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41. 发明授权

US06800822B2 Circuit breaker 失效
标题翻译：断路器
公开(公告)号：US06800822B2
公开(公告)日：2004-10-05
申请号：US10440109
申请日：2003-05-19
申请人： Yoshinobu Hamada , Tatsunori Takahashi , Koji Asakawa , Katsunori Kuboyama
发明人： Yoshinobu Hamada , Tatsunori Takahashi , Koji Asakawa , Katsunori Kuboyama
IPC分类号： H01H900
CPC分类号： H01H71/58 , H01H71/04 , H01H71/501 , H01H71/54 , H01H2009/288 , H01H2300/046
摘要： A circuit breaker for opening and closing a main-circuit includes main-circuit contacts; an opening-and-closing mechanism having a switching lever for opening and closing the main-circuit contacts, a main spring for urging the switching lever, and a toggle-link mechanism attached to the switching lever; and an operational handle. The operational handle includes a locker handle rotatably supported on a handle pin and connected to the toggle link of the switching mechanism, and a pushbutton linked to the handle. When the pushbutton is pushed, the handle portion rotates to allow the switching lever to close the main-circuit contacts.
摘要翻译：用于打开和关闭主电路的断路器包括主电路触点; 具有用于打开和关闭主回路触点的切换杆的开闭机构，用于推动切换杆的主弹簧和连接到切换杆的肘节连杆机构; 和操作手柄。操作手柄包括可旋转地支撑在手柄销上并连接到开关机构的肘节件的储物柜手柄和连接到手柄的按钮。当推动按钮时，手柄部分旋转以允许切换杆关闭主回路触点。

42. 发明授权

US06649516B2 Method for manufacturing a composite member from a porous substrate by selectively infiltrating conductive material into the substrate to form via and wiring regions 有权
标题翻译：通过选择性地将导电材料渗透到基板中以形成通孔和布线区域，从多孔基板制造复合构件的方法
公开(公告)号：US06649516B2
公开(公告)日：2003-11-18
申请号：US10161707
申请日：2002-06-05
申请人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
发明人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
IPC分类号： H05K310
CPC分类号： H05K3/10 , H05K1/034 , H05K3/0002 , H05K3/0082 , H05K3/107 , H05K3/185 , H05K3/422 , H05K2201/0116 , H05K2201/015 , H05K2203/056 , H05K2203/107 , H05K2203/1147 , Y10T29/49155 , Y10T29/49215
摘要： Disclosed is a method for manufacturing a composite member comprising a porous substrate, a via, and a wiring. The method comprises exposing a first region and a second region in the porous substrate to a exposure beam through a mask, the second region exposed by the exposure beam not more than 50% of the exposure of the first region, the exposure beam having the wavelength that an average size of voids of the porous substrate is, as expressed by a radius of gyration, {fraction (1/20)} to 10 times, and forming the via and the wiring by infiltrating a conductive material into the first region and the second region respectively.
摘要翻译：公开了一种用于制造包括多孔基底，通孔和布线的复合构件的方法。该方法包括将多孔基底中的第一区域和第二区域暴露于通过掩模的曝光光束，由曝光光束曝光的第二区域不大于第一区域的曝光的50％，曝光光束具有波长多孔基材的空隙的平均尺寸是以回转半径表示的{分数（1/20至10倍，并且通过将导电材料渗透到第一区域和第二区域中形成通孔和布线分别。

43. 再颁专利

USRE38256E1 Photosensitive composition 有权
标题翻译：感光组合物
公开(公告)号：USRE38256E1
公开(公告)日：2003-09-23
申请号：US09448977
申请日：1999-11-24
申请人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
发明人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
IPC分类号： G03F7021
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0215 , G03F7/038 , Y10S430/107 , Y10S430/11 , Y10S430/111
摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.

44. 发明授权

US06565764B2 Method of manufacturing a material having a fine structure 有权
公开(公告)号：US06565764B2
公开(公告)日：2003-05-20
申请号：US09927937
申请日：2001-08-13
申请人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta
发明人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta
IPC分类号： B44C122
CPC分类号： B29C35/08 , B29C59/16 , B29C71/0009 , B29C2035/0877 , B29C2071/0045 , B29C2071/0054 , B29K2096/02 , B29K2096/04 , Y02P20/582
摘要： Molded products may be made by a process comprising preparing a structure comprising a block copolymer or a graft copolymer having two or more phases, wherein each phase is comprised of polymer chains, decomposing the polymer chains of at least one phase of the structure, and cleaning the structure with a supercritical fluid or a sub-critical fluid, thereby removing the decomposed polymer chains from the structure. Molded products made by this method have very low levels of residual solvents, can be manufactured at a relatively low temperature in a short period of time without using large amounts of organic solvents, and without discharging large amounts of liquid waste.

45. 发明授权

US06229414B1 Make-and-break mechanism for circuit breaker 有权
标题翻译：断路器的断路机构
公开(公告)号：US06229414B1
公开(公告)日：2001-05-08
申请号：US09631478
申请日：2000-08-03
申请人： Kentaro Toyama , Naoshi Uchida , Tatsunori Takahashi , Koji Nomura , Katsunori Kuboyama , Koji Asakawa , Takumi Fujihira , Hisao Kawata , Hiroaki Tosaka
发明人： Kentaro Toyama , Naoshi Uchida , Tatsunori Takahashi , Koji Nomura , Katsunori Kuboyama , Koji Asakawa , Takumi Fujihira , Hisao Kawata , Hiroaki Tosaka
IPC分类号： H01H7312
CPC分类号： H01H71/46 , H01H71/54
摘要： In a make-and-break mechanism for use in a circuit breaker, an alarm output plate 56, which is disposed so as to be slidable in the vertical direction along the frame (cover plate) 27 of the make-and-break mechanism, is secured to the engaging projection 27d of the cover plate 27 through a pair of right and left guide holes 57 formed therein. At the same time, one end of a handle spring 59, which, in the trip operation, is used to rotate an operation handle 26 to a trip display position, is caught on the alarm output plate 56. In case where a latch receiver 47 is driven or rotated by the overcurrent detect portion of the make-and-break mechanism and the secured condition of a latch is thereby removed, the electric circuit of the circuit breaker is broken due to the stored energy of a main spring 64 and, in this case, the alarm output plate 56 is driven or slided in the lateral direction and thus the secured condition of the alarm output plate 56 is removed, so that the alarm output plate 56 is driven in the upward direction due to the spring force of the handle spring 59 to thereby operate an alarm contact.
摘要翻译：在用于断路器的断路机构中，沿着制动和断开机构的框架（盖板）27沿垂直方向设置的报警输出板56，通过形成在其中的一对左右引导孔57固定到盖板27的接合突起27d。同时，在跳闸操作中用于将操作手柄26旋转到跳闸显示位置的手柄弹簧59的一端被卡在报警输出板56上。在闩锁接收器47 由制动中断机构的过电流检测部驱动或旋转，由此闩锁的固定状态被去除，断路器的电路由于主弹簧64的存储能量而损坏，并且在在这种情况下，报警输出板56沿横向被驱动或滑动，从而消除了报警输出板56的固定状态，使得报警输出板56由于弹簧的力手柄弹簧59，从而操作报警触点。

46. 发明授权

US5932391A Resist for alkali development 失效
标题翻译：抵抗碱发展
公开(公告)号：US5932391A
公开(公告)日：1999-08-03
申请号：US697009
申请日：1996-08-16
申请人： Toru Ushirogouchi , Koji Asakawa , Naoko Kihara , Makoto Nakase , Naomi Shida , Takeshi Okino
发明人： Toru Ushirogouchi , Koji Asakawa , Naoko Kihara , Makoto Nakase , Naomi Shida , Takeshi Okino
IPC分类号： G03F7/004 , G03F7/039 , G03F7/021
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A resist for alkali development, which comprises an alicyclic compound attached with an acidic substituent group exhibiting pKa of 7 to 11 in an aqueous solution of 25.degree. C. This alicyclic compound is preferably a copolymer comprising as a comonomer component a vinyl compound and exhibiting a light absorbency of 3 or less per 1 .mu.m to the light of 193 nm in wavelength.
摘要翻译：一种碱显影用抗蚀剂，其包含在25℃的水溶液中具有表现出pKa为7〜11的酸性取代基的脂环族化合物。该脂环族化合物优选为包含乙烯基化合物作为共聚单体成分的共聚物，对于波长为193nm的光，每1μm的光吸收率为3以下。

47. 发明授权

US5691101A Photosensitive composition 失效
标题翻译：感光组合物
公开(公告)号：US5691101A
公开(公告)日：1997-11-25
申请号：US644395
申请日：1996-05-09
申请人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
发明人： Toru Ushirogouchi , Naomi Shida , Takuya Naito , Koji Asakawa , Akinori Hongu , Makoto Nakase , Hirokazu Niki
IPC分类号： G03F7/004 , G03F7/021 , G03F7/038 , G03F7/039 , G03F7/023
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0215 , G03F7/038 , Y10S430/107 , Y10S430/11 , Y10S430/111
摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.
摘要翻译：公开了一种安全的浆料感光性组合物，其成像能力如分辨率和灵敏度优异且不含有害化合物，以及能够在不使用任何有机溶剂的情况下溶解在水中的安全的水溶性光敏组合物，同时保持足够的灵敏度作为抗蚀剂不含有害物质。浆料光敏组合物含有当用光或电离辐射照射时产生酸的化合物，至少一种具有酸交联性或酸分解性的树脂和粉末。可以通过在基板上形成这种感光性组合物的层来制造各种装置，根据期望的图案将该层曝光，并加热该层。水溶性光敏组合物含有当用光或电离辐射照射时产生酸的化合物和缩醛树脂。将该水溶性感光性组合物涂布在基材上，并根据期望的图案用光或电离辐射照射。所得到的底物通过加热化学放大并用水显影。这使得可以安全地形成图案而不使用任何呼吸机。

48. 发明授权

US09231417B2 Rechargeable electrical device 有权
标题翻译：充电电器
公开(公告)号：US09231417B2
公开(公告)日：2016-01-05
申请号：US14342699
申请日：2012-06-12
申请人： Kazunori Watanabe , Koji Asakawa
发明人： Kazunori Watanabe , Koji Asakawa
IPC分类号： H02J7/16 , H02J7/00 , H02J7/04 , H01M10/44
CPC分类号： H02J7/0029 , H01M10/448 , H01M2220/30 , H02J7/007 , H02J7/04 , H02J2007/0037
摘要： The charging current value in the first trickle charge after the rapid charge is differentiated from the charging current value in the second and subsequent trickle charge. Thus, for example, in the first trickle charge, charging can be performed with the charging current value required to simultaneously activate and charge an inactive battery. In the second and subsequent trickle charge, charging can be performed with the charging current value required to compensate for self-discharge of a rechargeable battery. By charging the battery with the charging current value required to compensate for self-discharge of the battery in the second and subsequent trickle charge, power consumption required to charge the battery can be reduced, compared to the case where the trickle charge is continued with a constant charging current value required to simultaneously activate and charge the inactive battery, as the conventional device.
摘要翻译：在快速充电之后的第一涓流充电中的充电电流值与第二次和随后的涓流充电中的充电电流值不同。因此，例如，在第一涓流充电中，可以以同时激活并对不活动电池充电所需的充电电流值进行充电。在第二次和随后的涓流充电中，可以利用补偿可再充电电池的自放电所需的充电电流值进行充电。通过在第二次和随后的涓流充电中以补偿电池的自放电所需的充电电流值对电池充电，与使用电池继续进行涓流充电的情况相比，可以减少对电池充电所需的功耗恒定的充电电流值，同时激活和充电非活性电池，如传统的设备。

49. 发明授权

US09047941B2 Organic molecular memory 有权
标题翻译：有机分子记忆
公开(公告)号：US09047941B2
公开(公告)日：2015-06-02
申请号：US13425796
申请日：2012-03-21
申请人： Hideyuki Nishizawa , Reiko Yoshimura , Tsukasa Tada , Shigeki Hattori , Masaya Terai , Satoshi Mikoshiba , Koji Asakawa
发明人： Hideyuki Nishizawa , Reiko Yoshimura , Tsukasa Tada , Shigeki Hattori , Masaya Terai , Satoshi Mikoshiba , Koji Asakawa
IPC分类号： H01L51/10 , H01L29/792 , G11C13/00 , B82Y10/00 , H01L51/00 , H01L51/05
CPC分类号： G11C13/0014 , B82Y10/00 , G11C13/0016 , G11C2213/53 , H01L45/1233 , H01L45/1253 , H01L51/0078 , H01L51/0092 , H01L51/0098 , H01L51/0595
摘要： An organic molecular memory of an embodiment includes a first conductive layer, a second conductive layer, and an organic molecular layer interposed between the first conductive layer and the second conductive layer, the organic molecular layer including charge-storage molecular chains or variable-resistance molecular chains, the charge-storage molecular chains or the variable-resistance molecular chains including fused polycyclic groups.
摘要翻译：实施方案的有机分子存储器包括第一导电层，第二导电层和介于第一导电层和第二导电层之间的有机分子层，有机分子层包括电荷储存分子链或可变电阻分子链，电荷储存分子链或可变阻力分子链，包括稠合多环基团。

50. 发明授权

US08778201B2 Method for manufacturing porous structure and method for forming pattern 失效
标题翻译：制造多孔结构的方法及其形成方法
公开(公告)号：US08778201B2
公开(公告)日：2014-07-15
申请号：US13278833
申请日：2011-10-21
申请人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： B44C1/22
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
摘要翻译：图案形成材料含有嵌段共聚物或接枝共聚物，并形成具有微聚合物相的结构，其中，关于构成嵌段共聚物或接枝共聚物的聚合物链中的至少两个聚合物链，N /（Nc- 否）构成各聚合物链的单体单元的值为1.4以上，其中N表示单体单元中的总原子数，Nc表示单体单元中的碳原子数，No表示单体单元中的氧原子数。

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