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41. 发明申请

US20070216885A1 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US20070216885A1
公开(公告)日：2007-09-20
申请号：US11797605
申请日：2007-05-04
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.
摘要翻译：曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场元素。所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体辐射图。多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

42. 发明授权

US07163665B2 Apparatus for decomposing gaseous aliphatic hydrocarbon halide compounds 失效
标题翻译：用于分解气态脂族烃卤化物的装置
公开(公告)号：US07163665B2
公开(公告)日：2007-01-16
申请号：US10167549
申请日：2002-06-12
申请人： Kinya Kato
发明人： Kinya Kato
IPC分类号： B01J19/08
CPC分类号： B01D53/70 , B01D53/007 , B01D53/84 , Y02A50/2358 , Y02C20/30
摘要： A method for decomposing a gaseous aliphatic hydrocarbon halide compound more simply is provided. The method includes the steps of mixing the gaseous aliphatic hydrocarbon halide compound and a chlorine gas-containing gas and emitting light to a mixture gas of the gaseous aliphatic hydrocarbon halide compound and the chlorine gas.
摘要翻译：提供了一种更简单地分解气态脂族烃卤化物的方法。该方法包括以下步骤：将气态脂族烃卤化物和含氯气的气体混合并将其发射到气态脂族烃卤化物和氯气的混合气体中。

43. 发明授权

US07163615B2 Method of treating substance to be degraded and its apparatus 有权
标题翻译：处理待降解物质的方法及其设备
公开(公告)号：US07163615B2
公开(公告)日：2007-01-16
申请号：US10291370
申请日：2002-11-12
申请人： Kinya Kato , Masahiro Kawaguchi , Akira Kuriyama
发明人： Kinya Kato , Masahiro Kawaguchi , Akira Kuriyama
IPC分类号： C02F1/461
CPC分类号： A62D3/176 , B01D53/70 , B01D2251/30 , B01D2259/804 , Y02W10/37
摘要： There is provided a method of treating a substance to be degraded comprising the steps of: degrading the substance to produce a degraded product; contacting the product obtained in the degrading step with a liquid; and entrapping a component of the product not trapped by the liquid in a medium by contacting the component with the medium. Also, the apparatus for conducting the method is provided.
摘要翻译：提供一种处理待降解物质的方法，包括以下步骤：降解物质以产生降解产物; 将在降解步骤中获得的产物与液体接触; 并且通过使该组分与介质接触而将未被液体捕获的产物的组分截留在介质中。此外，提供了用于进行该方法的装置。

44. 发明授权

US07064339B2 Charged-particle-beam mapping projection-optical systems and methods for adjusting same 有权
标题翻译：带电粒子束映射投影光学系统及其调整方法
公开(公告)号：US07064339B2
公开(公告)日：2006-06-20
申请号：US10816467
申请日：2004-03-31
申请人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
发明人： Hiroshi Nishimura , Naoto Kihara , Kinya Kato , Toru Takagi , Akihiro Goto , Junji Ikeda , Kazuya Okamoto
IPC分类号： G01N21/00 , G21K7/00
CPC分类号： H01J37/26 , G01N23/225 , H01J37/1471 , H01J37/226 , H01J37/265 , H01J2237/0492 , H01J2237/057 , H01J2237/1501 , H01J2237/2482 , H01J2237/2538 , H01J2237/262 , H01J2237/2806 , H01J2237/2817 , H01J2237/282 , H01J2237/2823 , H01J2237/2826 , H01J2237/30438
摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.
摘要翻译：公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。调节光束可以相对于物镜光学系统偏轴。对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。

45. 发明授权

US07018514B2 Method and apparatus for processing substances to be decomposed 失效
公开(公告)号：US07018514B2
公开(公告)日：2006-03-28
申请号：US10292402
申请日：2002-11-12
申请人： Kinya Kato , Masahiro Kawaguchi , Akira Kuriyama
发明人： Kinya Kato , Masahiro Kawaguchi , Akira Kuriyama
IPC分类号： B01D53/00 , A62D3/00
CPC分类号： A62D3/176 , B01D53/70 , B01D2251/30 , B01D2259/804
摘要： A method for processing substances to be degraded is provided. The method includes a decomposing step in which a mixed gas containing chlorine and the substances to be degraded is irradiated with light to decompose the substances to be degraded, a contact step in which gas generated through the decomposing step is contacted with an alkaline solution to trap chlorine contained in the gas generated through the decomposing step in the alkaline solution, and a reusing step in which the alkaline solution containing the chlorine as a source of generating the chlorine is used again in the decomposing step.

46. 发明授权

US06610178B2 Method for decomposing halogenated aliphatic hydrocarbon compounds or aromatic compounds, method for cleaning medium contaminated with at least one of these compounds, and apparatus for these 失效
标题翻译：用于分解卤代脂族烃化合物或芳族化合物的方法，用于清洁被这些化合物中的至少一种污染的介质的方法及其装置
公开(公告)号：US06610178B2
公开(公告)日：2003-08-26
申请号：US09451443
申请日：1999-11-30
申请人： Kinya Kato , Etsuko Sugawa
发明人： Kinya Kato , Etsuko Sugawa
IPC分类号： C07B6300
CPC分类号： A62D3/17 , A62D3/115 , A62D3/176 , A62D2101/22 , A62D2203/02 , A62D2203/10 , C02F1/4618 , C02F1/4674 , C02F2201/46115 , C02F2201/46145 , C02F2209/04 , C02F2209/06
摘要： A method for decomposing an organic compound by using functional water followed by neutralization of the wastewater not to affect the environment.
摘要翻译：通过使用官能水分解有机化合物，然后中和废水不影响环境的方法。

47. 发明授权

US06585897B2 Apparatus for treating gas containing substance to be decomposed and method of treating its gas 失效
公开(公告)号：US06585897B2
公开(公告)日：2003-07-01
申请号：US10179174
申请日：2002-06-26
申请人： Kinya Kato
发明人： Kinya Kato
IPC分类号： C02F176
CPC分类号： C02F9/00 , B01D53/007 , B01D53/04 , B01D53/70 , B01D2253/102 , B01D2257/7022 , B01D2259/402 , C02F1/04 , C02F1/28 , C02F1/32 , C02F1/461 , C02F1/72 , C02F1/76 , C02F2101/36 , C02F2103/18 , Y02C20/30 , Y02W10/37 , Y10S210/908
摘要： The apparatus of the present invention for treating a gas containing a substance to be decomposed comprises an adsorption unit equipped with an adsorbent for adsorbing the substance to be decomposed, a steam introduction unit for bringing steam into contact with the adsorbent, a condensation unit for obtaining a condensed liquid containing the substance to be decomposed from the steam containing the substance, a reaction tank, a condensed liquid supply unit for supplying the condensed liquid to the reaction tank, a hypochlorous acid supply unit for supplying a solution containing hypochlorous acid to the reaction tank, and a light irradiation unit for irradiating the reaction tank with light.

48. 发明授权

US06538170B2 Polluted soil remediation apparatus, polluted soil remediation method, pollutant degrading apparatus and pollutant degrading method 有权
标题翻译：污染土壤整治设备，污染土壤修复方法，污染物降解设备和污染物降解方法
公开(公告)号：US06538170B2
公开(公告)日：2003-03-25
申请号：US09794836
申请日：2001-02-28
申请人： Kinya Kato , Masahiro Kawaguchi , Akira Kuriyama
发明人： Kinya Kato , Masahiro Kawaguchi , Akira Kuriyama
IPC分类号： A62D300
CPC分类号： C02F1/20 , B01D53/007 , B01D2257/2064 , B09C1/005 , B09C1/08 , C02F1/32 , C02F2101/36 , C02F2101/363 , C02F2103/06
摘要： A polluted soil remediation apparatus comprising a treatment tank in which pollutants degradable with light irradiation in the presence of chlorine is extracted as a gas containing the pollutants from polluted soil and a mixture of the gas containing the pollutants and chlorine-containing air is irradiated with light to degrade the pollutants, wherein the apparatus comprises a unit for aspirating the gas containing the pollutants from the polluted soil, a chlorine-containing air generation unit for generating the chlorine-containing gas, a mixing unit for mixing the gas containing the pollutants extracted by the aspiration unit and the chorine-containing air generated by the chlorine-containing gas generation unit to form a mixed gas.
摘要翻译：一种污染土壤修复装置，其包括处理罐，其中在氯存在下用光照射降解的污染物被提取为含有来自污染土壤的污染物的气体，并且将含有污染物和含氯空气的气体的混合物照射污染物的劣化，其中，所述装置包括用于从污染土壤吸入含有污染物的气体的单元，用于产生含氯气体的含氯空气产生单元，用于混合含有污染物的气体的混合单元，由含氯气体产生单元产生的吸入单元和含氯化空气形成混合气体。

49. 发明授权

US5900926A Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US5900926A
公开(公告)日：1999-05-04
申请号：US725255
申请日：1996-10-04
申请人： Kinya Kato
发明人： Kinya Kato
IPC分类号： G03B13/36 , G02B7/28 , G03F7/20 , G03F7/207 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70225 , G03F7/70275 , G03F7/70358 , G03F7/70883 , G03F7/70891
摘要： A projection exposure apparatus performs focus adjustment to correct variations in the focal position of a projection optical system which are caused by absorption of exposure light by a refraction system in the projection optical system. The projection optical system arranged in this projection exposure apparatus includes a refraction system having a positive refracting power, and a reflecting mirror positioned to be coaxial with the refraction system. The projection exposure apparatus includes a photodetection device for detecting light, of light emitted from an illumination optical system and transmitted through a first substrate, which is transmitted through the reflecting mirror, and an adjustment device for adjusting the in-focus state between the first substrate, a second substrate, and the projection optical system in accordance with an output from the photodetection device.
摘要翻译：投影曝光装置进行聚焦调整，以校正由投影光学系统中的折射系统吸收曝光所引起的投影光学系统的焦点位置的变化。布置在该投影曝光装置中的投影光学系统包括具有正折射率的折射系统和与折射系统同轴的反射镜。投影曝光装置包括：光检测装置，用于检测从照明光学系统发射的光，并透射通过反射镜的第一基板;以及调节装置，用于调节第一基板之间的对焦状态，第二基板和根据来自光检测装置的输出的投影光学系统。

50. 发明授权

US5850279A Alignment method, projection exposure method, and projection exposure apparatus 失效
标题翻译：对准方法，投影曝光方法和投影曝光装置
公开(公告)号：US5850279A
公开(公告)日：1998-12-15
申请号：US619981
申请日：1996-03-20
申请人： Kei Nara , Masaki Kato , Kinya Kato , Tsuyoshi Narabe
发明人： Kei Nara , Masaki Kato , Kinya Kato , Tsuyoshi Narabe
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70275 , G03F7/70358 , G03F9/70
摘要： Disclosed is a projection exposure method for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system. A light beam having a first wavelength for exposure is radiated through the projection optical system onto a first mark area including a fiducial mark on a fiducial plate installed on a substrate stage, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A light beam having a second wavelength to which the photosensitive substrate is not photosensitive is radiated through the projection optical system onto the first mark area, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A positional discrepancy of the fiducial mark caused by the difference in wavelength between the first and second wavelengths is previously calculated on the basis of results of the detection. The light beam having the second wavelength is radiated through the projection optical system onto an alignment mark on the photosensitive substrate, reflected light therefrom is detected to obtain a position of the photosensitive substrate under the light beam having the second wavelength. A positional discrepancy of the photosensitive substrate is corrected on the basis of a result of the detection and the calculation, and thus positional alignment for the photosensitive substrate is performed, followed by actual exposure.
摘要翻译：公开了一种投影曝光方法，用于通过投影光学系统将形成在掩模上的图案转印到感光基板上。将具有用于曝光的第一波长的光束通过投影光学系统辐射到安装在基板台上的基准板上的包括基准标记的第一标记区域上，检测来自第一标记区域的反射光，基准标记。具有感光基片不感光的第二波长的光束通过投影光学系统辐射到第一标记区域上，检测来自第一标记区域的反射光以获得基准标记的位置。基于检测结果预先计算由第一和第二波长之间的波长差导致的基准标记的位置偏差。具有第二波长的光束通过投影光学系统辐射到感光基板上的对准标记上，检测其反射光，以获得具有第二波长的光束下的感光基板的位置。基于检测和计算的结果校正感光性基板的位置偏差，由此进行感光性基板的位置对准，然后实际曝光。

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