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41. 发明申请

US20060204863A1 Mask for light exposure 有权
标题翻译：面罩曝光
公开(公告)号：US20060204863A1
公开(公告)日：2006-09-14
申请号：US11417247
申请日：2006-05-04
申请人： Shinichi Nakata , Takayuki Ishino , Masami Yamashita
发明人： Shinichi Nakata , Takayuki Ishino , Masami Yamashita
IPC分类号： G03F1/00
CPC分类号： G03F7/70475 , G03F1/00 , G03F7/0007 , G03F7/203 , G03F7/70791
摘要： Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.
摘要翻译：单个光罩中的曝光区域103和遮光区域104在纵向和横向方向彼此交替地排列。通过使用该掩模版的多畴光曝光将基板曝光，使得光掩模的各个区域暴露于相应的照射A至B，B至C。。。在分隔板的边界部分中，N到M彼此不相邻，用于执行各个镜头，从而缓和各镜头之间的照度差和镜头边界部分的完成差异，这些差异变成在显示液晶显示装置时人眼难以察觉。

42. 发明授权

US07064799B2 Semi-transmissive-type liquid crystal display device and method for manufacturing same 有权
公开(公告)号：US07064799B2
公开(公告)日：2006-06-20
申请号：US10615172
申请日：2003-07-08
申请人： Mamoru Okamoto , Michiaki Sakamoto , Osamu Sukegawa , Ken-Ichirou Naka , Shin-Ichi Nakata , Masami Yamashita
发明人： Mamoru Okamoto , Michiaki Sakamoto , Osamu Sukegawa , Ken-Ichirou Naka , Shin-Ichi Nakata , Masami Yamashita
IPC分类号： G02F1/1335
CPC分类号： G02F1/133555 , G02F1/136213
摘要： A semi-transmissive-type liquid crystal display device is provided which is capable of preventing an electric erosion reaction between a reflective film made of Al (aluminum) or an Al alloy and a transparent electrode film made of ITO or a like (Indium Tin Oxide) and of inhibiting occurrence of a flicker caused by a residual DC (Direct Current) voltage in the reflective film. In the semi-transmissive-type of a liquid crystal display device, a transmissive region to provide light from a backlight source and a reflective region to receive ambient light are placed in a pixel region and a transparent electrode film is formed above a reflective film formed in the reflective region on an active matrix substrate with a second passivation film being interposed between the reflective film and the transparent electrode film.

43. 发明授权

US07012657B2 Method of fabricating liquid crystal display device 有权
标题翻译：制造液晶显示装置的方法
公开(公告)号：US07012657B2
公开(公告)日：2006-03-14
申请号：US10692736
申请日：2003-10-27
申请人： Takasuke Hayase , Keiko Yamada , Masami Yamashita , Shinichi Nakata , Akitoshi Maeda
发明人： Takasuke Hayase , Keiko Yamada , Masami Yamashita , Shinichi Nakata , Akitoshi Maeda
IPC分类号： G02F1/136 , G02F1/13
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2202/104 , H01L27/124 , H01L27/1248 , H01L27/14621
摘要： The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c1) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c2) patterning the material into the transparent electrode, and (c3) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.
摘要翻译：制造液晶显示装置的方法包括以下步骤：（a）在基板上制造开关装置，（b）在基板上形成层间绝缘膜，使得开关装置被层间绝缘膜覆盖，以及（ c）在所述层间绝缘膜上形成透明电极，所述透明电极通过所述层间绝缘膜与所述开关器件电连接，所述步骤（c）包括（c 1）在所述层间绝缘膜上沉积导电，透明和非晶材料薄膜，（c 2）将材料图案化成透明电极，（c 3）通过在形成取向膜之后进行的热退火将透明电极转变成多晶硅。

44. 发明授权

US06872670B2 Silylation treatment unit and method 失效
标题翻译：甲硅烷基化处理装置及方法
公开(公告)号：US06872670B2
公开(公告)日：2005-03-29
申请号：US10752556
申请日：2004-01-08
申请人： Takayuki Toshima , Tsutae Omori , Masami Yamashita
发明人： Takayuki Toshima , Tsutae Omori , Masami Yamashita
IPC分类号： H01L21/205 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/31
CPC分类号： H01L21/67109 , G03F7/265 , G03F7/70991
摘要： A silylation treatment unit includes a chamber, a heating mechanism provided in this chamber for heating a substrate, a supplying mechanism for supplying a vapor including a silylation reagent into the chamber. The unit also has a substrate holder for holding the substrate in the chamber, in which an interval between the heating mechanism and the substrate is adjustable to at least three levels or more. The substrate is received such that it is least influenced by a heat in the chamber by maximizing the interval from the heating mechanism. The interval is brought comparatively closer to the heating mechanism to wait until the temperature inside the chamber obtains a high planer uniformity. The interval is brought further closer to the heating mechanism after a high planer uniformity is obtained such that a silylation reaction occurs.
摘要翻译：甲硅烷基化处理单元包括室，设置在该室中用于加热基板的加热机构，用于将包含甲硅烷基化试剂的蒸气供应到室中的供给机构。该单元还具有用于将基板保持在室中的基板保持器，其中加热机构和基板之间的间隔可调节至少三级或更多级。接收基板，使得其通过使来自加热机构的间隔最大化而受到室内热量的影响最小。使间隔相对更靠近加热机构，等待室内温度获得高的平面均匀性。在获得高平面均匀性之后，间隔进一步靠近加热机构，使得发生甲硅烷基化反应。

45. 发明授权

US4896209A Passenger vehicle polling system having a central unit for polling passenger seat terminal units 失效
标题翻译：乘客车辆投票系统具有用于轮询乘客座位终端单元的中央单元
公开(公告)号：US4896209A
公开(公告)日：1990-01-23
申请号：US148590
申请日：1988-01-26
申请人： Atsushi Matsuzaki , Koichi Tagawa , Masami Yamashita , Yoshiyuki Kondo
发明人： Atsushi Matsuzaki , Koichi Tagawa , Masami Yamashita , Yoshiyuki Kondo
IPC分类号： B64D11/00 , G07C3/00 , G08B26/00 , H04N7/173
CPC分类号： B64D11/00155 , B64D11/00151 , G07C3/00 , G08B26/003 , H04N21/2146 , H04N21/482 , H04N21/654 , H04N21/6582 , H04N7/17309 , B64D11/0015 , H04N2007/17372
摘要： A passenger vehicle polling system. The system is capable of polling one or more terminal units, where each terminal unit is provided at a different one of a plurality of passenger seats in a passenger vehicle, to obtain information indicative of the state of each terminal unit. The polling is accomplished by transmitting a polling command signal from a head end apparatus through a transmission line to the terminal units. Preferably, a sensor is mounted adjacent each passenger seat to sense the status of the passenger seat. The sensed information is transmitted as a polling answer signal through the transmission line to the head end apparatus so that the status of each passenger seat and the condition of each passenger can be checked from the head end apparatus. Further, a system according to the invention may transmit audio and video programs to the terminal units, and the polling answer signal may indicate which audio or video program has been selected at each terminal unit.
摘要翻译：乘客车辆轮询系统能够轮询一个或多个终端单元（30），其中每个终端单元设置在乘客车辆（例如飞机）中的多个乘客座位中的不同的一个乘客座位上，以获得指示状态的信息的每个终端单元（30）。通过从头端设备通过传输线（21）向终端单元（30）发送轮询命令信号来完成轮询。优选地，传感器（39）安装在每个乘客座附近以感测乘客座椅的状态。感测到的信息通过传输线（21）作为轮询答复信号发送到头端设备，使得可以在头端设备（例如监视器）上检查每个乘客座椅的状态和每个乘客的状况显示（81）。此外，系统可以向终端单元（30）发送音频和视频节目，并且轮询应答信号可以指示在每个终端单元（30）处已经选择了哪个音频或视频节目。

46. 发明授权

US4326046A Process for producing modified polytetrafluoroethylene 失效
标题翻译：生产改性聚四氟乙烯的方法
公开(公告)号：US4326046A
公开(公告)日：1982-04-20
申请号：US203505
申请日：1980-11-03
申请人： Haruhisa Miyaka , Masami Yamashita , Tatsuro Asawa
发明人： Haruhisa Miyaka , Masami Yamashita , Tatsuro Asawa
IPC分类号： B01J47/12 , C08F8/00 , C08F14/00 , C08F214/26 , C08F259/08 , C08J5/22
CPC分类号： C08F259/08 , Y10S525/902
摘要： A modified polytetrafluoroethylene is produced by polymerizing tetrafluoroethylene in an aqueous medium containing a dispersing agent with a polymerization initiator source and then, copolymerizing tetrafluoroethylene and a fluorinated monomer having an acid type functional group as a copolymerizable modifier in the presence of the resulting polytetrafluoroethylene to obtain a modified polytetrafluoroethylene having the modifier component of 0.001 to 10 mol %.
摘要翻译：通过在含有聚合引发剂源的分散剂的水性介质中聚合四氟乙烯，然后在得到的聚四氟乙烯的存在下共聚四氟乙烯和具有酸型官能团的氟化单体作为共聚改性剂来制备改性聚四氟乙烯，得到改性聚四氟乙烯的改性成分为0.001〜10摩尔％。

47. 发明授权

US07803501B2 Mask for light exposure 有权
标题翻译：面罩曝光
公开(公告)号：US07803501B2
公开(公告)日：2010-09-28
申请号：US11417247
申请日：2006-05-04
申请人： Shinichi Nakata , Takayuki Ishino , Masami Yamashita
发明人： Shinichi Nakata , Takayuki Ishino , Masami Yamashita
IPC分类号： G03F1/00
CPC分类号： G03F7/70475 , G03F1/00 , G03F7/0007 , G03F7/203 , G03F7/70791
摘要： Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.
摘要翻译：单个光罩中的曝光区域103和遮光区域104在纵向和横向方向彼此交替地排列。通过使用该掩模版的多畴光曝光将基板曝光，使得光掩模的各个区域暴露于相应的照射A至B，B至C。。。在分隔板的边界部分中，N到M彼此不相邻，用于执行各个镜头，从而缓和各镜头之间的照度差和镜头边界部分的完成差异，这些差异变成在显示液晶显示装置时人眼难以察觉。

48. 发明申请

US20100236477A1 HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND RECORDING MEDIUM STORING COMPUTER PROGRAM CARRYING OUT THE SAME 有权
标题翻译：热处理设备，热处理方法和记录中继存储计算机程序
公开(公告)号：US20100236477A1
公开(公告)日：2010-09-23
申请号：US12788981
申请日：2010-05-27
申请人： Hikaru Ito , Shinji Okada , Masami Yamashita
发明人： Hikaru Ito , Shinji Okada , Masami Yamashita
IPC分类号： B05C11/00 , B05C21/00
CPC分类号： C21D9/00 , C21D9/0056 , C21D11/00
摘要： An experiment is conducted in advance, for finding a temperature of a cooling plate attained as a result of balancing between a temperature of a substrate after heat treatment and a temperature of the cooling plate at the time of cooling of the substrate. Then, before heat treatment of a first substrate, the cooling plate is moved to a position above a hot plate, the cooling plate is heated to that temperature, and thereafter heat treatment of the substrate is started.
摘要翻译：预先进行实验，以获得由于热处理后的基板的温度与冷却基板之间的冷却板的温度之间的平衡而获得的冷却板的温度。然后，在热处理第一基板之前，将冷却板移动到加热板上方的位置，将冷却板加热至该温度，然后开始对基板进行热处理。

49. 发明授权

US07529595B2 Method of controlling substrate processing apparatus and substrate processing apparatus 有权
标题翻译：控制基板处理装置和基板处理装置的方法
公开(公告)号：US07529595B2
公开(公告)日：2009-05-05
申请号：US10581073
申请日：2004-11-30
申请人： Shinichi Shinozuka , Shigeki Wada , Masami Yamashita
发明人： Shinichi Shinozuka , Shigeki Wada , Masami Yamashita
IPC分类号： G06F19/00
CPC分类号： H01L21/67745 , G03F7/162 , G03F7/3021 , H01L21/67276
摘要： It is an object of the present invention to realize, in a coating and developing apparatus including an inspection section, reduction in the startup time, cost reduction, and an improved operating rate of the inspection section.In the present invention, a control program of the coating and developing apparatus is set such that a processing flow and an inspection flow can be independently executed, the processing flow being a flow in which a substrate is carried to a processing station from a cassette station to be processed in the processing station and an aligner and thereafter is returned to the cassette station, and the inspection flow being a flow in which the substrate is carried from the cassette station to an inspection station to be inspected there, and is thereafter returned to the cassette station. At startup of the coating and developing apparatus, the inspection flow and the processing flow are executed, and an evaluation work of an inspection unit of the inspection station and an adjustment work of a processing unit in the processing station can proceed simultaneously. When the inspection station is idle, a substrate can be carried from an external part to the cassette station to be inspected there.
摘要翻译：本发明的目的是在包括检查部分的涂覆和显影装置中实现起动时间的减少，成本降低和检查部分的提高的操作速度。在本发明中，涂布显影装置的控制程序被设定为能够独立地执行处理流程和检查流程，处理流程是将基板从盒式磁带机搬送到加工站的流程在处理站和对准器中处理，然后返回到盒式站，并且检查流程是将基板从盒式站被运送到在那里进行检查的检查站的流程，然后返回到盒式电台。在涂装和显影装置启动时，执行检查流程和处理流程，并且检查站的检查单元和处理站中的处理单元的调整工作的评估工作可以同时进行。当检查站空闲时，可以将基板从外部部件运送到要在那里进行检查的卡带站。

50. 发明授权

US07375831B2 Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit 有权
标题翻译：线宽测量方法，基板处理方法，基板处理装置和基板冷却处理单元
公开(公告)号：US07375831B2
公开(公告)日：2008-05-20
申请号：US11013784
申请日：2004-12-17
申请人： Michio Tanaka , Masami Yamashita
发明人： Michio Tanaka , Masami Yamashita
IPC分类号： G01B11/02
CPC分类号： G03F7/705 , G03F7/70625
摘要： In optical line width measurement performed using the scatterometry technique, the present invention measures the line width formed on a substrate more accurately than in the prior art. After a predetermined pattern is formed in a resist film on a substrate, the refractive index and the extinction coefficient of the resist film are measured. Based on the measured values, calculation is performed to obtain calculated light intensity distributions of reflected light reflected from a plurality of virtual patterns. The calculated light intensity distributions are stored, and their library is created. The substrate for which the refractive index and so on are measured is irradiated with light, and the light intensity distribution of its reflected light is measured. The light intensity distribution is collated with the calculated light intensity distributions in the library, so that the line width of the virtual pattern having a matching light intensity distribution is regarded as the line width of the real pattern. Since the library of the light intensity distributions of the virtual pattern is created based on the actually measured refractive index and so on after the formation of the pattern, an accurate line width matching the pattern state at the time of measuring the line width is measured.
摘要翻译：在使用散射测量技术进行的光线宽度测量中，本发明比现有技术更准确地测量在衬底上形成的线宽。在基板上的抗蚀剂膜中形成预定图案之后，测量抗蚀剂膜的折射率和消光系数。基于测量值，执行计算以获得从多个虚拟图案反射的反射光的计算的光强度分布。存储计算的光强度分布，并创建它们的库。用光照射测定折射率等的基板，测定其反射光的光强度分布。将光强度分布与库中计算的光强度分布进行比较，使得具有匹配的光强度分布的虚拟图案的线宽被视为实曲线的线宽。由于在形成图案之后，基于实际测量的折射率等创建虚拟图案的光强度分布的库，因此测量与测量线宽度时的图案状态匹配的精确线宽。

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