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41. 发明申请

WO2002069461A1 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 审中-公开
标题翻译：具有压电驱动器的激光波长控制单元
公开(公告)号：WO2002069461A1
公开(公告)日：2002-09-06
申请号：PCT/US2002/004623
申请日：2002-02-15
申请人： CYMER, INC. , SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
发明人： SPANGLER, Ronald, L. , JACQUES, Robert, N. , RULE, John, A. , PALENSCHAT, Frederick, A. , FOMENKOV, Igor, V. , ALGOTS, John, M. , LIPCON, Jacob, P. , SANDSTROM, Richard, L.
IPC分类号： H01S3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser (34) with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system (104) and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide fast feedback control based on wavelength measurements, fast vibration control, active damping using the load cell and an active damping module (320), and transient inversion using feed forward algorithms based on historical burst data.
摘要翻译：具有快速波长校正的放电激光器（34）。快速波长校正设备包括至少一个压电驱动器和快速波长测量系统（104）和快速反馈响应时间。在优选实施例中，提供设备以在从大约1到5毫秒的中间时间和几微秒的非常快的时间帧上在几毫秒的慢时间帧上控制波长。优选的技术包括相对较慢的步进电机和非常快的压电驱动器的组合，用于使用调谐镜来调谐激光波长。非常快的波长控制与压电驱动器组合地设置有压电测力传感器。优选实施例提供基于波长测量，快速振动控制，使用负载传感器的主动阻尼和主动阻尼模块（320）的快速反馈控制，以及使用基于历史突发数据的前馈算法的瞬态反转。

42. 发明申请

WO2003011595A2 LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS 审中-公开
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：WO2003011595A2
公开(公告)日：2003-02-13
申请号：PCT/US2002/022190
申请日：2002-07-11
申请人： CYMER, INC. , SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
发明人： SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
IPC分类号： B41C
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置产生具有三个单独峰值的光谱。

43. 发明申请

WO2013028272A1 ENERGY SENSORS FOR LIGHT BEAM ALIGNMENT 审中-公开
标题翻译：用于光束对准的能量传感器
公开(公告)号：WO2013028272A1
公开(公告)日：2013-02-28
申请号：PCT/US2012/046093
申请日：2012-07-10
申请人： CYMER, INC. ( A NEVADA CORPORATION) , GRAHAM, Matthew, R. , CHANG, Steven , CROUCH, James, H. , FOMENKOV, Igor, V.
发明人： GRAHAM, Matthew, R. , CHANG, Steven , CROUCH, James, H. , FOMENKOV, Igor, V.
IPC分类号： H05G2/00
CPC分类号： G03F7/70033 , H05G2/003 , H05G2/008
摘要： An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.
摘要翻译：一种装置包括驱动激光系统，其产生沿驱动轴线行进的放大的脉冲光束; 射束传送系统，其将放大的脉冲光束朝向目标区域引导; 目标材料输送系统，其在目标区域中提供含有靶材料的目标混合物; 两个或更多个传感器与跨越目标区域的主轴径向分离，两个或更多个传感器被配置为当被放大的脉冲光束与目标混合物相交时，检测从目标材料的等离子体状态发射的紫外电磁辐射的能量 ; 以及接收来自两个或更多个传感器的输出的控制器。控制器被配置为基于对所检测的能量的分析来估计目标混合物和目标区域内的驱动轴之间的相对径向对准。

44. 发明申请

WO2007005414A2 ALTERNATIVE FUELS FOR EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源替代燃料
公开(公告)号：WO2007005414A2
公开(公告)日：2007-01-11
申请号：PCT/US2006/024959
申请日：2006-06-27
申请人： CYMER, INC. , BOWERING, Norbert, R. , KHODYKIN, Oleh , BYKANOV, Alexander, N. , FOMENKOV, Igor, V.
发明人： BOWERING, Norbert, R. , KHODYKIN, Oleh , BYKANOV, Alexander, N. , FOMENKOV, Igor, V.
IPC分类号： G01J1/00
CPC分类号： H05G2/006 , B82Y10/00 , G21K2201/061 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and / or Indium.
摘要翻译：公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素元素表面。锡化合物可以包括SnBr4，SnBr2和SnH4。另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

45. 发明申请

WO2009123733A1 SYSTEMS AND METHODS FOR FILTERING OUT-OF-BAND RADIATION IN EUV EXPOSURE TOOLS 审中-公开
标题翻译：用于在EUV接触工具中过滤带外辐射的系统和方法
公开(公告)号：WO2009123733A1
公开(公告)日：2009-10-08
申请号：PCT/US2009/002058
申请日：2009-04-01
申请人： CYMER, INC. , AKINS, Robert, P. , FOMENKOV, Igor, V.
发明人： AKINS, Robert, P. , FOMENKOV, Igor, V.
IPC分类号： A61N5/06
CPC分类号： G03F7/70566 , G02B5/0891 , G02B5/3075 , G03F7/70033 , H01J35/06 , H05G2/001
摘要： In a first aspect, an apparatus for exposing a substrate with EUV radiation is described herein which may comprise a target material; a laser source generating a laser beam having a wavelength, λ, for irradiating the target material to generate EUV radiation, the laser beam defining a primary polarization direction; at least one mirror reflecting the EUV radiation along a path to the substrate; and a polarization filter disposed along the path filtering at least a portion of light having the wavelength, λ.
摘要翻译：在第一方面，本文描述了一种用EUV辐射曝光衬底的装置，其可包括靶材料; 激光源，其产生具有用于照射所述目标材料以产生EUV辐射的波长λ的激光束，所述激光束限定主偏振方向; 至少一个反射EUV辐射的镜子沿着到衬底的路径; 以及偏振滤光器，沿着所述路径设置，对至少一部分具有波长λ的光进行滤波。

46. 发明申请

WO2008088488A1 LASER PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：激光生产等离子体光源
公开(公告)号：WO2008088488A1
公开(公告)日：2008-07-24
申请号：PCT/US2007/024896
申请日：2007-12-04
申请人： CYMER, INC. , HANSSON, Bjorn, A. M. , BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , BRANDT, David, C.
发明人： HANSSON, Bjorn, A. M. , BYKANOV, Alexander, N. , FOMENKOV, Igor, V. , BRANDT, David, C.
IPC分类号： H05G2/00 , G01J3/10
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre- pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译：公开了一种EUV光源，其可以包括多个目标，例如锡液滴，以及产生预脉冲和主脉冲的系统，其具有用于照射目标以产生扩展目标的预脉冲。该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。另外，EUV光源还可以包括测量EUV光脉冲脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的突发。

47. 发明申请

WO2008020965A2 EUV OPTICS 审中-公开
标题翻译： EUV光学
公开(公告)号：WO2008020965A2
公开(公告)日：2008-02-21
申请号：PCT/US2007/016648
申请日：2007-07-24
申请人： CYMER, INC. , FOMENKOV, Igor, V. , BOWERING, Norbert, R.
发明人： FOMENKOV, Igor, V. , BOWERING, Norbert, R.
IPC分类号： G02B5/08
CPC分类号： G03F7/7015 , G02B5/0891 , G02B7/182 , G21K1/062 , Y10T29/49982
摘要： In a first aspect, a method of fabricating an EUV light source mirror is disclosed which may comprise the acts/steps of providing a plurality of discrete substrates; coating each substrate with a respective multilayer coating; securing the coated substrates in an arrangement wherein each coated substrate is oriented to a common focal point; and thereafter polishing at least one of the multilayer coatings. In another aspect, an optic for use with EUV light is disclosed which may comprise a substrate; a smoothing layer selected from the group of materials consisting of Si, C, Si 3 N 4 , B 4 C, SiC and Cr, the smoothing layer material being deposited using highly energetic deposition conditions ^nd a multilayer dielectric coating. In another aspect, a corrosion resistant, multilayer coating for an EUV mirror may comprise alternating layers of Si and a compound material having nitrogen and a 5th period transition metal.
摘要翻译：在第一方面中，公开了一种制造EUV光源反射镜的方法，其可以包括提供多个离散衬底的动作/步骤; 用各自的多层涂层涂覆每个基材; 将涂覆的基底固定在一种布置中，其中每个涂覆的基底都朝向共同的焦点; 之后抛光至少一个多层涂层。另一方面，公开了一种与EUV光一起使用的光学器件，其可以包括衬底; 选自Si，C，Si 3 N 4，B 4 C，SiC和Cr的材料组中的平滑层，使用高能量沉积条件和多层电介质涂层来沉积平滑层材料。另一方面，用于EUV反射镜的耐腐蚀多层涂层可以包括Si和具有氮和第五周期过渡金属的化合物材料的交替层。

48. 发明申请

WO2007008470A2 SYSTEMS AND METHODS FOR EUV LIGHT SOURCE METROLOGY 审中-公开
标题翻译： EUV光源计量系统与方法
公开(公告)号：WO2007008470A2
公开(公告)日：2007-01-18
申请号：PCT/US2006/025792
申请日：2006-06-29
申请人： CYMER, INC. , FOMENKOV, Igor, V. , BOWERING, Norbert, R. , HOFFMAN, Jerzy, R.
发明人： FOMENKOV, Igor, V. , BOWERING, Norbert, R. , HOFFMAN, Jerzy, R.
IPC分类号： G01J1/42
CPC分类号： G03F7/7085 , B82Y10/00 , G21K2201/061
摘要： Systems and methods for EUV Light Source metrology are disclosed. In a first aspect, a system for measuring an EUV light source power output may include a photoelectron source material disposed along an EUV light pathway to expose the material and generate a quantity of photoelectrons. The system may further include a detector for detecting the photoelectrons and producing an output indicative of EUV power. In another aspect, a system for measuring an EUV light intensity may include a multi-layer mirror, e.g., Mo/Si, disposable along an EUV light pathway to expose the mirror and generate a photocurrent in the mirror. A current monitor may be connected to the mirror to measure the photocurrent and produce an output indicative of EUV power. In yet another aspect, an off-line EUV metrology system may include an instrument for measuring a light characteristic and MoSi 2 /Si multi layer mirror.
摘要翻译：披露了EUV光源计量系统和方法。在第一方面，用于测量EUV光源功率输出的系统可以包括沿着EUV光路径设置的光电子源材料，以暴露材料并产生一定量的光电子。该系统还可以包括用于检测光电子并产生指示EUV功率的输出的检测器。在另一方面，用于测量EUV光强度的系统可以包括多层反射镜，例如Mo / Si，沿着EUV光路径可弃，以暴露反射镜并在反射镜中产生光电流。电流监视器可以连接到反射镜以测量光电流并产生指示EUV功率的输出。在另一方面，离线EUV测量系统可以包括用于测量光特性和MoSi 2 / Si多层反射镜的仪器。

49. 发明申请

WO2003011595A3 LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS 审中-公开
公开(公告)号：WO2003011595A3
公开(公告)日：2003-02-13
申请号：PCT/US2002/022190
申请日：2002-07-11
申请人： CYMER, INC. , SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
发明人： SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
IPC分类号： H01S3/10
摘要： An integrated circuit lithography technique called (spectral engineering for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.

50. 发明授权

EP1915596B1 ALTERNATIVE FUELS FOR EUV LIGHT SOURCE 有权
标题翻译：代用燃料的EUV光
公开(公告)号：EP1915596B1
公开(公告)日：2014-10-29
申请号：EP06774093.6
申请日：2006-06-27
申请人： Cymer, Inc.
发明人： BOWERING, Norbert, R. , KHODYKIN, Oleh, V. , BYKANOV, Alexander, N. , FOMENKOV, Igor, V.
IPC分类号： G01J3/10 , H05G2/00
CPC分类号： H05G2/006 , B82Y10/00 , G21K2201/061 , H05G2/003 , H05G2/005 , H05G2/008

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