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41. 发明申请

US20080108288A1 Conductive Polishing Article for Electrochemical Mechanical Polishing 审中-公开
标题翻译：电化学机械抛光导电抛光制品
公开(公告)号：US20080108288A1
公开(公告)日：2008-05-08
申请号：US11934878
申请日：2007-11-05
申请人： Yongqi Hu , Yan Wang , Alain Duboust , Stan Tsai , Feng Liu , Liang-Yuh Chen , Robert Ewald
发明人： Yongqi Hu , Yan Wang , Alain Duboust , Stan Tsai , Feng Liu , Liang-Yuh Chen , Robert Ewald
IPC分类号： B24B39/06 , H01L21/3105
CPC分类号： B23H5/08 , B23H5/10 , B24B37/046 , B24B37/14 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24B53/017 , H01L21/32125
摘要： Embodiments of a polishing article for processing a substrate are provided. In one embodiment, a polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or non-woven. The conductive layer may be comprised of a soft material and, in one embodiment, the exposed surface may be planar.
摘要翻译：提供了用于处理基板的抛光制品的实施例。在一个实施例中，用于处理衬底的抛光制品包括其上设置有导电层的织物层。导电层具有适于抛光衬底的暴露表面。织物层可以是编织的或非织造的。导电层可以由软质材料组成，并且在一个实施例中，暴露表面可以是平面的。

42. 发明申请

US20070290166A1 METHOD AND COMPOSITION FOR POLISHING A SUBSTRATE 审中-公开
标题翻译：用于抛光底物的方法和组合物
公开(公告)号：US20070290166A1
公开(公告)日：2007-12-20
申请号：US11838512
申请日：2007-08-14
申请人： Feng Liu , Tianbao Du , Alain Duboust , Wei-Yung Hsu
发明人： Feng Liu , Tianbao Du , Alain Duboust , Wei-Yung Hsu
IPC分类号： C09K13/04
CPC分类号： C09K3/1463
摘要： Compositions and processes for producing compositions for removing conductive material, such as copper or copper alloys, from a substrate with reduced dishing and reduced insensitivity to overpolishing are provided. Embodiments include polishing compositions for electrochemical mechanical polishing of a substrate surface comprising a conductive material, the compositions having a pH of between about 3.0 to about 9.0, such as between about 4.0 to about 7.0, for example between about 5.0 to about 6.5. The polishing compositions comprise one or more inorganic based electrolytes, such as potassium phosphate monobasic, one or more chelating agents, such as citric acid, imidodiacetic acid, glycine, or salts thereof, such as ammonium citrate, one or more corrosion inhibitors, such as benzotriazole, a basic pH adjusting agent, such as ammonium hydroxide, potassium hydroxide or combinations thereof, one or more oxidizers, such as hydrogen peroxide or ammonium persulphate (APS), and a solvent, such as deionized water.
摘要翻译：提供了用于从具有减少的凹陷的基底中去除导电材料（例如铜或铜合金）的组合物的组合物和方法，并且降低了对过度抛光的不敏感性。实施方案包括用于包含导电材料的基底表面的电化学机械抛光的抛光组合物，所述组合物的pH为约3.0至约9.0，例如约4.0至约7.0，例如约5.0至约6.5。抛光组合物包含一种或多种无机基电解质，例如磷酸二氢钾，一种或多种螯合剂，例如柠檬酸，亚氨基二乙酸，甘氨酸或其盐，例如柠檬酸铵，一种或多种腐蚀抑制剂，例如苯并三唑，碱性pH调节剂，例如氢氧化铵，氢氧化钾或其组合，一种或多种氧化剂，例如过氧化氢或过硫酸铵（APS），以及溶剂如去离子水。

43. 发明授权

US07281392B2 Beverage-cooling device 失效
标题翻译：饮料冷却装置
公开(公告)号：US07281392B2
公开(公告)日：2007-10-16
申请号：US11202559
申请日：2005-08-12
申请人： Feng Liu
发明人： Feng Liu
IPC分类号： F25D3/08
CPC分类号： F25D3/08 , B67D3/0009 , F25D2303/081 , F25D2331/811
摘要： A beverage-cooling device includes a refrigeration unit, a position unit and a switch unit. The refrigeration unit has a housing with a cavity formed therein and a tube disposed inside the cavity. The tube has an inlet and an outlet both secured to the housing, and the inlet is higher than the outlet. The position unit has a base member connecting to the refrigeration unit, a control member pivoted to the base member, and a securing member adjustably assembled onto the control member. The base member has a passage formed therein to communicate with the inlet of the tube. The control member has a through hole communicating with the passage. The securing member orientates a bottle mouth of a bottle to the control member, wherein the bottle mouth communicates with the through hole. The switch unit is secured to the refrigeration unit and connected with the outlet of the tube.
摘要翻译：饮料冷却装置包括制冷单元，位置单元和开关单元。制冷单元具有形成有空腔的壳体和设置在空腔内的管。管具有固定到壳体上的入口和出口，并且入口高于出口。位置单元具有连接到制冷单元的基座构件，枢转到基座构件的控制构件和可调节地组装到控制构件上的固定构件。基部构件具有形成在其中以与管的入口连通的通道。控制构件具有与通道连通的通孔。固定部件将瓶子的瓶口定向到控制部件，其中瓶口与通孔连通。开关单元固定到制冷单元并与管的出口连接。

44. 发明申请

US20070235345A1 Polishing method that suppresses hillock formation 审中-公开
标题翻译：抑制小丘形成的抛光方法
公开(公告)号：US20070235345A1
公开(公告)日：2007-10-11
申请号：US11400454
申请日：2006-04-07
申请人： Tianbao Du , Feng Liu , May Yu , Alan Duboust , Wei-Yung Hsu
发明人： Tianbao Du , Feng Liu , May Yu , Alan Duboust , Wei-Yung Hsu
IPC分类号： B23H5/08
CPC分类号： B23H5/08 , B24B37/04 , C25F3/02 , H01L21/321 , H01L21/32125 , H01L21/7684
摘要： An ECMP method that suppresses hillock formation on a substrate includes the step of buffing a substrate before a two-step electrochemical mechanical polishing process. The buffing step prevents hillocks from forming around the features of the substrate and does not interfere with the protrusion formation. The buffing step includes contacting the substrate with a polishing pad and rotating the substrate and the polishing pad in opposite directions.
摘要翻译：抑制基板上的小丘形成的ECMP方法包括在两步电化学机械抛光工艺之前抛光基板的步骤。抛光步骤防止小丘围绕衬底的特征形成，并且不会妨碍突起形成。抛光步骤包括使基板与抛光垫接触，并以相反的方向旋转基板和抛光垫。

45. 发明申请

US20070034506A1 PAD ASSEMBLY FOR ELECTROCHEMICAL MECHANICAL PROCESSING 失效
标题翻译：电化学机械加工用PAD组件
公开(公告)号：US20070034506A1
公开(公告)日：2007-02-15
申请号：US11458356
申请日：2006-07-18
申请人： Yongqi Hu , Stan Tsai , Yan Wang , Feng Liu , Shou-Sung Chang , Liang-Yuh Chen
发明人： Yongqi Hu , Stan Tsai , Yan Wang , Feng Liu , Shou-Sung Chang , Liang-Yuh Chen
IPC分类号： C25B11/03
CPC分类号： B24B37/26 , B23H5/06 , B23H5/08 , B23H5/10 , B24B37/042 , B24B37/046 , B24B37/22 , B24B37/24 , B24B49/16 , B24B53/017 , C25D17/14 , H01L21/32125
摘要： Embodiments of a processing pad assembly for processing a substrate are provided. The processing pad assembly includes an upper layer having a processing surface and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side. A first set of holes is formed through the upper layer for exposing the electrode to the processing surface. At least one aperture is formed through the upper layer and the electrode.
摘要翻译：提供了用于处理衬底的处理衬垫组件的实施例。处理垫组件包括具有处理表面的上层和具有联接到上层的顶侧和与顶侧相对的底侧的电极。通过上层形成第一组孔，用于将电极暴露于处理表面。通过上层和电极形成至少一个孔。

46. 发明申请

US20070033963A1 Beverage-cooling device 失效
公开(公告)号：US20070033963A1
公开(公告)日：2007-02-15
申请号：US11202559
申请日：2005-08-12
申请人： Feng Liu
发明人： Feng Liu
IPC分类号： F25D3/08
CPC分类号： F25D3/08 , B67D3/0009 , F25D2303/081 , F25D2331/811
摘要： A beverage-cooling device includes a refrigeration unit, a position unit and a switch unit. The refrigeration unit has a housing with a cavity formed therein and a tube disposed inside the cavity. The tube has an inlet and an outlet both secured to the housing, and the inlet is higher than the outlet. The position unit has a base member connecting to the refrigeration unit, a control member pivoted to the base member, and a securing member adjustably assembled onto the control member. The base member has a passage formed therein to communicate with the inlet of the tube. The control member has a through hole communicating with the passage. The securing member orientates a bottle mouth of a bottle to the control member, wherein the bottle mouth communicates with the through hole. The switch unit is secured to the refrigeration unit and connected with the outlet of the tube.

47. 发明申请

US20060260951A1 Full Sequence Metal and Barrier Layer Electrochemical Mechanical Processing 失效
标题翻译：全序列金属和屏障层电化学机械加工
公开(公告)号：US20060260951A1
公开(公告)日：2006-11-23
申请号：US11425682
申请日：2006-06-21
申请人： Feng Liu , Liang-Yuh Chen , Stan Tsai , Yongqi Hu
发明人： Feng Liu , Liang-Yuh Chen , Stan Tsai , Yongqi Hu
IPC分类号： B23H3/02
CPC分类号： B23H5/08 , C25F7/00
摘要： A method and apparatus for electrochemically processing metal and barrier materials is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of establishing an electrically-conductive path through an electrolyte between an exposed layer of barrier material on the substrate and an electrode, pressing the substrate against a processing pad assembly, providing motion between the substrate and pad assembly in contact therewith and electrochemically removing a portion of the exposed layer during a first electrochemical processing step in a barrier processing station.
摘要翻译：提供了一种用于电化学处理金属和阻隔材料的方法和装置。在一个实施例中，用于电化学处理衬底的方法包括以下步骤：在衬底上的暴露的阻挡材料层与电极之间建立通过电解质的导电路径，将衬底压在处理衬垫组件上，所述衬底和焊盘组件与其接触并且在屏障处理站中的第一电化学处理步骤期间电化学去除所述暴露层的一部分。

48. 发明申请

US20060255805A1 Shielded, asymmetric magnets for use in magnetic resonance imaging 有权
标题翻译：用于磁共振成像的屏蔽非对称磁体
公开(公告)号：US20060255805A1
公开(公告)日：2006-11-16
申请号：US11390913
申请日：2006-03-28
申请人： Stuart Crozier , Feng Liu
发明人： Stuart Crozier , Feng Liu
IPC分类号： G01V3/00
CPC分类号： G01R33/3815 , G01R33/381 , G01R33/421
摘要： Magnetic resonance systems are provided which employ a shielded, asymmetric magnet to produce an offset dsv. The magnets include at least a first coil C1, which carries current in a first direction, and two coils C2 and C3, which are located at least in part within the internal envelope EC1 defined by the first coil and which carry current in an opposite direction to the first coil. The magnets are shielded by a shielding coil C4, which carries current in a direction opposite to that of the first coil, and/or a ferromagnetic structure (FS). The magnets can include additional coils, such as a fifth coil C5 at the magnet's distal end. The magnets can be used in, for example, orthopedic imaging.
摘要翻译：提供了使用屏蔽的不对称磁体产生偏移dsv的磁共振系统。磁体包括至少第一线圈C 1，其沿第一方向承载电流，以及两个线圈C 2和C 3 3，其中至少部分地位于由第一线圈限定的内部包络E C1 C1中，并且沿与第一线圈相反的方向承载电流。这些磁体由与第一线圈相反的方向的电流和/或铁磁结构（FS）的屏蔽线圈C 4屏蔽。磁体可以包括附加的线圈，例如磁体远端处的第五线圈C 5。磁体可用于例如矫形成像。

49. 发明授权

US07129073B2 Regulation of neuronal function through metabotropic glutamate receptor signaling pathways 有权
标题翻译：通过代谢型谷氨酸受体信号通路调节神经元功能
公开(公告)号：US07129073B2
公开(公告)日：2006-10-31
申请号：US10175190
申请日：2002-06-18
申请人： Feng Liu , Angus C. Nairn , Paul Greengard
发明人： Feng Liu , Angus C. Nairn , Paul Greengard
IPC分类号： C12N9/12
CPC分类号： C12Q1/485 , G01N2500/00 , G01N2500/04 , G01N2500/10
摘要： The present invention provides methods and compositions for modulating the activities of metabotropic glutamate receptor intracellular signaling molecules. The present invention provides methods and compositions for modulating the activities of casein kinase I and/or cyclin-dependent kinase 5 in cells or tissues. The present invention provides methods of modulating the function of calcium channels in cells or tissues. The present invention provides methods of treating calcium channel dysfunction. The present invention provides methods of identifying agents that modulate the activities of the metabotropic glutamate receptor intracellular signaling molecules casein kinase I and/or cyclin-dependent kinase 5 for use in such treatments.
摘要翻译：本发明提供调节代谢型谷氨酸受体细胞内信号传导分子活性的方法和组合物。本发明提供用于调节细胞或组织中酪蛋白激酶I和/或细胞周期蛋白依赖性激酶5的活性的方法和组合物。本发明提供调节细胞或组织中钙通道功能的方法。本发明提供治疗钙通道功能障碍的方法。本发明提供了鉴定调节代谢型谷氨酸受体细胞内信号传导分子酪蛋白激酶I和/或细胞周期蛋白依赖性激酶5在这种治疗中的活性的方法。

50. 发明申请

US20060219663A1 Metal CMP process on one or more polishing stations using slurries with oxidizers 审中-公开
标题翻译：使用具有氧化剂的浆料在一个或多个抛光站上进行金属CMP处理
公开(公告)号：US20060219663A1
公开(公告)日：2006-10-05
申请号：US11338146
申请日：2006-01-23
申请人： Shi-Ping Wang , Martin Wohlert , Alain Duboust , Renhe Jia , Feng Liu , Yuan Tian , Liang-Yuh Chen , Stan Tsai , Wei-Yung Hsu
发明人： Shi-Ping Wang , Martin Wohlert , Alain Duboust , Renhe Jia , Feng Liu , Yuan Tian , Liang-Yuh Chen , Stan Tsai , Wei-Yung Hsu
IPC分类号： C03C15/00 , H01L21/302 , B44C1/22 , H01L21/461
CPC分类号： H01L21/3212 , C09G1/02 , C23F3/04 , C23F3/06 , H01L21/32125 , H01L21/7684
摘要： Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. In one aspect, a full sequence electrochemical mechanical planarization technique is provided. In another aspect, a hybrid planarization technique using combination of at least one chemical mechanical polishing process and at least one electrochemical mechanical polishing process is provided. In addition, a multi-step polishing process for polishing a substrate surface using at least two oxidizers in one or more polishing composition is described. The polishing composition may be used in the full sequence or the hybrid planarization technique. The polishing compositions and methods described herein improve the effective removal rate of materials from the substrate surface with a reduction in planarization defects.
摘要翻译：提供了抛光组合物和从衬底表面去除导电材料和阻挡材料的方法。一方面，提供了全序列电化学机械平面化技术。在另一方面，提供了使用至少一种化学机械抛光工艺和至少一种电化学机械抛光工艺的组合的混合平面化技术。此外，描述了在一种或多种研磨组合物中使用至少两种氧化剂来研磨衬底表面的多步抛光方法。抛光组合物可以以全序或混合平面化技术使用。本文所述的抛光组合物和方法改善了材料从衬底表面的有效去除速率，同时减小了平坦化缺陷。

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