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1. 发明授权

US09323143B2 Controlling template surface composition in nano-imprint lithography 有权
标题翻译：在纳米压印光刻中控制模板表面组成
公开(公告)号：US09323143B2
公开(公告)日：2016-04-26
申请号：US12364979
申请日：2009-02-03
申请人： Frank Y. Xu , Weijun Liu
发明人： Frank Y. Xu , Weijun Liu
IPC分类号： B82Y10/00 , B82Y40/00 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/24802
摘要： A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.
摘要翻译：纳米压印光刻工艺包括在基本无机纳米压印光刻模板的表面上形成多个羟基，加热模板，并使模板表面上预选择的羟基百分数与单体官能的非氟化合物，以在纳米压印光刻模板的表面上形成单层涂层。涂布的模板可以与设置在纳米压印光刻基材上的可聚合组合物接触，并且可聚合组合物固化以形成图案化层。将涂覆的模板与图案化层分离。

2. 发明授权

US09070803B2 Nanostructured solar cell 有权
公开(公告)号：US09070803B2
公开(公告)日：2015-06-30
申请号：US13105422
申请日：2011-05-11
申请人： Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
发明人： Shuqiang Yang , Michael N. Miller , Mohamed M. Hilali , Fen Wan , Gerard M. Schmid , Liang Wang , Sidlgata V. Sreenivasan , Frank Y. Xu
IPC分类号： H01L31/00 , H01L31/0352 , B82Y20/00 , H01L31/0224 , H01L31/0236 , H01L31/0376 , H01L31/0392 , H01L31/075 , H01L31/076 , H01L31/20 , H01L31/0463
CPC分类号： H01L31/02363 , B82Y20/00 , C23C14/34 , H01L31/022466 , H01L31/0236 , H01L31/035263 , H01L31/035281 , H01L31/03762 , H01L31/0392 , H01L31/03921 , H01L31/03926 , H01L31/0463 , H01L31/075 , H01L31/076 , H01L31/202 , Y02E10/548 , Y02P70/521
摘要： Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.

3. 发明授权

US08968620B2 Safe separation for nano imprinting 有权
标题翻译：纳米压印安全分离
公开(公告)号：US08968620B2
公开(公告)日：2015-03-03
申请号：US13095514
申请日：2011-04-27
申请人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C45/76 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译：通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db））和/或材料刚度的选择。

4. 发明授权

US08802747B2 Nanoimprint lithography processes for forming nanoparticles 有权
标题翻译：用于形成纳米颗粒的纳米压印光刻工艺
公开(公告)号：US08802747B2
公开(公告)日：2014-08-12
申请号：US13017259
申请日：2011-01-31
申请人： Frank Y. Xu , Sidlgata V. Sreenivasan , Shuqiang Yang
发明人： Frank Y. Xu , Sidlgata V. Sreenivasan , Shuqiang Yang
IPC分类号： B29D11/00 , C08F20/06 , B23P15/00 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.
摘要翻译：用于形成纳米颗粒的光刻方法包括在多层基板上图案化牺牲材料。在一些情况下，将图案转移到多层基板的可移除层或其中，并且将功能材料设置在多层基板的可移除层上并固化。然后去除功能材料的至少一部分以暴露可移除层的突起，并且功能材料的柱从可除去的层释放以产生纳米颗粒。在其他情况下，多层基板包括功能材料，并且图案被转移到多层基板的可移除层中或其中。去除牺牲层，并且功能材料的柱从可除去的层中释放出来以产生纳米颗粒。

5. 发明授权

US08652393B2 Strain and kinetics control during separation phase of imprint process 有权
标题翻译：压印过程分离阶段的应变和动力学控制
公开(公告)号：US08652393B2
公开(公告)日：2014-02-18
申请号：US12604517
申请日：2009-10-23
申请人： Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung-Jin Choi
发明人： Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung-Jin Choi
IPC分类号： B29C45/76
CPC分类号： B29C37/0003 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
摘要翻译：描述了在压印光刻工艺的分离过程期间改进鲁棒层分离的系统和方法。包括在待印刷的基底与模板之间匹配应变的方法，改变或改变在分离期间施加到模板和/或基底的力，或改变或改变分离过程的动力学。

6. 发明授权

US08637587B2 Release agent partition control in imprint lithography 有权
标题翻译：印版光刻中的脱模剂分区控制
公开(公告)号：US08637587B2
公开(公告)日：2014-01-28
申请号：US13226635
申请日：2011-09-07
申请人： Frank Y. Xu , Weijun Liu
发明人： Frank Y. Xu , Weijun Liu
IPC分类号： C08F2/50
CPC分类号： C07D237/24 , B82Y10/00 , B82Y40/00 , C07C233/18 , G03F7/0002
摘要： Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.
摘要翻译：在纳米压印光刻工艺中将模板与固化的抗蚀剂分离期间，与纳米压印光刻模板表面的亲和性增加的脱模剂与模板相互作用强烈。表面活性剂和模板表面之间的强相互作用减少了在压印光刻循环中将图案化层与模板分离期间从模板表面上拉出的表面活性剂的量。在将图案化层与模板分离之后，维持与模板表面相关的更多表面活性剂可以减少液体抗蚀剂中所需的表面活性剂的量，以在压印光刻过程中从模板中实现固化的抗蚀剂的合适释放。脱模剂与模板表面的强相关有助于在纳米压印光刻中形成超薄的残余层和致密的精细特征。

7. 发明授权

US08616873B2 Micro-conformal templates for nanoimprint lithography 有权
标题翻译：用于纳米压印光刻的微型适形模板
公开(公告)号：US08616873B2
公开(公告)日：2013-12-31
申请号：US13014354
申请日：2011-01-26
申请人： Michael N. Miller , Frank Y. Xu , Nicholas A. Stacey
发明人： Michael N. Miller , Frank Y. Xu , Nicholas A. Stacey
IPC分类号： B28B7/36 , B29C59/00 , B29C59/16 , B29C33/38
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.
摘要翻译：微型共形纳米压印光刻模板包括背衬层和粘附到背衬层的纳米图案化层。背衬层的弹性模量超过纳米图案层的弹性模量。微型共形纳米压印光刻模板可以用于从基底上的抗蚀刻剂形成图案化层，该衬底具有微米级缺陷，使得从微米级缺陷的外表面到图案化的排除距离由纳米压印光刻模板形成的层小于缺陷的高度。纳米压印光刻模板可以用于形成多个压印，而不会降低特征保真度。

8. 发明授权

US08541053B2 Enhanced densification of silicon oxide layers 有权
标题翻译：增强氧化硅层的致密化
公开(公告)号：US08541053B2
公开(公告)日：2013-09-24
申请号：US13178057
申请日：2011-07-07
申请人： Marlon Menezes , Frank Y. Xu , Fen Wan
发明人： Marlon Menezes , Frank Y. Xu , Fen Wan
IPC分类号： B05D3/02 , B05D3/04 , B32B3/26
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01L21/3105 , Y10T428/249953
摘要： Densifying a multi-layer substrate includes providing a substrate with a first dielectric layer on a surface of the substrate. The first dielectric layer includes a multiplicity of pores. Water is introduced into the pores of the first dielectric layer to form a water-containing dielectric layer. A second dielectric layer is provided on the surface of the water-containing first dielectric layer. The first and second dielectric layers are annealed at temperature of 600° C. or less. In an example, the multi-layer substrate is a nanoimprint lithography template. The second dielectric layer may have a density and therefore an etch rate similar to that of thermal oxide, yet may still be porous enough to allow more rapid diffusion of helium than a thermal oxide layer.
摘要翻译：致密化多层基板包括在基板的表面上提供具有第一介电层的基板。第一介电层包括多个孔。将水引入第一介电层的孔中以形成含水介电层。在含水的第一介电层的表面上设置有第二介质层。第一和第二电介质层在600℃或更低的温度下退火。在一个实例中，多层衬底是纳米压印光刻模板。第二电介质层可以具有与热氧化物类似的密度，因此蚀刻速率可能仍然足够多孔以允许氦比热氧化物层更快速地扩散。

9. 发明授权

US08529778B2 Large area patterning of nano-sized shapes 有权
标题翻译：纳米尺寸形状的大面积图案
公开(公告)号：US08529778B2
公开(公告)日：2013-09-10
申请号：US12616896
申请日：2009-11-12
申请人： Sidlgata V. Sreenivasan , Shuqiang Yang , Frank Y. Xu , Dwayne L. LaBrake
发明人： Sidlgata V. Sreenivasan , Shuqiang Yang , Frank Y. Xu , Dwayne L. LaBrake
IPC分类号： B44C1/22
CPC分类号： G03F7/0035 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
摘要翻译：描述了形成纳米形图案的方法。该方法可以用于直接图案化基底和/或产生压印光刻模具，其可以随后用于在高通量过程中将纳米形图案直接复制到其它基底中。

10. 发明授权

US08415010B2 Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers 有权
标题翻译：具有增强的含硅层和非含硅层之间的粘附性的纳米压印光刻堆叠
公开(公告)号：US08415010B2
公开(公告)日：2013-04-09
申请号：US12581634
申请日：2009-10-19
申请人： Weijun Liu , Frank Y. Xu
发明人： Weijun Liu , Frank Y. Xu
IPC分类号： B32B27/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/027 , G03F7/0382 , G03F7/0757 , Y10T428/265 , Y10T428/31667
摘要： A nano-imprint lithography stack includes a nano-imprint lithography substrate, a non-silicon-containing layer solidified from a first polymerizable, non-silicon-containing composition, and a silicon-containing layer solidified from a polymerizable silicon-containing composition adhered to a surface of the non-silicon-containing layer. The non-silicon-containing layer is adhered directly or through one or more intervening layers to the nano-imprint lithography substrate. The silicon-containing layer includes a silsesquioxane with a general formula (R′(4-2z)SiOz)x(HOSiO1.5)y, wherein R′ is a hydrocarbon group or two or more different hydrocarbon groups other than methyl, 1
摘要翻译：纳米压印光刻堆叠包括纳米压印光刻基板，从第一可聚合的非含硅组合物固化的非含硅层和从可聚合的含硅组合物固化的含硅层，所述可聚合的含硅组合物粘附到非含硅层的表面。非含硅层直接或通过一个或多个中间层粘附到纳米压印光刻基片上。含硅层包括具有通式（R'（4-2z）SiO z）x（HOSiO 1.5）y的倍半硅氧烷，其中R'是烃基或两个或更多个不同于甲基的不同烃基， z <2，x和y是整数。压印光刻叠层可以进一步包括第二非含硅层，其从粘附到含硅层的表面的第二可聚合非含硅组合物固化，使得含硅层被夹在非晶硅层之间，含硅层。

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