专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明授权

US08781775B2 Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus 有权
标题翻译：用于校正光刻设备的台阶位置的光刻设备和方法
公开(公告)号：US08781775B2
公开(公告)日：2014-07-15
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G01C17/38
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译：光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

42. 发明授权

US08730485B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08730485B2
公开(公告)日：2014-05-20
申请号：US12948533
申请日：2010-11-17
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra
IPC分类号： G01B11/14 , G03B27/42 , G03F7/20 , G01D5/38
CPC分类号： G03F7/70775 , G01D5/38
摘要： A position measurements system to measure a position of a movable object with respect to another object includes two or more one dimensional (1D) encoder heads mounted on one of the movable object and the other object and each capable of emitting a measurement beam along a measurement direction, one or more reference targets mounted on the other of the movable object and the other object, each reference target including a planar surface with a grid or grating to cooperate with the two or more one dimensional (1D) encoder heads, and a processor to calculate a position of the object on the basis of outputs of the two or more 1D encoder heads, wherein the measurement direction of each of the two or more 1D encoder heads is non-perpendicular to the planar surface of the respective reference target.
摘要翻译：用于测量可移动物体相对于另一物体的位置的位置测量系统包括安装在可移动物体和另一物体之一上的两个或更多个一维（1D）编码器头，并且每个能够沿测量发射测量光束方向，安装在可移动物体和另一物体另一个上的一个或多个参考目标，每个参考目标包括具有格栅或光栅的平面，以与两个或更多个一维（1D）编码器头配合，以及处理器基于两个或更多个1D编码器头的输出来计算物体的位置，其中两个或更多个1D编码器头中的每一个的测量方向与相应参考目标的平面不垂直。

43. 发明授权

US08248583B2 Lithographic apparatus and calibration method 有权
标题翻译：平版印刷设备和校准方法
公开(公告)号：US08248583B2
公开(公告)日：2012-08-21
申请号：US12367193
申请日：2009-02-06
申请人： Marinus Aart Van Den Brink , Hans Butler , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Georgo Angelis , Renatus Gerardus Klaver , Martijn Robert Hamers , Boudewijn Theodorus Verhaar , Peter Hoekstra
发明人： Marinus Aart Van Den Brink , Hans Butler , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Georgo Angelis , Renatus Gerardus Klaver , Martijn Robert Hamers , Boudewijn Theodorus Verhaar , Peter Hoekstra
IPC分类号： G03B27/52
CPC分类号： G03F7/70775 , G03F7/70516
摘要： In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.
摘要翻译：在一个实施例中，舞台系统校准方法包括响应于设定点信号相对于编码器网格移动舞台，并通过与编码器网格协作的传感器头测量舞台的位置。舞台的位置由舞台控制器控制。记录表示由传感器头测量的设定点信号和台的位置之间的差异的信号。舞台系统根据代表差异的注册信号进行校准。

44. 发明申请

US20120156807A1 METHOD OF UPDATING CALIBRATION DATA AND A DEVICE MANUFACTURING METHOD 有权
标题翻译：更新校准数据的方法和设备制造方法
公开(公告)号：US20120156807A1
公开(公告)日：2012-06-21
申请号：US13328519
申请日：2011-12-16
申请人： Franciscus VAN DE MAST , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Franciscus VAN DE MAST , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： H01L21/66 , G06F19/00
CPC分类号： G03F7/70775 , G03F7/70516 , H01L21/67259 , H01L21/68
摘要： A method of updating calibration data of a first position detection system adapted to determine the position of an object, is presented. The first position detection system includes a target and a plurality of sensors one of which is mounted on an object and the calibration data including coefficients relating an apparent measured position to an actual position and which can be used to convert an apparent measured position to an actual position thereby to correct for physical imperfections in the first position detection system and enable determination of the actual position from the apparent measured position.
摘要翻译：提出了一种更新适于确定物体的位置的第一位置检测系统的校准数据的方法。第一位置检测系统包括目标和多个传感器，其中一个传感器安装在物体上，并且校准数据包括与表观测量位置相关联的实际位置的系数，并且可用于将表观测量位置转换为实际位置从而校正第一位置检测系统中的物理缺陷，并且能够从表观测量位置确定实际位置。

45. 发明申请

US20120075613A1 Lithographic Apparatus Having an Encoder Type Position Sensor System 有权
标题翻译：具有编码器类型位置传感器系统的平版印刷设备
公开(公告)号：US20120075613A1
公开(公告)日：2012-03-29
申请号：US13308388
申请日：2011-11-30
申请人： Peter Paul STEIJAERT , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul STEIJAERT , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
IPC分类号： G03B27/58
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译：公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

46. 发明授权

US07903866B2 Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object 有权
标题翻译：测量系统，光刻设备和用于测量可移动物体的位置相关信号的方法
公开(公告)号：US07903866B2
公开(公告)日：2011-03-08
申请号：US11730190
申请日：2007-03-29
申请人： Marc Wilhelmus Maria Van Der Wijst , Engelbertus Antonius Fransiscus Van Der Pasch , Koen Jacobus Johannes Maria Zaal
发明人： Marc Wilhelmus Maria Van Der Wijst , Engelbertus Antonius Fransiscus Van Der Pasch , Koen Jacobus Johannes Maria Zaal
IPC分类号： G06K9/00
CPC分类号： G03F7/7085 , G03F7/70425 , G03F7/70775 , G03F7/70783
摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
摘要翻译：编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置，传感器目标物体在基本上固定的框架上。测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

47. 发明申请

US20110026004A1 POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD 有权
标题翻译：定位系统，平面设备和方法
公开(公告)号：US20110026004A1
公开(公告)日：2011-02-03
申请号：US12830963
申请日：2010-07-06
申请人： Jan VAN EIJK , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen
发明人： Jan VAN EIJK , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen
IPC分类号： G03B27/58 , B25J11/00
CPC分类号： G03B27/58 , G03F7/70716 , G03F7/70783
摘要： A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.
摘要翻译：一种定位系统，用于定位具有本体的可移动物体，所述定位系统包括物体位置测量系统，物体致动器和物体控制器，其中所述定位系统还包括加强件，以增加刚度和/或抑制相对运动在物体的身体内，加强筋包括; 一个或多个传感器，其中每个传感器布置成确定表示体内的内部应变或相对位移的测量信号，一个或多个致动器，其中每个致动器布置成在身体的一部分上施加致动力，以及至少一个控制器，被配置为基于所述传感器中的至少一个传感器的测量信号提供到所述致动器中的至少一个致动器的致动信号，以增加所述刚度和/或抑制所述主体内的运动。

48. 发明申请

US20100157263A1 LITHOGRAPHIC APPARATUS, AND PATTERNING DEVICE FOR USE IN A LITHOGRAPHIC PROCESS 有权
标题翻译：光刻设备和用于光刻工艺的图案设备
公开(公告)号：US20100157263A1
公开(公告)日：2010-06-24
申请号：US12627094
申请日：2009-11-30
申请人： Jan Van Eijk , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen
发明人： Jan Van Eijk , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen
IPC分类号： G03B27/42 , G01B11/14
CPC分类号： G03F1/44 , G03B27/42 , G03F7/704 , G03F7/70516 , G03F7/70775 , G03F7/7085
摘要： The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.
摘要翻译：本发明涉及一种光刻设备，其包括配置成调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，所述图案形成装置能够在辐射束的横截面中赋予辐射束以形成图案，图案化的辐射束，被构造成保持衬底的衬底支撑件; 配置成将图案化的辐射束投影到基板的目标部分上的投影系统，以及配置成至少在将图案化的辐射束投射到基板的目标部分上的编码器型测量系统中，连续地确定使用设置在图案形成装置上的格栅或格栅支撑在图案形成装置支撑体上的图案形成装置。

49. 发明授权

US07619207B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07619207B2
公开(公告)日：2009-11-17
申请号：US11594230
申请日：2006-11-08
申请人： Erik Roelof Loopstra , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Onno Bram Loopstra
发明人： Erik Roelof Loopstra , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Onno Bram Loopstra
IPC分类号： G21G5/00 , H03M1/48
CPC分类号： G03F9/7011 , G03F7/70516 , G03F7/70775 , G03F9/7019
摘要： The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.
摘要翻译：本发明涉及一种用于在两个相邻校准位置之间校准编码器测量系统的光栅的方法，所述方法包括沿着传感器对象中的另一个移动包括编码器型传感器和光栅的传感器对象中的一个，光栅的速度，其中选择速度，使得光栅中基本上延伸的距离小于两个校准位置之间的距离的干扰不能或仅部分地由传感器对象和光栅之一进行跟踪，并且测量在两个校准位置之间的多个位置移动传感器对象相对于光栅的位置。

50. 发明授权

US07602489B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07602489B2
公开(公告)日：2009-10-13
申请号：US11358725
申请日：2006-02-22
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen
IPC分类号： G01B11/00
CPC分类号： G03F7/70775 , G03F7/70725
摘要： A lithographic apparatus includes a displacement measuring system to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least three coplanar degrees of freedom (x, y, Rz) of an orthogonal x-y-z coordinate system centered in the center of the moveable object. The moveable object includes a support structure configured to support a patterning device or a substrate table configured to support a substrate. The displacement measuring system includes at least three sensor heads, each sensor head being positioned with a measuring direction substantially coplanar with the x-y plane of the coordinate system and each sensor head being furthermore positioned with the measuring direction substantially perpendicular to a connection line connecting the sensor head with the center of the movable object and extending coplanar with the x-y plane.
摘要翻译：光刻设备包括位移测量系统，用于以至少三个以共焦平面自由度（x，y，Rz）为中心的正交xyz坐标系统来测量可移动物体相对于光刻设备的参考系的位置可移动物体的中心。可移动物体包括支撑结构，其构造成支撑构造成支撑衬底的图案形成装置或衬底台。位移测量系统包括至少三个传感器头，每个传感器头被定位成具有与坐标系的xy平面基本上共面的测量方向，并且每个传感器头进一步定位，测量方向基本上垂直于连接传感器头部与可移动物体的中心并与xy平面延伸共面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式