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41. 发明专利

JP2004289126A Lithography system and process for fabricating device 有权
公开(公告)号：JP2004289126A
公开(公告)日：2004-10-14
申请号：JP2003417259
申请日：2003-11-11
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： LOF JOERI , ANTONIUS THEODORUS ANNA MARIA , HOOGENDAM CHRISTIAAN ALEXANDER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MODDERMAN THEODORUS MARINUS , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , SIMON KLAUS , DE SMIT JOHANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： PROBLEM TO BE SOLVED: To provide a lithography projector in which a space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. SOLUTION: In the lithography projector, the space between the final element of the projection system and the substrate table of the lithography projector is surrounded by a sealing member. A gas seal is formed between the sealing member and the plane of the substrate and the liquid is confined in that space. COPYRIGHT: (C)2005,JPO&NCIPI

42. 发明专利

JP2004177956A Method for manufacturing optical element, lithographic apparatus, and device manufacturing method 有权
公开(公告)号：JP2004177956A
公开(公告)日：2004-06-24
申请号：JP2003393923
申请日：2003-11-25
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： DIERICHS MARCEL MATHIJS THEODO , LOOPSTRA ERIK ROELOF
IPC分类号： G03F7/11 , G02B5/18 , G03F1/24 , G03F7/00 , G03F7/20 , G03F7/40 , G21K1/06 , H01L21/027
CPC分类号： G03F7/70958 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/001 , G21K1/062
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing technique for manufacturing an optical element having a relief profile with which a reflective film can surely be deposited on a multilayered stack. SOLUTION: In this manufacturing technique, the relief profile is formed by selectively applying a plasma etching to a multilayered stack including alternative layers of a first material and a second material, which have relative etching selectivity. The relief profile is coated with the film such as a reflective coating film. COPYRIGHT: (C)2004,JPO

43. 发明专利

JP2004165155A Radiation source, lithography apparatus, and device manufacturing method 有权
公开(公告)号：JP2004165155A
公开(公告)日：2004-06-10
申请号：JP2003363845
申请日：2003-09-17
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KOSHELEV KONSTANTIN NIKOLAEVIT , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITAL EVITCH , KIEFT ERIK RENE , LOOPSTRA ERIK ROELOF , STEVENS LUCAS HENRICUS JOHANNE , SIDELKOV YURII VICTOROVITCH , KOLOSHNIKOV VSEVOLOD GRIGOREVI , KRIVTSUN VLADIMIR MIHAILOVITCH , GAYAZOV ROBERT RAFILEVITCH , FRIJNS OLAV WALDEMAR VLADIMIR
IPC分类号： G21K5/00 , F28D15/02 , G03F7/20 , G21K5/02 , G21K5/08 , H01L21/027 , H05G2/00 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , F28D15/0266 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide a radiation source in which an output level and a repeating speed that are suitable for production are realized.
SOLUTION: The radiation source comprises an anode 220 and a cathode 210 that are configured and arranged to create a discharge in a gas or vapor in a space between the anode 220 and cathode 210 to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium, and tin. In order to improve heat dissipation, the radiation source LA comprises a plurality of plasma discharge elements 240, each of which is only used for short intervals, after which another discharge element is selected.
COPYRIGHT: (C)2004,JPO

44. 发明公开

KR20100130577A Lithographic apparatus having parts with a coated film adhered thereto 审中-公开
标题翻译：具有涂层薄膜的零件的平版印刷装置
公开(公告)号：KR20100130577A
公开(公告)日：2010-12-13
申请号：KR20100110912
申请日：2010-11-09
申请人： ASML NETHERLANDS BV
发明人： LIEBREGTS PAULUS MARTINUS MARIA , FIEN MENNO , LOOPSTRA ERIK ROELOF , VAN DER HAM RONALD , SIMONS WILHELMUS FRANCISCUS JOHANNES , DIRECKS DANIEEL JOZEF MARIA , JANSSEN FRANCISCUS JOHANNES JOSEPH , BRANDS GERT JAN GERARDUS JOHANNES THOMAS , STEFFENS KOEN
IPC分类号： H01L21/027
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/70866 , G03F7/70975 , G03F7/70983 , H01L21/0274 , G03F7/2041 , G03F7/70916
摘要： PURPOSE: A lithographic apparatus having parts with a coated film adhered thereto is provided top protect a negative effect from an UV radiation and an immersion fluid by supporting the coating on at least part of lithography apparatus. CONSTITUTION: A lighting system(IL) conditions radiation beam. A patterning device supporter(MT) supports a patterning device(MA). A substrate supporter supports the substrate. A projection system(PS) projects the patterned radiation beam on the target on the substrate. The adhesive film supports the coating on at least part of a lithography apparatus.
摘要翻译：目的：提供具有附着有涂膜的部件的光刻设备，其通过将涂层支撑在至少一部分光刻设备上而保护由UV辐射和浸没流体产生的负面影响。构成：照明系统（IL）规定辐射束。图案形成装置支撑体（MT）支撑图案形成装置（MA）。基板支撑件支撑基板。投影系统（PS）将图案化的辐射束投射到基板上的靶上。粘合膜在至少部分光刻设备上支撑涂层。

45. 发明公开

KR20070095805A DISPLACEMENT MEASUREMENT SYSTEMS LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：位移测量系统平台设备和设备制造方法
公开(公告)号：KR20070095805A
公开(公告)日：2007-10-01
申请号：KR20070027566
申请日：2007-03-21
申请人： ASML NETHERLANDS BV
发明人： KLAVER RENATUS GERARDUS , LOOPSTRA ERIK ROELOF , VAN DER PASCH ENGELBERTUS ANTO
IPC分类号： G01B11/02 , G01B9/02 , G03F7/20
CPC分类号： G01D5/38 , G03F7/70775
摘要： A displacement measuring system, a lithography device, and a manufacturing method thereof are provided to reduce sensitivity against an error and to decrease an installation space thereof. A displacement measuring system comprises first and second diffraction lattices, a sensor(216), and at least one linear polarizer(217,218). The first diffraction lattice is used to divide a first beam of inputted radiation into first positive and negative diffraction radiation beams(212,213). The first positive and negative diffraction radiation beams are diffracted more by the second diffraction lattice. The sensor is used to decide a relative displacement between the first and second diffraction lattices from a decision of a phase difference between a first component of the second beam deduced from the first positive diffraction radiation beam, and a second component of the second beam deduced from the first negative diffraction radiation beam. The linear polarizer is formed to diffract the first and second components of the second beam linearly and to position and cross the first and second components mutually. A lithography device is used to detect the displacement of the first component thereof against the second component thereof.
摘要翻译：提供了位移测量系统，光刻设备及其制造方法，以降低对错误的灵敏度并减小其安装空间。位移测量系统包括第一和第二衍射栅格，传感器（216）和至少一个线性偏振器（217,218）。第一衍射栅格用于将第一射入的辐射束分成第一正和负衍射辐射束（212,213）。第一正和负衍射辐射束被第二衍射晶格衍射更多。该传感器用于根据从第一正衍射辐射束推断的第二光束的第一分量与从第一正衍射辐射束推导出的第二光束的第二分量之间的相位差的判定来确定第一和第二衍射光栅之间的相对位移第一个负衍射辐射束。线性偏振器被形成为线性地衍射第二光束的第一和第二分量并相互定位和交叉第一和第二分量。光刻装置用于检测其第一部件相对于其第二部件的位移。

46. 发明专利

JP2014017526A Lithography system 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2014017526A
公开(公告)日：2014-01-30
申请号：JP2013222157
申请日：2013-10-25
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BOB STREEFKERK , JOHANNES JACOBS MATEUS BASELMANS , BRULS RICHARD JOSEPH , DIERICHS MARCLE MATHIJS T M , SECHELT NICHOLAS LAMBELDUS DONDERS , CHRISTIANE ALEXANDER HOGENDAM , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA MERTENS , MULKENS JOHANNES CATHARINUS HUBERTUS , SENGERS TIMOTHEUS FRANCISCUS , RONALD WALTER JIIN SEVERYNS , SERGEI SHULEPOV , BOOM HERMAN
IPC分类号： H01L21/027 , B05D3/12 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: An immersion lithographic projection apparatus in which immersion liquid is sealed between a final element of a projection system and a substrate is disclosed. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the immersion liquid.
摘要翻译：要解决的问题：提供一种浸没式光刻投影装置。公开了一种浸没式光刻投影装置，其中浸入液体密封在投影系统的最终元件和基板之间。公开了在设备的各种元件上使用疏水层和亲水层两者。使用这些层有助于防止在浸没液中形成气泡，并且在浸入浸液中之后减少元件上的残留物。

47. 发明专利

JP2012114485A Lithographic device and device manufacturing method 有权
公开(公告)号：JP2012114485A
公开(公告)日：2012-06-14
申请号：JP2012066781
申请日：2012-03-23
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBERTUS , ALEXEI KOLESNE TCHENKO , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , KLAUS SIMON , DE SMIT JOANNES THEODOOR , ALEXANDER STOLE YALE , STREEFKERK BOB , ERIK THEODORUS MARIA BIJLAART , CHRISTIAAN ALEXANDER HOOGENDAM , HELMAR VAN SANTEN , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , JEROEN JOHANNES SOPHIA MARIA MERTENS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

48. 发明专利

JP2012064982A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2012064982A
公开(公告)日：2012-03-29
申请号：JP2011285516
申请日：2011-12-27
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CADEE THEODORUS PETRUS MARIA , JACOBS JOHANNES HENRICUS WILHELMUS , KATE NICOLAAS TEN , LOOPSTRA ERIK ROELOF , ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL , JEROEN JOHANNES SOPHIA MARIA MERTENS , CHRISTIANUS GERARDUS MARIA DE MOL , MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS , VAN DER NET ANTONIUS J , OTTENS JOOST JEROEN , QUAEDACKERS JOHANNES ANNA , REUHMAN-HUISKEN MARIA ELISABETH , MARCO COELHO STAUFEN , TINNEMANS PATRICIUS ALOYSIUS J , VERHAGEN MARTINUS CORNELIS MARIA , VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS , DE JONG FREDERIK EDUARD , GOORMAN KOEN , MENCHTCHIKOV BORIS , BOOM HERMAN , STOYAN NIHTIANOV , MOERMAN RICHARD , SMEETS MARTIN FRANS PIERRE , SCHOONDERMARK BART LEONARD PETER , JANSSEN FRANCISCUS JOHANNES JOSEPH , RIEPEN MICHEL
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors arising from an immersion liquid.SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device capable of imparting a pattern to the radiation beam in its cross section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.
摘要翻译：要解决的问题：提供减少由浸没液体引起的光刻误差的系统。光刻设备包括：被配置为调节辐射束的照明系统; 支撑构造以支撑能够在其横截面中将辐射束赋予图案以形成图案化辐射束的图案形成装置; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。版权所有（C）2012，JPO＆INPIT

49. 发明专利

JP2012054601A Lithographic projection apparatus 审中-公开
标题翻译： LITHOGRAPHIC投影设备
公开(公告)号：JP2012054601A
公开(公告)日：2012-03-15
申请号：JP2011243513
申请日：2011-11-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBERTUS , ALEXEI KOLESNE TCHENKO , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , KLAUS SIMON , DE SMIT JOANNES THEODOOR , ALEXANDER STOLE YALE , STREEFKERK BOB , ERIK THEODORUS MARIA BIJLAART , CHRISTIAAN ALEXANDER HOOGENDAM , HELMAR VAN SANTEN , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , JEROEN JOHANNES SOPHIA MARIA MERTENS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.
摘要翻译：要解决的问题：提供具有改进的功能的浸没式光刻投影设备。浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射，浸液版权所有（C）2012，JPO＆INPIT

50. 发明专利

JP2010206225A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2010206225A
公开(公告)日：2010-09-16
申请号：JP2010138208
申请日：2010-06-17
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： CHRISTIAAN ALEXANDER HOOGENDAM , STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HUBERTUS , BIJLAART ERIK THEODORUS MARIA , KOLESNYCHENKO ALEKSEY YURIEVICH , LOOPSTRA ERIK ROELOF , MERTENS JEROEN JOHANNES SOPHIA MARIA , SLAGHEKKE BERNARDUS ANTONIUS , TINNEMANS PATRICIUS ALOYSIUS J , VAN SANTEN HELMAR
IPC分类号： G03F7/20 , H01L21/027 , B05C11/00 , G03B27/42 , G03B27/52 , H01L21/00
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a liquid supply system minimized in liquid pressure fluctuation and/or temperature variation without unnecessary disturbance by mechanical vibration. SOLUTION: Liquid is supplied from an inlet 21 into a reservoir 10 disposed between a substrate and the final element of a projection system PS. A liquid above a given height is removed by an overflow. The overflow is held above the inlet so that the liquid is constantly refreshed and a liquid pressure is substantially kept constant. COPYRIGHT: (C)2010,JPO&INPIT

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