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    • 42. 发明授权
    • Structure and method to fabricate high performance MTJ devices for MRAM applications
    • 制造用于MRAM应用的高性能MTJ器件的结构和方法
    • US07211447B2
    • 2007-05-01
    • US11080868
    • 2005-03-15
    • Cheng T. HorngRu-Ying TongMao-Min ChenLiubo HongMin Li
    • Cheng T. HorngRu-Ying TongMao-Min ChenLiubo HongMin Li
    • H01L21/00
    • H01L43/12
    • A method of forming a high performance MTJ in an MRAM array is disclosed. A Ta/Ru capping layer in a bottom conductor is sputter etched to remove the Ru layer and form an amorphous Ta capping layer. A key feature is a subsequent surface treatment of the Ta capping layer in a transient vacuum chamber where a self-annealing occurs and a surfactant layer is formed on the Ta surface. The resulting smooth and flat Ta surface promotes a smooth and flat surface in the MTJ layers which are subsequently formed on the surfactant layer. For a 0.3×0.6 micron MTJ bit size, a 35 to 40 Angstrom thick NiFe(18%) free layer, an AlOx barrier layer generated from a ROX oxidation of an 9 to 10 Angstrom thick Al layer, and a Ru/Ta/Ru capping layer are employed to give a dR/R of >40% and an RA of about 4000 ohm-μm2.
    • 公开了一种在MRAM阵列中形成高性能MTJ的方法。 溅射蚀刻底部导体中的Ta / Ru覆盖层以去除Ru层并形成无定形Ta覆盖层。 一个关键的特征是在瞬态真空室中Ta覆盖层的后续表面处理,其中发生自退火并且在Ta表面上形成表面活性剂层。 所得到的平滑且平坦的Ta表面促进在表面活性剂层上随后形成的MTJ层中的光滑和平坦的表面。 对于0.3×0.6微米的MTJ位尺寸,35至40埃厚的NiFe(18%)自由层,由9至10埃厚的Al层的ROX氧化产生的AlO x势垒层,以及Ru / Ta / 使用Ru覆盖层来产生大于40%的dR / R和约4000欧姆 - 姆2的RA。
    • 48. 发明授权
    • Engineered magnetic layer with improved perpendicular anisotropy using glassing agents for spintronic applications
    • 具有改进的垂直各向异性的工程磁性层,使用玻璃化剂进行自旋电子应用
    • US08710603B2
    • 2014-04-29
    • US13408555
    • 2012-02-29
    • Guenole JanYu-Jen WangRu-Ying Tong
    • Guenole JanYu-Jen WangRu-Ying Tong
    • H01L29/82
    • H01L43/08H01L43/10H01L43/12
    • A magnetic element is disclosed wherein first and second interfaces of a free layer with a perpendicular Hk enhancing layer and tunnel barrier, respectively, produce enhanced surface perpendicular anisotropy to increase thermal stability in a magnetic tunnel junction (MTJ). The free layer may be a single layer or a composite and is comprised of one or more glassing agents that have a first concentration in a middle portion thereof and a second concentration less than the first concentration in regions near first and second interfaces. As a result, a CoFeB free layer, for example, selectively crystallizes along first and second interfaces but maintains an amorphous character in a middle region containing a glass agent providing the annealing temperature is less than the crystallization temperature of the middle region. The magnetic element may be part of a spintronic device or serve as a propagation medium in a domain wall motion device.
    • 公开了一种磁性元件,其中具有垂直Hk增强层和隧道势垒的自由层的第一和第二界面分别产生增强的表面垂直各向异性以增加磁性隧道结(MTJ)中的热稳定性。 自由层可以是单层或复合物,并且由一个或多个在中间部分具有第一浓度并且在第一和第二界面附近的区域中的第二浓度小于第一浓度的玻璃化剂组成。 结果,例如,CoFeB自由层沿着第一界面和第二界面选择性地结晶,但是在含有提供退火温度的玻璃试剂的中间区域中保持无定形特征小于中间区域的结晶温度。 磁性元件可以是自旋电子器件的一部分或用作域壁运动装置中的传播介质。