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    • 41. 发明申请
    • Torque sensor
    • 扭矩传感器
    • US20070012122A1
    • 2007-01-18
    • US11390122
    • 2006-03-28
    • Toshimichi MatsusakiTatsuya OhtakaKouichi SatoYukio Ikeda
    • Toshimichi MatsusakiTatsuya OhtakaKouichi SatoYukio Ikeda
    • G01N19/08
    • G01L3/104
    • A torque sensor 1 is provided with two shafts 3, 4 (input shaft 3 and output shaft 4) which constitute a shaft member 2, which is a torque detection object, an elastic member 5 which connects the shafts 3 and 4 coaxially, and a torsion angle of the elastic member 5 is detected as a torque which affects on the shaft member 2. The torque sensor 1 is provided with a hard magnetic member 6 which generates a magnetic flux therearound, a pair of first soft magnetic members 7, 8 which constitute a first magnetic circuit H1 together with the hard magnetic member 6 to change a reluctance by torsion of the elastic member 5, a pair of second soft magnetic members 9, 10 which constitute a second magnetic circuit H2 together with the hard magnetic member 6 to keep the reluctance constant, and a flux detection means 12 which detects a flux density of the second magnetic circuit H2 that varies in accordance with a torsion angle of the elastic member 5.
    • 扭矩传感器1设置有构成转矩检测对象的轴构件2,同轴地连接轴3和4的弹性构件5的两个轴3,4(输入轴3和输出轴4)和 检测弹性构件5的扭转角作为影响轴构件2的扭矩。扭矩传感器1设置有产生磁通的硬磁性构件6,一对第一软磁性构件7,8 与硬磁体6一起构成第一磁路H 1,以通过弹性部件5的扭转改变磁阻,构成第二磁路H 2的一对第二软磁体9,10与硬磁性体 6以保持磁阻恒定;以及磁通检测装置12,其检测根据弹性构件5的扭转角度变化的第二磁路H 2的磁通密度。
    • 46. 发明授权
    • Manufacturing multiple layered structures of large scale integrated semiconductor devices
    • 制造大规模集成半导体器件的多层结构
    • US06194318B1
    • 2001-02-27
    • US09309252
    • 1999-05-10
    • Yukio Ikeda
    • Yukio Ikeda
    • H01L21311
    • H01L23/5258H01L2924/0002H01L2924/00
    • A process of making a multiple layered structure comprises etching at least partially a portion of dielectric material above a fuse upon etching at least one hole to establish electrical interconnection between the adjacent two wiring layers separated by the dielectric material. After forming a protective film, a portion of the protective film above the fuse is etched upon etching at least one aperture to expose a pad of one of the wiring layers underneath the protective film. The remaining material above the fuse is removed by etching using the same mask as etching the at least one aperture through the protective film. Electrical testing is conducted using an electrical probe at the pad. In response to result of the electrical testing, laser energy is focused to a target fuse.
    • 制造多层结构的工艺包括在蚀刻至少一个孔以至在由电介质材料隔开的相邻的两个布线层之间形成电互连的情况下,至少部分地在保险丝上方蚀刻一部分介电材料。 在形成保护膜之后,在蚀刻至少一个孔之后蚀刻保险丝上方的保护膜的一部分,以暴露保护膜下面的布线层之一的焊盘。 通过使用与通过保护膜蚀刻至少一个孔的相同掩模的蚀刻来去除熔丝之上的剩余材料。 在焊盘上使用电探针进行电气测试。 响应于电气测试的结果,激光能量聚焦到目标保险丝。