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41. 发明授权

US07788796B2 Method FPR manufacturing a magnetic write head 有权
标题翻译：磁写头制造方法
公开(公告)号：US07788796B2
公开(公告)日：2010-09-07
申请号：US11611824
申请日：2006-12-15
申请人： Wen-Chien David Hsiao , Ming Jiang , Vladimir Nikitin , Aron Pentek , Yi Zheng
发明人： Wen-Chien David Hsiao , Ming Jiang , Vladimir Nikitin , Aron Pentek , Yi Zheng
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3169 , G11B5/1278 , G11B5/3163 , G11B5/3166 , G11B5/3173 , G11B5/6005 , Y10T29/49021 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for constructing a magnetic write head using an electrical lapping guide to carefully control critical dimensions during a lapping operation used to define an air bearing surface. The lapping guide is photolithograhically patterned in a common photolithographic step with another write head structure so that special relation between the lapping guide and critical dimensions of the write head structure can be carefully maintained. The electrical lapping guide can be patterned in a common photolithographic step as the write pole so that the location of the flare point can be carefully controlled with respect to the location of the lapping guide. A stitched flare structure can also be built together with the electrical lapping guide, then a self-aligned shield can be further built over this stitched flare structure so that both flare point and shield throat can be controlled tightly together by this electrical lapping guide during lapping process.
摘要翻译：一种用于在用于限定空气轴承表面的研磨操作期间使用电研磨引导件来构造磁性写入头以小心地控制临界尺寸的方法。研磨导轨在具有另一写头结构的普通光刻步骤中以光刻方式进行图案化，从而可以仔细地保持研磨引导件与写头结构的临界尺寸之间的特殊关系。电研磨引导件可以以普通光刻步骤图案化为写极，使得可以相对于研磨导轨的位置仔细地控制扩张点的位置。缝合的火炬结构也可以与电气研磨导轨一起构建，然后可以在该缝合的火炬结构上进一步构建自对准屏蔽，使得在研磨过程中，电气研磨引导件可以将喇叭口和屏蔽喉部两者紧密地一起控制处理。

42. 发明申请

US20100157474A1 METHOD OF MULTI-ANGLED BUMP PROCESSING FOR MAGNETIC POLE FABRICATION AND SYSTEMS THEREOF 有权
标题翻译：用于磁极制造及其系统的多重保护加工方法
公开(公告)号：US20100157474A1
公开(公告)日：2010-06-24
申请号：US12341834
申请日：2008-12-22
申请人： Wen-Chien David Hsiao , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Wen-Chien David Hsiao , Vladimir Nikitin , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/3163
摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.
摘要翻译：根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面所述凸起层的沉积，其中所述第二角度大于所述第一角度。

43. 发明申请

US20100157472A1 MAGNETIC WRITE HEAD HAVING A SELF-ALIGNED SIDE WRAP-AROUND SHIELD WITH MULTI-ANGLE SLANTED BUMP 有权
标题翻译：具有多角度凸起的自对准侧面封装的磁头写头
公开(公告)号：US20100157472A1
公开(公告)日：2010-06-24
申请号：US12343709
申请日：2008-12-24
申请人： Wen-Chien David Hsiao , Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Wen-Chien David Hsiao , Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： G11B5/10 , B44C1/22
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3116 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A method for forming a magnetic write head having a trailing shield with a tapered and stepped, self aligned trailing magnetic shield. The shield has a tapered portion that tapers away from the write pole as it extends away from the ABS. This tapered portion helps to channel flux to the pole tip portion of the shield, while preventing the loss of write field to the shield. The stepped portion of the shield further helps to prevent the loss of write field and also defines a secondary throat height of the shield that can be accurately located relative to the air bearing surface.
摘要翻译：一种用于形成具有带有锥形和阶梯式自对准拖尾磁屏蔽的后挡板的磁写头的方法。屏蔽件具有锥形部分，当锥形部分远离ABS延伸时，该锥形部分从写入柱逐渐变细。该锥形部分有助于将通量传导到屏蔽的极端部分，同时防止对屏蔽件的写入场的损失。护罩的台阶部分还有助于防止写入场的损失，并且还限定可相对于空气轴承表面精确定位的护罩的次级喉部高度。

44. 发明申请

US20090139958A1 FENCELESS MAIN POLE DEFINITION FOR ADVANCED PERPENDICULAR MAGNETIC WRITE HEAD 有权
标题翻译：高级磁性写字头的无缝主要定义
公开(公告)号：US20090139958A1
公开(公告)日：2009-06-04
申请号：US11947616
申请日：2007-11-29
申请人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
发明人： Aron Pentek , Sue Siyang Zhang , Yi Zheng
IPC分类号： B44C1/22
CPC分类号： G03B31/00
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole using a mask that includes a hard mask layer deposited over the write pole laminate material, and a thick, physically robust image transfer layer. The image transfer layer can be a material such as AlTiO that can be patterned by a reactive ion etching process, but which also resists deformation during processing. This process allows a write pole and wrap-around trailing shield to be constructed at very narrow track widths without the mask deformation and fencing problems experienced by prior art methods.
摘要翻译：一种用于制造用于垂直磁记录的磁写头的方法。该方法包括使用掩模形成写入极，该掩模包括沉积在写磁极层压材料上的硬掩模层，以及厚的，物理上坚固的图像转印层。图像转印层可以是诸如AlTiO的材料，其可以通过反应离子蚀刻工艺进行图案化，但也可以在加工过程中抵抗变形。该过程允许在非常窄的轨道宽度上构造写极点和缠绕后挡板，而不会由现有技术方法遇到的掩模变形和围栏问题。

45. 发明授权

US07464458B2 Method for manufacturing a self-aligned, notched trailing shield for perpendicular recording 失效
标题翻译：用于制造用于垂直记录的自对准，带切口的后挡板的方法
公开(公告)号：US07464458B2
公开(公告)日：2008-12-16
申请号：US11830552
申请日：2007-07-30
申请人： Quang Le , Aron Pentek
发明人： Quang Le , Aron Pentek
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/112 , G11B5/1278 , H01F41/32 , Y10T29/49039 , Y10T29/49041 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular magnetic write head having a notched, self aligned trailing shield for canting a magnetic field emitted therefrom.
摘要翻译：一种垂直磁性写入头，其具有用于使从其发射的磁场的切口，自对准后挡板。

46. 发明申请

US20080113514A1 Methods for the manufacture of notched trailing shields 失效
标题翻译：开槽后挡板的制造方法
公开(公告)号：US20080113514A1
公开(公告)日：2008-05-15
申请号：US11595654
申请日：2006-11-10
申请人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
发明人： Amanda Baer , Hung-chin Guthrie , Yimin Hsu , Ming Jiang , Aron Pentek
IPC分类号： H01L21/311
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3163 , Y10T29/49032 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterened prior to CMP. Patterned stop layers produce the highest yields.
摘要翻译：公开了在制造缺口尾部屏蔽结构期间在晶片和晶片之间改善晶片产量的方法。在平坦化和切口形成之前沉积Ta / Rh CMP停止层以确保用于尾部屏蔽结构的平坦表面。这些停止层可以在CMP之前被铺平或沉积。图案化的停止层产生最高的产量。

47. 发明授权

US07363698B2 Process for creating a write head by forming a bump after the top pole is formed 失效
标题翻译：用于通过在形成顶极之后形成凸起来产生写入头的过程
公开(公告)号：US07363698B2
公开(公告)日：2008-04-29
申请号：US10956221
申请日：2004-09-30
申请人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
发明人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49034 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.
摘要翻译：提供了通过在形成顶极之后形成凸块来创建写入头的方法。在一个实施例中，从第一层产生底极。将非磁隙材料施加到晶片的表面。第二层创建顶杆。创建顶极后，会创建一个凸起。凸块用于在蚀刻时保护第一层的至少一部分以产生杂散通量吸收体。

48. 发明申请

US20070258167A1 Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
标题翻译：具有磁写入磁极的垂直磁性写头具有凹形后缘
公开(公告)号：US20070258167A1
公开(公告)日：2007-11-08
申请号：US11411556
申请日：2006-04-25
申请人： Donald Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Wen-Chien Hsiao , Yimin Hsu , Ming Jiang , Yinshi Liu , Aron Neuhaus , Vladimir Nikitin , Aron Pentek , Katalin Pentek , Yi Zheng
发明人： Donald Allen , Amanda Baer , Michael Feldbaum , Hung-Chin Guthrie , Wen-Chien Hsiao , Yimin Hsu , Ming Jiang , Yinshi Liu , Aron Neuhaus , Vladimir Nikitin , Aron Pentek , Katalin Pentek , Yi Zheng
IPC分类号： G11B5/147
CPC分类号： G11B5/3116 , G11B5/11 , G11B5/1278 , G11B5/1871 , G11B5/3146 , G11B5/315 , G11B5/3163
摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.
摘要翻译：用于垂直磁记录的磁写头，具有带有凹后缘的写极。磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。凹形后边缘提高磁性能，例如通过改善转变曲率。构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。

49. 发明授权

US07243411B2 Method for protecting write head coil during write pole/shaping 失效
标题翻译：写磁头/整形期间保护写头线圈的方法
公开(公告)号：US07243411B2
公开(公告)日：2007-07-17
申请号：US11037405
申请日：2005-01-18
申请人： David P. Druist , Aron Pentek
发明人： David P. Druist , Aron Pentek
IPC分类号： G11B5/127 , G11B5/147 , C23C13/00
CPC分类号： G11B5/3163 , B82Y10/00 , G11B5/17 , G11B5/3116 , Y10T29/49032 , Y10T29/49041 , Y10T29/4906 , Y10T29/49062 , Y10T29/49064
摘要： A method for protecting a write head coil during write pole notching using ion mill resistant mask formed by reactive ion etching is disclosed. Ion mill shaping of the write pole is performed after depositing an ion mill-resistant material to protect the coil.
摘要翻译：公开了一种使用由反应离子蚀刻形成的离子磨损掩模在写入磁极刻槽期间保护写入磁头线圈的方法。在沉积抗离子磨损材料以保护线圈之后执行写入极的离子磨机成形。

50. 发明申请

US20070017087A1 Method for making magnetic write head 失效
标题翻译：磁头写入方法
公开(公告)号：US20070017087A1
公开(公告)日：2007-01-25
申请号：US11186174
申请日：2005-07-21
申请人： Daniel Bedell , Aron Pentek , Katalin Pentek , Yi Zheng
发明人： Daniel Bedell , Aron Pentek , Katalin Pentek , Yi Zheng
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , Y10T29/49032 , Y10T29/49041 , Y10T29/49043 , Y10T29/49046 , Y10T29/49052
摘要： After defining the P2 pole of a magnetic read head, alumina is deposited over it and planarized by CMP, with the portion of the alumina overlaying the ABS region of the P2 pole subsequently being masked by a photoresist layer and with the portions of the alumina overlaying the flare area, back gap region, and center tap regions of the P2 pole not being masked. A reactive ion mill is performed to expose the flare area, back gap region, and center tap regions of the P2 pole by removing the alumina over these portions, so that subsequent steps such as forming a layer of coiled conductors, forming a return pole, and forming stud connections along with removing the respective seed layers can be executed with the ABS region protected by the alumina and with the flare area, back gap region, and center tap region exposed.
摘要翻译：在定义磁读头的P2极之后，将氧化铝沉积在其上并通过CMP平坦化，其中覆盖P2极的ABS区域的氧化铝的部分随后被光致抗蚀剂层掩蔽，并且氧化铝的部分覆盖 P2极的光斑区域，背隙区域和中心抽头区域不被掩蔽。通过在这些部分上除去氧化铝，进行反应离子磨，以暴露P2极的火炬区域，后隙区域和中心抽头区域，从而形成后续步骤，例如形成线圈导体层，形成返回极，并且可以利用由氧化铝保护的ABS区域和暴露的火炬区域，后隙区域和中心抽头区域来执行形成螺柱连接以及移除相应的种子层。

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