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    • 44. 发明授权
    • Auxiliary coding for home networking communication system
    • 家庭网络通信系统的辅助编码
    • US07898972B2
    • 2011-03-01
    • US10046749
    • 2002-01-17
    • Gang HuangZhenyu WangJinguo Yu
    • Gang HuangZhenyu WangJinguo Yu
    • H04L12/26
    • H04W99/00H04L12/2803H04W28/18H04W48/08
    • Advance training information is provided to a receiving Home network station via auxiliary coding, synchronized and/or included in the relevant Ethernet type packet. The advance training information may be, e.g., past equalizer, timing recovery circuit, AGC circuit, echo canceler values resulting from the reception of a previous frame. The training information may be, e.g., an early identity of the source of the packet, with a subsequent lookup performed by the receiving station for predetermined training value(s), or the training values themselves may be transmitted to the home network receiver via auxiliary coding. The auxiliary coding information may be transmitted before and/or during the frame training period of the relevant frame. This permits use of predetermined training values specific to the particular transmitter based on past frames received from that same transmitter during the training period for the received signal to be further refined from that determined from the auxiliary coding, resulting in more efficient and more accurate training of, e.g., a receiving equalizer, time recovery circuits, AGC, echo canceler, etc. Exemplary auxiliary coding techniques include, e.g., BPSK, FSK, QAM.
    • 通过辅助编码向接收家庭网络站提供预先训练信息,同步和/或包括在相关的以太网类型分组中。 预先训练信息可以是例如过去均衡器,定时恢复电路,AGC电路,由接收前一帧产生的回波消除器值。 培训信息可以是例如分组的源的早期身份,接收站对于预定训练值执行的后续查找,或者训练值本身可以经由辅助方式发送到家庭网络接收机 编码。 辅助编码信息可以在相关帧的帧训练周期之前和/或期间传送。 这允许在训练期间基于从相同发射机接收的过去帧来使用特定发射机的预定训练值,以便从辅助编码确定的接收信号进一步改进接收信号,导致更有效和更准确的训练 例如接收均衡器,时间恢复电路,AGC,回波消除器等。示例性辅助编码技术包括例如BPSK,FSK,QAM。
    • 47. 发明授权
    • Synthesis, uses and compositions of crystal hydrogels
    • 水凝胶的合成,用途和组成
    • US07347988B2
    • 2008-03-25
    • US10295484
    • 2002-11-15
    • Zhibing HuXihua LuJun GaoTong CaiGang HuangBo Zhou
    • Zhibing HuXihua LuJun GaoTong CaiGang HuangBo Zhou
    • A61K7/021
    • G02B1/04C08F220/56C08J3/075G01N2021/7723
    • A method is disclosed for creating hydrogels with ordered crystalline structures that exhibit a characteristic colored opalescence. In addition to the unique optical properties, these materials contain a large amount of water in their crosslinked networks. The manufacturing processes include synthesizing monodispersed hydrogel nanoparticles containing specific reactive functional groups, self-assembly of these particles to form a crystalline structure, and subsequent crosslinking neighboring spheres to stabilize the entire network. Polymerizing a hydrogel monomeric composition around the crystalline structure can enhance the mechanical strength. The resulting network is dimensionally and thermodynamically stabile under various pH and temperature conditions. The color and volume of these crystalline hydrogel networks can reversibly change in response to external stimuli such as temperature, pH and other environmental conditions. These new materials may lead to a variety of technological and artistic applications, ranging from sensors, displays, controlled drug delivery devices, jewelry and decorative consumer products.
    • 公开了一种用于产生具有有色晶体结构的水凝胶的方法,其具有特征性的着色乳光。 除了独特的光学性能之外,这些材料在其交联网络中含有大量的水。 制造方法包括合成包含特定反应性官能团的单分散水凝胶纳米颗粒,这些颗粒的自组装形成晶体结构,随后交联相邻球体以稳定整个网络。 在晶体结构周围聚合水凝胶单体组合物可以增强机械强度。 所得到的网络在各种pH和温度条件下在尺寸和热力学上是稳定的。 这些结晶水凝胶网络的颜色和体积可以响应于诸如温度,pH和其他环境条件的外部刺激而可逆地改变。 这些新材料可能导致各种技术和艺术应用,从传感器,显示器,受控药物输送装置,首饰和装饰消费品。
    • 48. 发明授权
    • Centerline-based pinch/bridge detection
    • 基于中心线的夹点/桥接检测
    • US07191428B2
    • 2007-03-13
    • US11142789
    • 2005-05-31
    • ZongWu TangJuhwan KimDaniel ZhangHaiqing WeiGang Huang
    • ZongWu TangJuhwan KimDaniel ZhangHaiqing WeiGang Huang
    • G06F17/50
    • G03F1/36
    • A method for performing layout verification involves identifying feature centerlines in a mask layout, and then performing lithography simulation along the centerlines to generate a set of intensity distributions. At each local maxima or minima in the intensity distributions, further lithography simulation can be performed to determine an exposure pattern width at those local maxima/minima (check positions). The exposure pattern widths can then be evaluated to determine whether an actual pinch or bridge defect will be generated at those locations. If defect generation is likely (based on the lithographical simulation) at a particular location, the corresponding portion of the mask layout can be redesigned to avoid defect generation during actual production. In this method, accurate layout verification can be performed with a minimum of time-consuming lithography modeling.
    • 用于执行布局验证的方法涉及识别掩模布局中的特征中心线,然后沿着中心线执行光刻模拟以生成一组强度分布。 在强度分布的每个局部最大值或最小值处,可以进行进一步的光刻模拟,以确定那些局部最大值/最小值(检查位置)处的曝光图案宽度。 然后可以评估曝光图案宽度,以确定在这些位置是否将产生实际的夹点或桥接缺陷。 如果在特定位置可能存在缺陷产生(基于光刻模拟),则可以重新设计掩模布局的相应部分,以避免在实际生产期间产生缺陷。 在这种方法中,可以用最少的耗时的光刻建模来执行精确的布局验证。
    • 49. 发明申请
    • Centerline-based pinch/bridge detection
    • 基于中心线的夹点/桥接检测
    • US20060271906A1
    • 2006-11-30
    • US11142789
    • 2005-05-31
    • ZongWu TangJuhwan KimDaniel ZhangHaiqing WeiGang Huang
    • ZongWu TangJuhwan KimDaniel ZhangHaiqing WeiGang Huang
    • G06F17/50G03F1/00
    • G03F1/36
    • A method for performing layout verification involves identifying feature centerlines in a mask layout, and then performing lithography simulation along the centerlines to generate a set of intensity distributions. At each local maxima or minima in the intensity distributions, further lithography simulation can be performed to determine an exposure pattern width at those local maxima/minima (check positions). The exposure pattern widths can then be evaluated to determine whether an actual pinch or bridge defect will be generated at those locations. If defect generation is likely (based on the lithographical simulation) at a particular location, the corresponding portion of the mask layout can be redesigned to avoid defect generation during actual production. In this method, accurate layout verification can be performed with a minimum of time-consuming lithography modeling.
    • 用于执行布局验证的方法涉及识别掩模布局中的特征中心线,然后沿着中心线执行光刻模拟以生成一组强度分布。 在强度分布的每个局部最大值或最小值处,可以进行进一步的光刻模拟,以确定那些局部最大值/最小值(检查位置)处的曝光图案宽度。 然后可以评估曝光图案宽度,以确定在这些位置是否将产生实际的夹点或桥接缺陷。 如果在特定位置可能存在缺陷产生(基于光刻模拟),则可以重新设计掩模布局的相应部分,以避免在实际生产期间产生缺陷。 在这种方法中,可以用最少的耗时的光刻建模来执行精确的布局验证。