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41. 发明授权

US5294980A Positioning detecting method and apparatus 失效
标题翻译：定位检测方法及装置
公开(公告)号：US5294980A
公开(公告)日：1994-03-15
申请号：US58662
申请日：1993-05-10
申请人： Masakazu Matsugu , Kenji Saitoh , Yukichi Niwa , Noriyuki Nose , Ryo Kuroda , Shigeyuki Suda
发明人： Masakazu Matsugu , Kenji Saitoh , Yukichi Niwa , Noriyuki Nose , Ryo Kuroda , Shigeyuki Suda
IPC分类号： G03F9/00 , G01B11/00 , G01N21/85
CPC分类号： G03F9/70
摘要： A device for detecting a relative positional relationship between first and second objects with respect to a predetermined direction includes an illumination system for irradiating the first object with light, wherein the first and second objects are provided with first and second physical optic elements, respectively, each having a light converging or diverging function in at least one direction and wherein the illumination system illuminates the first physical optic element. A photodetecting system detects light passing through the first object and emanating from the second object, and is operable to detect light convergently or divergently influenced by both of the first and physical optic elements, such that the relative positional relationship between the first and second objects can be detected on the basis of the detection by the photodetecting system. At least one of the first and second physical optic elements has a light converging or diverging function in a direction perpendicular to the one direction and has different focal lengths in the perpendicular direction and in the one direction.
摘要翻译：用于检测相对于预定方向的第一和第二物体之间的相对位置关系的装置包括用于用光照射第一物体的照明系统，其中第一和第二物体分别设置有第一和第二物理光学元件，在至少一个方向上具有聚光或发散功能，并且其中所述照明系统照亮所述第一物理光学元件。光检测系统检测穿过第一物体并从第二物体发出的光，并且可操作以从第一物理光学元件和物理光学元件两者收敛或分散地检测光，使得第一和第二物体之间的相对位置关系基于光检测系统的检测来检测。第一和第二物理光学元件中的至少一个在垂直于一个方向的方向上具有聚光或发散功能，并且在垂直方向和一个方向上具有不同的焦距。

42. 发明授权

US5229617A Position detecting method having reflectively scattered light prevented from impinging on a detector 失效
标题翻译：具有反射散射光的位置检测方法防止撞击在检测器上
公开(公告)号：US5229617A
公开(公告)日：1993-07-20
申请号：US972726
申请日：1992-11-06
申请人： Kenji Saitoh , Masakazu Matsugu
发明人： Kenji Saitoh , Masakazu Matsugu
IPC分类号： G03F9/00
CPC分类号： G03F9/7076 , G03F9/7049
摘要： A method of detecting the position of a substrate by using a grating pattern formed on the substrate is disclosed. In this method, a radiation beam is projected to the grating pattern by which a diffraction beam is produced and received by a sensor, wherein any reflectively scattered light from an edge of an outer peripheral part of the diffraction pattern is substantially prevented from being received by the sensor; and wherein an output signal from the sensor responsive substantially only to the diffraction beam from the grating pattern is used to determine the position of the substrate.
摘要翻译：公开了通过使用形成在基板上的光栅图案来检测基板的位置的方法。在这种方法中，辐射束被投射到光栅图案上，通过该光栅图案由传感器产生和接收衍射光束，其中基本上防止了衍射图案的外周部分的边缘的任何反射散射的光被传感器; 并且其中来自传感器的输出信号基本上仅响应于来自光栅图案的衍射光束被用于确定基板的位置。

43. 发明授权

US5196711A Deviation measuring device including a mask having a grating pattern and a zone plate pattern 失效
标题翻译：偏差测量装置，包括具有纹理图案和区域图案的蒙版
公开(公告)号：US5196711A
公开(公告)日：1993-03-23
申请号：US643475
申请日：1991-01-22
申请人： Masakazu Matsugu , Kenji Saitoh
发明人： Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01B11/14 , G02B7/28 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7076 , G03F9/7023
摘要： A device for detecting relative positional deviation between a mask and a wafer is disclosed, wherein the mask has a first grating pattern and a zone plate pattern and the wafer has a second grating pattern. The device includes a directing system for directing a radiation beam to the first grating pattern of the mask, such that the first grating pattern produces a first transmitted beam which is then inputted to the wafer substantially perpendicularly and a second transmitted beam which is obliquely inputted to the wafer and such that the first grating pattern also produces a first reflected beam; and a detecting system for detecting (i) the first reflected beam and also for detecting (ii) a second reflected beam resulting from reflective diffraction of the first transmitted beam by the second diffraction pattern of the wafer, the third reflected beam being displaceable with any inclination of a surface of the wafer and (iii) a third reflected beam resulting from reflection of the second transmitted beam by the wafer surface and from diffraction of the same by the zone plate pattern of the mask and being displaceable with any inclination of the wafer surface and an interval between the mask and the wafer.

44. 发明授权

US5160848A Device for detecting the relative position between opposed first and second objects 失效
标题翻译：用于检测相对的第一和第二物体之间的相对位置的装置
公开(公告)号：US5160848A
公开(公告)日：1992-11-03
申请号：US832612
申请日：1992-02-12
申请人： Kenji Saitoh , Masakazu Matsugu , Naoto Abe
发明人： Kenji Saitoh , Masakazu Matsugu , Naoto Abe
IPC分类号： G03F9/00
CPC分类号： G03F9/7049
摘要： A device, usable with first and second opposed objects each having at least one diffraction grating, for detecting a positional relationship between those objects in a direction perpendicular to the direction in which they are opposed, is disclosed. The device includes a light source for projecting light to a diffraction grating of one of the first and second objects and a first detecting system for detecting, in a first plane, first light diffracted by diffraction gratings of the first and second objects. The position of incidence of the first light on the first plane is changeable with a change in the relative position of the first and second objects in the perpendicular direction. A second detecting system detects, in a second plane, second light diffracted by a diffraction grating of the first and second objects, wherein a change in the position of incidence of the second light on the second plane due to a change in the relative position of the first and second objects in the perpendicular direction is different from the change in the position of incidence of the first light. A position detecting system detects the relative position of the first and second objects, in accordance with the detection by the first and second detecting systems; wherein the first and second lights are those lights having been diffracted, at different orders, by the same diffraction grating of one of the first and second objects.
摘要翻译：公开了一种可用于具有至少一个衍射光栅的第一和第二相对对象的装置，用于检测这些物体在与它们相对的方向垂直的方向上的位置关系。该装置包括用于将光投射到第一和第二物体之一的衍射光栅的光源和用于在第一平面中检测由第一和第二物体的衍射光栅衍射的第一光的第一检测系统。在第一平面上的第一光的入射位置随着第一和第二物体在垂直方向上的相对位置的变化而变化。第二检测系统在第二平面中检测由第一和第二物体的衍射光栅衍射的第二光，其中由于相对位置的变化，第二平面上的第二光的入射位置的变化垂直方向上的第一和第二物体与第一光的入射位置的变化不同。根据第一和第二检测系统的检测，位置检测系统检测第一和第二物体的相对位置; 其中所述第一和第二光是通过所述第一和第二物体之一的相同衍射光栅以不同的次数衍射的那些光。

45. 发明授权

US5148036A Multi-axis wafer position detecting system using a mark having optical power 失效
标题翻译：使用具有光功率的标记的多轴波形位置检测系统
公开(公告)号：US5148036A
公开(公告)日：1992-09-15
申请号：US835062
申请日：1992-02-18
申请人： Masakazu Matsugu , Kenji Saitoh
发明人： Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01B11/00 , G01B11/14 , G03F9/00 , H01J37/304 , H01L21/027 , H01L21/30
CPC分类号： G03F7/7035 , B82Y10/00 , B82Y40/00 , G03F7/70775 , G03F9/7049 , H01J37/3045 , H01J37/3174
摘要： A position detecting system, for detecting the position of a substrate having a surface, with respect to a first direction perpendicular to the surface of the substrate and a second direction perpendicular to the first direction, by use of a mark formed on the substrate and having an optical power, is disclosed. The system includes a directing device for directing a radiation beam to the mark so that the radiation beam is deflected by the mark; a sensor for receiving the radiation beam deflected by the mark, wherein the position of the radiation beam incident on the sensor is shiftable in a third direction in accordance with the position of the substrate with respect to the first direction and also is shiftable in a fourth direction, different from the third direction, in accordance with the position of the substrate with respect to the second direction; and a detecting device for detecting the position of the substrate with respect to the first and second directions on the basis of an output of the sensor corresponding to the position of incidence of the radiation beam upon the sensor.

46. 发明授权

US08497995B2 Measurement apparatus and method for measuring surface shape and roughness 有权
标题翻译：用于测量表面形状和粗糙度的测量装置和方法
公开(公告)号：US08497995B2
公开(公告)日：2013-07-30
申请号：US12669825
申请日：2008-08-14
申请人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
发明人： Kazuyuki Ota , Hiroshi Yoshikawa , Yusuke Mitarai , Masafumi Takimoto , Kazunori Okudomi , Hiroyuki Shinbata , Kenji Saitoh , Masakazu Matsugu
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01B11/30
摘要： A measurement apparatus includes an illumination light setting unit which sets illumination light having an optical characteristic corresponding to a microstructure which is formed on the surface of a measurement target and is to be measured, and a measurement unit which measures reflected light when the measurement target is irradiated with the illumination light. In addition, an extraction unit extracts, from the measured reflected light, information about the surface shape of the measurement target and the microstructure formed on the surface.
摘要翻译：测量装置包括照明光设定单元，其设置具有对应于形成在测量对象物的表面上并要被测量的微结构的光学特性的照明光，以及测量单元，其在测量对象为用照明光照射。此外，提取单元从测量的反射光中提取关于测量目标的表面形状和形成在表面上的微结构的信息。

47. 发明授权

US08456621B2 Measurement system and measurement processing method 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US08456621B2
公开(公告)日：2013-06-04
申请号：US13595013
申请日：2012-08-27
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01N21/00
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

48. 发明授权

US08274646B2 Measurement system and measurement processing method 有权
标题翻译：测量系统和测量处理方法
公开(公告)号：US08274646B2
公开(公告)日：2012-09-25
申请号：US12816069
申请日：2010-06-15
申请人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
发明人： Kazuyuki Ota , Masakazu Matsugu , Kenji Saitoh
IPC分类号： G01N21/00
CPC分类号： G01B11/25
摘要： This invention is directed to extract the scattering characteristic of a measurement target together when measuring the surface shape in a measurement system, which measures the surface shape of a measurement target, by the pattern projection method. To accomplish this, the measurement system includes an illumination unit which irradiates a measurement target with dot pattern light, a reflected light measurement unit which receives the reflected light at a reflection angle almost equal to a incident angle, and a reflected light extraction unit which extracts the inclination of the surface of the measurement target, based on the shift amount between the light receiving position of the received reflected light and a predetermined reference position, and extracts the luminance value of the reflected light and the dot diameter of the dot pattern light as information about the scattering characteristic.
摘要翻译：本发明旨在通过图案投影法在测量测量对象的表面形状的测量系统中测量表面形状时，将测量对象的散射特性一起提取。为了实现这一点，测量系统包括用点阵图形光照射测量对象的照明单元，以几乎等于入射角的反射角接收反射光的反射光测量单元和提取出的反射光提取单元基于接收到的反射光的光接收位置与预定的基准位置之间的偏移量，测量对象的表面的倾斜度，并将点阵图案光的反射光的亮度值和点直径提取为关于散射特性的信息。

49. 发明授权

US07988309B2 Corner cube member illumination device and inspection system having the same 失效
标题翻译：角立方会员照明装置及其检查系统
公开(公告)号：US07988309B2
公开(公告)日：2011-08-02
申请号：US11863649
申请日：2007-09-28
申请人： Kenji Saitoh , Hiroshi Yoshikawa
发明人： Kenji Saitoh , Hiroshi Yoshikawa
IPC分类号： G03B15/02 , G03B15/06 , F21V7/05
CPC分类号： G03B15/02 , G01N21/8806
摘要： An illumination device has a light source that supplies illumination light to an object to be illuminated and also has a corner cube member disposed at the opposite side of the light source with respect to the object to be illuminated. With this feature, efficient illumination of the object to be illuminated is achieved without need for high precision in positioning.
摘要翻译：照明装置具有将照明光提供给被照射物体的光源，并且还具有相对于被照射物体设置在光源的相反侧的角部立方体部件。利用该特征，可以实现对要被照明的物体的高效照明，而不需要高精度的定位。

50. 发明授权

US07965917B2 Illuminating apparatus and surface inspection system using illuminating apparatus 有权
标题翻译：照明装置和使用照明装置的表面检查系统
公开(公告)号：US07965917B2
公开(公告)日：2011-06-21
申请号：US11764555
申请日：2007-06-18
申请人： Hiroshi Yoshikawa , Kenji Saitoh
发明人： Hiroshi Yoshikawa , Kenji Saitoh
IPC分类号： G02B6/10 , G01N21/00 , F21S6/00 , F21V7/00
CPC分类号： G02B17/086 , G01N21/47
摘要： At least one exemplary embodiment is directed to an illuminating apparatus, configured to uniformly illuminate a surface of an object, and includes a light-guiding member configured to guide light emitted from a source to a surface to be illuminated, and a reflecting member disposed between the light-guiding member and the surface to be illuminated. The reflecting member includes a pair of reflection surfaces disposed so as to face each other in a long side direction of the surface to be illuminated, and reflects light emitted from the light-guiding member in directions having directional components parallel to a short side direction of the surface to be illuminated toward the surface to be illuminated.
摘要翻译：至少一个示例性实施例涉及一种被配置为均匀地照射物体的表面的照明装置，并且包括导光构件，其被配置为将从源发射的光引导到待照亮的表面，以及反射构件，导光构件和被照射的表面。反射构件包括一对反射面，其被布置为在被照射表面的长边方向上彼此面对，并且将从导光构件发射的光沿具有平行于短边方向的方向分量的方向反射要照亮的表面被照亮的表面。

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