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41. 发明专利

JP2013209928A Vacuum evacuation device 有权
标题翻译：真空灭火装置
公开(公告)号：JP2013209928A
公开(公告)日：2013-10-10
申请号：JP2012080559
申请日：2012-03-30
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KAWASAKI HIROYUKI , SOFUGAWA TAKUJI , OYAMA ATSUSHI
IPC分类号： F04D19/04 , F04B37/16
CPC分类号： F04B25/00 , F04C23/00 , F04D19/042 , F04D19/046 , F04D25/16
摘要： PROBLEM TO BE SOLVED: To provide a vacuum evacuation device to compress gas from an ultra-high degree of vacuum to the atmospheric pressure, capable of establishing simplification of an exhaust line, less operating power, and a high efficiency, and also capable of being installed in the neighborhood of a vacuum vessel or directly on it in any direction.SOLUTION: A vacuum evacuation device to make evacuation from the atmospheric pressure down to a high degree of vacuum or less includes a first vacuum pump 1 capable of evacuating to the high degree of vacuum or less, and a second vacuum pump 2 capable of evacuating from the atmospheric pressure down to a medium or low degree of vacuum, wherein the first and second pumps 1 and 2 are coupled together into an integrated structure.
摘要翻译：要解决的问题：提供一种真空排气装置，用于将气体从超高真空度压缩至大气压，能够简化排气管路，减少操作功率和高效率，并且还能够安装在真空容器附近或直接在任何方向上。解决方案：从大气压降至高真空度以下的真空排气装置包括能够排出高压的第一真空泵1 以及能够从大气压降至中等或低真空度的第二真空泵2，其中第一和第二泵1和2联接在一起成为一体的结构。

42. 发明专利

JP2012119694A Inspection apparatus with charged particle beam and device manufacturing method using the same 有权
标题翻译：具有充电颗粒束的检查装置和使用其的装置制造方法
公开(公告)号：JP2012119694A
公开(公告)日：2012-06-21
申请号：JP2011283102
申请日：2011-12-26
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOMICHI SHINJI , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： H01L21/66 , H01J37/22 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide a technology enabling an SEM device to accelerate inspection speed.SOLUTION: Device manufacturing method using the inspection apparatus with charged particle beam comprises the steps of: moving a stage so that a lower left corner of a first search die in a lower part of a wafer is positioned nearly at a center of a camera, and obtaining a pattern matching template image; when a second search die is in a right adjacent side of the first search die, and a third search die is in an upper adjacent side of the second search die, moving the stage and conducting automatic pattern matching using the template image so that exact coordinate values of patterns for the second search die and the third search die are obtained; calculating moving amount of motion to an upper adjacent die with reference to a relationship between the second search die pattern matching coordinate and the third search die pattern matching coordinate and moving the stage to a coordinate where a pattern of an upper adjacent die to the first search die is expected to exist; and conducting the pattern matching using the template image so that an exact coordinate value of a searching pattern is repeatedly updated and obtained. Consequently, accuracy is improved.
摘要翻译：要解决的问题：提供使SEM装置能够加快检测速度的技术。＆lt; P＆gt;解决方案：使用带有带电粒子束的检查装置的装置制造方法包括以下步骤：移动台，使得晶片下部的第一搜索管芯的左下角几乎位于晶片的中心相机，并获得模式匹配模板图像; 当第二搜索模具位于第一搜索模具的右侧，并且第三搜索模具位于第二搜索模具的上部相邻侧时，移动平台并使用模板图像进行自动模式匹配，使得精确坐标获得第二搜索模具和第三搜索模具的图案的值; 参考第二搜索模具匹配坐标和第三搜索模具匹配坐标之间的关系，将移动的运动量计算到上部相邻模具，并将平台移动到上部相邻模具的图案到第一次搜索的坐标死亡预计会存在; 并使用模板图像进行图案匹配，使得重复地更新并获得搜索图案的精确坐标值。因此，精度提高。版权所有（C）2012，JPO＆INPIT

43. 发明专利

JP2012064567A Electron beam inspection device having foreign substance attachment prevention function, and method 有权
标题翻译：具有外部物质附着防护功能的电子束检查装置及方法
公开(公告)号：JP2012064567A
公开(公告)日：2012-03-29
申请号：JP2011169040
申请日：2011-08-02
申请人： Ebara Corp , 株式会社荏原製作所
发明人： WATANABE KENJI , HATAKEYAMA MASAKI , NAITO YOSHIHIKO , KOHAMA TATSUYA , TERAO KENJI , MURAKAMI TAKESHI , HAYASHI TAKEHIDE , TSUKAMOTO KIWAMU , SOFUGAWA TAKUJI , KIMURA NORIO
IPC分类号： H01J37/20 , H01J37/28 , H01J37/29 , H01L21/66
CPC分类号： H01J37/22 , H01J37/265 , H01J37/29 , H01J2237/004 , H01J2237/022 , H01J2237/24495 , H01J2237/24564 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide an electron beam inspection device capable of preventing the attachment of a foreign substance on a sample surface.SOLUTION: A stage 100 with a sample 200 disposed is installed inside a vacuum chamber 112 capable of vacuum evacuation, and a dust collection electrode 122 is disposed in a position surrounding the periphery of the sample 200. To the dust collection electrode 122, a voltage having an identical polarity to a voltage applied to the sample 200 with an equal absolute value or higher is applied. By this, the foreign substance such as a particle is attached to the dust collection electrode 122 and therefore the attachment of the foreign substance to the sample surface can be reduced. In place of using the dust collection electrode, a recess may be formed on a wall face of the vacuum chamber surrounding the stage or a metallic flat plate of mesh structure, to which a prescribed voltage is to be applied, may be laid on the wall face. Also, by the disposition of a gap control plate 124, having a through hole 124a at the center, upward of the sample 200 and the dust collection electrode 122, the foreign substance attachment can be further reduced.
摘要翻译：要解决的问题：提供能够防止异物附着在样品表面上的电子束检查装置。解决方案：将具有样品200的台架100安装在能够真空抽真空的真空室112的内部，并且集尘电极122设置在围绕样品200周围的位置。向集尘电极122 施加与施加到具有相等绝对值或更高的绝对值的样品200的电压具有相同极性的电压。由此，将颗粒等异物附着在集尘电极122上，能够减少异物与样品表面的附着。代替使用集尘电极，可以在围绕台架的真空室的壁面上形成凹槽，或者可以在其上施加规定电压的网状结构的金属平板面对。此外，通过设置具有中心的通孔124a的间隙控制板124和样品200的上方以及集尘电极122，可以进一步减少异物附着。版权所有（C）2012，JPO＆INPIT

44. 发明专利

JP2007147648A Defect inspection method and substrate inspection device 审中-公开
标题翻译：缺陷检查方法和基板检查装置
公开(公告)号：JP2007147648A
公开(公告)日：2007-06-14
申请号：JP2007031703
申请日：2007-02-13
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KANEUMA TOSHIFUMI , SATAKE TORU , KARIMATA TSUTOMU , WATANABE KENJI , NOMICHI SHINJI , MURAKAMI TAKESHI , HATAKEYAMA MASAKI , NAKASUJI MAMORU , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , H01J37/18 , H01J37/20 , H01L21/66 , H01L21/677
摘要： PROBLEM TO BE SOLVED: To provide a substrate inspection device capable of inspecting defects of a sample with good throughput and high accuracy. SOLUTION: The substrate inspection device 1 comprises a working chamber 30 in vacuum state, an electron-optical device 70 equipped with an LaB 6 electron source, a loader housing 40, which carries out/in a wafer to/from the working chamber, and a mini-environment device 20, which is connected to the working chamber and in which atmosphere is controlled. A loader housing 40 comprises a first loading chamber connected to the mini-environment device 20, a second loading chamber connected to the working chamber, a first shutter device 27 that selectively prevents communication between the first and second loading chambers, and a second shutter device 45 that selectively prevents communication between the second loading chamber and the working chamber. A vacuum exhaust pipe and a vent pipe for inert gas are connected to the first and second loading chambers, respectively. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够以良好的生产量和高精度检查样品的缺陷的基板检查装置。解决方案：基板检查装置1包括处于真空状态的工作室30，装有LaB <6>电子源的电子 - 光学装置70，装载机壳体40，其执行/进入与工作室相连的晶片，以及连接到工作室并且控制大气的微型环境设备20。装载机壳体40包括连接到迷你环境装置20的第一装载室，连接到工作室的第二装载室，选择性地防止第一和第二装载室之间的连通的第一挡板装置27和第二挡板装置 45，其选择性地防止第二装载室和工作室之间的连通。真空排气管和惰性气体排放管分别连接到第一和第二装载室。版权所有（C）2007，JPO＆INPIT

45. 发明专利

JP2007141488A Electron beam device and pattern evaluation method 审中-公开
标题翻译：电子束装置和图案评估方法
公开(公告)号：JP2007141488A
公开(公告)日：2007-06-07
申请号：JP2005329825
申请日：2005-11-15
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , MURAKAMI TAKESHI , MORI SATOSHI
IPC分类号： H01J37/29 , H01J37/153 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To reduce influence of space charge and generation of deflection aberration by reducing optical path length of an electron optical system.
SOLUTION: An electron beam emitted from an electron gun 1 forms a reduced image on a sample 18 through a multi-opening 2, a reducing glass 3, a non-dispersing Wien filter 5, a tablet lens 10, an electromagnetic deflector 11, a beam separator 12 and a tablet lens 17 constituting an objective lens. Since the beam separator 12 is constituted so that the passage distance of a secondary electron beam within the beam separator 12 becomes about 3 times the passage distance of a first electron beam within the beam separator 12, the secondary electron beam can be deflected about 30 degrees or more even if a magnetic field in the beam separator 12 is set to deflect the first electron beam only by a small angle of about 10 degrees or less, thus, the first and secondary electron beams are sufficiently separated. Since the first electron beam is deflected only by a small angle, aberration caused in the first electron beam is small.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过减小电子光学系统的光程长度来减少空间电荷的影响和偏转像差的产生。解决方案：从电子枪1发射的电子束通过多开口2，还原玻璃3，非分散维恩滤波器5，平板透镜10，电磁偏转器 11，构成物镜的光束分离器12和平板镜头17。由于束分离器12被构造成使得束分离器12内的二次电子束的通过距离成为分束器12内的第一电子束的通过距离的约3倍，所以二次电子束可以偏转约30度或者更大，即使设在光束分离器12中的磁场使第一电子束偏转约10度以下的小角度的情况下，第一和第二电子束被充分分离。由于第一电子束仅以小角度偏转，所以在第一电子束中产生的像差小。版权所有（C）2007，JPO＆INPIT

46. 发明专利

JP2006260957A Electron beam device 审中-公开
标题翻译：电子束装置
公开(公告)号：JP2006260957A
公开(公告)日：2006-09-28
申请号：JP2005077136
申请日：2005-03-17
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , SOFUGAWA TAKUJI
IPC分类号： H01J37/29 , G01T1/20 , H01J37/147 , H01J37/22 , H01J37/244 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device capable of obtaining high-speed image even if an area sensor with small frame number/sec is used.
SOLUTION: The electron beam device obtains information of an estimation area by dividing the estimation area into a plurality of sub-visual fields, successively irradiating primary electron beam on the sub-visual fields, and by detecting secondary electron including the information of a sample face by a detection means at every sub-visual fields. The detection means 26 is constituted of area sensors CCD1 to CCD14, a bundle of optical fibers 25 of which each one end part is connected to a detection face of the area sensor, and a plurality of unit detectors 24-1 having an FOP painted on the other end part of the optical fibers, having a scintillator, on which an image of the secondary electron beam of the sub-visual field, formed thereon. The secondary electron beam emitted from the sub-visual field is deflected and made to move on the FOP face of the unit detector by an electromagnetic deflector in every movement of the sub-visual field on which electron beam is irradiated. Since the image information can be taken out from respective unit detector while the other unit detectors are under exposure, high-speed image can be obtained.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：即使使用小帧数/秒的区域传感器，也能够提供能够获得高速图像的电子束装置。解决方案：电子束装置通过将估计区域划分为多个子视野，在子视野上连续照射一次电子束，并通过检测包含信息的二次电子来获得估计区域的信息在每个子视野下通过检测装置的样品面。检测单元26由区域传感器CCD1〜CCD14构成，光纤25的一端与区域传感器的检测面连接，多个单元检测器24-1具有FOP 具有闪烁体的光纤的另一端部在其上形成有副视域的二次电子束的图像。从副视野发射的二次电子束在电子束被照射的子视野的每次运动中被电磁偏转器偏转并在单元检测器的FOP面上移动。由于在其他单元检测器曝光的同时可以从各单元检测器中取出图像信息，因此可以获得高速图像。版权所有（C）2006，JPO＆NCIPI

47. 发明专利

JP2006024455A Electron beam device, and manufacturing method of device using the same 审中-公开
标题翻译：电子束装置，以及使用该装置的装置的制造方法
公开(公告)号：JP2006024455A
公开(公告)日：2006-01-26
申请号：JP2004201736
申请日：2004-07-08
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , MURAKAMI TAKESHI , SOFUGAWA TAKUJI
IPC分类号： H01J37/244 , G01N23/225 , H01J37/22 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To carry out evaluation of a pattern having a line width of 0.2 μm or less with a high throughput and high reliability secured.
SOLUTION: The electron beam device forms electron beams irradiated from an electron gun 2 into rectangular shapes, scans the electron beams on a visual field of a sample S, enlarges the electron emitted from the scanning area by an image projection optical system, makes the enlarged image form an image on a scintillator 51 and guides it to a CCD through a relay optical system, and obtains a two-dimensional image. At least two faces capable of imaging the two-dimensional image are formed on the CCD, and an image data can be taken out from one face while the other face is receiving an enlarged image.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：确保具有高通量和高可靠性的线宽为0.2μm以下的图案的评价。解决方案：电子束装置形成从电子枪2照射成矩形的电子束，扫描样品S的视野上的电子束，通过图像投影光学系统放大从扫描区域发射的电子，使放大图像在闪烁器51上形成图像，并通过中继光学系统将其引导到CCD，并获得二维图像。在CCD上形成能够成像二维图像的至少两个面，并且可以从一个面取出图像数据，而另一个面正在接收放大的图像。版权所有（C）2006，JPO＆NCIPI

48. 发明专利

JP2005353298A Electron beam device, and manufacturing method of device using the same 审中-公开
标题翻译：电子束装置，以及使用该装置的装置的制造方法
公开(公告)号：JP2005353298A
公开(公告)日：2005-12-22
申请号：JP2004169675
申请日：2004-06-08
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , SOFUGAWA TAKUJI , MURAKAMI TAKESHI , WATANABE KENJI
IPC分类号： H01J37/22 , H01J37/141 , H01J37/153
摘要： PROBLEM TO BE SOLVED: To provide an electron beam device, with the problem of a conventional device solved, especially, capable of irradiating electron beams with high current density, greatly improved in transmittance of secondary electron of image projection optical system, and further, capable of reducing the size of electro-optical lens barrel, and to provide a manufacturing method of a device using the electron beam device.
SOLUTION: On the electron beam device A irradiating the electron beams on a sample 13, forming a two-dimensional image by enlarging the secondary electron emitted from the sample 13, or the electron transmitted through the sample 13 by an image projection optical system A
2 , the surface of the sample 13 is divided into a plurality of stripe areas 2, of which, a longitudinal direction is parallel with a prescribed axis, and each stripe area 26 is divided into rectangular main visual field areas in parallel with its short side direction, and each rectangular main visual field area is further divided into square sub-visual fields 27. The irradiation of electron beams and the formation of the two-dimensional image are repeated at every sub-visual field 27, and a correction corresponding to the distance between each sub-visual field 27 and an optical axis is carried at every two-dimensional image formation.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：为了提供一种解决电子束装置的问题，特别是能够照射高电流密度的电子束，大大提高了图像投影光学系统的二次电子的透射率，此外，能够减小电光镜筒的尺寸，并提供使用电子束装置的装置的制造方法。解决方案：在电子束装置A上，在样品13上照射电子束，通过放大从样品13发射的二次电子或通过图像投影光学透射通过样品13的电子形成二维图像系统A 2 ，样品13的表面被分成多个条带区域2，其长度方向与规定的轴线平行，并且每个条纹区域26被分成矩形主体视场区域与其短边方向平行，并且每个矩形主视野区域进一步分成正方形的副视野27.电子束的照射和二维图像的形成在每个子视觉下重复场27，并且在每个二维图像形成时承载对应于每个子视野27和光轴之间的距离的校正。版权所有（C）2006，JPO＆NCIPI

49. 发明专利

JP2002341216A OPTICAL ELEMENT ASSEMBLY FOR ELECTRON-BEAM DEVICE, TREATING METHOD FOR THE SAME OPTICAL ELEMENT ASSEMBLY, AND DEVICE MANUFACTURING METHOD USING ELECTRON-BEAM DEVICE EQUIPPED WITH THE SAME OPTICAL ELEMENT ASSEMBLY 失效
公开(公告)号：JP2002341216A
公开(公告)日：2002-11-27
申请号：JP2001142813
申请日：2001-05-14
申请人： EBARA CORP
发明人： HIRABAYASHI YOSHIHISA , SOFUGAWA TAKUJI , KARIMATA TSUTOMU
IPC分类号： G01R1/06 , G01R31/302 , G02B7/02 , G21K5/04 , H01J9/14 , H01J37/04 , H01J37/12
摘要： PROBLEM TO BE SOLVED: To provide an optical element assembly which can actualize high-level mutual positioning precision for a plurality of optical elements with simple constitution. SOLUTION: The optical element assembly 1 is equipped with a plurality of lenses 31, 33, and 35, a cylinder body 10 which stores the lenses 31, 33, and 35 inside, and holders 20A, 20B, and 20C which are fitted to the cylinder body and arranged coaxially with the center axis of the cylinder body at equal intervals on the same circumference and hold the respective lenses in a position- adjustable state. This optical element assembly is manufactured as a unit and built integrally in a lens barrel which carries the optical system of an electron- beam device.

50. 发明专利

JP2001173558A EVACUATION SYSTEM 失效
公开(公告)号：JP2001173558A
公开(公告)日：2001-06-26
申请号：JP2000305116
申请日：2000-10-04
申请人： EBARA CORP
发明人： KAWASAKI HIROYUKI , SOFUGAWA TAKUJI
IPC分类号： F04D19/04 , F04B37/16
摘要： PROBLEM TO BE SOLVED: To provide an evacuation system capable of reducing the cost by reducing the space as the whole, and simplifying piping construction work. SOLUTION: In this evacuation system having a vacuum chamber, a means for introducing gas into the vacuum chamber, a main pump for exhausting the vacuum chamber to be reduced in pressure to desired pressure, an auxiliary pump provided on the trailing side of the main pump, and a pipe for connecting the above members, the outside diameter of a connecting pipe connecting between the main pump and the auxiliary pump is 1/2 inch (12.7 mm) or less, and the length of the connecting pipe and the capacity of the auxiliary pump are combined so that the back pressure of the main pump is 5 Torr or more.

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