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    • 47. 发明申请
    • FULL COLOR DISPLAY
    • 全彩色显示
    • US20100112736A1
    • 2010-05-06
    • US12568620
    • 2009-09-28
    • Michael LebbyVijit SabnisPetar B. Atanackovic
    • Michael LebbyVijit SabnisPetar B. Atanackovic
    • H01L21/18H01L33/00
    • H01L27/156H01L33/105H01L33/343H01L33/44
    • A full color display comprising a red, a green, and a blue light emitting diode, each light emitting diode including a light emitting region having at least one layer of single crystal rare earth material, the rare earth material in each of the light emitting diodes having at least one radiative transition, and the rare earth material producing a radiation wavelength of approximately 640 nm in the red light emitting diode, 540 nm in the green light emitting diode, and 460 nm in the blue light emitting diode. Generally, the color of each LED is determined by selecting a rare earth with a radiative transition producing a radiation wavelength at the selected color. In cases where the rare earth has more than one radiative transition, tuned mirrors can be used to select the desired color.
    • 包括红色,绿色和蓝色发光二极管的全色显示器,每个发光二极管包括具有至少一层单晶稀土材料的发光区域,每个发光二极管中的稀土材料 具有至少一个辐射跃迁,并且在红色发光二极管中产生约640nm的发射波长的稀土材料,绿色发光二极管中的540nm,以及蓝色发光二极管中的460nm。 通常,通过选择具有产生所选颜色的辐射波长的辐射跃迁的稀土来确定每个LED的颜色。 在稀土具有多于一个辐射跃迁的情况下,可以使用调整后的反射镜来选择所需的颜色。
    • 49. 发明申请
    • STACKED TRANSISTORS AND PROCESS
    • 堆叠晶体管和工艺
    • US20090291535A1
    • 2009-11-26
    • US12534011
    • 2009-07-31
    • Petar B. AtanackovicMichael Lebby
    • Petar B. AtanackovicMichael Lebby
    • H01L29/786
    • H01L21/8221H01L21/823807H01L21/823878H01L21/84H01L27/0688H01L27/1203
    • A method of horizontally stacking transistors on a common semiconductor substrate is initiated by providing a single crystal, generally silicon, semiconductor substrate. A plurality of transistors are formed on the single crystal semiconductor substrate and encapsulated in an insulating layer, such as silicon dioxide. One or more openings are formed through the insulating layer between the plurality of transistors so as to expose a surface of the single crystal semiconductor substrate. A layer of single crystal rare earth insulator material is epitaxially grown on the exposed surface of the single crystal semiconductor substrate. A layer of single crystal semiconductor material, generally silicon, is epitaxially grown on the layer of single crystal rare earth insulator material. An intermixed transistor is formed on the layer of single crystal semiconductor material.
    • 在公共半导体衬底上水平堆叠晶体管的方法是通过提供单晶体,一般为硅的半导体衬底来启动的。 在单晶半导体基板上形成多个晶体管,并封装在二氧化硅等绝缘层中。 通过多个晶体管之间的绝缘层形成一个或多个开口,以暴露单晶半导体衬底的表面。 在单晶半导体衬底的暴露表面上外延生长单晶稀土绝缘体材料层。 在单晶稀土绝缘体材料层上外延生长单层半导体材料(通常为硅)层。 在单晶半导体材料层上形成混合晶体管。