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41. 发明授权

US07474469B2 Arrangement of optical elements in a microlithographic projection exposure apparatus 失效
标题翻译：微光刻投影曝光装置中的光学元件的布置
公开(公告)号：US07474469B2
公开(公告)日：2009-01-06
申请号：US11232606
申请日：2005-09-22
申请人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder , Wolfgang Singer
发明人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder , Wolfgang Singer
IPC分类号： G02B3/12 , G02B3/00
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.
摘要翻译：本发明涉及微光刻投影曝光装置中的光学元件的布置，特别是在微光刻投影曝光装置的投影物镜中。该装置包括刚性第一光学元件，具有第一光学表面的刚性第二光学元件和在相对侧上的第二光学表面和第一液体。第一光学元件具有凹面光学表面。第二光学元件的第一面面对第一光学元件的凹面光学表面。第一液体至少部分地填充第一光学元件和第二光学元件之间的空间。

42. 发明授权

US07782538B2 Projection objective having a high aperture and a planar end surface 有权
标题翻译：具有高孔径和平坦端面的投射物镜
公开(公告)号：US07782538B2
公开(公告)日：2010-08-24
申请号：US12269686
申请日：2008-11-12
申请人： Susanne Beder , Wolfgang Singer , Karl-Heinz Schuster
发明人： Susanne Beder , Wolfgang Singer , Karl-Heinz Schuster
IPC分类号： G02B27/30 , G03B27/42
CPC分类号： G02B17/0892 , B82Y10/00 , G02B17/0804 , G02B17/0812 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。至少一个光学元件是在工作波长处由折射率n≥1.6的高折射率材料制成的高折射率光学元件。

43. 发明授权

US07466489B2 Projection objective having a high aperture and a planar end surface 有权
标题翻译：具有高孔径和平坦端面的投射物镜
公开(公告)号：US07466489B2
公开(公告)日：2008-12-16
申请号：US11151465
申请日：2005-06-14
申请人： Susanne Beder , Wolfgang Singer , Karl-Heinz Schuster
发明人： Susanne Beder , Wolfgang Singer , Karl-Heinz Schuster
IPC分类号： G02B3/00 , G03B27/42
CPC分类号： G02B17/0892 , B82Y10/00 , G02B17/0804 , G02B17/0812 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。至少一个光学元件是在工作波长处由折射率n> = 1.6的高折射率材料制成的高折射率光学元件。

44. 发明申请

US20060012885A1 Projection objective having a high aperture and a planar end surface 有权
标题翻译：具有高孔径和平坦端面的投射物镜
公开(公告)号：US20060012885A1
公开(公告)日：2006-01-19
申请号：US11151465
申请日：2005-06-14
申请人： Susanne Beder , Wolfgang Singer , Karl-Heinz Schuster
发明人： Susanne Beder , Wolfgang Singer , Karl-Heinz Schuster
IPC分类号： G02B3/00
CPC分类号： G02B17/0892 , B82Y10/00 , G02B17/0804 , G02B17/0812 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70958
摘要： A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的适合于微光刻投影曝光机的投影物镜的平面上的投影物镜具有在投影物镜的工作波长处对于辐射而透明的多个光学元件。至少一个光学元件是在工作波长处由折射率n> = 1.6的高折射率材料制成的高折射率光学元件。

45. 发明授权

US07385764B2 Objectives as a microlithography projection objective with at least one liquid lens 有权
标题翻译：目标作为具有至少一个液体透镜的微光刻投影物镜
公开(公告)号：US07385764B2
公开(公告)日：2008-06-10
申请号：US10562257
申请日：2004-12-14
申请人： David R. Shafer , Susanne Beder , Karl-Heinz Schuster , Wolfgang Singer
发明人： David R. Shafer , Susanne Beder , Karl-Heinz Schuster , Wolfgang Singer
IPC分类号： G02B9/00 , G02B1/06
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index NF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.
摘要翻译：本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。目标具有最大的可调节图像侧数值孔径NA，由实心透明体，特别是玻璃或晶体制成的至少一个第一透镜，具有折射率n L L和至少一个液体透镜（F）由折射率为NF的透明液体制成。在工作波长处，第一透镜具有物镜的所有实心透镜的最大折射率n L L，所述至少一个液体透镜的折射率n F ）大于第一透镜的折射率nLL ，并且数值孔径NA的值大于1。

46. 发明授权

US07570343B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US07570343B2
公开(公告)日：2009-08-04
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译：微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜在投影透镜的图像平面中。投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。

47. 发明申请

US20060187430A1 Microlithographic projection exposure apparatus 有权
公开(公告)号：US20060187430A1
公开(公告)日：2006-08-24
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

48. 发明授权

US07728987B2 Method of manufacturing an optical element 有权
标题翻译：制造光学元件的方法
公开(公告)号：US07728987B2
公开(公告)日：2010-06-01
申请号：US11596187
申请日：2004-05-14
申请人： Ralf Arnold , Bernd Dörband , Frank Schillke , Susanne Beder
发明人： Ralf Arnold , Bernd Dörband , Frank Schillke , Susanne Beder
IPC分类号： G01B11/02
CPC分类号： G01B11/2441
摘要： A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element. Further, a method of calibrating the interferometer optics includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam of measuring light generated by the interferometer optics and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics.
摘要翻译：制造光学元件的方法包括通过使用产生仅照射被测光学元件的子孔径的测量光束的干涉仪光学元件来测试光学元件。干涉仪光学器件包括全息图。子孔径测量的结果被缝合在一起以获得关于光学元件的整个表面的测量结果。此外，校准干涉仪光学器件的方法包括使用校准光学器件执行干涉测量，所述校准光学器件具有仅覆盖由干涉仪光学器件产生的测量光束的全部横截面的子孔径并将子孔缝合在一起的全息图测量以获得指示干涉仪光学器件的完整横截面的结果。

49. 发明申请

US20060066962A1 Arrangement of optical elements in a microlithographic projection exposure apparatus 失效
公开(公告)号：US20060066962A1
公开(公告)日：2006-03-30
申请号：US11232606
申请日：2005-09-22
申请人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder
发明人： Michael Totzeck , Gerhart Fuerter , Olaf Dittmann , Karl-Heinz Schuster , David Shafer , Susanne Beder
IPC分类号： G02B7/02
CPC分类号： G02B3/12 , G02B17/0812 , G02B17/0856 , G03F7/70225 , G03F7/70241 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.

50. 发明授权

US07061626B1 Method of manufacturing an optical element using a hologram 失效
标题翻译：使用全息图制造光学元件的方法
公开(公告)号：US07061626B1
公开(公告)日：2006-06-13
申请号：US10845251
申请日：2004-05-14
申请人： Frank Schillke , Susanne Beder , Jochen Hetzler
发明人： Frank Schillke , Susanne Beder , Jochen Hetzler
IPC分类号： G01B9/02
CPC分类号： G01B9/021 , G02B5/32 , G03H1/08 , G03H2001/0072
摘要： A method of manufacturing an optical element having an optical surface of a target shape includes performing an interferometric test using an interferometer optics, wherein the interferometer optics includes a hologram that deflects a beam of measuring light by a substantial angle or that displaces an axis of symmetry of measuring light emerging from the hologram with respect to an axis of symmetry of measuring light incident on the hologram.
摘要翻译：制造具有目标形状的光学表面的光学元件的方法包括使用干涉仪光学器件执行干涉测试，其中所述干涉仪光学器件包括将测量光束偏转相当角度的全息图，或者使对称轴测量相对于入射在全息图上的测量光的对称轴从全息图出射的光。

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