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41. 发明授权

US07621807B2 Fixing mechanism for a container in a vehicle air conditioning device 有权
标题翻译：车辆空调装置中的容器的固定机构
公开(公告)号：US07621807B2
公开(公告)日：2009-11-24
申请号：US11325580
申请日：2006-01-04
申请人： Shinichi Hara , Akihiko Yoshida , Takao Koike
发明人： Shinichi Hara , Akihiko Yoshida , Takao Koike
IPC分类号： B60H3/00 , B60H1/00 , F24F3/12
CPC分类号： B60H3/0092 , B60H3/0085
摘要： The purpose of the present invention is to satisfy the following: (1) it prevents the adsorption of antibacterial agent to the filter during storage, (2) for this reason, makes the container and the filter separable and furthermore makes it easy to fix the container, and (3) makes it possible to change the filter and the antibacterial agent respectively separately with simple operations. The fixing mechanism of the container in which an antibacterial agent has been sealed according to the present invention is a fixing mechanism for a container in which an antibacterial agent is sealed in a vehicle air conditioning device. And, fixing means 53 are provided for removably fixing the container 31 to the lid 51 which opens and closes the inlet/outlet port 50 of the filter unit 30.
摘要翻译：本发明的目的是满足以下要求：（1）防止了在贮存期间将抗菌剂吸附到过滤器上，（2）为此，容器和过滤器可分离，并且使得容易固定容器，（3）可以通过简单的操作分别更换过滤器和抗菌剂。根据本发明的密封有抗菌剂的容器的固定机构是在车辆空调装置中密封抗菌剂的容器的固定机构。并且，设置固定装置53，用于将容器31可拆卸地固定到打开和关闭过滤器单元30的入口/出口50的盖51上。

42. 发明申请

US20090237674A1 Method for estimating distance between tracking type laser interferometer and target, and tracking type laser interferometer 失效
标题翻译：跟踪型激光干涉仪与目标之间的距离估计方法以及跟踪型激光干涉仪
公开(公告)号：US20090237674A1
公开(公告)日：2009-09-24
申请号：US12379467
申请日：2009-02-23
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： G01B11/14 , G06F15/00
CPC分类号： G01B11/002 , G01B9/02083 , G01B2290/15
摘要： In the tracking type laser interferometer including: a laser interferometer; an optical axis deviation detection sensor for detecting a deviation of an optical axis of the laser interferometer; a two-axis turning mechanism for turning the laser interferometer to any optional direction; an angle sensor for detecting a turning angle of the two-axis turning mechanism; a retroreflector for reflecting its reflected light to a direction parallel to the incident light; and a controller for driving the two-axis turning mechanism so as to track the retroreflector based on signals of the optical axis deviation detection sensor and the angle sensor, stop of the retroreflector is detected, and a target distance is calculated from the turning center of the laser interferometer to the center of the retroreflector based on the total sum of deviation of an optical axis during movement, which is obtained by the optical axis deviation detection sensor, and a turning angle during movement, which is obtained by the angle sensor.
摘要翻译：在跟踪型激光干涉仪中包括：激光干涉仪; 用于检测激光干涉仪的光轴的偏差的光轴偏差检测传感器; 用于将激光干涉仪转动到任何可选方向的两轴转动机构; 用于检测所述两轴转动机构的转动角度的角度传感器; 用于将其反射光反射到与入射光平行的方向的后向反射器; 以及控制器，用于基于光轴偏差检测传感器和角度传感器的信号来驱动双轴转动机构以跟踪后向反射器，检测到后向反射器的停止，并且从转向中心激光干涉仪基于由光轴偏差检测传感器获得的运动期间的光轴的偏差和通过角度传感器获得的运动期间的转动角度，到后向反射器的中心的距离。

43. 发明授权

US07566422B2 Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus 失效
标题翻译：带有储存氦气的储罐的曝光装置和使用曝光装置的制造装置的方法
公开(公告)号：US07566422B2
公开(公告)日：2009-07-28
申请号：US11201142
申请日：2005-08-11
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05D16/00 , C23C14/00
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

44. 发明授权

US07388674B2 Laser tracking interferometer 有权
标题翻译：激光跟踪干涉仪
公开(公告)号：US07388674B2
公开(公告)日：2008-06-17
申请号：US11458533
申请日：2006-07-19
申请人： Shinichirou Yanaka , Makoto Abe , Shinichi Hara , Naoyuki Taketomi
发明人： Shinichirou Yanaka , Makoto Abe , Shinichi Hara , Naoyuki Taketomi
IPC分类号： G01B9/06
CPC分类号： G01S17/36 , G01B11/03 , G01S7/4812 , G01S7/497 , G01S17/42 , G01S17/66
摘要： A laser tracking interferometer directs a laser beam to a retroreflector serving as an object to be measured to sense a displacement of the retroreflector using interference with a laser beam back reflected from the retroreflector. The laser tracking interferometer includes: a reference sphere; a carriage that rotates about a center of the reference sphere; a laser interferometer; a displacement gage for providing a displacement signal corresponding to a relative displacement between the reference sphere and the displacement gage; a data processing apparatus for computing a displacement of the retroreflector; a position sensitive detector for providing a position signal corresponding to deviation of a laser beam; and a controller for controlling rotation of the carriage based on the position signal so that the amount of deviation becomes zero.
摘要翻译：激光跟踪干涉仪将激光束引导到用作被测量对象的后向反射器，以使用与从后向反射器反射的激光束的干涉来感测回射器的位移。激光跟踪干涉仪包括：参考球; 围绕参考球的中心旋转的托架; 激光干涉仪; 用于提供对应于参考球和位移计之间的相对位移的位移信号的位移计; 用于计算后向反射器的位移的数据处理装置; 位置敏感检测器，用于提供对应于激光束偏离的位置信号; 以及控制器，用于基于位置信号控制滑架的旋转，使得偏差量变为零。

45. 发明授权

US07145632B2 Cooling apparatus 有权
公开(公告)号：US07145632B2
公开(公告)日：2006-12-05
申请号：US11232987
申请日：2005-09-23
申请人： Shinichi Hara , Eiji Sakamoto , Yoshinori Miwa , Yasuo Hasegawa , Yoshiki Kino
发明人： Shinichi Hara , Eiji Sakamoto , Yoshinori Miwa , Yasuo Hasegawa , Yoshiki Kino
IPC分类号： G03B27/42
CPC分类号： G03F7/70891 , G03B27/52
摘要： A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.

46. 发明授权

US06804323B2 Mask pattern magnification correction method, magnification correction apparatus, and mask structure 失效
标题翻译：掩模图案放大校正方法，倍率校正装置和掩模结构
公开(公告)号：US06804323B2
公开(公告)日：2004-10-12
申请号：US10176614
申请日：2002-06-24
申请人： Akira Moriya , Takeshi Miyachi , Shinichi Hara , Toshinobu Tokita
发明人： Akira Moriya , Takeshi Miyachi , Shinichi Hara , Toshinobu Tokita
IPC分类号： G21K500
CPC分类号： G03F1/22 , Y02P90/14 , Y02P90/18 , Y02P90/20
摘要： A method of correcting a magnification of a mask pattern formed on a mask substrate. The method includes applying forces to four pressurizing points of an outer periphery of an approximately ring-shaped frame, which supports the mask substrate and has a rectangular window, on substantially extended lines of two diagonal lines of the rectangular window, and adjusting at least an angle, to the extended lines, of a vector of the forces applied to each of the pressurizing points.
摘要翻译：一种校正形成在掩模基板上的掩模图案的放大率的方法。该方法包括在矩形窗口的两个对角线的基本上延伸的线上对大约环形框架的外周边的四个加压点施加力，该四个加压点支撑掩模基板并具有矩形窗口，并且至少调整与施加到每个加压点的力的向量的延伸线的角度。

47. 发明授权

US06750946B2 Processing apparatus for processing sample in predetermined atmosphere 失效
标题翻译：用于在预定气氛中处理样品的处理装置
公开(公告)号：US06750946B2
公开(公告)日：2004-06-15
申请号：US09897930
申请日：2001-07-05
申请人： Yutaka Tanaka , Shigeru Terashima , Shinichi Hara
发明人： Yutaka Tanaka , Shigeru Terashima , Shinichi Hara
IPC分类号： G03B2752
CPC分类号： H01L21/67196 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70866 , H01L21/67017 , H01L21/67201 , Y10T29/41
摘要： A substrate processing system has a first processing device which processes a substrate with a first process in a first gas atmosphere within a process chamber and a transfer device that transfers a substrate in a second gas atmosphere within a clean booth, the transfer device transferring a substrate which has been processed with a second process by a second processing device or a substrate which is to be processed by that second processing device. A load-lock chamber has a substrate transfer path between the first processing device and the transfer device and there is a gas supply device which supplies the first gas from the process chamber to the load-lock chamber when the substrate is transferred between the load-lock chamber and a first processing device, and supplies the second gas from the clean booth to the load-lock chamber when the substrate is transferred between the load-lock chamber and the transfer device.
摘要翻译：基板处理系统具有第一处理装置，其处理处理室内的第一气体气氛中的第一处理的基板和在清洁室内将第二气体气氛中的基板转印的转印装置，所述转印装置将基板其通过第二处理装置或将被该第二处理装置处理的基板的第二处理进行处理。负载锁定室具有在第一处理装置和转印装置之间的基板传送路径，并且存在一个气体供应装置，当基板在载荷传递装置之间传送时，将第一气体从处理室供应到装载锁定室，锁定室和第一处理装置，并且当衬底在负载锁定室和转移装置之间传送时，将来自清洁室的第二气体供应到负载锁定室。

48. 发明授权

US06084938A X-ray projection exposure apparatus and a device manufacturing method 失效
公开(公告)号：US06084938A
公开(公告)日：2000-07-04
申请号：US813349
申请日：1997-03-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K5/02 , G03F7/20 , G21K5/10 , H01L21/027 , H01L21/683 , G21K5/00
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

49. 发明授权

US6005910A Holding mechanism, and exposure apparatus using the mechanism 失效
标题翻译：保持机构，使用该机构的曝光装置
公开(公告)号：US6005910A
公开(公告)日：1999-12-21
申请号：US792526
申请日：1997-01-31
申请人： Yuji Chiba , Shinichi Hara
发明人： Yuji Chiba , Shinichi Hara
IPC分类号： G03B27/62 , G03F7/20 , H01J37/09 , H01L21/027 , H01L21/683
CPC分类号： G03F7/707 , H01J37/09 , H01J2237/0456 , H01J2237/31788
摘要： A holding mechanism includes a box body for providing a space for accommodating an X-ray mask, at least one opening formed at the side of the box body and a holding mechanism for holding the X-ray mask within the space by a kinematic mount system.
摘要翻译：保持机构包括用于提供用于容纳X射线掩模的空间的箱体，形成在箱体侧面的至少一个开口和用于通过运动安装系统将X射线掩模保持在该空间内的保持机构。

50. 发明授权

US5994003A Scanning exposure method and mask therefor 失效
标题翻译：扫描曝光方法和掩模
公开(公告)号：US5994003A
公开(公告)日：1999-11-30
申请号：US935901
申请日：1997-09-23
申请人： Shinichi Hara , Takeshi Miyachi
发明人： Shinichi Hara , Takeshi Miyachi
IPC分类号： H01L21/027 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70075 , G03F7/20 , G03F7/702 , G03F7/70358
摘要： A scanning exposure method includes steps of relatively scanning a mask and a wafer relative to exposure light of a slit beam, to transfer a pattern of the mask onto the wafer and applying a relative speed between the mask and the wafer in a scan direction, during the scan exposure in one shot area, wherein the relative speed is changed in accordance with thermal distortion of the mask pattern caused during the scan exposure.
摘要翻译：扫描曝光方法包括以下步骤：相对于狭缝光束的曝光来相对地扫描掩模和晶片，以将掩模的图案转移到晶片上，并在扫描方向上在掩模和晶片之间施加相对速度，在一个拍摄区域中的扫描曝光，其中相对速度根据在扫描曝光期间引起的掩模图案的热失真而改变。

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