专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08390820B2 Displacement measurement system having a prism, for displacement measurement between two or more gratings 有权
标题翻译：具有棱镜的位移测量系统，用于在两个或更多个光栅之间进行位移测量
公开(公告)号：US08390820B2
公开(公告)日：2013-03-05
申请号：US12615685
申请日：2009-11-10
申请人： Renatus Gerardus Klaver , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Renatus Gerardus Klaver , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/02
CPC分类号： G01D5/38 , G03F7/70775
摘要： A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
摘要翻译：位移测量系统，被配置为提供六个自由度中的两个部件的相对位移的测量，具有改进的一致性并且不需要过多的空间。

2. 发明申请

US20100053586A1 Displacement Measurement Systems, Lithographic Apparatus, and Device Manufacturing Method 有权
标题翻译：位移测量系统，平版印刷设备和设备制造方法
公开(公告)号：US20100053586A1
公开(公告)日：2010-03-04
申请号：US12615685
申请日：2009-11-10
申请人： Renatus Gerardus KLAVER , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Renatus Gerardus KLAVER , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/14 , G03B27/58
CPC分类号： G01D5/38 , G03F7/70775
摘要： A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
摘要翻译：位移测量系统，被配置为提供六个自由度中的两个部件的相对位移的测量，具有改进的一致性并且不需要过多的空间。

3. 发明授权

US07636165B2 Displacement measurement systems lithographic apparatus and device manufacturing method 有权
标题翻译：位移测量系统光刻设备和器件制造方法
公开(公告)号：US07636165B2
公开(公告)日：2009-12-22
申请号：US11384834
申请日：2006-03-21
申请人： Renatus Gerardus Klaver , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Renatus Gerardus Klaver , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B9/02
CPC分类号： G01D5/38 , G03F7/70775
摘要： A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
摘要翻译：一种位移测量系统，被配置为提供六个自由度中的两个部件的相对位移的测量，具有改进的一致性并且不需要过多的空间。

4. 发明授权

US08248583B2 Lithographic apparatus and calibration method 有权
标题翻译：平版印刷设备和校准方法
公开(公告)号：US08248583B2
公开(公告)日：2012-08-21
申请号：US12367193
申请日：2009-02-06
申请人： Marinus Aart Van Den Brink , Hans Butler , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Georgo Angelis , Renatus Gerardus Klaver , Martijn Robert Hamers , Boudewijn Theodorus Verhaar , Peter Hoekstra
发明人： Marinus Aart Van Den Brink , Hans Butler , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Georgo Angelis , Renatus Gerardus Klaver , Martijn Robert Hamers , Boudewijn Theodorus Verhaar , Peter Hoekstra
IPC分类号： G03B27/52
CPC分类号： G03F7/70775 , G03F7/70516
摘要： In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.
摘要翻译：在一个实施例中，舞台系统校准方法包括响应于设定点信号相对于编码器网格移动舞台，并通过与编码器网格协作的传感器头测量舞台的位置。舞台的位置由舞台控制器控制。记录表示由传感器头测量的设定点信号和台的位置之间的差异的信号。舞台系统根据代表差异的注册信号进行校准。

5. 发明申请

US20090153880A1 OPTICAL SYSTEM FOR DETECTING MOTION OF A BODY 审中-公开
标题翻译：用于检测身体运动的光学系统
公开(公告)号：US20090153880A1
公开(公告)日：2009-06-18
申请号：US11719561
申请日：2005-11-16
申请人： Renatus Gerardus Klaver , Johan Cornelis Compter , Piet Van Der Meer
发明人： Renatus Gerardus Klaver , Johan Cornelis Compter , Piet Van Der Meer
IPC分类号： G01B11/00
CPC分类号： G03F7/70775 , G03F9/7003 , G03F9/7049
摘要： The invention relates to a system (1) for detecting motion of a body (2), said body comprising a first diffraction pattern (3A) and a second diffraction pattern (3B) with a predetermined orientation relative to said first diffraction pattern. The system comprises optical means (4A, 4B) adapted to provide at least a first incident beam to said first diffraction pattern to obtain a first diffracted beam from said first diffraction pattern and at least a second incident beam, with a predetermined orientation relative to said first incident beam, to said second diffraction pattern to obtain a second diffracted beam from said second diffraction pattern. The system has means for detecting motion of said body on the basis of the phase difference between at least one of said first diffracted beam and said second diffracted beam. Accordingly a larger in-plane rotation range is obtained for detecting motion of the body (2). The invention also relates to a wafer (2) provided with two-dimensional diffraction patterns (3A,3B) and a method for detecting motion of a body.
摘要翻译：本发明涉及一种用于检测主体（2）的运动的系统（1），所述主体包括相对于所述第一衍射图案具有预定取向的第一衍射图案（3A）和第二衍射图案（3B）。该系统包括适于将至少第一入射光束提供给所述第一衍射图案以获得来自所述第一衍射图案的第一衍射光束和至少第二入射光束的光学装置（4A，4B），具有相对于所述第一衍射图案的预定取向第一入射光束到所述第二衍射图案，以从所述第二衍射图案获得第二衍射光束。该系统具有用于基于所述第一衍射光束和所述第二衍射光束中的至少一个之间的相位差来检测所述主体的运动的装置。因此，为了检测身体（2）的运动，获得更大的面内旋转范围。本发明还涉及具有二维衍射图案（3A，3B）的晶片（2）和用于检测身体运动的方法。

6. 发明申请

US20090147265A1 DETECTION SYSTEM FOR DETECTING TRANSLATIONS OF A BODY 审中-公开
标题翻译：用于检测身体翻译的检测系统
公开(公告)号：US20090147265A1
公开(公告)日：2009-06-11
申请号：US11719563
申请日：2005-11-17
申请人： Renatus Gerardus Klaver , Johan Cornelis Compter , Piet Van Der Meer
发明人： Renatus Gerardus Klaver , Johan Cornelis Compter , Piet Van Der Meer
IPC分类号： G01B9/02
CPC分类号： G01D5/38
摘要： The invention relates to a system (1) for detecting a translation (T) of a body (2) with a diffraction pattern (3) applied to said body. The system comprises means (4) for providing an incident light beam (I) to said diffraction pattern and to obtain a diffracted light beam (D) from said diffraction pattern; means (4) for measuring a phase difference by interference between said incident light beam and said diffracted beam an means (4) for detecting said translation on the basis of said measured phase difference. The invention further relates to a method for detecting a translation of a body (2); a redirection arrangement 6 and a frequency multiplexing system.
摘要翻译：本发明涉及一种用于利用应用于所述身体的衍射图案（3）检测身体（2）的平移（T）的系统（1）。该系统包括用于向所述衍射图案提供入射光束（I）并从所述衍射图案获得衍射光束（D）的装置（4）用于通过所述入射光束和所述衍射光束之间的干涉测量相位差的装置（4），用于基于所述测量的相位差检测所述平移的装置（4）。本发明还涉及一种用于检测身体（2）的平移的方法。重定向装置6和频率复用系统。

7. 发明申请

US20100007867A1 Lithographic Apparatus and Calibration Method 有权
标题翻译：平版印刷设备和校准方法
公开(公告)号：US20100007867A1
公开(公告)日：2010-01-14
申请号：US12367193
申请日：2009-02-06
申请人： Marinus Aart VAN DEN BRINK , Hans BUTLER , Emiel Jozef Melanie EUSSEN , Engelbertus Antonius Fransiscu VAN DER PASCH , Marc Wilhelmus Maria VAN DER WIJST , Georgo ANGELIS , Renatus Gerardus KLAVER , Martijn Robert HAMERS , Boudewijn Theodorus VERHAAR , Peter HOEKSTRA
发明人： Marinus Aart VAN DEN BRINK , Hans BUTLER , Emiel Jozef Melanie EUSSEN , Engelbertus Antonius Fransiscu VAN DER PASCH , Marc Wilhelmus Maria VAN DER WIJST , Georgo ANGELIS , Renatus Gerardus KLAVER , Martijn Robert HAMERS , Boudewijn Theodorus VERHAAR , Peter HOEKSTRA
IPC分类号： G03B27/58 , G03B27/32
CPC分类号： G03F7/70775 , G03F7/70516
摘要： In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.
摘要翻译：在一个实施例中，舞台系统校准方法包括响应于设定点信号相对于编码器网格移动舞台，并通过与编码器网格协作的传感器头测量舞台的位置。舞台的位置由舞台控制器控制。记录表示由传感器头测量的设定点信号和台的位置之间的差异的信号。舞台系统根据代表差异的注册信号进行校准。

8. 发明申请

US20090237634A1 ENCODER-TYPE MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD TO DETECT AN ERROR ON OR IN A GRID OR GRATING OF AN ENCODER-TYPE MEASUREMENT SYSTEM 有权
标题翻译：编码器类型测量系统，LITHOGRAPHIC装置和检测编码器类型测量系统的网格或纹理错误的方法
公开(公告)号：US20090237634A1
公开(公告)日：2009-09-24
申请号：US12392852
申请日：2009-02-25
申请人： Emiel Jozef Melanie EUSSEN , Engelbertus Antonius Fransiscus VAN DER PASCH , Robbert Edgar VAN LEEUWEN , Renatus Gerardus KLAVER , Martijn Robert HAMERS
发明人： Emiel Jozef Melanie EUSSEN , Engelbertus Antonius Fransiscus VAN DER PASCH , Robbert Edgar VAN LEEUWEN , Renatus Gerardus KLAVER , Martijn Robert HAMERS
IPC分类号： G03B27/54 , G01B11/14 , G06F19/00
CPC分类号： G03B27/54 , G01D5/24461 , G01D5/347 , G03F7/70775
摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.
摘要翻译：编码器型测量系统被配置为测量可移动物体的位置相关信号。测量系统包括光源和传感器。光源和传感器安装在可移动物体之一或基本上固定的框架上。测量系统还包括参考对象，其包括安装在可移动物体或基本上固定的框架上的另一个上的光栅或栅格。光源被配置为朝向参考对象发射光束。传感器被配置为检测由参考对象反射的光源的光。该测量系统还包括能够在连续生产过程中检测传感器目标物体的光栅或格栅上的误差的误差检测器。

9. 发明授权

US06577400B1 Interferometer 失效
标题翻译：干涉仪
公开(公告)号：US06577400B1
公开(公告)日：2003-06-10
申请号：US09719285
申请日：2001-03-05
申请人： Renatus Gerardus Klaver
发明人： Renatus Gerardus Klaver
IPC分类号： G01B902
CPC分类号： G01M11/0271 , G01B9/02002 , G01B9/02004 , G01B9/02007 , G01B11/255 , G01B2290/45 , G01M11/025 , G03F7/70591 , G03F7/706
摘要： Interferometer for measuring a phase difference between a reference beam (37) and an object beam (36′) transformed by an optical element (10), comprising light source means (2), an optical device (3) and detection means (4) in a detection plane (34). The optical device (3) comprises a first light conductor (30) having a first output surface (31) that generates an object beam (36) having a spherical wave front and a second light conductor (32) having a second output surface (33) that generates a reference beam (37) having a spherical wave front, directed onto the detection plane (34), wherein the set-up of the first light conductor (30) and the optical element (10) is such that the transformed object beam (36′) interferes with the reference beam (37) in the detection plane (34).
摘要翻译：一种用于测量由光学元件（10）变换的参考光束（37）和物体光束（36'）之间的相位差的干涉仪，包括光源装置（2），光学装置（3）和检测装置（4）在检测平面（34）中。光学装置（3）包括具有产生具有球面波前的物体光束（36）和具有第二输出表面（33）的第二光导体（32）的第一输出表面（31）的第一光导体（30）），其产生指向所述检测平面（34）的具有球面波前的参考光束（37），其中所述第一光导体（30）和所述光学元件（10）的设置使得所述变换对象光束（36'）在检测平面（34）中干涉参考光束（37）。

10. 发明授权

US08614783B2 Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system 有权
标题翻译：编码器型测量系统，光刻设备和方法，用于检测编码器型测量系统的栅格或光栅上或之上的误差
公开(公告)号：US08614783B2
公开(公告)日：2013-12-24
申请号：US12392852
申请日：2009-02-25
申请人： Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Robbert Edgar Van Leeuwen , Renatus Gerardus Klaver , Martijn Robert Hamers
发明人： Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Robbert Edgar Van Leeuwen , Renatus Gerardus Klaver , Martijn Robert Hamers
IPC分类号： G03B27/52 , G03B27/58
CPC分类号： G03B27/54 , G01D5/24461 , G01D5/347 , G03F7/70775
摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.
摘要翻译：编码器型测量系统被配置为测量可移动物体的位置相关信号。测量系统包括光源和传感器。光源和传感器安装在可移动物体之一或基本上固定的框架上。测量系统还包括参考对象，其包括安装在可移动物体或基本上固定的框架上的另一个上的光栅或栅格。光源被配置为朝向参考对象发射光束。传感器被配置为检测由参考对象反射的光源的光。该测量系统还包括能够在连续生产过程中检测传感器目标物体的光栅或格栅上的误差的误差检测器。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式