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    • 45. 发明授权
    • Silylation treatment unit and method
    • 甲硅烷基化处理装置及方法
    • US06872670B2
    • 2005-03-29
    • US10752556
    • 2004-01-08
    • Takayuki ToshimaTsutae OmoriMasami Yamashita
    • Takayuki ToshimaTsutae OmoriMasami Yamashita
    • H01L21/205G03F7/20G03F7/26H01L21/00H01L21/31
    • H01L21/67109G03F7/265G03F7/70991
    • A silylation treatment unit includes a chamber, a heating mechanism provided in this chamber for heating a substrate, a supplying mechanism for supplying a vapor including a silylation reagent into the chamber. The unit also has a substrate holder for holding the substrate in the chamber, in which an interval between the heating mechanism and the substrate is adjustable to at least three levels or more. The substrate is received such that it is least influenced by a heat in the chamber by maximizing the interval from the heating mechanism. The interval is brought comparatively closer to the heating mechanism to wait until the temperature inside the chamber obtains a high planer uniformity. The interval is brought further closer to the heating mechanism after a high planer uniformity is obtained such that a silylation reaction occurs.
    • 甲硅烷基化处理单元包括室,设置在该室中用于加热基板的加热机构,用于将包含甲硅烷基化试剂的蒸气供应到室中的供给机构。 该单元还具有用于将基板保持在室中的基板保持器,其中加热机构和基板之间的间隔可调节至少三级或更多级。 接收基板,使得其通过使来自加热机构的间隔最大化而受到室内热量的影响最小。 使间隔相对更靠近加热机构,等待室内温度获得高的平面均匀性。 在获得高平面均匀性之后,间隔进一步靠近加热机构,使得发生甲硅烷基化反应。
    • 50. 发明授权
    • Method of controlling substrate processing apparatus and substrate processing apparatus
    • 控制基板处理装置和基板处理装置的方法
    • US07529595B2
    • 2009-05-05
    • US10581073
    • 2004-11-30
    • Shinichi ShinozukaShigeki WadaMasami Yamashita
    • Shinichi ShinozukaShigeki WadaMasami Yamashita
    • G06F19/00
    • H01L21/67745G03F7/162G03F7/3021H01L21/67276
    • It is an object of the present invention to realize, in a coating and developing apparatus including an inspection section, reduction in the startup time, cost reduction, and an improved operating rate of the inspection section.In the present invention, a control program of the coating and developing apparatus is set such that a processing flow and an inspection flow can be independently executed, the processing flow being a flow in which a substrate is carried to a processing station from a cassette station to be processed in the processing station and an aligner and thereafter is returned to the cassette station, and the inspection flow being a flow in which the substrate is carried from the cassette station to an inspection station to be inspected there, and is thereafter returned to the cassette station. At startup of the coating and developing apparatus, the inspection flow and the processing flow are executed, and an evaluation work of an inspection unit of the inspection station and an adjustment work of a processing unit in the processing station can proceed simultaneously. When the inspection station is idle, a substrate can be carried from an external part to the cassette station to be inspected there.
    • 本发明的目的是在包括检查部分的涂覆和显影装置中实现起动时间的减少,成本降低和检查部分的提高的操作速度。 在本发明中,涂布显影装置的控制程序被设定为能够独立地执行处理流程和检查流程,处理流程是将基板从盒式磁带机搬送到加工站的流程 在处理站和对准器中处理,然后返回到盒式站,并且检查流程是将基板从盒式站被运送到在那里进行检查的检查站的流程,然后返回到 盒式电台。 在涂装和显影装置启动时,执行检查流程和处理流程,并且检查站的检查单元和处理站中的处理单元的调整工作的评估工作可以同时进行。 当检查站空闲时,可以将基板从外部部件运送到要在那里进行检查的卡带站。