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41. 发明授权

US07588879B2 Graded spin-on organic antireflective coating for photolithography 有权
标题翻译：梯度旋涂有机抗反射涂层用于光刻
公开(公告)号：US07588879B2
公开(公告)日：2009-09-15
申请号：US12042709
申请日：2008-03-05
申请人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
发明人： Colin J. Brodsky , Sean D. Burns , Dario L. Goldfarb , Michael Lercel , David R. Medeiros , Dirk Pfeiffer , Daniel P. Sanders , Steven A. Scheer , Libor Vyklicky
IPC分类号： G03F7/11
CPC分类号： G03F7/091 , Y10S438/952
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

42. 发明授权

US07446859B2 Apparatus and method for reducing contamination in immersion lithography 失效
标题翻译：用于减少浸没光刻中污染的装置和方法
公开(公告)号：US07446859B2
公开(公告)日：2008-11-04
申请号：US11307230
申请日：2006-01-27
申请人： Dmitriy Shneyder , Raschid J. Bezama , Dario L. Goldfarb , Kafai Lai
发明人： Dmitriy Shneyder , Raschid J. Bezama , Dario L. Goldfarb , Kafai Lai
IPC分类号： G03B27/58 , G03B27/62 , G03B27/42
CPC分类号： G03D3/02 , G03F7/70341 , G03F7/70716 , G03F7/70916 , H01L21/68735
摘要： An apparatus for reducing contamination in immersion lithography includes a wafer chuck assembly having a wafer chuck configured to hold a semiconductor wafer on a support surface thereof. The wafer chuck has a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein. A fluid circulation path is configured within the wafer chuck so as to facilitate the radial outward movement of the immersion lithography fluid in the gap, thereby maintaining a meniscus of the immersion lithography fluid at a selected height with respect to a top surface of the semiconductor wafer.
摘要翻译：一种用于减少浸没式光刻中的污染的装置包括晶片卡盘组件，其具有构造成将半导体晶片保持在其支撑表面上的晶片卡盘。晶片卡盘在其中具有间隙，间隙位于晶片的外边缘附近，并且该间隙包含一定量的浸没光刻流体。流体循环路径被配置在晶片卡盘内，以便于浸没式光刻流体在间隙中的径向向外移动，从而将浸没式光刻流体的弯月面相对于半导体晶片的顶表面保持在选定的高度。

43. 发明授权

US07332436B2 Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition 有权
标题翻译：使用液体或超临界二氧化碳组合物从精密表面除去残留物的方法
公开(公告)号：US07332436B2
公开(公告)日：2008-02-19
申请号：US10966301
申请日：2004-10-15
申请人： John Michael Cotte , Dario L. Goldfarb , Pamela Jones , Kenneth John McCullough , Wayne Martin Moreau , Keith R. Pope , John P. Simons , Charles J. Taft
发明人： John Michael Cotte , Dario L. Goldfarb , Pamela Jones , Kenneth John McCullough , Wayne Martin Moreau , Keith R. Pope , John P. Simons , Charles J. Taft
IPC分类号： H01L21/302 , C09K13/00
CPC分类号： H01L21/02071 , B08B7/0021 , C11D7/08 , C11D7/265 , C11D7/28 , C11D7/50 , C11D11/0047 , H01L21/31116
摘要： A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.
摘要翻译：包括液体或超临界二氧化碳和pKa小于约4的酸的组合物。该组合物用于从精密表面与精密表面接触的精密表面（例如半导体样品）中除去残余物的方法在热力学条件下的组成与液体或超临界二氧化碳在液体或超临界状态下的保留一致。

44. 发明授权

US09012133B2 Removal of alkaline crystal defects in lithographic patterning 有权
标题翻译：去除光刻图案中的碱性晶体缺陷
公开(公告)号：US09012133B2
公开(公告)日：2015-04-21
申请号：US13221248
申请日：2011-08-30
申请人： Javier J. Perez , Dario L. Goldfarb , Ranee W. Kwong , Libor Vyklicky
发明人： Javier J. Perez , Dario L. Goldfarb , Ranee W. Kwong , Libor Vyklicky
IPC分类号： G03F7/32 , G03F7/40
CPC分类号： G03F7/405
摘要： An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.
摘要翻译：在基材的表面上形成粘合促进剂层作为粘合促进剂层，在其上施加光致抗蚀剂。光致抗蚀剂被光刻曝光。将光刻曝光的光致抗蚀剂的可溶部分溶解在包括四烷基氢氧化铵的显影剂溶液中。四烷基氢氧化铵盐以结晶形式形成在基材的表面上。将水溶性酸性聚合物层施加在基材的表面上以溶解四烷基氢氧化铵盐。将水溶性酸性聚合物层用水冲洗掉，由此提供在基材上不包括四烷基氢氧化铵盐的清洁表面。随后的工艺可以在衬底上进行，其被显影的光致抗蚀剂的剩余部分覆盖，并且在未被光致抗蚀剂覆盖的区域中具有清洁的表面。

45. 发明授权

US08722307B2 Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer 有权
标题翻译：近红外吸收层形成组合物和包含近红外吸收层的多层膜
公开(公告)号：US08722307B2
公开(公告)日：2014-05-13
申请号：US13118013
申请日：2011-05-27
申请人： Seiichiro Tachibana , Kazumi Noda , Masaki Ohashi , Takeshi Kinsho , Wu-Song Huang , Dario L. Goldfarb , Wai-Kin Li , Martin Glodde
发明人： Seiichiro Tachibana , Kazumi Noda , Masaki Ohashi , Takeshi Kinsho , Wu-Song Huang , Dario L. Goldfarb , Wai-Kin Li , Martin Glodde
IPC分类号： G03F7/004 , G03F7/11
CPC分类号： G03F7/038 , G03F7/0046 , G03F7/091
摘要： A composition comprising a polymer comprising repeat units selected from formulae (1) to (4), an aromatic ring-containing polymer, a near-infrared absorbing dye, and a solvent is used to form a near-infrared absorptive film. R1, R7, R9, and R14 are H, methyl, fluorine or trifluoromethyl, R2 to R6 are H, F, trifluoromethyl, —C(CF3)2OR16, alkyl or alkoxy, at least one of R2 to R6 being F or a fluorinated group, R16, R8 and R13 are H or a monovalent organic group, L1 is a single bond or —C(═O)O—, m is 0 or 1, L2 is a di- or trivalent hydrocarbon group, n is 1 or 2, R10 to R12 are H, hydroxyl, halogen or a monovalent organic group, and R15 is a fluorinated C2-C15 hydrocarbon group.
摘要翻译：包含含有选自式（1）至（4）的重复单元，含芳族环的聚合物，近红外吸收染料和溶剂的聚合物的组合物用于形成近红外吸收膜。 R1，R7，R9和R14是H，甲基，氟或三氟甲基，R2至R6是H，F，三氟甲基，-C（CF3）2OR16，烷基或烷氧基，R2至R6中的至少一个为F或氟化基团R 16，R 8和R 13为H或一价有机基团，L 1为单键或-C（= O）O-，m为0或1，L 2为二价或三价烃基，n为1或 2，R 10〜R 12为H，羟基，卤素或一价有机基团，R 15为氟代C 2 -C 15烃基。

46. 发明授权

US08652762B2 Organic graded spin on BARC compositions for high NA lithography 有权
标题翻译：用于高NA光刻的BARC组合物上的有机分级纺丝
公开(公告)号：US08652762B2
公开(公告)日：2014-02-18
申请号：US13423838
申请日：2012-03-19
申请人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
发明人： Dario L. Goldfarb , Libor Vyklicky , Sean D. Burns , David R. Medeiros , Daniel P. Sanders , Robert D. Allen
IPC分类号： H01L21/312 , H01L29/02 , G03F7/38
CPC分类号： G03F7/091
摘要： An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
摘要翻译：提供了包含至少两种聚合物组分并且包含发色团部分和透明部分的抗反射涂层。抗反射涂层可用于提供在光致抗蚀剂层下形成的单层复合渐变抗反射涂层。

47. 发明申请

US20130157463A1 NEAR-INFRARED ABSORBING FILM COMPOSITION FOR LITHOGRAPHIC APPLICATION 审中-公开
标题翻译：近红外吸收膜组合物用于光刻应用
公开(公告)号：US20130157463A1
公开(公告)日：2013-06-20
申请号：US13325797
申请日：2011-12-14
申请人： Dario L. Goldfarb , Martin Glodde , Wu-Song Huang , Takeshi Kinsho , Wai-Kin Li , Kazumi Noda , Masaki Ohashi , Seiichiro Tachibana
发明人： Dario L. Goldfarb , Martin Glodde , Wu-Song Huang , Takeshi Kinsho , Wai-Kin Li , Kazumi Noda , Masaki Ohashi , Seiichiro Tachibana
IPC分类号： H01L21/302 , G03F7/207 , G02B5/22
CPC分类号： G03F7/094 , G02B5/208 , G02B5/223 , G03F7/091 , G03F7/105 , G03F9/7026
摘要： The present invention relates to a near-infrared (NIR) film composition for use in vertical alignment and correction in the patterning of integrated semiconductor wafers and a pattern forming method using the composition. The NIR absorbing film composition includes a NIR absorbing dye having a polymethine cation and a crosslinkable anion, a crosslinkable polymer and a crosslinking agent. The patterning forming method includes aligning and focusing a focal plane position of a photoresist layer by sensing near-infrared emissions reflected from a substrate containing the photoresist layer and a NIR absorbing layer formed from the NIR absorbing film composition under the photoresist layer. The NIR absorbing film composition and the pattern forming method are especially useful for forming material patterns on a semiconductor substrate having complex buried topography.
摘要翻译：本发明涉及用于集成半导体晶片的图案化的垂直取向和校正的近红外（NIR）膜组合物和使用该组合物的图案形成方法。近红外吸收膜组合物包括具有聚甲炔阳离子和可交联阴离子的NIR吸收染料，可交联聚合物和交联剂。图案形成方法包括通过感测从包含光致抗蚀剂层的基板反射的近红外发射和由光致抗蚀剂层下的NIR吸收膜组合物形成的NIR吸收层来对准和聚焦光致抗蚀剂层的焦平面位置。近红外吸收膜组合物和图案形成方法对于在具有复杂掩埋形貌的半导体衬底上形成材料图案特别有用。

48. 发明授权

US08388758B2 Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid 失效
标题翻译：用于在液体或超临界流体中快速热控制工件的装置和方法
公开(公告)号：US08388758B2
公开(公告)日：2013-03-05
申请号：US11866255
申请日：2007-10-02
申请人： John P. Simons , Kenneth J. McCullough , Wayne M. Moreau , John M. Cotte , Keith R. Pope , Charles J. Taft , Dario L. Goldfarb
发明人： John P. Simons , Kenneth J. McCullough , Wayne M. Moreau , John M. Cotte , Keith R. Pope , Charles J. Taft , Dario L. Goldfarb
IPC分类号： B08B7/00
CPC分类号： H01L21/02101 , B08B7/0021 , H01L21/67109 , H01L21/67248 , Y10S134/902
摘要： A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.
摘要翻译：一种表面清洁装置，包括腔室和热转印装置。该室能够在其中保持半导体结构。热传递装置连接到腔室。热传递装置具有设置在室内的表面，用于接触半导体结构并控制与表面接触的半导体结构的温度。热转印装置具有连接到表面的热控制模块，用于加热和冷却表面以使表面热循环。当热再循环表面时，热控制模块会对表面产生实质上即时的热响应。

49. 发明申请

US20110312176A1 FORMING AN ELECTRODE HAVING REDUCED CORROSION AND WATER DECOMPOSITION ON SURFACE USING AN ORGANIC PROTECTIVE LAYER 失效
标题翻译：使用有机保护层形成具有降低的腐蚀和表面水分解的电极
公开(公告)号：US20110312176A1
公开(公告)日：2011-12-22
申请号：US12820543
申请日：2010-06-22
申请人： Ali Afzali-Ardakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Binquan Luan , Glenn J. Martyna , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
发明人： Ali Afzali-Ardakani , Shafaat Ahmed , Hariklia Deligianni , Dario L. Goldfarb , Stefan Harrer , Binquan Luan , Glenn J. Martyna , Hongbo Peng , Stanislav Polonsky , Stephen Rossnagel , Xiaoyan Shao , Gustavo A. Stolovitzky
IPC分类号： H01L21/283 , H01L21/441 , C23C28/00 , C30B23/02 , C23C14/34 , B05D3/14 , B05D5/12 , B05D3/06
CPC分类号： B82Y10/00 , H01L21/76834 , H01L29/0665 , H01L51/0093 , H01L51/0504 , H01L51/102
摘要： Accordingly, the present invention provides a method of forming an electrode having reduced corrosion and water decomposition on a surface thereof. A substrate which has a conductive layer disposed thereon is provided and the conductive layer has an oxide layer with an exposed surface. The exposed surface of the oxide layer contacts a solution of an organic surface active compound in an organic solvent to form a protective layer of the organic surface active compound over the oxide layer. The protective layer has a thickness of from about 0.5 nm to about 5 nm and ranges therebetween depending on a chemical structure of the surface active compound.
摘要翻译：因此，本发明提供一种在其表面上形成具有降低的腐蚀和水分解的电极的方法。提供了具有设置在其上的导电层的衬底，并且导电层具有具有暴露表面的氧化物层。氧化物层的暴露表面接触有机表面活性化合物在有机溶剂中的溶液，以在氧化物层上形成有机表面活性化合物的保护层。根据表面活性化合物的化学结构，保护层的厚度为约0.5nm至约5nm，并且其范围。

50. 发明授权

US07869002B2 Reducing contamination in immersion lithography 有权
标题翻译：降低浸渍光刻中的污染
公开(公告)号：US07869002B2
公开(公告)日：2011-01-11
申请号：US12182282
申请日：2008-07-30
申请人： Dmitriy Shneyder , Raschid J. Bezama , Dario L. Goldfarb , Kafal Lai
发明人： Dmitriy Shneyder , Raschid J. Bezama , Dario L. Goldfarb , Kafal Lai
IPC分类号： G03B27/58
CPC分类号： G03D3/02 , G03F7/70341 , G03F7/70716 , G03F7/70916 , H01L21/68735
摘要： A method for reducing contamination in immersion lithography includes retaining a semiconductor wafer on a support surface of a wafer chuck, the wafer chuck having a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein; and providing a fluid circulation path within the wafer chuck so as to facilitate the radial outward movement of the immersion lithography fluid in the gap, thereby maintaining a meniscus of the immersion lithography fluid at a selected height with respect to a top surface of the semiconductor wafer.
摘要翻译：一种用于减少浸没式光刻中的污染的方法，包括将半导体晶片保持在晶片卡盘的支撑表面上，晶片卡盘在其中具有间隙，位于晶片的外边缘附近的间隙，以及包含一定量的浸没光刻流体; 并且在晶片卡盘内提供流体循环路径，以便于浸没式光刻流体在间隙中的径向向外移动，从而将浸没式光刻流体的弯月面相对于半导体晶片的顶表面保持在选定的高度。

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