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1. 发明授权

US08043520B2 Method for manufacturing porous structure and method for forming pattern 有权
标题翻译：制造多孔结构的方法及其形成方法
公开(公告)号：US08043520B2
公开(公告)日：2011-10-25
申请号：US12355170
申请日：2009-01-16
申请人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： C08J9/26
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
摘要翻译：图案形成材料含有嵌段共聚物或接枝共聚物，并形成具有微聚合物相的结构，其中，关于构成嵌段共聚物或接枝共聚物的聚合物链中的至少两个聚合物链，N /（Nc- 否）构成各聚合物链的单体单元的值为1.4以上，其中N表示单体单元中的总原子数，Nc表示单体单元中的碳原子数，No表示单体单元中的氧原子数。

2. 发明授权

US06906423B1 Mask used for exposing a porous substrate 失效
标题翻译：用于暴露多孔基材的掩模
公开(公告)号：US06906423B1
公开(公告)日：2005-06-14
申请号：US10670520
申请日：2003-09-26
申请人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
发明人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
IPC分类号： H05K1/03 , H05K3/00 , H05K3/10 , H05K3/18 , H05K3/42 , G03F1/16
CPC分类号： G03F1/16 , G03F1/50 , H05K1/034 , H05K3/0002 , H05K3/0082 , H05K3/107 , H05K3/185 , H05K3/422 , H05K2201/0116 , H05K2201/015 , H05K2203/056 , H05K2203/107 , H05K2203/1147 , Y10T428/12042
摘要： A mask used for exposing a porous substrate to form a first region and a second region, the first region being filled with a conductive material piercing through the entire thickness of the porous substrate to constitute an interfacial conductive portion, the second region being filled with a conductive material not piercing the entire thickness of the porous substrate to constitute a non-interfacial conductive portion. The mask includes a first light-transmitting region for exposing the first region, and a second light-transmitting region for exposing the second region, said second light-transmitting region including an aggregation of fine patterns of which an average aperture ratio is not more than 50% of an average aperture ratio of the first light-transmitting region and a size of said fine patterns of the second light-transmitting region being in the range of 0.1 μm to 10 μm.
摘要翻译：一种用于暴露多孔基底以形成第一区域和第二区域的掩模，所述第一区域填充有穿透所述多孔基材的整个厚度的导电材料以构成界面导电部分，所述第二区域填充有导电材料不刺穿多孔基材的整个厚度以构成非界面导电部分。掩模包括用于暴露第一区域的第一透光区域和用于曝光第二区域的第二透光区域，所述第二透光区域包括平均孔径比不大于的细微图案的聚集第一透光区域的平均开口率的50％和第二透光区域的所述精细图案的尺寸在0.1μm至10μm的范围内。

3. 发明授权

US06899999B2 Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member 失效
标题翻译：制造复合构件，感光组合物，多孔基材，绝缘体和复合构件的方法
公开(公告)号：US06899999B2
公开(公告)日：2005-05-31
申请号：US10091481
申请日：2002-03-07
申请人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta , Shigeru Matake
发明人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta , Shigeru Matake
IPC分类号： G03F7/027 , G03F7/075 , G03F7/38 , H05K3/18 , G03F7/00 , G03F7/04
CPC分类号： H05K3/185 , G03F7/027 , G03F7/0755 , G03F7/38
摘要： Disclosed is a method of manufacturing a composite member having a conductive pattern, comprising (1) forming on a surface of an insulating body a photosensitive layer containing both a photosensitive compound forming an ion-exchange group upon irradiation with an energy beam and a crosslinkable compound having a crosslinkable group, (2) forming a pattern of ion-exchange groups by selectively exposing the photosensitive layer to an energy beam so as to form an ion-exchange group in the exposed portion, (3) crosslinking the crosslinkable compound contained in at least the exposed portion of the photosensitive layer, (4) allowing metal ions, or a metal colloid to be adsorbed on the pattern of ion-exchange groups formed by the selectively exposing, and (5) forming a composite member having conductive pattern by depositing a conductive material on the pattern of ion-exchange groups having the metal ions, or the metal colloid adsorbed thereon using an electroless plating.
摘要翻译：公开了一种制造具有导电图案的复合构件的方法，包括（1）在绝缘体的表面上形成含有能量束和形成离子交换基团的感光性化合物的光敏层和可交联化合物具有可交联基团，（2）通过选择性地将感光层暴露于能量束以形成离子交换基团的图案，以在暴露部分中形成离子交换基团，（3）将包含在其中的可交联化合物交联至少曝光部分感光层，（4）允许金属离子或金属胶体被吸附在通过选择性曝光形成的离子交换基团的图案上，和（5）通过沉积形成具有导电图案的复合构件在具有金属离子的离子交换基团的图案上的导电材料或使用无电解电镀吸附在其上的金属胶体。

4. 发明授权

US06649516B2 Method for manufacturing a composite member from a porous substrate by selectively infiltrating conductive material into the substrate to form via and wiring regions 有权
标题翻译：通过选择性地将导电材料渗透到基板中以形成通孔和布线区域，从多孔基板制造复合构件的方法
公开(公告)号：US06649516B2
公开(公告)日：2003-11-18
申请号：US10161707
申请日：2002-06-05
申请人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
发明人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
IPC分类号： H05K310
CPC分类号： H05K3/10 , H05K1/034 , H05K3/0002 , H05K3/0082 , H05K3/107 , H05K3/185 , H05K3/422 , H05K2201/0116 , H05K2201/015 , H05K2203/056 , H05K2203/107 , H05K2203/1147 , Y10T29/49155 , Y10T29/49215
摘要： Disclosed is a method for manufacturing a composite member comprising a porous substrate, a via, and a wiring. The method comprises exposing a first region and a second region in the porous substrate to a exposure beam through a mask, the second region exposed by the exposure beam not more than 50% of the exposure of the first region, the exposure beam having the wavelength that an average size of voids of the porous substrate is, as expressed by a radius of gyration, {fraction (1/20)} to 10 times, and forming the via and the wiring by infiltrating a conductive material into the first region and the second region respectively.
摘要翻译：公开了一种用于制造包括多孔基底，通孔和布线的复合构件的方法。该方法包括将多孔基底中的第一区域和第二区域暴露于通过掩模的曝光光束，由曝光光束曝光的第二区域不大于第一区域的曝光的50％，曝光光束具有波长多孔基材的空隙的平均尺寸是以回转半径表示的{分数（1/20至10倍，并且通过将导电材料渗透到第一区域和第二区域中形成通孔和布线分别。

5. 发明授权

US06565764B2 Method of manufacturing a material having a fine structure 有权
公开(公告)号：US06565764B2
公开(公告)日：2003-05-20
申请号：US09927937
申请日：2001-08-13
申请人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta
发明人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta
IPC分类号： B44C122
CPC分类号： B29C35/08 , B29C59/16 , B29C71/0009 , B29C2035/0877 , B29C2071/0045 , B29C2071/0054 , B29K2096/02 , B29K2096/04 , Y02P20/582
摘要： Molded products may be made by a process comprising preparing a structure comprising a block copolymer or a graft copolymer having two or more phases, wherein each phase is comprised of polymer chains, decomposing the polymer chains of at least one phase of the structure, and cleaning the structure with a supercritical fluid or a sub-critical fluid, thereby removing the decomposed polymer chains from the structure. Molded products made by this method have very low levels of residual solvents, can be manufactured at a relatively low temperature in a short period of time without using large amounts of organic solvents, and without discharging large amounts of liquid waste.

6. 发明授权

US08435416B2 Method for manufacturing porous structure and method for forming pattern 有权
公开(公告)号：US08435416B2
公开(公告)日：2013-05-07
申请号：US13278862
申请日：2011-10-21
申请人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： B44C1/22
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc-No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.

7. 发明申请

US20120037595A1 METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN 有权
标题翻译：制造多孔结构的方法和形成图案的方法
公开(公告)号：US20120037595A1
公开(公告)日：2012-02-16
申请号：US13278862
申请日：2011-10-21
申请人： Koji ASAKAWA , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji ASAKAWA , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： C23F1/02
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc-No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
摘要翻译：图案形成材料含有嵌段共聚物或接枝共聚物，并形成具有微聚合物相的结构，其中，关于构成嵌段共聚物或接枝共聚物的聚合物链中的至少两个聚合物链，N /（Nc- 否）构成各聚合物链的单体单元的值为1.4以上，其中N表示单体单元中的总原子数，Nc表示单体单元中的碳原子数，No表示单体单元中的氧原子数。

8. 发明授权

US06835889B2 Passive element component and substrate with built-in passive element 失效
标题翻译：无源元件元件和衬底内置无源元件
公开(公告)号：US06835889B2
公开(公告)日：2004-12-28
申请号：US10251825
申请日：2002-09-23
申请人： Toshiro Hiraoka , Yasuyuki Hotta , Koji Asakawa , Shigeru Matake
发明人： Toshiro Hiraoka , Yasuyuki Hotta , Koji Asakawa , Shigeru Matake
IPC分类号： H01L2329
CPC分类号： H05K3/423 , H01C7/00 , H01F17/0006 , H01F41/041 , H01F2017/006 , H05K1/16 , H05K1/162 , H05K1/165 , H05K1/167 , H05K2201/0116 , H05K2201/0355 , H05K2201/0394 , H05K2203/1545
摘要： The present invention provides a composite material such as a passive element, a passive element composite component, a substrate with a built-in passive element and a composite wiring substrate which are free from, for example, a layer peeling problem and enables high density packaging with ease. In the present invention, a porous base material is divided into plural functional regions and a material having different electromagnetic characteristics is filled in a pore of the porous base material of each functional region, to form a passive element or a wiring substrate. Among the aforementioned plural functional regions, at least one functional region is a conductive material region filled with a conductive material and other regions are filled with a high-dielectric material, a high-permeability material or a low-dielectric material. This structure ensures that a single passive element, plural passive elements or a wiring substrate provided with a circuit wiring can be formed on a porous base material efficiently.
摘要翻译：本发明提供了诸如无源元件，无源元件复合元件，具有内置无源元件的基板和复合布线基板的复合材料，其不含例如层剥离问题并且能够实现高密度封装轻松。在本发明中，将多孔基材分成多个功能区域，并且将具有不同电磁特性的材料填充在各功能区域的多孔基材的孔中，形成无源元件或布线基板。在上述多个功能区域中，至少一个功能区域是填充有导电材料的导电材料区域，并且其它区域填充有高介电材料，高磁导率材料或低电介质材料。这种结构确保了能够有效地在多孔基材上形成单个无源元件，多个无源元件或设置有电路布线的布线基板。

9. 发明授权

US06565763B1 Method for manufacturing porous structure and method for forming pattern 有权
公开(公告)号：US06565763B1
公开(公告)日：2003-05-20
申请号：US09588721
申请日：2000-06-07
申请人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： C08J926
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.

10. 发明授权

US07517466B2 Method for manufacturing porous structure and method for forming pattern 有权
标题翻译：制造多孔结构的方法及其形成方法
公开(公告)号：US07517466B2
公开(公告)日：2009-04-14
申请号：US11455916
申请日：2006-06-20
申请人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： C08J9/26
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
摘要翻译：图案形成材料含有嵌段共聚物或接枝共聚物，并形成具有微聚合物相的结构，其中，关于构成嵌段共聚物或接枝共聚物的聚合物链中的至少两个聚合物链，N /（Nc- 否）构成各聚合物链的单体单元的值为1.4以上，其中N表示单体单元中的总原子数，Nc表示单体单元中的碳原子数，No表示单体单元中的氧原子数。

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