会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 52. 发明申请
    • DEVICE FOR INDIVISUAL CONTROL OF MULTIPLE CIRCUIT-UNITS USING SINGLE CABLE AND METHOD THEREOF
    • 使用单个电缆对多个电路单独进行单独控制的设备及其方法
    • WO2005050585A1
    • 2005-06-02
    • PCT/KR2004/002990
    • 2004-11-18
    • LEE, Sam Hyeon
    • LEE, Sam Hyeon
    • G08C15/00
    • G08C19/00
    • Disclosed is a control device and method for individually controlling plural circuit-units connected along a single cable. The control device comprises a central unit, a cable emanating from the central unit, and plural circuit-units connected to the cable in parallel and each provided with a band pass filter having a frequency band different from those of any other band pass filters provided for the other circuit-units. If the central unit selects a carrier frequency and sends the carrier with a control signal through the cable, the control signal is transmitted only to the selected circuit-unit to control the circuit-unit because the signal does not pass through a band pass filter of a circuit-unit that does not match with the signal in frequency.
    • 公开了一种用于单独控制沿着单个电缆连接的多个电路单元的控制装置和方法。 控制装置包括中央单元,从中央单元发出的电缆和并联连接到电缆的多个电路单元,并且每个电路单元设置有带通滤波器,该带通滤波器的频带不同于为 其他电路单元。 如果中央单元选择载波频率并通过电缆发送具有控制信号的载波,则控制信号仅发送到所选择的电路单元以控制电路单元,因为该信号不经过带通滤波器 与频率信号不匹配的电路单元。
    • 58. 发明申请
    • TUNGSTEN SILICIDE ETCH PROCESS WITH REDUCED ETCH RATE MICRO-LOADING
    • TUNGSTEN硅胶蚀刻工艺具有降低的刻蚀速率微加载
    • WO2006130744A1
    • 2006-12-07
    • PCT/US2006/021214
    • 2006-05-31
    • LAM RESEARCH CORPORATIONTAN, Sok, KiowLIU, ShenjianSINGH, HarmeetLEE, Sam, DoLEE, Linda Fung-Ming
    • TAN, Sok, KiowLIU, ShenjianSINGH, HarmeetLEE, Sam, DoLEE, Linda Fung-Ming
    • H01L21/3213
    • H01L21/28061H01L21/32137
    • The embodiments provides an improved tungsten silicide etching process with reduced etch rate micro-loading effect. In one embodiment, a method for etching a layer formed on a substrate is provided. The method includes providing a substrate into a plasma processing chamber, the substrate having a metal silicide layer formed thereon and a patterned mask defined over the metal silicide layer. The method also includes supplying an etching gas mixture of a fluorine-containing gas, a chlorine-containing gas, a nitrogen- containing gas, and an oxygen-containing gas to the plasma processing chamber, wherein the ratio of the nitrogen-containing gas to the fluorine-containing gas is between about 5 to about 15. In addition, the method includes generating a plasma in the plasma processing chamber using the supplied etching gas mixture to etch the metal silicide layer in regions not covered by the patterned mask, the patterned mask defining dense regions and isolated regions, wherein the generated plasma is configured to remove the metal silicide layer in the dense regions and the isolated regions at a reduced etch rate micro-loading.
    • 实施例提供了一种改进的硅化钨蚀刻工艺,具有降低的蚀刻速率微负载效应。 在一个实施例中,提供了蚀刻形成在基板上的层的方法。 该方法包括将衬底提供到等离子体处理室中,所述衬底具有形成在其上的金属硅化物层和限定在金属硅化物层上的图案化掩模。 该方法还包括向等离子体处理室供应含氟气体,含氯气体,含氮气体和含氧气体的蚀刻气体混合物,其中含氮气体与 含氟气体在约5至约15之间。此外,该方法包括使用所提供的蚀刻气体混合物在等离子体处理室中产生等离子体,以在未被图案化掩模覆盖的区域中蚀刻金属硅化物层, 掩模,其限定致密区域和隔离区域,其中所产生的等离子体被配置为以降低的蚀刻速率微负载去除密集区域和隔离区域中的金属硅化物层。
    • 59. 发明申请
    • CONTROLLER FOR MONITOR
    • 监视器控制器
    • WO2006009405A1
    • 2006-01-26
    • PCT/KR2005/002367
    • 2005-07-21
    • MAMEDEN INC.LEE, Sam-Hyeon
    • LEE, Sam-Hyeon
    • G06F1/16
    • G06F1/1601
    • An apparatus for adjusting a tilting angle of a monitor is disclosed. The apparatus is capable of supporting a monitor and adjusting a tilting angle of the same and includes a monitor side support member for supporting one side of a monitor, a base side support member for supporting a base surface, an upper side connection member for connecting an upper side of the monitor side support member and an upper side of the base side support member, and a lower side connection member for connecting a lower side of the monitor side support member and a lower side of the base side support member.
    • 公开了一种用于调节监视器的倾斜角度的装置。 该装置能够支撑监视器并调整其倾斜角度,并且包括用于支撑监视器的一侧的监视器侧支撑构件,用于支撑基面的基部侧支撑构件,用于连接监视器的上侧连接构件 监视器侧支撑构件的上侧和底侧支撑构件的上侧,以及用于连接监视器侧支撑构件的下侧和底侧支撑构件的下侧的下侧连接构件。
    • 60. 发明申请
    • APPARATUS FOR MANUFACTURING ORGANIC ELECTRO-LUMINESCENT LIGHT EMITTING DEVICES FOR MASS PRODUCTION
    • 制造大规模生产有机电致发光发光装置的装置
    • WO2003043067A1
    • 2003-05-22
    • PCT/KR2002/002135
    • 2002-11-15
    • JEONG, Kwang-HoLEE, Sam-HyeonHWANG, Chang-Hun
    • JEONG, Kwang-HoLEE, Sam-HyeonHWANG, Chang-Hun
    • H01L21/20
    • C23C14/12C23C14/568H01L51/56
    • The present invention relates to an apparatus for manufacturing an organic electro-luminescent device, and more particularly, to an apparatus for manufacturing an organic electro-luminescent device including a thin film with at least one player. The apparatus for manufacturing the organic electro-luminescent device according to the present invention comprises a substrate carrying chamber 100 in which a plurality of openings 110 for installation of processing chambers are formed and a pump port 120 is installed, a substrate carrying means 200 installed in the substrate carrying chamber 100 for carrying substrates processed in the plurality of openings to next openings within the substrate carrying chamber 100, and a plurality of chambers 300 attached to the openings 100 of the substrate carrying chamber 100, respectively. Accordingly, the substrates can be carried within the substrate carrying chamber and relevant processes such as substrate cleaning, mask alignment and cleaning, and vapor deposition can be simultaneously performed within the plurality of chambers.
    • 本发明涉及一种用于制造有机电致发光器件的设备,更具体地,涉及一种用于制造包括具有至少一个播放器的薄膜的有机电致发光器件的设备。 根据本发明的用于制造有机电致发光器件的装置包括:衬底承载室100,其中形成有用于安装处理室的多个开口110和安装泵口120;衬底承载装置200安装在 用于将在多个开口中处理的衬底承载到衬底承载室100内的下一个开口的衬底承载室100以及分别附接到衬底承载室100的开口100的多个室300。 因此,可以在基板承载室内承载基板,并且可以在多个室内同时执行诸如基板清洁,掩模对准和清洁以及气相沉积的相关工艺。