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    • 49. 发明授权
    • Semiconductor laser
    • 半导体激光器
    • US5936990A
    • 1999-08-10
    • US877514
    • 1997-06-17
    • Takahiro Nakamura
    • Takahiro Nakamura
    • H01S5/00H01S5/22H01S5/227H01S5/343H01S3/19
    • B82Y20/00H01S5/227H01S5/2206H01S5/2226H01S5/2275H01S5/34306H01S5/3434
    • A semiconductor laser includes an active layer and a current block structure where a p-type InP layer (a first layer), an n-type InP layer (a second layer), a p-type InP layer (a third layer) and an n-type InP layer (a fourth layer) are laminated, at least one layer selected from a non-doped InP layer, an n-type InP impurity controlled layer and a p-type InP impurity controlled layer being interposed in at least one interface selected from that between the p-type InP layer (the first layer) and the n-type InP layer (the second layer) and that between the n-type InP layer (the second layer) and the p-type InP layer (the third layer); where, the n-type or p-type InP impurity controlled layer is a layer having such an n-type or p-type, respectively, impurity concentration profile in the layer that the impurity concentration continuously decreases from the n-type InP layer (the second layer) side or from the p-type InP layer (the first or the third layer) side, respectively, to the other side until the concentration of the impurity reaches equal to or below 1.times.10.sup.17 cm.sup.-3, and the n-type or p-type , respectively, InP impurity controlled layer is formed so as to be adjacent to the same type InP layer.
    • 半导体激光器包括有源层和当前块结构,其中p型InP层(第一层),n型InP层(第二层),p型InP层(第三层)和 n型InP层(第四层)层叠,选自非掺杂InP层,n型InP杂质控制层和p型InP杂质控制层中的至少一层插入至少一个界面 选自p型InP层(第一层)和n型InP层(第二层)之间以及n型InP层(第二层)和p型InP层(第二层)之间 第三层); 其中,n型或p型InP杂质控制层是在杂质浓度从n型InP层连续降低的层中具有这样的n型或p型杂质浓度分布的层( 第二层)侧或p型InP层(第一或第三层)侧分别延伸到另一侧,直到杂质的浓度达到等于或低于1×10 17 cm -3,并且n型 或p型,分别形成InP杂质控制层,以便与相同类型的InP层相邻。