
IPC分类号： H01L21/00 , G01R31/26
CPC分类号： H01L22/22 , G01R31/307 , H01L21/31116 , H01L2924/0002 , H01L2924/00
摘要： The invention relates to a method for enabling repair of a defect in a substrate, particularly the invention provides a method and apparatus for enabling repair of a pattern shape in a semiconductor device, which has not been able to be practiced because of lack of a suitable method, and further provides a method for manufacturing the semiconductor device using those. A method for repairing the pattern shape of a substrate having an imperfect pattern is used, which includes (a) a step for inspecting the substrate and thus detecting the imperfect pattern, and (b) a step for repairing the pattern shape by performing etching or deposition to the detected imperfect-pattern using radiation rays. Moreover, apparatus for repairing a pattern shape of a via-hole in a wafer having an imperfect via-hole is used, which has a defect inspection section for detecting the imperfect via-hole, and an etching section for etching the imperfect via-hole using a fast atom beam.

54. 发明申请

US20070097081A1 INPUT DEVICE 有权
标题翻译：输入设备
公开(公告)号：US20070097081A1
公开(公告)日：2007-05-03
申请号：US11552800
申请日：2006-10-25
申请人： Kazuhito Ohshita , Akihisa Ito , Yoshiyuki Kikuchi , Kenji Watanabe , Shoji Suzuki
发明人： Kazuhito Ohshita , Akihisa Ito , Yoshiyuki Kikuchi , Kenji Watanabe , Shoji Suzuki
IPC分类号： G09G5/00 , G06F1/16
CPC分类号： G09G5/08 , G06F3/023 , G06F3/03547 , G06F3/038 , G06F3/0383 , G06F3/0416 , G09G2310/04
摘要： An input device is provided. The input device includes a key input unit having a plurality of input keys and an input operation unit. A key input monitor monitors a key input to the key input unit. A timer measures a setting time upon the key input. A relay driver is operative to acquire and output an operation signal output from the input operation unit as a control signal and monitor the operation signal. The key input monitor is operative to initiate the timer when the key input to the key input unit is detected and set the relay driver to an output inhibition state. The relay driver is operative to release the output inhibition state such that the control signal is normally output when it is detected that the operation signal is a predetermined operation input within the setting time.
摘要翻译：提供输入装置。输入装置包括具有多个输入键的键输入单元和输入操作单元。键输入监视器监视键输入单元的键输入。定时器测量键输入时的设定时间。继电器驱动器用于获取并输出从输入操作单元输出的操作信号作为控制信号并监视操作信号。当输入到键输入单元的键被检测并且将继电器驱动器设置为输出禁止状态时，键输入监视器用于启动定时器。继电器驱动器操作以释放输出禁止状态，使得当在设定时间内检测到操作信号是预定的操作输入时，控制信号通常被输出。

55. 发明授权

US07212017B2 Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus 有权
标题翻译：具有详细观察功能的电子束装置和使用电子束装置的样品检查和观察方法
公开(公告)号：US07212017B2
公开(公告)日：2007-05-01
申请号：US11019111
申请日：2004-12-22
申请人： Kenji Watanabe , Tohru Satake , Nobuharu Noji , Takeshi Murakami , Tsutomu Karimata , Yuichiro Yamazaki , Ichirota Nagahama , Atsushi Onishi
发明人： Kenji Watanabe , Tohru Satake , Nobuharu Noji , Takeshi Murakami , Tsutomu Karimata , Yuichiro Yamazaki , Ichirota Nagahama , Atsushi Onishi
IPC分类号： G01N23/00
CPC分类号： G01R31/305
摘要： Provided is a sample observing method allowing for a detailed observation of a sample by using one and the same electron beam apparatus. The method uses an electron beam apparatus 1 comprising a primary optical system 10 serving for irradiating the electron beam onto the sample surface and a secondary optical system 30 serving for detecting secondary electrons emanating from said sample surface to form an image of the sample surface. The inspection is carried out on the sample surface, S, by irradiating the electron beam to the sample surface, and after the extraction of a defective region in the sample based on the inspection, the extracted defective region is once again applied with the irradiation of the electron beam so as to provide a magnification or a detailed observation of the defective region.
摘要翻译：提供了通过使用同一电子束装置对样品进行详细观察的样本观察方法。该方法使用电子束装置1，其包括用于将电子束照射到样品表面上的主要光学系统10和用于检测从所述样品表面发出的二次电子以形成样品表面的图像的二次光学系统30。通过向样品表面照射电子束，在样品表面S上进行检查，并且在基于检查提取样品中的缺陷区域之后，再次施加提取的缺陷区域电子束，以便提供缺陷区域的放大或详细观察。

56. 发明授权

US07176459B2 Electron beam apparatus 有权
标题翻译：电子束装置
公开(公告)号：US07176459B2
公开(公告)日：2007-02-13
申请号：US10999124
申请日：2004-11-30
申请人： Kenji Watanabe , Tohru Satake , Mamoru Nakasuji , Takeshi Murakami , Tsutomu Karimata , Nobuharu Noji , Keiichi Tohyama , Masahiro Hatakeyama
发明人： Kenji Watanabe , Tohru Satake , Mamoru Nakasuji , Takeshi Murakami , Tsutomu Karimata , Nobuharu Noji , Keiichi Tohyama , Masahiro Hatakeyama
IPC分类号： H01J37/28 , G01N23/225
CPC分类号： H01J37/28 , G01N23/225 , H01J2237/24435
摘要： An electron beam apparatus is provided for evaluating a sample at a high throughput and a high S/N ratio. As an electron beam emitted from an electron gun is irradiated to a sample placed on an X-Y-θ stage through an electrostatic lens, an objective lens and the like, secondary electrons or reflected electrons are emitted from the sample. The primary electron beam is incident at an incident angle set at approximately 35° or more by controlling a deflector. Electrons emitted from the sample is guided in the vertical direction, and focused on a detector. The detector is made up of an MCP, a fluorescent plate, a relay lens, and a TDI (or CCD). An electric signal from the TDI is supplied to a personal computer for image processing to generate a two-dimensional image of the sample.
摘要翻译：提供一种用于以高通量和高S / N比来评估样品的电子束装置。当从电子枪发射的电子束通过静电透镜，物镜等照射到放置在X-Y-θ台上的样品时，从样品发射二次电子或反射电子。通过控制偏转器，一次电子束入射角约为35°以上的入射角。从样品发射的电子在垂直方向上被引导，并聚焦在检测器上。检测器由MCP，荧光板，中继透镜和TDI（或CCD）组成。来自TDI的电信号被提供给用于图像处理的个人计算机以产生样本的二维图像。

57. 发明授权

US07138629B2 Testing apparatus using charged particles and device manufacturing method using the testing apparatus 有权
标题翻译：使用带电粒子的测试装置和使用该测试装置的装置制造方法
公开(公告)号：US07138629B2
公开(公告)日：2006-11-21
申请号：US10754623
申请日：2004-01-12
申请人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
发明人： Nobuharu Noji , Tohru Satake , Hirosi Sobukawa , Toshifumi Kimba , Masahiro Hatakeyama , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Kenichi Suematsu , Yutaka Tabe , Ryo Tajima , Keiichi Tohyama
IPC分类号： G21K7/00 , G21N23/99 , H01J37/28 , G01N23/225
CPC分类号： H01J37/20 , G01N23/2204 , G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/202 , H01J2237/2441 , H01J2237/2446 , H01J2237/2801 , H01J2237/2817 , H01L21/6833 , H01L2223/54466
摘要： A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.
摘要翻译：提供了一种用于进一步提高速度的系统，即提高SEM型检查装置中的生产量。用于检查基板的表面的检查装置产生从电子束源25.1发射的电子的交叉，然后在样品W的方向上以期望的倍率形成图像以产生交叉。当交叉通过时，作为噪声的电子从具有孔的交叉点移除，进行调整，使得交叉成为平行电子束以以期望的分段形式照射基板。产生电子束，使照度不均匀为10％以下。由检测器25.11检测从样品W发射的电子。

58. 发明授权

US07116816B2 Method of inspecting a pattern and an apparatus thereof and a method of processing a specimen 有权
标题翻译：检查图案的方法及其装置以及处理样本的方法
公开(公告)号：US07116816B2
公开(公告)日：2006-10-03
申请号：US09793922
申请日：2001-02-28
申请人： Maki Tanaka , Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Hiroshi Morioka , Kenji Watanabe , Hiroshi Miyai , Mari Nozoe
发明人： Maki Tanaka , Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Hiroshi Morioka , Kenji Watanabe , Hiroshi Miyai , Mari Nozoe
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/10056 , G06T2207/30121 , G06T2207/30148 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2811 , H01J2237/2817
摘要： In order to enable the most suitable image processing condition to be set as one in which a dispersion in brightness between comparing images caused by object to be inspected and an image detecting system is not applied as a false information, in the present invention, there is obtained a noise characteristic of a secondary electron image caused by the image detecting system is calculated, the most suitable image processing parameters are determined depending on the object to be inspected on the basis of the characteristic, and its comparing processing is performed by using the noise characteristic and the image of the object to be inspected, thereby a dispersion in process for the object to be inspected is evaluated.
摘要翻译：为了使最合适的图像处理条件被设置为将未被应用的被检查对象所引起的比较图像与图像检测系统之间的亮度的色散作为虚假信息，在本发明中，存在计算出由图像检测系统引起的二次电子图像的噪声特性，根据特性根据被检查对象确定最合适的图像处理参数，并且通过使用噪声来执行其比较处理特性和待检查对象的图像，从而评估待检查对象的分散处理。

59. 发明授权

US07112791B2 Method of inspecting pattern and inspecting instrument 有权
标题翻译：检查模式和检验仪器的方法
公开(公告)号：US07112791B2
公开(公告)日：2006-09-26
申请号：US10916451
申请日：2004-08-12
申请人： Mari Nozoe , Hidetoshi Nishiyama , Shigeaki Hijikata , Kenji Watanabe , Koji Abe
发明人： Mari Nozoe , Hidetoshi Nishiyama , Shigeaki Hijikata , Kenji Watanabe , Koji Abe
IPC分类号： H01J37/00 , H01J37/256
CPC分类号： G06T7/0004 , G01N23/20 , G06T2207/30148 , H01J2237/2487 , H01J2237/2817
摘要： A sample inspection system having a sample stage holding a sample to be inspected, electron beam optics so as to radiate an electron beam to the sample, a detector unit that detects a secondly generated signal generated in response to radiation of the sample by the electron beam, a storage for storing a plurality of images obtained from the generated signal and information for classifying the plurality of images by a type of defect in the sample, and an image processing unit. The image processing unit retrieves any of the plurality of images and classifies the retrieved image depending on the type of defect including an electrical defect and a defect in the figure.
摘要翻译：具有保持要检查的样品的样品台的样品检查系统，电子束光学以便向样品辐射电子束的检测器单元，检测器单元，其检测响应于通过电子束的样品的辐射而产生的第二生成的信号用于存储从所生成的信号获得的多个图像的存储器和用于通过样本中的缺陷类型对所述多个图像进行分类的信息，以及图像处理单元。图像处理单元检索多个图像中的任一个，并且根据包括图中的电缺陷和缺陷的缺陷的类型对检索到的图像进行分类。

60. 发明授权

US07061602B2 Method of inspecting a semiconductor device and an apparatus thereof 有权
标题翻译：检查半导体器件的方法及其装置
公开(公告)号：US07061602B2
公开(公告)日：2006-06-13
申请号：US11117336
申请日：2005-04-29
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G06T7/97 , G06T2207/10152 , G06T2207/30148
摘要： A method of inspecting a sample in which the sample is inspected under a plurality of inspection conditions and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要翻译：检查在多个检查条件下检查样品的样品的检查方法以及根据多个检查条件中的每一个检查样品而获得的检查数据以及与检查日期对应的检查日期的样品的位置信息的方法条件被存储。多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的获得。对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

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