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    • 45. 发明授权
    • Image formation characteristics adjustment method for projection optical system
    • 投影光学系统的图像形成特征调整方法
    • US07123347B2
    • 2006-10-17
    • US10713269
    • 2003-11-17
    • Kousuke Suzuki
    • Kousuke Suzuki
    • G03B27/54G03B27/72G03B27/42
    • G03F7/70575G03F7/70258G03F7/70591G03F7/706G03F7/70825G03F7/70883
    • The present invention is an adjustment method for a projection optical system which allows measuring the relationship (dependency) of the fluctuation amount of the image formation characteristics of the projection optical system with respect to the change of the installation environment (e.g. barometric pressure) around the projection optical system substantially, without actually changing the installation environment. The illumination light (IL) from the exposure light source (1) illuminates the reticle (9) via the fly eye lenses (2, 4) and the capacitor lens (8) etc., and the pattern image on the reticle (9) is projected onto the wafer (12) via the projection optical system (11) under the illumination light (IL). Based on the fact that changing the wavelength of the illumination light (IL) and changing the barometric pressure (approximately equal to the atmospheric pressure) are substantially equivalent for the projection optical system (11), the fluctuation amount of the image formation characteristics is measured while changing the wavelength of the illumination light (IL) so as to measure the dependency of the image formation characteristics on the atmospheric pressure.
    • 本发明是一种用于投影光学系统的调整方法,其能够测量投影光学系统的图像形成特性的波动量与周围的安装环境(例如大气压)的变化的关系(依赖性) 投影光学系统基本上没有实际改变安装环境。 来自曝光光源(1)的照明光(IL)通过飞眼透镜(2,4)和电容透镜(8)等照亮标线片(9),并且掩模版(9)上的图案图像, 通过投影光学系统(11)在照明光(IL)下投影到晶片(12)上。 基于改变投影光学系统(11)的照明光(IL)的波长和改变大气压力(近似等于大气压力)的事实基本相同,测量图像形成特性的波动量 同时改变照明光(IL)的波长,以便测量图像形成特性对大气压力的依赖性。
    • 50. 发明授权
    • Exposure apparatus, exposure method, and device manufacturing method
    • 曝光装置,曝光方法和装置制造方法
    • US08125613B2
    • 2012-02-28
    • US11785715
    • 2007-04-19
    • Kousuke Suzuki
    • Kousuke Suzuki
    • G03B27/32G03B27/42G03B27/52G03B27/58G03B27/62G01B11/00
    • G03F7/70875G03F7/70225G03F7/70258G03F7/70783
    • An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical axis center of the projection optical system is set to a position different from that of the center of the projection area onto which the pattern is projected. The exposure apparatus further includes a magnification modification device, which modifies the projection magnification of the projection optical system; a calculation device, which calculates a shift length of the center of the projection area associated with modification of the projection magnification; and a correction device, which corrects the position information of the exposure area based on the shift length of the center of the projection area.
    • 曝光装置包括投影光学系统,其以规定的投影倍率将掩模的图案投影到基板上的规定的曝光区域上。 将投影光学系统的光轴中心设定为与投影图案的投影区域的中心不同的位置。 所述曝光装置还具备能够改变所述投影光学系统的投影倍率的倍率变更装置, 计算装置,其计算与投影倍率的修改相关联的投影区域的中心的移动长度; 以及校正装置,其基于投影区域的中心的移动长度校正曝光区域的位置信息。