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41. 发明申请

US20060255805A1 Shielded, asymmetric magnets for use in magnetic resonance imaging 有权
标题翻译：用于磁共振成像的屏蔽非对称磁体
公开(公告)号：US20060255805A1
公开(公告)日：2006-11-16
申请号：US11390913
申请日：2006-03-28
申请人： Stuart Crozier , Feng Liu
发明人： Stuart Crozier , Feng Liu
IPC分类号： G01V3/00
CPC分类号： G01R33/3815 , G01R33/381 , G01R33/421
摘要： Magnetic resonance systems are provided which employ a shielded, asymmetric magnet to produce an offset dsv. The magnets include at least a first coil C1, which carries current in a first direction, and two coils C2 and C3, which are located at least in part within the internal envelope EC1 defined by the first coil and which carry current in an opposite direction to the first coil. The magnets are shielded by a shielding coil C4, which carries current in a direction opposite to that of the first coil, and/or a ferromagnetic structure (FS). The magnets can include additional coils, such as a fifth coil C5 at the magnet's distal end. The magnets can be used in, for example, orthopedic imaging.
摘要翻译：提供了使用屏蔽的不对称磁体产生偏移dsv的磁共振系统。磁体包括至少第一线圈C 1，其沿第一方向承载电流，以及两个线圈C 2和C 3 3，其中至少部分地位于由第一线圈限定的内部包络E C1 C1中，并且沿与第一线圈相反的方向承载电流。这些磁体由与第一线圈相反的方向的电流和/或铁磁结构（FS）的屏蔽线圈C 4屏蔽。磁体可以包括附加的线圈，例如磁体远端处的第五线圈C 5。磁体可用于例如矫形成像。

42. 发明授权

US07129073B2 Regulation of neuronal function through metabotropic glutamate receptor signaling pathways 有权
标题翻译：通过代谢型谷氨酸受体信号通路调节神经元功能
公开(公告)号：US07129073B2
公开(公告)日：2006-10-31
申请号：US10175190
申请日：2002-06-18
申请人： Feng Liu , Angus C. Nairn , Paul Greengard
发明人： Feng Liu , Angus C. Nairn , Paul Greengard
IPC分类号： C12N9/12
CPC分类号： C12Q1/485 , G01N2500/00 , G01N2500/04 , G01N2500/10
摘要： The present invention provides methods and compositions for modulating the activities of metabotropic glutamate receptor intracellular signaling molecules. The present invention provides methods and compositions for modulating the activities of casein kinase I and/or cyclin-dependent kinase 5 in cells or tissues. The present invention provides methods of modulating the function of calcium channels in cells or tissues. The present invention provides methods of treating calcium channel dysfunction. The present invention provides methods of identifying agents that modulate the activities of the metabotropic glutamate receptor intracellular signaling molecules casein kinase I and/or cyclin-dependent kinase 5 for use in such treatments.
摘要翻译：本发明提供调节代谢型谷氨酸受体细胞内信号传导分子活性的方法和组合物。本发明提供用于调节细胞或组织中酪蛋白激酶I和/或细胞周期蛋白依赖性激酶5的活性的方法和组合物。本发明提供调节细胞或组织中钙通道功能的方法。本发明提供治疗钙通道功能障碍的方法。本发明提供了鉴定调节代谢型谷氨酸受体细胞内信号传导分子酪蛋白激酶I和/或细胞周期蛋白依赖性激酶5在这种治疗中的活性的方法。

43. 发明申请

US20060219663A1 Metal CMP process on one or more polishing stations using slurries with oxidizers 审中-公开
标题翻译：使用具有氧化剂的浆料在一个或多个抛光站上进行金属CMP处理
公开(公告)号：US20060219663A1
公开(公告)日：2006-10-05
申请号：US11338146
申请日：2006-01-23
申请人： Shi-Ping Wang , Martin Wohlert , Alain Duboust , Renhe Jia , Feng Liu , Yuan Tian , Liang-Yuh Chen , Stan Tsai , Wei-Yung Hsu
发明人： Shi-Ping Wang , Martin Wohlert , Alain Duboust , Renhe Jia , Feng Liu , Yuan Tian , Liang-Yuh Chen , Stan Tsai , Wei-Yung Hsu
IPC分类号： C03C15/00 , H01L21/302 , B44C1/22 , H01L21/461
CPC分类号： H01L21/3212 , C09G1/02 , C23F3/04 , C23F3/06 , H01L21/32125 , H01L21/7684
摘要： Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. In one aspect, a full sequence electrochemical mechanical planarization technique is provided. In another aspect, a hybrid planarization technique using combination of at least one chemical mechanical polishing process and at least one electrochemical mechanical polishing process is provided. In addition, a multi-step polishing process for polishing a substrate surface using at least two oxidizers in one or more polishing composition is described. The polishing composition may be used in the full sequence or the hybrid planarization technique. The polishing compositions and methods described herein improve the effective removal rate of materials from the substrate surface with a reduction in planarization defects.
摘要翻译：提供了抛光组合物和从衬底表面去除导电材料和阻挡材料的方法。一方面，提供了全序列电化学机械平面化技术。在另一方面，提供了使用至少一种化学机械抛光工艺和至少一种电化学机械抛光工艺的组合的混合平面化技术。此外，描述了在一种或多种研磨组合物中使用至少两种氧化剂来研磨衬底表面的多步抛光方法。抛光组合物可以以全序或混合平面化技术使用。本文所述的抛光组合物和方法改善了材料从衬底表面的有效去除速率，同时减小了平坦化缺陷。

44. 发明授权

US07056672B2 Method of identifying an open reading frame using a nucleic acid molecule encoding multiple start codons and histidine tags 失效
标题翻译：使用编码多个起始密码子和组氨酸标签的核酸分子鉴定开放阅读框的方法
公开(公告)号：US07056672B2
公开(公告)日：2006-06-06
申请号：US10766102
申请日：2004-01-27
申请人： Patrick S. Schnable , Feng Liu , Yan Fu
发明人： Patrick S. Schnable , Feng Liu , Yan Fu
IPC分类号： C12Q1/68 , C12P21/00 , C12P21/02
CPC分类号： C12N15/1086 , C07K2319/21 , C12N15/1065 , C12N15/62
摘要： Compositions and methods for identifying nucleotide fragments that contain an open reading frame are provided. Compositions comprise a nucleotide sequence that encodes, in each of the three possible reading frames, an ATG start codon and a histidine tag, and vectors comprising such a nucleotide sequence. The vectors may be provided with cloning sites for insertion of nucleotide sequences of interest 5′ or 3′ to the 3-frame His-tag DNA sequence. Vectors also are provided with cloning sites for inserting nucleotide sequences of interest 3′ of the ATG start codon and 5′ of the 3-frame His-tag DNA sequence.
摘要翻译：提供了用于鉴定包含开放阅读框架的核苷酸片段的组合物和方法。组合物包含在三个可能的阅读框中的每一个中编码ATG起始密码子和组氨酸标签的核苷酸序列，以及包含这种核苷酸序列的载体。可以向载体提供用于将感兴趣的5'或3'的核苷酸序列插入3框架His标签DNA序列的克隆位点。载体还提供有用于插入ATG起始密码子的3'和3框His标签DNA序列的5'的感兴趣的核苷酸序列的克隆位点。

45. 发明申请

US20060046623A1 Method and apparatus for reduced wear polishing pad conditioning 失效
标题翻译：降低磨损抛光垫调理的方法和装置
公开(公告)号：US20060046623A1
公开(公告)日：2006-03-02
申请号：US11209167
申请日：2005-08-22
申请人： Yan Wang , Stan Tsai , Yongqi Hu , Feng Liu , Liang-Yuh Chen , Daxin Mao , Huyen Tran , Martin Wohlert , Renhe Jia , Yuan Tian
发明人： Yan Wang , Stan Tsai , Yongqi Hu , Feng Liu , Liang-Yuh Chen , Daxin Mao , Huyen Tran , Martin Wohlert , Renhe Jia , Yuan Tian
IPC分类号： B24B1/00
CPC分类号： B24B53/017 , B23H5/08
摘要： Embodiments of a conditioning head for in-situ conditioning and/or cleaning a processing pad of a CMP, ECMP, or other processing system are provided. In one embodiment, the conditioning head includes a brush disposed in a central cavity. A cleaning fluid is provided through the central cavity of the conditioning head to a processing pad. The brush spins and moves laterally across the surface of the processing pad. The cleaning solution dispensed through the conditioning head dissolves by-products of the processing operation while the brush gently wipes the processing pad. A lip of the conditioning head retains the cleaning fluid and cleaning waste, thereby minimizing contamination of the area outside of the conditioning head. The cleaning waste is removed from the processing pad via passages formed near the outer periphery of the conditioning head.
摘要翻译：提供了用于原位调理和/或清洁CMP，ECMP或其它处理系统的处理垫的调节头的实施例。在一个实施例中，调节头包括设置在中心腔中的刷子。清洁流体通过调节头的中心空腔设置到处理垫。刷子旋转并横向移动到处理垫的表面上。通过调节头分配的清洁溶液溶解处理操作的副产物，同时刷子轻轻地擦拭处理垫。调节头的唇缘保持清洁流体和清洁废物，从而最小化调节头外部区域的污染。清洁废物通过在调节头的外周附近形成的通道从处理垫移除。

46. 发明申请

US20050233578A1 Method and composition for polishing a substrate 失效
标题翻译：抛光基材的方法和组合物
公开(公告)号：US20050233578A1
公开(公告)日：2005-10-20
申请号：US11130032
申请日：2005-05-16
申请人： Renhe Jia , Feng Liu , Stan Tsai , Liang-Yuh Chen
发明人： Renhe Jia , Feng Liu , Stan Tsai , Liang-Yuh Chen
IPC分类号： B23H5/08 , C09G1/02 , C09K13/00 , C11D3/14 , C11D3/39 , C11D11/00 , C25F3/02 , C25F3/08 , H01L21/321 , H01L21/44 , H01L21/4763 , H01L21/768
CPC分类号： B23H5/08 , C09G1/02 , C11D3/1213 , C11D3/124 , C11D3/14 , C11D3/3765 , C11D3/3947 , C11D11/0041 , C25F3/02 , C25F3/08 , H01L21/3212 , H01L21/32125 , H01L21/7684
摘要： Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. Polishing compositions are provided for removing at least a barrier material from a substrate surface by a chemical mechanical polishing process or by an electrochemical mechanical polishing process. The polishing compositions used in barrier removal may further be used after a process for electrochemical mechanical planarization process of a conductive material. The polishing compositions and methods described herein improve the effective removal rate of materials from the substrate surface with a reduction in planarization type defects.
摘要翻译：提供了抛光组合物和从衬底表面去除导电材料和阻挡材料的方法。提供抛光组合物用于通过化学机械抛光工艺或通过电化学机械抛光工艺从衬底表面去除至少一种阻挡材料。用于屏障去除的抛光组合物可以在导电材料的电化学机械平面化工艺的过程之后进一步使用。本文所述的抛光组合物和方法改善了材料从衬底表面的有效去除速率，同时降低了平面化型缺陷。

47. 发明申请

US20050198320A1 Resilient application layer overlay framework for converged communication over internet protocol networks 有权
标题翻译：用于通过互联网协议网络进行融合通信的弹性应用层覆盖框架
公开(公告)号：US20050198320A1
公开(公告)日：2005-09-08
申请号：US10953033
申请日：2004-09-29
申请人： Wu Chou , Feng Liu
发明人： Wu Chou , Feng Liu
IPC分类号： G06F15/16
CPC分类号： H04L65/1006 , H04L67/02 , H04L69/30
摘要： Methods and apparatus for providing converged communication services in a communication system are disclosed. A first endpoint of the system communicates with at least a second endpoint of the system via session initiation protocol (SIP). At least a portion of the SIP communication is controlled utilizing an application layer overlay framework which permits substantially simultaneous operation of the first endpoint in two application layer protocols, the two application layer protocols including SIP and web services protocol. The web services protocol may illustratively comprise an application layer web services transport protocol such as SOAP/HTTP. The application overlay framework comprises a web services interface, with the web services interface being configured to permit access to information associated with the SIP communication by one or more communication service applications of the system.
摘要翻译：公开了在通信系统中提供融合通信业务的方法和装置。系统的第一端点经由会话发起协议（SIP）与系统的至少第二端点通信。使用应用层覆盖框架控制SIP通信的至少一部分，其允许在两个应用层协议中实现第一端点的基本上同时的操作，所述两个应用层协议包括SIP和web服务协议。 web服务协议可以说明性地包括诸如SOAP / HTTP的应用层web服务传输协议。应用覆盖框架包括Web服务接口，其中web服务接口被配置为允许通过系统的一个或多个通信服务应用访问与SIP通信相关联的信息。

48. 发明申请

US20050045799A1 Optical retarders and related devices and systems 有权
标题翻译：光阻器及相关设备及系统
公开(公告)号：US20050045799A1
公开(公告)日：2005-03-03
申请号：US10918299
申请日：2004-08-13
申请人： Xuegong Deng , Jian Wang , Feng Liu
发明人： Xuegong Deng , Jian Wang , Feng Liu
IPC分类号： G02B5/30 , G01J1/00
CPC分类号： G02B5/3083
摘要： Optical retarders and related devices and systems are disclosed.
摘要翻译：公开了光学延迟器及相关装置和系统。

49. 发明授权

US06736992B2 Chemical mechanical planarization of low dielectric constant materials 失效
标题翻译：低介电常数材料的化学机械平面化
公开(公告)号：US06736992B2
公开(公告)日：2004-05-18
申请号：US10145649
申请日：2002-05-14
申请人： Fan Zhang , Feng Liu , Dan Towery
发明人： Fan Zhang , Feng Liu , Dan Towery
IPC分类号： C09K1300
CPC分类号： C09K3/1472 , C09G1/02 , C09K3/1436 , C09K3/1463 , H01L21/31053 , H01L21/31058
摘要： The present invention relates to apparatus, procedures and compositions for avoiding and reducing damage to low dielectric constant materials and other soft materials, such as Cu and Al, used in fabricating semiconductor devices. Damage reduction can be achieved by decreasing the role of mechanical abrasion in the CMP of these materials and increasing the role of chemical polishing, which can also improve material removal rates. Increasing the role of chemical polishing can be accomplished by creating a polishing slurry, which contains components that interact chemically with the surface to be polished. This slurry may or may not also contain soft abrasive particles, which replace the hard abrasive particles of conventional slurries. Use of soft abrasive particles can reduce the role of mechanical abrasion in the CMP process. Use of this slurry in CMP can reduce surface scratches and device damage.
摘要翻译：本发明涉及用于避免和减少用于制造半导体器件的低介电常数材料和其它软材料（例如Cu和Al）的损伤的装置，程序和组合物。通过减少这些材料的CMP中的机械磨损的作用并增加化学抛光的作用可以减少损伤，这也可以提高材料去除率。增加化学抛光的作用可以通过产生抛光浆料来实现，抛光浆料含有与待抛光表面化学反应的组分。该浆料可以含有也可以不含有软磨粒，其代替常规浆料的硬磨粒。使用软磨粒可以减少CMP工艺中机械磨损的作用。在CMP中使用这种浆料可以减少表面划痕和器件损坏。

50. 发明授权

US06465694B1 Method for preparation of polyethylene glycol aldehyde derivatives 有权
标题翻译：聚乙二醇醛衍生物的制备方法
公开(公告)号：US06465694B1
公开(公告)日：2002-10-15
申请号：US09830470
申请日：2001-06-04
申请人： Miroslav Baudys , Feng Liu , Sung Wan Kim
发明人： Miroslav Baudys , Feng Liu , Sung Wan Kim
IPC分类号： C07C4310
CPC分类号： C07K1/1077 , C07C45/38 , C07C47/198 , C07C213/02 , C07C227/18 , C07C229/26 , C07C241/02 , C07C319/12 , C08G65/324 , C07C323/25 , C07C217/28 , C07C217/42 , C07C243/14
摘要： Aldehyde derivatives of polyethylene glycols and methods of making thereof are disclosed. These aldehyde derivatives can be used to make polyethylene glycol-hydrazines, polyethylene glycol-thiols, polyethylene glycol amines, and branched polyethylene glycols. PEG aldehyde derivatives or other functional PEG derivatives prepared from PEG aldehydes are useful for protein conjugation and surface modification.
摘要翻译：公开了聚乙二醇的醛衍生物及其制备方法。这些醛衍生物可用于制备聚乙二醇 - 肼，聚乙二醇 - 硫醇，聚乙二醇胺和支链聚乙二醇。由PEG醛制备的PEG醛衍生物或其它功能性PEG衍生物可用于蛋白质缀合和表面改性。

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