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41. 发明专利

JP2007329484A Radiation source for lithographic projection apparatus 有权
标题翻译：光栅投影装置的辐射源
公开(公告)号：JP2007329484A
公开(公告)日：2007-12-20
申请号：JP2007155698
申请日：2007-06-12
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： FIEDOROWICZ HENRYK , BIJKERK FREDERIK , DE BRUIJN CORNELIS C , BARTNIK ANDRZEJ , KOSHELEV KONSTANTIN NIKOLAEVIT , BANINE VADIM YEVGENYEVICH
IPC分类号： G21K5/00 , H01L21/027 , B01J19/08 , G03F7/20 , G21K5/08 , H05G2/00 , H05H1/06 , H05H1/24
CPC分类号： H05G2/003 , G03F7/70033
摘要： PROBLEM TO BE SOLVED: To provide an improved plasma source that can be used as a radiation source for a lithographic projection apparatus and emits extreme ultraviolet radiations (EUV). SOLUTION: A radiation source 220 of a radiation system of a lithographic projection apparatus comprises electrodes 221 and 222 generating an electric discharge between them in such a manner that the electric discharge collapses into a pinch volume 229. The collapsing electric discharge generates a high-temperature plasma that is highly ionized in the pinch volume. The working fluid of a supply source 227 is ejected into the pinch volume from an injection nozzle. Thereby, it is raised up to the high-temperature state, and far ultraviolet rays PB are emitted. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可用作光刻投影设备的辐射源并发射极紫外辐射（EUV）的改进的等离子体源。解决方案：光刻投影设备的辐射系统的辐射源220包括电极221和222，它们以这样的方式产生它们之间的放电，使得放电塌陷成压缩体积229.塌陷放电产生在压缩体积中高度电离的高温等离子体。供应源227的工作流体从喷嘴喷射到压缩容积中。由此，升高到高温状态，发出远紫外线PB。版权所有（C）2008，JPO＆INPIT

42. 发明专利

JP2007201438A Radiation source 有权
标题翻译：辐射源
公开(公告)号：JP2007201438A
公开(公告)日：2007-08-09
申请号：JP2006345106
申请日：2006-12-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOSEPHINA MOORS JOHANNES H , BANINE VADIM YEVGENYEVICH , FRANKEN JOHANNES CHRISTIAAN LE , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , STRUYCKEN ALEXANDER MATTHIJS
IPC分类号： H01L21/027 , G01N23/02 , G03F7/20 , G21K1/00 , G21K5/02 , H01J61/20
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide a radiation source capable of short wavelength emission like extreme ultraviolet emission for use by lithography. SOLUTION: This radiation source has rotating electrodes 14, 16 to be immersed in respective tanks 18, 20 for liquid metal like tin. Discharge is caused between the electrodes 14 and 16, resulting in emission. To ensure that pumping is improved to result in low voltage generation in the proximity of discharge for source conversion efficiency improvement, holes are created on a shielding metal plate on the electrodes 14, 16 and/or on the periphery of the electrodes 14, 16. These holes for the electrodes 14, 16 effectively cool the electrodes 14, 16 through liquid metal agitation and electric contact improvement between the electrodes 14, 16 and the liquid metal. This electric contact improvement also lowers the time constant of a discharge circuit, so that the source conversion efficiency is further improved. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够进行短波长发射的辐射源，如通过光刻使用的极紫外发射。
解决方案：该辐射源具有旋转电极14,16，以将其浸入相应的罐18,20中，用于液体金属如锡。在电极14和16之间产生放电，导致发射。为了确保泵送被改善以导致在放电附近的低电压产生以改善源转换效率，在电极14,16上的屏蔽金属板上和/或电极14,16的外围产生孔。用于电极14,16的这些孔通过液体金属搅拌和电极14,16与液态金属之间的电接触改善来有效地冷却电极14,16。这种电接触改善也降低了放电电路的时间常数，从而进一步提高了源极转换效率。版权所有（C）2007，JPO＆INPIT

43. 发明专利

JP2007189219A Optical apparatus, lithography apparatus, and method for manufacturing device 有权
标题翻译：光学装置，光刻设备和制造装置的方法
公开(公告)号：JP2007189219A
公开(公告)日：2007-07-26
申请号：JP2006342131
申请日：2006-12-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MOORS JOHANNES H J , BANINE VADIM YEVGENYEVICH , WOLSCHRIJN BASTIAAN T , ANTONIUS SPEE CAROLUS I M , JANSEN RIK
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/2043 , G03F7/70041 , G03F7/70925
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for preventing deterioration of an optical element in a pulse radiation beam optical apparatus.
SOLUTION: The optical apparatus includes: an irradiation system configured so as to form a pulse radiation beam; an optical element equipped with a surface that the radiation beam enters during operation; and a gas source configured so as to supply a mixture of a first type gas and a second type gas to a space adjacent to the surface. The particles of the first and second type gases are enabled to react with the surface when activated by the radiation beam. The gas source is configured so as to generate a combination of surface occupation numbers NI, NII of the molecules of the first and second type gases on the surface under the condition of operation at least before the pulse of the radiation beam, and the combination of the surface occupation numbers NI, NII is in a safety region S in which the reactions of the particles with the surface during the pulses of the radiation beam are in majority reversed.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于防止脉冲辐射束光学装置中的光学元件的劣化的方法和装置。解决方案：光学装置包括：被配置为形成脉冲辐射束的照射系统; 配备有在操作期间辐射束进入的表面的光学元件; 以及气源，其被配置为将第一类型气体和第二类型气体的混合物供应到与表面相邻的空间。当由辐射束激活时，第一和第二类气体的颗粒能够与表面反应。气源被配置为在至少在辐射束的脉冲之前的操作条件下产生表面上的第一和第二类型气体的分子的表面占有数量NI，NII的组合，以及表面占有数NI，NII处于安全区域S，其中在辐射束的脉冲期间颗粒与表面的反应多数反转。版权所有（C）2007，JPO＆INPIT

44. 发明专利

JP2007013167A Lithography equipment, radiation system, and device manufacturing method 有权
标题翻译：光刻设备，辐射系统和器件制造方法
公开(公告)号：JP2007013167A
公开(公告)日：2007-01-18
申请号：JP2006178866
申请日：2006-06-29
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： GAYAZOV ROBERT R , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR V , KOROB EVGENII D , KOSHELEV KONSTANTIN N , ZUKAVISHVILI GIVI GEORGIEVITCH , SIDELNIKOV YURII V
IPC分类号： H01L21/027
CPC分类号： G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide lithography equipment including a contamination-resistant barrier or a wheel trap, which suppresses charged particles in the form of plasma moving with a radiating beam, and ions moving in front of or at the back of such plasma.
SOLUTION: The wheel trap is arranged in a path of the radiant beam. The wheel trap includes an array of conductive strips 34. A voltage-applying circuit is connected to the strips 34 to apply a voltage difference between adjoining strip couples of the strips 34. The voltage-applying circuit includes a current-limiting circuit constituted so that the current to the strips 34 is limited to a value lower than the threshold, at which self-sustained arc discharge is be caused in the wheel trap.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供包括耐污染屏障或轮捕集器的光刻设备，其抑制以等离子体以辐射束移动的形式的带电粒子，以及在其前面或后面移动的离子等离子体。
解决方案：车轮收集器布置在辐射束的路径中。车轮收集器包括导电条34阵列。电压施加电路连接到条带34上，以在条带34的相邻带状条之间施加电压差。电压施加电路包括限流电路，到条带34的电流被限制在低于在车轮捕集器中引起自持电弧放电的阈值的值。版权所有（C）2007，JPO＆INPIT

45. 发明专利

JP2005005713A Lithography apparatus and method of manufacturing device 有权
标题翻译：平面设备及其制造方法
公开(公告)号：JP2005005713A
公开(公告)日：2005-01-06
申请号：JP2004172029
申请日：2004-06-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： DE SMIT JOANNES THEODOOR , BANINE VADIM YEVGENYEVICH , BISSCHOPS THEODORUS HUBERTUS J , MODDERMAN THEODORUS MARINUS , DIERICHS MARCLE MATHIJS T M
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： PROBLEM TO BE SOLVED: To enhance imaging performance of an apparatus which has a liquid filling a space between the final element of a projection system and a substrate. SOLUTION: A lithography apparatus and a method of manufacturing device use a liquid of a large index of refraction which fills at least a part of a imaging region between the final element of a projection lens and the substrate and is trapped in a liquid trap 13. Bubbles produced in the liquid, which is resulted from a dissolved atmosphere gas or is resulted from a gas discharged from the apparatus element exposed to the liquid, are detected and removed so as to prevent the bubbles from interfering with the exposure and from causing a baking defect. The detection can be carried out by measuring the frequency dependence of damping of the ultrasonic wave. The bubbles can be removed through a process that the liquid is degased and pressurized, the liquid is isolated from the atmosphere, a liquid of low surface tension is used, a continuous liquid flow passing the imaging region, and a node of an ultrasonic stationary wave is shifted. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了增强具有液体填充投影系统的最终元件和基板之间的空间的装置的成像性能。解决方案：光刻设备和制造方法使用大折射率的液体，其填充投影透镜的最终元件和基板之间的成像区域的至少一部分并被捕获在液体中在液体中产生的气泡，其由溶解的气氛气体产生，或者是从暴露于液体的装置元件排出的气体产生的气泡被检测和去除，以防止气泡与曝光和造成烘烤缺陷。可以通过测量超声波阻尼的频率依赖性来进行检测。可以通过将液体脱气加压，液体与大气隔离的方法除去气泡，使用低表面张力的液体，通过成像区域的连续的液体流，以及超声波固定波的节点被转移版权所有（C）2005，JPO＆NCIPI

46. 发明专利

JP2003007611A Lithographic projection system, method of manufacturing element, and element manufactured by the method 有权
标题翻译：光刻投影系统，制造元件的方法和由方法制造的元件
公开(公告)号：JP2003007611A
公开(公告)日：2003-01-10
申请号：JP2002001119
申请日：2002-01-08
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： KOSTER NORBERTUS BENEDICTUS , MERTENS BASTIAAN MATTHIAS , LEENDERS MARTINUS HENDRIKUS AN , IVANOV VLADIMIR VITAL EVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , BANINE VADIM YEVGENYEVICH
IPC分类号： B03C3/38 , G03F7/20 , H01J27/02 , H01J37/08 , H01L21/027
CPC分类号： G03F7/70908 , G03F7/70916 , G03F7/70933
摘要： PROBLEM TO BE SOLVED: To remove unwanted contaminants generated by a radiation source. SOLUTION: Contaminant particles which move together with a projected beam are ionized. A purge gas can be attracted toward a gettering plate provided on the upstream of a purge gas supply source. The ionization of the purge gas is improved, by enclosing electrons generated by an ionizing device by means of a magnetic field. The contaminant particles can be ionized, by generating a plasma in a pipe having a larger length than its width.
摘要翻译：要解决的问题：去除由辐射源产生的不需要的污染物。解决方案：与投射光束一起移动的污染物颗粒被电离。净化气体可以被吸引到设置在净化气体供应源的上游的吸气板。吹扫气体的电离通过用磁场封闭由电离装置产生的电子而得到改善。可以通过在具有比其宽度更大的长度的管中产生等离子体来使污染物颗粒离子化。

47. 发明专利

JP2012227528A Heat adjusting system and heat adjusting method for adjusting one part of lithographic device 有权
标题翻译：用于调整一部分光刻设备的热调节系统和热调节方法
公开(公告)号：JP2012227528A
公开(公告)日：2012-11-15
申请号：JP2012092233
申请日：2012-04-13
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： LAMBERTUS DONDERS SJOERD NICOLAAS , BANINE VADIM YEVGENYEVICH , MOORS JOHANNES HUBERTUS JOSEPHINA , VERHAGEN MARTINUS CORNELIS MARIA , OLAV WALDEMAR VLADIMIR FRIJNS , VAN DONK GERRIT , HENK JAN VAN GERNER
IPC分类号： H01L21/027
CPC分类号： G03F7/70858 , F28D15/0266
摘要： PROBLEM TO BE SOLVED: To provide a heat adjusting system capable of using a small cooling flow path with improved cooling efficiency.SOLUTION: A two-phase heat adjusting system includes an evaporator 3 thermally contacting one part 1 of a lithographic device and extracting heat from one part by evaporating a fluid inside the evaporator; a condenser 5 for removing heat by condensing the fluid inside the condenser; fluid lines 7, 8 arranged between the evaporator 3 and the condenser 5; a pump 14 for circulating the fluid in a circuit; an accumulator 16 constituted to hold the fluid and having a heat exchanger 18 fluid-communicated with the circuit and transmitting heat between the circuit and the fluid inside the heat exchanger; a temperature sensor 23 constituted to provide measurement signals indicating a temperature of the fluid; and a control device 27 constituted to maintain a substantially constant temperature of the fluid inside the circuit by adjusting an amount of heat transmitted by the heat exchanger 18 between the it and the fluid inside the accumulator based on the measurement signals.
摘要翻译：要解决的问题：提供一种能够使用具有提高的冷却效率的小型冷却流路的热调节系统。解决方案：两相热调节系统包括蒸发器3，其与光刻设备的一部分1热接触并且通过蒸发蒸发器内的流体从一部分提取热量; 用于通过冷凝器内的流体冷凝来除热的冷凝器5; 布置在蒸发器3和冷凝器5之间的流体管线7,8; 用于使流体在回路中循环的泵14; 储液器16构造成保持流体并具有与回路流体连通的热交换器18，并在回路和热交换器内的流体之间传递热量; 构成为提供表示流体温度的测量信号的温度传感器23; 以及控制装置27，其通过基于测量信号调节由蓄热器内的热交换器18和蓄液器内的流体之间传递的热量，来维持电路内的流体的基本恒定的温度。版权所有（C）2013，JPO＆INPIT

48. 发明专利

JP2012028813A Apparatus for trapping contaminant 有权
标题翻译：捕捉污染物的装置
公开(公告)号：JP2012028813A
公开(公告)日：2012-02-09
申请号：JP2011231451
申请日：2011-10-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： JOHANNES CHRISTIAAN LEONARDUS FRANKEN , BANINE VADIM YEVGENYEVICH , WASSINK ARNOLD CORNELIS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916 , B82Y10/00 , F16C32/0603 , F16C32/0685 , F16C33/02 , F16C33/72 , F16C2300/62 , G03F7/70033 , G03F7/70941
摘要： PROBLEM TO BE SOLVED: To provide an apparatus and a method comprising an improved debris mitigation system.SOLUTION: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are substantially in parallel with the direction of propagation of the radiation beam, the rotor including electrically chargeable material and being electrically charged as a result of the operation of the radiation source; and a bearing rotatably holding the rotor with respect to a rotor carrying structure. The apparatus is configured to (i) control or redirect electrical discharge of the rotor, or (ii) suppress electrical discharge of the rotor, or (iii) both (i) and (ii).
摘要翻译：要解决的问题：提供一种包括改进的碎片减轻系统的装置和方法。公开了一种布置在辐射束的路径中的污染捕集装置，用于捕获从被配置成产生辐射束的辐射源发出的污染物。污染物捕集装置包括具有多个通道形成元件的转子，该多个通道形成元件限定与辐射束的传播方向基本上平行的通道，转子包括可充电的材料并且由于辐射的操作而带电资源; 以及相对于转子承载结构可旋转地保持转子的轴承。该装置被配置为（i）控制或改变转子的放电，或（ii）抑制转子的放电，或（iii）（i）和（ii）两者。版权所有（C）2012，JPO＆INPIT

49. 发明专利

JP2011103448A Imprint lithography device 有权
标题翻译： IMPRINT LITHOGRAPHY设备
公开(公告)号：JP2011103448A
公开(公告)日：2011-05-26
申请号：JP2010211472
申请日：2010-09-22
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DEN BOEF ARIE JEFFREY , BANINE VADIM YEVGENYEVICH , JEUNINK ANDRE BERNARDUS , WUISTER SANDER FREDERIK , KRUIJT-STEGEMAN YVONNE WENDELA
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： PROBLEM TO BE SOLVED: To align patterns with enough accuracy to each other in an imprint lithography device. SOLUTION: A method of determining an offset between an imprint template 21 and a substrate 20 by using an alignment grating 24 on the imprint template 21 and an alignment grating 23 on the substrate 20 is disclosed. The method includes bringing the imprint template alignment grating 24 and the substrate alignment grating 23 sufficiently close together such that they form a composite grating, guiding an alignment radiation beam to the composite grating while modulating the relative position of the imprint template 21 and the substrate 20, detecting a luminous intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing the modulation of the detected luminous intensity. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：在压印光刻设备中使图案彼此之间具有足够的精度。公开了一种通过使用压印模板21上的对准光栅24和衬底20上的对准光栅23来确定压印模板21和衬底20之间的偏移的方法。该方法包括使压印模板对准光栅24和衬底对准光栅23足够靠近在一起，使得它们形成复合光栅，将对准辐射束引导到复合光栅，同时调制压印模板21和衬底20的相对位置检测从复合光栅反射的对准辐射的发光强度，并通过分析所检测的发光强度的调制来确定偏移。版权所有（C）2011，JPO＆INPIT

50. 发明专利

JP2011082551A Lithographic apparatus comprising electrical discharge generator and method for cleaning element of lithographic apparatus 有权
标题翻译：包含电力放电发生器的平台设备和清洁光刻设备元件的方法
公开(公告)号：JP2011082551A
公开(公告)日：2011-04-21
申请号：JP2010270657
申请日：2010-12-03
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： RAKHIMOVA TATYANA V , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVITCH , MOORS JOHANNES HUBERTUS JOSEPHINA , KOVALEV ALEKSANDER S , LOPAEV DMITRIY VICTOROVICH
IPC分类号： H01L21/027
CPC分类号： G03F7/70925 , G03F7/70933 , G21K2201/06
摘要： PROBLEM TO BE SOLVED: To provide a method for cleaning elements of a lithographic device, for example, optical elements such as a collector mirror. SOLUTION: The method for cleaning the elements includes the steps of: providing a gas 155 containing nitrogen; generating nitrogen radicals from at least a part of the gas, thereby forming a radical containing gas 165; and providing at least a part of the radical containing gas to the one or more elements 100 of the apparatus. The lithographic apparatus includes a source and an optical element 100, and an electrical discharge generator 200 arranged so as to generate a radio frequency discharge. COPYRIGHT: (C)2011,JPO&INPIT

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