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41. 发明申请

US20120298864A1 Charged Particle Beam Apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US20120298864A1
公开(公告)日：2012-11-29
申请号：US13521273
申请日：2011-01-12
申请人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
发明人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
IPC分类号： H01J37/26
CPC分类号： H01J49/067 , H01J37/244 , H01J2237/2441 , H01J2237/24465 , H01J2237/2448 , H01J2237/28
摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
摘要翻译：为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19）样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40）以及处理来自带电粒子检测器的输出信号的信号计算单元。带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角，对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

42. 发明授权

US08304723B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US08304723B2
公开(公告)日：2012-11-06
申请号：US12725857
申请日：2010-03-17
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： H01J37/04 , H01J37/28
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化 μm以上。缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

43. 发明申请

US20120261574A1 Electron Beam Apparatus and Electron Beam Inspection Method 有权
标题翻译：电子束设备和电子束检测方法
公开(公告)号：US20120261574A1
公开(公告)日：2012-10-18
申请号：US13530797
申请日：2012-06-22
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an E×B deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译：一种电子束装置，包括放置样品的样品台和电子光学系统。电子光学系统包括：电子枪，其产生一次电子束，将一次电子束收敛在样品上的浸没物镜;将主光束照射产生的二次粒子分离的E×B偏转器; 来自主光束的光轴的样品，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测速度分量和方位分量由二次粒子与反射部件碰撞产生的三元粒子，以及位于反射部件上方的中心检测器。

44. 发明授权

US08217363B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US08217363B2
公开(公告)日：2012-07-10
申请号：US12073948
申请日：2008-03-12
申请人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
发明人： Michio Hatano , Takashi Ohshima , Mitsugu Sato
IPC分类号： H01J1/50
CPC分类号： G01N23/225 , H01J37/244 , H01J2237/2446 , H01J2237/24485 , H01J2237/28
摘要： A scanning electron microscope can discriminate secondary particles in a desired energy region by band-pass and detect the secondary particles with a high yield point. Even when a lens 23 is disposed on an electron source side of an objective lens 18, and a primary electron beam forms any optical system on the electron gun side of the lens, the lens operates the primary electron beam to be converged to a convergent point 24 that is a specific position. A detection ExB 16 that supplies a field that affects the locus of the secondary particles that are generated from a specimen 2 is disposed at the convergent point 24 of the primary electron beam so as to lead only the secondary particles in a specific energy range to a detection unit 13. Because a position to which the field that affects the locus of the secondary particles is supplied is the convergent point of the primary electron beam 19, it is possible to lead only the secondary particles of the desired energy to the detection unit without enlarging the aberration of the primary electron beam 19 and also to effectively conduct the band-pass discrimination of the energy. As a result, the signal electrons according to an observation object can be discriminated and detected.
摘要翻译：扫描电子显微镜可以通过带通来区分所需能量区域中的二次粒子，并以高屈服点检测二次粒子。即使当透镜23设置在物镜18的电子源侧，并且一次电子束在透镜的电子枪侧形成任何光学系统时，该透镜操作一次电子束以收敛到会聚点 24这是一个具体的位置。提供影响从样本2产生的二次粒子的轨迹的场的检测ExB 16设置在一次电子束的会聚点24处，以便仅将二次粒子在特定能量范围内引导到因为提供影响二次粒子的轨迹的场的位置是一次电子束19的会聚点，所以只能将具有所需能量的二次粒子仅引导到检测单元而没有扩大一次电子束19的像差，并且有效地进行能量的通带鉴别。结果，可以区分和检测根据观察对象的信号电子。

45. 发明授权

US08030614B2 Charged particle beam apparatus and dimension measuring method 有权
公开(公告)号：US08030614B2
公开(公告)日：2011-10-04
申请号：US12549828
申请日：2009-08-28
申请人： Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
发明人： Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
IPC分类号： H01J37/21 , G01N21/00 , G01N23/00
CPC分类号： H01J37/244 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/221 , H01J2237/24578 , H01J2237/24592 , H01J2237/2816 , H01J2237/2817
摘要： There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.

46. 发明授权

US07964845B2 Charged particle beam device 有权
标题翻译：带电粒子束装置
公开(公告)号：US07964845B2
公开(公告)日：2011-06-21
申请号：US12289089
申请日：2008-10-20
申请人： Yuusuke Tanba , Mitsugu Sato , Kaname Takahashi , Shunya Watanabe , Mine Nakagawa , Atsushi Muto , Akinari Morikawa
发明人： Yuusuke Tanba , Mitsugu Sato , Kaname Takahashi , Shunya Watanabe , Mine Nakagawa , Atsushi Muto , Akinari Morikawa
IPC分类号： H01J37/28 , G01N13/10
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24455 , H01J2237/2446 , H01J2237/2802
摘要： The charged particle beam device of this invention separately detects secondary signal particles emitted from the surface of a sample, dark field signal particles scattered within and transmitted through the sample, bright field signal particles transmitted through the sample without being scattered within the sample, and thereby allows the operator to observe the image with an optimum contrast according to applications. In order to detect only the dark field transmitted signal particles scattered within the sample, among the transmitted signal particles obtained by the primary charged particle beams having transmitted through the thin film sample, the device includes a transmitted signal conversion member having an opening through which the bright field transmitted signal particles not being scattered within the sample can pass, and a detection means for detecting signals colliding against the conversion member.
摘要翻译：本发明的带电粒子束装置分别检测从样品表面发射的二次信号颗粒，散射在样品内并透过样品的暗场信号颗粒，通过样品透射的亮场信号颗粒，而不分散在样品内，允许操作者根据应用以最佳对比度观察图像。为了仅检测在样品内散射的暗场发射信号颗粒，在通过薄膜样品传输的初级带电粒子束获得的透射信号颗粒中，该装置包括具有开口的透射信号转换构件，未被分散在样品内的明场传输信号粒子可以通过;以及检测装置，用于检测与转换构件相撞的信号。

47. 发明授权

US07923701B2 Charged particle beam equipment 有权
标题翻译：带电粒子束设备
公开(公告)号：US07923701B2
公开(公告)日：2011-04-12
申请号：US12081969
申请日：2008-04-24
申请人： Hiromi Inada , Hiroyuki Tanaka , Shun-ichi Watanabe , Shigeto Isakozawa , Mitsugu Sato , Atsushi Takane , Satoshi Yamaguchi
发明人： Hiromi Inada , Hiroyuki Tanaka , Shun-ichi Watanabe , Shigeto Isakozawa , Mitsugu Sato , Atsushi Takane , Satoshi Yamaguchi
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/265 , H01J2237/15 , H01J2237/2487 , H01J2237/2826
摘要： Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned. Also, a specimen stand has a mechanism for holding a specimen having a periodical structure or a specimen simultaneously having a periodical structure and a non-periodical structure, and a storage device for automatically changing a magnification for an enlarged specimen image, and storing measured values at all magnifications.
摘要翻译：带电粒子束设备具有用于校准放大的标本图像的尺寸值的处理单元和用于改变扫描带电粒子束的量的装置。此外，试样架具有用于保持具有周期性结构的试样或同时具有周期性结构和非周期性结构的试样的机构，以及用于自动改变放大的试样图像的倍率并存储测量值的存储装置在所有放大倍率。

48. 发明授权

US07838827B2 Monochromator and scanning electron microscope using the same 有权
标题翻译：单色器和扫描电子显微镜使用相同
公开(公告)号：US07838827B2
公开(公告)日：2010-11-23
申请号：US11987018
申请日：2007-11-26
申请人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
发明人： Yoichi Ose , Shunroku Taya , Hideo Todokoro , Tadashi Otaka , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/05
CPC分类号： H01J37/05 , H01J37/153 , H01J37/28
摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.
摘要翻译：本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场在与包含狭缝的表面形成对称镜的位置处。该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

49. 发明授权

US07807980B2 Charged particle beam apparatus and methods for capturing images using the same 有权
标题翻译：带电粒子束装置及使用该装置拍摄图像的方法
公开(公告)号：US07807980B2
公开(公告)日：2010-10-05
申请号：US11647348
申请日：2006-12-29
申请人： Chie Shishido , Mayuka Oosaki , Mitsugu Sato , Hiroki Kawada , Tatsuya Maeda
发明人： Chie Shishido , Mayuka Oosaki , Mitsugu Sato , Hiroki Kawada , Tatsuya Maeda
IPC分类号： G21K7/00 , A61N5/00 , G21G5/00
CPC分类号： H01J37/263 , H01J37/265 , H01J37/28 , H01J2237/2826
摘要： The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement. Accordingly, the present invention provides methods for reducing the variation in the CD value caused by the variation in the electron beam landing angle with respect to the sample with an equal beam landing angle and methods for reducing the instrumental error caused by the difference in the electron beam landing angle between apparatuses.
摘要翻译：本发明提供一种用于测量捕获用于测量的图像的半导体装置等的微尺寸（CD值）的带电粒子束装置。对于本发明，使用用于校准的样品，其上在视场中排列有通过晶体各向异性蚀刻技术产生的表面上具有已知角度的多个多面体结构物体。基于每个多面体结构物体的图像上的几何变形来计算视野内的每个位置处的束着陆角。用于均衡视场内每个位置的束着陆角的光束控制参数被预先注册。当进行尺寸测量时，根据待测图案的位置在观察区域中应用登记的光束控制参数。因此，本发明提供了减少相对于具有相同束着陆角的样品的电子束着角的变化引起的CD值的变化的方法，以及用于减少由电子差异引起的仪器误差的方法设备之间的束着陆角度。

50. 发明授权

US07807966B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07807966B2
公开(公告)日：2010-10-05
申请号：US12250763
申请日：2008-10-14
申请人： Hirohiko Kitsuki , Kazuo Aoki , Mitsugu Sato
发明人： Hirohiko Kitsuki , Kazuo Aoki , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , H01J37/04 , H01J37/263 , H01J2237/21 , H01J2237/2487 , H01J2237/2809
摘要： A scanning electron microscope for digitally processing an image signal to secure the largest focal depth and the best resolution in accordance with the magnification for observation is disclosed. The angle of aperture of an optical system having a plurality of convergence lenses is changed by changing the convergence lenses and the hole diameter of a diaphragm. The angle α of aperture of the electron beam is changed in accordance with the visual field range corresponding to a single pixel, i.e. what is called the pixel size.
摘要翻译：公开了一种用于数字处理图像信号以确保最大焦深和根据观察放大率的最佳分辨率的扫描电子显微镜。具有多个会聚透镜的光学系统的光圈角度通过改变会聚透镜和光阑的孔径而改变。根据与单个像素对应的视场范围，即所谓的像素大小，改变电子束的孔径的角度α。

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