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    • 51. 发明授权
    • Semiconductor device having a plurality of stacked transistors and method of fabricating the same
    • 具有多个堆叠晶体管的半导体器件及其制造方法
    • US07825472B2
    • 2010-11-02
    • US12219278
    • 2008-07-18
    • Han-Byung ParkSoon-Moon JungHoon LimCha-Dong YeoByoung-Keun SonJae-Joo ShimChang-Min Hong
    • Han-Byung ParkSoon-Moon JungHoon LimCha-Dong YeoByoung-Keun SonJae-Joo ShimChang-Min Hong
    • H01L27/12
    • H01L21/8221H01L27/0688H01L27/1108H01L27/1207
    • A semiconductor device according to example embodiments may have a plurality of stacked transistors. The semiconductor device may have a lower insulating layer formed on a semiconductor substrate and an upper channel body pattern formed on the lower insulating layer. A source region and a drain region may be formed within the upper channel body pattern, and a non-metal transfer gate electrode may be disposed on the upper channel body pattern between the source and drain regions. The non-metal transfer gate electrode, the upper channel body pattern, and the lower insulating layer may be covered by an intermediate insulating layer. A metal word line may be disposed within the intermediate insulating layer to contact at least an upper surface of the non-metal transfer gate electrode. An insulating spacer may be disposed on a sidewall of the metal word line. A metal node plug may be disposed within the intermediate insulating layer and the lower insulating layer to contact the source region of the upper channel body pattern. Example embodiments also relate to a method of fabricating the above semiconductor device.
    • 根据示例性实施例的半导体器件可以具有多个堆叠的晶体管。 半导体器件可以具有形成在半导体衬底上的下绝缘层和形成在下绝缘层上的上沟道体图案。 源极区域和漏极区域可以形成在上部通道主体图案内,并且非金属转移栅极电极可以设置在源极和漏极区域之间的上部通道主体图案上。 非金属转移栅电极,上通道体图案和下绝缘层可以被中间绝缘层覆盖。 金属字线可以设置在中间绝缘层内以接触非金属转移栅电极的至少上表面。 绝缘间隔物可以设置在金属字线的侧壁上。 金属节点插头可以设置在中间绝缘层和下绝缘层内以接触上通道主体图案的源区域。 示例性实施例还涉及制造上述半导体器件的方法。
    • 60. 发明申请
    • Method of forming single crystal semiconductor thin film on insulator and semiconductor device fabricated thereby
    • 在绝缘体上形成单晶半导体薄膜的方法和由此制造的半导体器件
    • US20060097319A1
    • 2006-05-11
    • US11197836
    • 2005-08-05
    • Jong-Hyuk KimSoon-Moon JungWon-Seok ChoJae-Hoon JangKun-Ho KwakSung-Jin KimJae-Joo Shim
    • Jong-Hyuk KimSoon-Moon JungWon-Seok ChoJae-Hoon JangKun-Ho KwakSung-Jin KimJae-Joo Shim
    • H01L27/01
    • H01L21/8221H01L21/28525H01L21/76877H01L27/0688H01L27/11H01L27/1108H01L27/12H01L29/785
    • Methods of forming a single crystal semiconductor thin film on an insulator and semiconductor devices fabricated thereby are provided. The methods include forming an interlayer insulating layer on a single crystal semiconductor layer. A single crystal semiconductor plug is formed to penetrate the interlayer insulating layer. A semiconductor oxide layer is formed within the single crystal semiconductor plug using an ion implantation technique and an annealing technique. As a result, the single crystal semiconductor plug is divided into a lower plug and an upper single crystal semiconductor plug with the semiconductor oxide layer being interposed therebetween. That is, the upper single crystal semiconductor plug is electrically insulated from the lower plug by the semiconductor oxide layer. A single crystal semiconductor pattern is formed to be in contact with the upper single crystal semiconductor plug and cover the interlayer insulating layer. The single crystal semiconductor pattern is grown by an epitaxy growth technique using the upper single crystal semiconductor plug as a seed layer, or by a solid epitaxy growth technique using the upper single crystal semiconductor plug as a seed layer.
    • 提供了在绝缘体上形成单晶半导体薄膜的方法和由此制造的半导体器件。 所述方法包括在单晶半导体层上形成层间绝缘层。 形成单晶半导体插塞以穿透层间绝缘层。 使用离子注入技术和退火技术在单晶半导体插头内形成半导体氧化物层。 结果,单晶半导体插头被分成下插头和上部单晶半导体插头,半导体氧化物层之间插入其中。 也就是说,上单晶半导体插头通过半导体氧化物层与下插塞电绝缘。 单晶半导体图案形成为与上单晶半导体插头接触并覆盖层间绝缘层。 通过使用上部单晶半导体插塞作为种子层的外延生长技术,或通过使用上部单晶半导体插塞作为种子层的固体外延生长技术,生长单晶半导体图案。