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1. 发明申请

US20110208459A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A STAGE OF A LITHOGRAPHIC APPARATUS 有权
标题翻译：用于校正平面设备阶段的位置的平面设备和方法
公开(公告)号：US20110208459A1
公开(公告)日：2011-08-25
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G06F19/00
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译：光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

2. 发明授权

US08781775B2 Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus 有权
标题翻译：用于校正光刻设备的台阶位置的光刻设备和方法
公开(公告)号：US08781775B2
公开(公告)日：2014-07-15
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G01C17/38
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译：光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

3. 发明授权

US07483120B2 Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method 有权
标题翻译：位移测量系统，光刻设备，位移测量方法和设备制造方法
公开(公告)号：US07483120B2
公开(公告)日：2009-01-27
申请号：US11430196
申请日：2006-05-09
申请人： Bernardus Antonius Johannes Luttikhuis , Henrikus Herman Marie Cox , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
发明人： Bernardus Antonius Johannes Luttikhuis , Henrikus Herman Marie Cox , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
IPC分类号： G03B27/42 , G03B27/58 , G01B11/14
CPC分类号： G03B27/53 , G03F7/70733 , G03F7/70775
摘要： A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.
摘要翻译：提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。

4. 发明授权

US07408617B2 Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method 有权
标题翻译：使用装有编码器的大面积FPD卡盘的光刻设备和器件制造方法进行编码器刻度校准方法
公开(公告)号：US07408617B2
公开(公告)日：2008-08-05
申请号：US11165575
申请日：2005-06-24
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70625
摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The substrate table supports a substrate. The projection system projects the modulated radiation beam onto a target portion of the substrate, thereby applying a pattern to the target portion of the substrate. The pattern comprises a first line and a second line. The first line is offset from the second line. The position encoder determines a position of the substrate table. The position encoder comprises a position sensor and a scale. The scale comprises a plurality of lines intended to be straight and parallel to one another. The imaging device obtains an image of the first line and the second line. The image processing unit measures the separation between the first line and the second line in a plurality of locations, and determines the non-uniformity of at least a part of the scale from the plurality of separations.
摘要翻译：光刻设备包括照明系统，独立可控元件的阵列，衬底台，投影系统，位置编码器，成像设备和图像处理单元。照明系统调节辐射束。独立可控元件的阵列调制辐射束的横截面。衬底台支撑衬底。投影系统将调制的辐射束投影到基板的目标部分上，从而将图案施加到基板的目标部分。该图案包括第一行和第二行。第一行偏离第二行。位置编码器确定衬底台的位置。位置编码器包括位置传感器和秤。该刻度尺包括多条相互直线并平行的线。成像装置获得第一行和第二行的图像。图像处理单元测量多个位置中第一线和第二线之间的间隔，并且从多个分离中确定刻度的至少一部分的不均匀性。

5. 发明申请

US20100165319A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。

6. 发明授权

US07256866B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07256866B2
公开(公告)日：2007-08-14
申请号：US10961391
申请日：2004-10-12
申请人： Henrikus Herman Marie Cox , Hans Butler , Ronald Casper Kunst , Harmen Klaas Van Der Schoot , Youssef Karel Maria De Vos
发明人： Henrikus Herman Marie Cox , Hans Butler , Ronald Casper Kunst , Harmen Klaas Van Der Schoot , Youssef Karel Maria De Vos
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70725
摘要： To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.
摘要翻译：为了实现光刻设备的图形支撑件或基板台的高加速度和高移动速度，图案支撑件和基板台之一由用于较大位移的致动器支撑，而省略了用于精确定位的致动器。图案支撑件和衬底台中的另一个由包括用于精确定位的致动器和用于相对较大位移的致动器的致动器组件支撑。图案形成装置和基板的对准精度通过提供一种控制系统来实现，该控制系统适于将图案支撑件和基板台中的另一个定位成使得图案支撑件和基板台之一的定位误差为通过另一个的定位来补偿。

7. 发明授权

US07760324B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07760324B2
公开(公告)日：2010-07-20
申请号：US11378627
申请日：2006-03-20
申请人： Jozef Petrus Henricus Benschop , Hans Butler , Nicolaas Rudolf Kemper , Bartholomeus Hendricus Koek , Frits Van Der Meulen , Harmen Klaas Van Der Schoot
发明人： Jozef Petrus Henricus Benschop , Hans Butler , Nicolaas Rudolf Kemper , Bartholomeus Hendricus Koek , Frits Van Der Meulen , Harmen Klaas Van Der Schoot
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.
摘要翻译：浸没式光刻投影装置包括闸板构件，以在衬底交换期间阻挡液体供应系统，以确保在衬底互换期间液体保持与投影系统的元件接触。挡板构件连接到也支撑投影系统的计量框架。以这种方式，挡板部件的位置总是已知的。

8. 发明授权

US08411252B2 Lithographic apparatus and device manufacturing method utilizing a substrate handler 有权
标题翻译：利用基板处理器的平版印刷设备和器件制造方法
公开(公告)号：US08411252B2
公开(公告)日：2013-04-02
申请号：US12639457
申请日：2009-12-16
申请人： Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
IPC分类号： G03B27/58 , G03B27/52
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.
摘要翻译：提供衬底处理器。衬底处理器包括被配置为承载衬底的支撑表面和被配置为预处理衬底的预调节单元。衬底处理器被配置为相对于衬底台移动衬底。

9. 发明授权

US08174680B2 Substrate handler, lithographic apparatus and device manufacturing method 有权
标题翻译：基板处理器，光刻设备和器件制造方法
公开(公告)号：US08174680B2
公开(公告)日：2012-05-08
申请号：US12512220
申请日：2009-07-30
申请人： Harmen Klaas Van Der Schoot , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
发明人： Harmen Klaas Van Der Schoot , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
IPC分类号： G03B27/58 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/7075
摘要： An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.
摘要翻译：提供了一种装置，方法和系统来调节基板。该装置可以包括基板处理器，二极管阵列和投影系统。衬底处理器可以包括调节装置，浮子装置和置换装置。二极管阵列可以被配置为提供图案化的辐射束，其中投影系统将图案化的辐射束投影到经调理的基底的目标部分上。

10. 发明授权

US07595496B2 Optimized correction of wafer thermal deformations in a lithographic process 失效
标题翻译：光刻过程中晶片热变形的优化校正
公开(公告)号：US07595496B2
公开(公告)日：2009-09-29
申请号：US11812801
申请日：2007-06-21
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
IPC分类号： G21K5/00
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译：本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

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