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    • 53. 发明授权
    • Mounting method
    • 安装方法
    • US5687947A
    • 1997-11-18
    • US422932
    • 1995-04-17
    • Kazunori IwamotoShunichi UzawaTakao KariyaRyuichi EbinumaHiroshi ChibaShinkichi Ohkawa
    • Kazunori IwamotoShunichi UzawaTakao KariyaRyuichi EbinumaHiroshi ChibaShinkichi Ohkawa
    • G03F7/20G12B5/00F16M13/00
    • G03F7/707G03F7/70841G03F7/70858G03F7/70866G03F7/70883G12B5/00
    • A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container is disclosed. The method is particularly applicable to an SOR X-ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument is hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given latitude only in the x direction. By this arrangement, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.
    • 公开了一种在真空容器中支撑或安装用于支撑掩模和晶片的精密仪器的方法。 该方法特别适用于SOR X射线曝光装置,其中掩模和晶片被设置在期望的减压水平,并且包含在同步加速器辐射中的诸如X射线的曝光能量通过掩模投射到晶片上 以将掩模的图案打印到晶片上。 在x方向垂直的x-y-z坐标系中,将精密仪器挂在至少两个x方向间隔的点上,与真空容器的内壁相连。 在其中一个支撑点上,精密仪器具有x,y和z方向运动的纬度,而在另一个支撑点,精密仪器是固定的,或仅在x方向上被赋予纬度。 通过这种布置,当真空容器因内部和外部压力之间的差异而变形时,可以正确地支撑精密仪器。
    • 55. 发明授权
    • Exposure apparatus
    • 曝光装置
    • US5390227A
    • 1995-02-14
    • US062151
    • 1993-05-17
    • Nobutoshi MizusawaRyuichi EbinumaTakao KariyaIsamu ShimodaShunichi Uzawa
    • Nobutoshi MizusawaRyuichi EbinumaTakao KariyaIsamu ShimodaShunichi Uzawa
    • G03F7/20G21K5/00
    • G03F7/70066G03F7/702G03F7/70858G03F7/70875
    • An exposure apparatus for exposing a semiconductor wafer to a semiconductor device pattern formed in a mask. The exposure energy is, for example, X-rays contains in synchrotron orbit radiation. A blade for limiting the area irradiated with the exposure energy on a mask or wafer is integrally movable in an alignment detecting unit for detecting the alignment mark. Four of such blades are provided to provide a square exposure area. The blades are movable independently by the associated alignment detecting units. Each of the blades is finely movable relative to the associated alignment detecting unit. The shape or size or the like of the blade is determined in consideration of the position of the blade in the direction of the exposure energy irradiation, and the maximum and minimum exposure view angle. The blade is cooled. The exposure area can be changed highly accurately and efficiently with a simple structure.
    • 一种用于将半导体晶片暴露于形成在掩模中的半导体器件图案的曝光装置。 曝光能量例如是X射线含有同步加速器轨道辐射。 用于将在曝光能量上照射的面积限制在掩模或晶片上的刀片可在用于检测对准标记的对准检测单元中一体地移动。 提供四个这样的刀片以提供方形曝光区域。 叶片可通过相关联的对准检测单元独立地移动。 每个叶片相对于相关联的对准检测单元精细地移动。 考虑到叶片在曝光能量照射方向上的位置以及最大和最小曝光视角来确定叶片的形状或尺寸等。 刀片冷却。 曝光区域可以用简单的结构高精度高效地进行改变。
    • 59. 发明授权
    • X-ray exposure system
    • X射线曝光系统
    • US5128975A
    • 1992-07-07
    • US641332
    • 1991-01-15
    • Kazunori IwamotoShunichi UzawaTakao KariyaRyuichi Ebinuma
    • Kazunori IwamotoShunichi UzawaTakao KariyaRyuichi Ebinuma
    • G03F9/00G03F7/20H01L21/027H01L21/30
    • G03F7/707G03F7/708
    • An X-ray exposure system for exposing a semiconductor wafer to a mask with X-rays contained in synchrotron radiation, is disclosed. In this system, the mask and the wafer are held on a main frame so that their surfaces extend substantially parallel to a vertical axis. The main frame suspends from a supporting frame through a plurality of air mounts, each being vertically displaceable. The supporting frame is placed on the same reference surface as that of an SOR ring that produces synchrotron radiation. By using these air mounts, any tilt of the mask and the wafer relative to the irradiation region of the synchrotron radiation, as well as the position of the mask and the wafer in the vertical direction, with respect to the irradiation region, can be controlled and maintained constant. Thus, accurate pattern printing is ensured.
    • 公开了一种用于将半导体晶片暴露于具有同步加速器辐射中所含的X射线的掩模的X射线曝光系统。 在该系统中,掩模和晶片被保持在主框架上,使得其表面基本上平行于垂直轴线延伸。 主框架通过多个空气支架从支撑框架悬挂,每个空气支架可垂直移动。 支撑框架放置在与产生同步加速器辐射的SOR环相同的参考表面上。 通过使用这些空气支架,可以控制掩模和晶片相对于照射区域相对于同步加速器辐射的照射区域的任何倾斜以及掩模和晶片在垂直方向上的位置。 并保持不变。 因此,确保了精确的图案印刷。