专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明申请

US20050179452A1 Configurable prober for TFT LCD array test 有权
标题翻译：可配置探针用于TFT LCD阵列测试
公开(公告)号：US20050179452A1
公开(公告)日：2005-08-18
申请号：US10903216
申请日：2004-07-30
申请人： Matthias Brunner , Shinichi Kurita , Ralf Schmid , Fayez Abboud , Benjamin Johnston , Paul Bocian , Emanuel Beer
发明人： Matthias Brunner , Shinichi Kurita , Ralf Schmid , Fayez Abboud , Benjamin Johnston , Paul Bocian , Emanuel Beer
IPC分类号： G01R31/302 , G01R31/26 , G01R31/305 , G02F1/13 , G09G3/00 , H01L21/687
CPC分类号： G01R1/07364 , G01R31/2893 , G01R31/305 , G09G3/006
摘要： An improved prober for an electronic devices test system is provided. The prober is “configurable,” meaning that it can be adapted for different device layouts and substrate sizes. The prober generally includes a frame, at least one prober bar having a first end and a second end, a frame connection mechanism that allows for ready relocation of the prober bar to the frame at selected points along the frame, and a plurality of electrical contact pins along the prober bar for placing selected electronic devices in electrical communication with a system controller during testing. In one embodiment, the prober is be used to test devices such as thin film transistors on a glass substrate. Typically, the glass substrate is square, and the frame is also square. In this way, “x” and “y” axes are defined by the frame. The electrical pins may be movable along the axial length of the prober bars, or may be selectively pushed down to contact selected contact pads on the substrate.
摘要翻译：提供了一种用于电子设备测试系统的改进的探测器。探测器是“可配置的”，这意味着它可以适用于不同的设备布局和基板尺寸。探测器通常包括框架，至少一个具有第一端和第二端的探测杆，框架连接机构，其允许在沿着框架的选定点准备将探测杆重新定位到框架，以及多个电触点沿着探测杆的引脚，用于在测试期间将选定的电子设备与系统控制器电连通。在一个实施例中，探测器用于测试诸如玻璃基板上的薄膜晶体管的器件。通常，玻璃基板是正方形的，框架也是正方形的。以这种方式，“x”和“y”轴由框架定义。电引脚可以沿着探针杆的轴向长度移动，或者可以选择性地向下推动以接触衬底上的所选择的接触垫。

42. 发明授权

US06577923B1 Apparatus and method for robotic alignment of substrates 失效
标题翻译：用于机器人对准基板的装置和方法
公开(公告)号：US06577923B1
公开(公告)日：2003-06-10
申请号：US09470821
申请日：1999-12-23
申请人： John M. White , Shinichi Kurita
发明人： John M. White , Shinichi Kurita
IPC分类号： G06F1900
CPC分类号： H01L21/67259 , H01L21/68 , H01L21/681 , H01L21/68707
摘要： A robot device that either translationally or rotationally aligns an object with a slot. For translational alignment, the robot device comprises a position sensor positioned in close proximity to the slot. The translational position sensor determines the position of the object by moving the object parallel to the slot until it actuates the position sensor. For rotational alignment, two position sensors are provided that determine the relative angle between the object and a portion of the robot device and the object.
摘要翻译：一个机器人设备，可以平移或旋转对齐一个对象与一个槽。对于平移对准，机器人装置包括位置传感器，该位置传感器位于狭缝附近。平移位置传感器通过将物体平行于槽移动直到其致动位置传感器来确定物体的位置。为了旋转对准，提供了两个位置传感器，其确定物体与机器人装置和物体的一部分之间的相对角度。

43. 发明授权

US06235634B1 Modular substrate processing system 失效
标题翻译：模块化基板处理系统
公开(公告)号：US06235634B1
公开(公告)日：2001-05-22
申请号：US09082483
申请日：1998-05-20
申请人： John M. White , Robert B. Conner , Kam S. Law , Norman L. Turner , William T. Lee , Shinichi Kurita
发明人： John M. White , Robert B. Conner , Kam S. Law , Norman L. Turner , William T. Lee , Shinichi Kurita
IPC分类号： H01L2144
CPC分类号： H01L21/67167 , H01L21/67161 , H01L21/67173 , H01L21/67236 , H01L21/67721 , H01L21/67727 , H01L21/67736 , H01L21/68707
摘要： The invention provides an apparatus and method for performing a process on a substrate. At least two types of structures may be used to provide a flow path for a substrate so that the substrate may be moved from one processing or loading position to another. The first is a conveyor. The second is a track. The flow path may be a closed continuous loop. Each processing island has a valve for introduction and extraction of the substrate into and out of an interior of the island. The processing island may include load locks, and may include in conjunction therewith an inspection station, a CVD chamber, a PECVD chamber, a PVD chamber, a post-anneal chamber, a cleaning chamber, a descumming chamber, an etch chamber, or a combination of such chambers.
摘要翻译：本发明提供了一种在衬底上进行处理的装置和方法。可以使用至少两种类型的结构来提供用于衬底的流动路径，使得衬底可以从一个处理或装载位置移动到另一个。第一个是输送机。第二是轨道。流动路径可以是闭合的连续环路。每个处理岛具有用于将基板引入和提取到岛内部的阀。处理岛可以包括负载锁，并且可以包括检查站，CVD室，PECVD室，PVD室，后退火室，清洁室，除污室，蚀刻室或这些室的组合。

44. 发明授权

US5862103A Magneto-optical recording method capable of determining optimum laser beam intensities 失效
标题翻译：能够确定最佳激光束强度的磁光记录方法
公开(公告)号：US5862103A
公开(公告)日：1999-01-19
申请号：US954663
申请日：1997-10-20
申请人： Hiroyuki Matsumoto , Shinichi Kurita , Koichiro Ishii , Masashi Horikawa
发明人： Hiroyuki Matsumoto , Shinichi Kurita , Koichiro Ishii , Masashi Horikawa
IPC分类号： G11B7/0045 , G11B7/006 , G11B7/125 , G11B11/105 , G11B11/00
CPC分类号： G11B7/126 , G11B11/1053 , G11B11/10595 , G11B7/006 , G11B11/10521 , G11B7/0045
摘要： A method and apparatus for recording data on a magnetooptical recording medium finds an optimum laser beam intensities for recording. The method and apparatus do not cause a low level P.sub.L setting to become excessively low and poor overwriting of data during overwrite recording. Recording can be accomplished changing low level and high level laser beam intensities, while holding the ratio of the low level and high level laser beam intensities constant. Data can be reproduced and evaluated. When the optimum laser beam intensities have not been determined, the intensity ratio of the low level and high level intensities can be altered. After data has been is reproduced and evaluated, the process can be repeated, until the optimum laser beam intensities are obtained. Further, recording can be based on temperature of the recording medium and surroundings to obtain optimum laser beam intensities.
摘要翻译：用于在磁光记录介质上记录数据的方法和装置找到用于记录的最佳激光束强度。该方法和装置在重写记录期间不会导致低电平PL设置变得过低和数据重写不良。可以实现低电平和高电平激光束强度的记录，同时保持低电平和高电平激光束强度的比例恒定。数据可以被复制和评估。当最佳激光束强度尚未确定时，可以改变低电平和高电平强度的强度比。在再现和评估数据之后，可以重复该过程，直到获得最佳的激光束强度。此外，记录可以基于记录介质和周围环境的温度，以获得最佳的激光束强度。

45. 发明授权

US5600612A Magnetooptic recording method and apparatus 失效
标题翻译：磁光记录方法和装置
公开(公告)号：US5600612A
公开(公告)日：1997-02-04
申请号：US331578
申请日：1994-11-01
申请人： Jun Saito , Shinichi Kurita , Yoshihiro Yamanaka , Kazutomo Miyata
发明人： Jun Saito , Shinichi Kurita , Yoshihiro Yamanaka , Kazutomo Miyata
IPC分类号： G11B11/105 , G11B20/12 , G11B11/10 , G11B7/00
CPC分类号： G11B11/1053 , G11B11/10506 , G11B11/10595 , G11B11/10584 , G11B20/1258
摘要： In magnetooptic recording, compensation is provided for changes in temperature up and down characteristics for heating and cooling processes of a recording medium due to the rise and fall of a laser beam effected in dependence on the relative velocity of the laser beam and the recording medium. The advantages of the Z-CAV system, i.e., a high density recording and an enhanced access performance are realized and the reliability for performing a high density recording is also improved in the case of the CAV system. The relation between the relative velocity of the laser beam and the medium or the linear velocity of the medium and the thermal time constant of the medium is clarified and the thermal time constant .tau. at the current linear velocity is obtained. Information to be recorded is converted into binary signals and the laser beam intensity modulated in accordance with the binary signals is projected on the mangetooptic recording medium thereby recording the information. Thermal time constant information relating to the temperature variations of the magnetooptic recording medium due to the projection of the laser beam is preliminarily recorded on the magnetooptic recording medium. A clock frequency f is controlled in such a manner that a ratio T/.tau. between a reciprocal T of the clock frequency f and the thermal time constant .tau. of the medium is always maintained constant. The starting and end positions of each mark are formed with a high degree of accuracy.
摘要翻译： PCT No.PCT / JP94 / 00411 Sec。 371日期：1994年11月1日 102（e）1994年11月1日PCT 1994年3月15日PCT公布。公开号WO94 / 22139 日期1994年9月29日在磁光记录中，由于根据激光束的相对速度而激发的激光束的上升和下降，对记录介质的加热和冷却过程的温度上升和下降特性的变化提供补偿和记录介质。实现了Z-CAV系统的优点，即高密度记录和增强的访问性能，并且在CAV系统的情况下，还提高了执行高密度记录的可靠性。激光束与介质的相对速度或介质的线速度和介质的热时间常数之间的关系得到澄清，并获得当前线速度下的热时间常数τ。要记录的信息被转换为二进制信号，并且根据二进制信号调制的激光束强度被投影在管理记录介质上，从而记录信息。与激光束的投射有关的光磁记录介质的温度变化的热时间常数信息被预先记录在磁光记录介质上。控制时钟频率f，使得时钟频率f的倒数T与介质的热时间常数τ之间的比率T /τ始终保持恒定。每个标记的开始和结束位置都以高精度形成。

46. 发明授权

US5561642A Pulse train condition/heat shut off condition determination method and apparatus for optical recording, and optical recording method and apparatus 失效
标题翻译：脉冲序列条件/热关闭条件确定方法和光学记录装置，以及光学记录方法和装置
公开(公告)号：US5561642A
公开(公告)日：1996-10-01
申请号：US526875
申请日：1995-09-12
申请人： Jun Saito , Shinichi Kurita
发明人： Jun Saito , Shinichi Kurita
IPC分类号： G11B7/00 , G11B7/0045 , G11B7/125 , G11B11/105 , G11B11/00
CPC分类号： G11B7/126 , G11B11/1053 , G11B7/0045 , G11B7/0062 , G11B7/1267
摘要： This invention relates to an optical recording method and apparatus, in which the intensity of a laser beam to be radiated onto an optical recording medium is raised from an intensity P.sub.pre for maintaining a pre-heat state in which the temperature of the medium surface becomes a predetermined temperature, to P.sub.W1 higher than P.sub.pre, the intensity is reduced to an intensity P.sub.LT lower than P.sub.W1 after P.sub.W1 is maintained for a time T.sub.W1, and thereafter, the laser beam is intensity-modulated between P.sub.LT and an intensity P.sub.W2 higher than P.sub.LT so as to form a mark on the optical recording medium. When at least one of P.sub.W2, P.sub.LT, and a time T.sub.W2 for maintaining P.sub.W2 is controlled, the medium temperature, after an elapse of T.sub.W1, at the peak temperature position or the spot center position of the laser beam radiated onto the medium surface is equal to the medium temperature after an elapse of T.sub.W2.
摘要翻译：本发明涉及一种光记录方法和装置，其中要辐射到光记录介质上的激光束的强度从用于维持介质表面的温度变为的预热状态的强度Ppre升高在PW1高于Ppre的情况下，在PW1保持一段时间TW1之后，将强度降低到低于PW1的强度PLT，之后激光束在PLT和比PLT高的PW2之间进行强度调制，以便以在光学记录介质上形成标记。当PW2，PLT以及用于维持PW2的时间TW2中的至少一个被控制时，TW1之后的中间温度在辐射到介质表面上的激光束的峰值温度位置或光点中心位置相等经过TW2后的介质温度。

47. 发明授权

US4788409A Method of and apparatus for automatically conducting all position plasma welding of pipes 失效
标题翻译：自动进行管道等离子体焊接的方法和装置
公开(公告)号：US4788409A
公开(公告)日：1988-11-29
申请号：US84555
申请日：1987-08-11
申请人： Takashi Yamade , Seishi Watahiki , Yasuzi Sakuma , Masayoshi Yamaguchi , Shinichi Kurita
发明人： Takashi Yamade , Seishi Watahiki , Yasuzi Sakuma , Masayoshi Yamaguchi , Shinichi Kurita
IPC分类号： B23K9/167 , B23K9/235 , B23K10/00 , B23K10/02 , B23K5/00
CPC分类号： B23K10/02 , B23K9/167
摘要： A plasma welding method has successive steps including pre-heating of members to be welded, tack welding of the members for tentatively fixing these members, keyhole welding for completely welding the members to each other, and finish padding. These steps are automatically conducted by a single plasma welding apparatus operative in accordance with a programmed sequence including data concerning the optimum conditions of operation in each step in relation to the conditions such as sizes and materials of the members to be welded. The apparatus has a welding torch, a welding head on which the welding torch is mounted for rotation, a controller adapted for storing the optimum welding conditions for successive steps of the welding process in relation to the conditions of the members to be welded, a power supply system for transmitting welding current and welding speed signal to the welding head in accordance with a command provided by the controller, and a gas supply system for supplying a plasma gas at a rate determined in accordance with a command from the controller.

48. 发明授权

US4770105A Piping travelling apparatus 失效
标题翻译：管道行走装置
公开(公告)号：US4770105A
公开(公告)日：1988-09-13
申请号：US892285
申请日：1986-08-04
申请人： Atsushi Takagi , Shinichi Kurita , Seishi Watahiki , Yasuzi Sakuma , Kiyoshi Sakamoto , Chikara Sato
发明人： Atsushi Takagi , Shinichi Kurita , Seishi Watahiki , Yasuzi Sakuma , Kiyoshi Sakamoto , Chikara Sato
IPC分类号： G01N23/18 , B61B13/10 , F16L55/30 , F16L55/32 , G01N29/04 , G21C17/017 , G01M19/00
CPC分类号： G21C17/017 , F16L55/30 , F16L55/32 , F16L2101/30
摘要： A piping travelling apparatus having a plurality of continuous treads driven by motors through transmission gearing. The continuous treads are mounted to a frame and spaced apart a predetermined distance peripherally of the inner wall surface of the piping. At least one of the continuous treads is kept in contact with the inner wall surface of the piping no matter what the posture of the apparatus may be, so that the apparatus can travel without any trouble even if its posture undergoes a change when it moves along elevations and depressions on the inner wall surface of the piping or negotiates the boundary between different levels of the inner wall surface or bends of the piping. The apparatus enables a travel through piping of relatively small diameter having vertical or steeply slanted pipes to be made without any trouble.
摘要翻译：一种管道传送装置，具有通过传动装置由马达驱动的多个连续胎面。连续的胎面安装到框架并且在管道的内壁表面的外围隔开预定距离。连续的胎面中的至少一个与管道的内壁表面保持接触，不管装置的姿势如何，使得即使其姿势在其移动时其姿势发生变化，该装置也可以无障碍地行进在管道的内壁表面上的高度和凹陷或协调内壁表面的不同层次或管道的弯曲之间的边界。该装置能够在没有任何麻烦的情况下通过具有垂直或陡倾斜管道的相对较小直径的管道行进。

49. 发明授权

US09758869B2 Anodized showerhead 有权
公开(公告)号：US09758869B2
公开(公告)日：2017-09-12
申请号：US12779167
申请日：2010-05-13
申请人： Soo Young Choi , Suhail Anwar , Gaku Furuta , Beom Soo Park , Robin L Tiner , John M White , Shinichi Kurita
发明人： Soo Young Choi , Suhail Anwar , Gaku Furuta , Beom Soo Park , Robin L Tiner , John M White , Shinichi Kurita
IPC分类号： C23C16/00 , H01J37/00 , C23C16/455 , C23C16/44 , C23C16/509 , H01J37/32
CPC分类号： C23C16/45565 , C23C16/4404 , C23C16/5096 , H01J37/32091 , H01J37/32449 , H01J37/32541 , H01J37/32559 , H01J37/32577
摘要： Embodiments disclosed herein generally relate to an apparatus having an anodized gas distribution showerhead. In large area, parallel plate RF processing chambers, mastering the RF return path can be challenging. Arcing is a frequent problem encountered in RF processing chambers. To reduce arcing in RF processing chambers, straps may be coupled to the susceptor to shorten the RF return path, a ceramic or insulating or anodized shadow frame may be coupled to the susceptor during processing, and an anodized coating may be deposited onto the edge of the showerhead that is nearest the chamber walls. The anodized coating may reduce arcing between the showerhead and the chamber walls and therefore enhance film properties and increase deposition rate.

50. 发明申请

US20140170785A1 MASK MANAGEMENT SYSTEM AND METHOD FOR OLED ENCAPSULATION 有权
标题翻译：用于OLED封装的掩模管理系统和方法
公开(公告)号：US20140170785A1
公开(公告)日：2014-06-19
申请号：US14126211
申请日：2012-06-18
申请人： Shinichi Kurita , Beom Soo Kim
发明人： Shinichi Kurita , Beom Soo Kim
IPC分类号： H01L51/56
CPC分类号： H01L51/56 , C23C16/042
摘要： A system and method for encapsulating an organic light-emitting diode (OLED) device by enabling a substrate and a plurality of masks to be efficiently received into a vacuum processing environment, transferred between one or more process chambers for the deposition of encapsulating layers, and removed from the processing system. A method of encapsulating an organic light-emitting diode (OLED) device includes positioning one or more masks over a substrate to deposit encapsulating layers on an OLED device disposed on the substrate. A processing system for encapsulating an organic light-emitting diode (OLED) device includes one or more transfer chambers, one or more load lock chambers coupled to each transfer chamber and operable to receive a mask into a vacuum environment, and one or more process chambers coupled to each transfer chamber and operable to deposit an encapsulating layer on a substrate.
摘要翻译：一种用于封装有机发光二极管（OLED）器件的系统和方法，其通过使衬底和多个掩模能够被有效地接收到真空处理环境中，在一个或多个用于沉积封装层的处理室之间传送的真空处理环境中，以及从处理系统中删除。封装有机发光二极管（OLED）器件的方法包括将一个或多个掩模定位在衬底上以将封装层沉积在设置在衬底上的OLED器件上。用于封装有机发光二极管（OLED）器件的处理系统包括一个或多个传送室，耦合到每个传送室的一个或多个负载锁定室，并可操作以将掩模接收到真空环境中，以及一个或多个处理室耦合到每个传送室并可操作以将封装层沉积在衬底上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式