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41. 发明申请

US20100084376A1 NANO-IMPRINT LITHOGRAPHY TEMPLATES 有权
标题翻译： NANO-IMPRINT LITHOGRAPHY模板
公开(公告)号：US20100084376A1
公开(公告)日：2010-04-08
申请号：US12572838
申请日：2009-10-02
申请人： Niyaz Khusnatdinov , Weijun Liu , Frank Y. Xu , Fen Wan , Edward Brian Fletcher , Marlon Menezes
发明人： Niyaz Khusnatdinov , Weijun Liu , Frank Y. Xu , Fen Wan , Edward Brian Fletcher , Marlon Menezes
IPC分类号： B44C1/22 , H05B6/00 , B29C59/00
CPC分类号： G03F7/0002 , B32B37/14 , B82Y10/00 , B82Y40/00 , Y10T156/10
摘要： Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
摘要翻译：多孔纳米压印光刻模板可以包括孔，通道或多孔层，布置成允许排出捕获在纳米压印光刻模板和衬底之间的气体。孔或通道可以通过蚀刻或其它工艺形成。垫片可以形成在纳米压印光刻模板上以限制纳米压印光刻工艺期间可聚合材料的流动。

42. 发明申请

US20090272875A1 Composition to Reduce Adhesion Between a Conformable Region and a Mold 有权
标题翻译：降低适形区域和模具之间粘合性的成分
公开(公告)号：US20090272875A1
公开(公告)日：2009-11-05
申请号：US12404024
申请日：2009-03-13
申请人： Frank Y. Xu , Michael N. Miller
发明人： Frank Y. Xu , Michael N. Miller
IPC分类号： B28B7/36
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography mold assembly includes a mold having a surface, a substrate having a surface, and a polymerizable composition disposed between the surface of the mold and the surface of the substrate. The polymerizable composition includes a bulk material and a non-ionic surfactant having a first end and a second end. The first end of the non-ionic surfactant has an affinity for the bulk material, and the second end of the non-ionic surfactant is fluorinated.
摘要翻译：压印光刻模具组件包括具有表面的模具，具有表面的基底和设置在模具表面和基底表面之间的可聚合组合物。可聚合组合物包括本体材料和具有第一端和第二端的非离子表面活性剂。非离子表面活性剂的第一端对本体材料具有亲和性，非离子表面活性剂的第二端被氟化。

43. 发明申请

US20090148619A1 Controlling Thickness of Residual Layer 审中-公开
标题翻译：控制残留层厚度
公开(公告)号：US20090148619A1
公开(公告)日：2009-06-11
申请号：US12328498
申请日：2008-12-04
申请人： Dwayne L. LaBrake , Niyaz Khusnatdinov , Christopher Ellis Jones , Frank Y. Xu
发明人： Dwayne L. LaBrake , Niyaz Khusnatdinov , Christopher Ellis Jones , Frank Y. Xu
IPC分类号： C08J7/04 , B05D5/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm.
摘要翻译：描述了在基板上制造图案化表面的方法。通常，图案化表面由厚度小于约5nm的残余层限定。

44. 发明申请

US20080110557A1 Methods and Compositions for Providing Preferential Adhesion and Release of Adjacent Surfaces 审中-公开
标题翻译：提供相邻表面的优先粘附和释放的方法和组合
公开(公告)号：US20080110557A1
公开(公告)日：2008-05-15
申请号：US11560266
申请日：2006-11-15
申请人： Frank Y. Xu
发明人： Frank Y. Xu
IPC分类号： B32B38/10 , B32B37/12 , C09J4/02
CPC分类号： B32B38/06 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention provides a method and composition for providing preferential adhesion and release of adjacent surfaces, that features solidifying a composition to form a solidified layer having first and second opposed sides, with the first side facing a first surface and being adhered thereto with a first adhesive forces and the second side facing the second surface and being adhered thereto with a second adhesive force, with the first and second adhesive forces establishing a predetermined preferential adhesion ratio. Generally, the first surface is covalently bonded to the first side and adhesion between the second side and the second surface occurs through Van der Waal forces. It has been found that the use of a fluorine group for enhancing the release properties (as a priori fluorinated release layer or a fluorinated release agent) is no longer needed for such method and composition. In one embodiment, the composition can be formed from an isobornyl acrylate component; an aliphatic urethane acrylate component; a 1,6-hexanediol diacrylate component; and a 2-hydroxy-2-methyl-1-phenyl-propan-1-one component. The first surface can be formed by polymerizing a compound formed from a multi-functional component that contains functional groups facilitating the formation of covalent bonds with the above mentioned polymerizable composition during an imprinting process, a cross-linking agent component, a catalyst component, and a solvent component. The second surface is usually a patterned or smoothed portion of a quartz mold.
摘要翻译：本发明提供了一种用于提供相邻表面的优先粘合和释放的方法和组合物，其特征在于固化组合物以形成具有第一和第二相对侧的固化层，其中第一侧面向第一表面并且用第一粘合力并且第二面朝向第二表面并且以第二粘合力粘附到其上，第一和第二粘合力确定预定的优先粘合比。通常，第一表面共价结合到第一侧，并且通过范德华力产生第二侧和第二表面之间的粘合。已经发现，对于这种方法和组成，不再需要使用用于提高剥离性能的氟基（作为先验氟化脱模层或氟化脱模剂）。在一个实施方案中，组合物可由丙烯酸异冰片酯组分形成; 脂肪族聚氨酯丙烯酸酯组分; 1,6-己二醇二丙烯酸酯组分; 和2-羟基-2-甲基-1-苯基 - 丙-1-酮组分。第一表面可以通过聚合由多功能组分形成的化合物形成，所述多官能组分含有促进在压印过程中与上述可聚合组合物共价键形成的官能团，交联剂组分，催化剂组分和溶剂组分。第二表面通常是石英模具的图案化或平滑化部分。

45. 发明授权

US07282550B2 Composition to provide a layer with uniform etch characteristics 有权
标题翻译：组合物以提供具有均匀蚀刻特性的层
公开(公告)号：US07282550B2
公开(公告)日：2007-10-16
申请号：US10919062
申请日：2004-08-16
申请人： Frank Y. Xu , Nicholas A. Stacey
发明人： Frank Y. Xu , Nicholas A. Stacey
IPC分类号： C08F30/08 , C08F118/02 , H01L21/302 , H01L21/461
CPC分类号： C08F230/08 , Y10T428/31663
摘要： The present invention includes a composition to form a layer on a substrate having uniform etch characteristics. To that end, the composition has a plurality of components, a subset of which has substantially similar rates of evaporation for an interval of time.
摘要翻译：本发明包括在基材上形成具有均匀蚀刻特性的层的组合物。为此，组合物具有多个组分，其一部分在一段时间内具有基本相似的蒸发速率。

46. 发明授权

US07090716B2 Single phase fluid imprint lithography method 有权
标题翻译：单相流体压印光刻法
公开(公告)号：US07090716B2
公开(公告)日：2006-08-15
申请号：US10677639
申请日：2003-10-02
申请人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Michael P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
发明人： Ian M. McMackin , Nicholas A. Stacey , Daniel A. Babbs , Duane J. Voth , Michael P. C. Watts , Van N. Truskett , Frank Y. Xu , Ronald D. Voisin , Pankaj B. Lad
IPC分类号： B01D19/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S425/06 , Y10S425/815 , Y10S438/909
摘要： The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.
摘要翻译：本发明涉及通过减少存在于沉积在基底上的粘性液体层中的气穴来减少压印层中的图案失真的方法。为此，该方法包括改变靠近粘性液体设置的气体的输送。具体地，其中待记录图案的基板附近的气氛相对于被沉积的粘性液体是高度可溶的，高度扩散的或者两者都被饱和。另外，或者代替饱和气氛，可以降低气氛的压力。

47. 发明申请

US20150255640A1 Nanostructured Solar Cell 有权
标题翻译：纳米结构太阳能电池
公开(公告)号：US20150255640A1
公开(公告)日：2015-09-10
申请号：US14716233
申请日：2015-05-19
申请人： Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人： Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号： H01L31/0236 , H01L31/20 , C23C14/34
CPC分类号： H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要： Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
摘要翻译：描述了具有纳米结构阵列的纳米结构太阳能电池的制造系统和方法，包括具有金字塔纳米结构重复图案的纳米结构太阳能电池，为具有改进的PCE的低成本薄膜太阳能电池提供。

48. 发明授权

US08808808B2 Method for imprint lithography utilizing an adhesion primer layer 有权
标题翻译：使用粘合底漆层的压印光刻方法
公开(公告)号：US08808808B2
公开(公告)日：2014-08-19
申请号：US11734542
申请日：2007-04-12
申请人： Frank Y. Xu , Sidlgata V. Sreenivasan , Edward Brian Fletcher
发明人： Frank Y. Xu , Sidlgata V. Sreenivasan , Edward Brian Fletcher
IPC分类号： B05D1/36 , B05D7/00
CPC分类号： C08L59/00 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B5/855 , Y10T428/31663 , Y10T428/31678 , Y10T428/31692
摘要： The invention provides a method of applying an adhesion primer layer for an imprint lithography process that includes contacting a fluid with a surface of a substrate in a coating process and initiating a chemical reaction that forms a covalent bond between a component in the fluid and the surface of the substrate such that an adhesion primer layer is adhered to the surface of the substrate. A polymeric layer may be adhered to the surface of the substrate coated with the adhesion primer layer. The method allows adhesion primer coating for double-sided imprinting applications including patterned magnetic media.
摘要翻译：本发明提供了一种施加用于压印光刻工艺的粘合底漆层的方法，该方法包括在涂布过程中使流体与基材的表面接触并引发在流体和表面之间形成共价键的化学反应的基底，使得粘合底漆层粘附到基底的表面。聚合物层可以粘附到涂覆有粘合底漆层的基材的表面上。该方法允许用于包括图案化磁性介质的双面印刷应用的粘合底漆涂层。

49. 发明授权

US08641941B2 Photocatalytic reactions in nano-imprint lithography processes 有权
标题翻译：纳米压印光刻工艺中的光催化反应
公开(公告)号：US08641941B2
公开(公告)日：2014-02-04
申请号：US13446364
申请日：2012-04-13
申请人： Edward Brian Fletcher , Frank Y. Xu
发明人： Edward Brian Fletcher , Frank Y. Xu
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance.
摘要翻译：具有粘附到模板表面的光敏涂层的压印光刻模板。光活性涂层的照射通过分散模板附近的有机材料（例如吸附在模板上的有机材料）促进模板的清洁。压印光刻系统可以被配置为使得在压印光刻基板上形成图案化层期间实现模板清洁。在压印光刻工艺期间清洁模板减少了可能与模板维护相关的停机时间。

50. 发明申请

US20120288686A1 REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS 审中-公开
标题翻译：在多层堆叠中减少残留形成
公开(公告)号：US20120288686A1
公开(公告)日：2012-11-15
申请号：US13546622
申请日：2012-07-11
申请人： Frank Y. Xu , Weijun Liu , Cynthia B. Brooks , Dwayne L. LaBrake , David J. Lentz
发明人： Frank Y. Xu , Weijun Liu , Cynthia B. Brooks , Dwayne L. LaBrake , David J. Lentz
IPC分类号： B32B3/30 , B05D3/10 , B05D1/38 , C08F236/20 , B32B27/08
CPC分类号： G03F7/027 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/24612
摘要： A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition.
摘要翻译：通过将第一可聚合组合物施加到基底上，聚合第一可聚合组合物以形成第一聚合层，向第一聚合层施加第二可聚合组合物，并将第二可聚合组合物聚合成在第一聚合层上形成第二聚合层。第一可聚合组合物包括玻璃化转变温度低于约25℃的可聚合组分，并且第一聚合层对于第二可聚合组合物基本上是不可渗透的。

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