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41. 发明授权

US4585834A Silicon-containing step ladder polymer and a process for producing the same 失效
标题翻译：含硅阶梯聚合物及其制造方法
公开(公告)号：US4585834A
公开(公告)日：1986-04-29
申请号：US758367
申请日：1985-07-24
申请人： Shiro Konotsune , Hiromi Higashi , Masami Wada , Hiroshi Maehara , Kazuyuki Tsuji
发明人： Shiro Konotsune , Hiromi Higashi , Masami Wada , Hiroshi Maehara , Kazuyuki Tsuji
IPC分类号： C08F8/42 , C08F8/40
CPC分类号： C08F8/42
摘要： A silicon-containing step ladder polymer comprising a unit represented by the following general formula (I): ##STR1## a unit represented by the following general formula (II): ##STR2## and a unit represented by the following general formula (III): ##STR3## where R.sup.1 represents a hydrocarbon or fluorine-substituted hydrocarbon group, R.sup.2 represents hydrogen or a trialkyl siloxy group, and R.sup.3 and R.sup.4 which may be identical or different with each other represent individually hydrocarbon or fluorine-substituted hydrocarbon groups, the molar ratio of the unit (I) to the unit (II) is between 5:1-100:1 and the molar ratio of the unit (III) to the total amount of the unit (I)+unit (II) is between 1:5-1:100, as well as a process for producing such polymer.
摘要翻译：一种含硅梯形聚合物，其包含由以下通式（I）表示的单元：（I）由以下通式（II）表示的单元：由下式（I）表示的单元：（III）：其中R 1表示烃或氟取代的烃基，R 2表示氢或三烷基甲硅烷氧基，R 3和R 4可以相同或不同，表示单独的烃或氟取代的烃基，单元（I）与单元（II）的摩尔比为5:1-1:1:1，单元（III）与单元（I）的总量的摩尔比）+单元（II）在1：5-1：100之间，以及制备这种聚合物的方法。

42. 发明申请

US20110299046A1 LAMP UNIT AND PROJECTOR EMPLOYING SAME 有权
标题翻译：灯泡单元和投影仪使用相同
公开(公告)号：US20110299046A1
公开(公告)日：2011-12-08
申请号：US13091670
申请日：2011-04-21
申请人： Hiroshi MAEHARA , Hiroyuki Inoue , Hideharu Saito , Takashi Omori
发明人： Hiroshi MAEHARA , Hiroyuki Inoue , Hideharu Saito , Takashi Omori
IPC分类号： G03B21/16
CPC分类号： G03B21/16 , F21V29/67
摘要： Cooling air conveyed through a cooling duct 3 is supplied to a discharge lamp 10 via a cooling air exit 21 having a plurality of flow paths 23a to 23c partitioned by a partition plate 22. An air flow direction changeover section 24 changes a flow path through which the discharge lamp is supplied with the cooling air from the cooling air exit. An air flow blocking ball 25 in the air flow direction changeover section moves by its own weight through a guide portion 26 to thereby block the flow path of the cooling air exit. This allows the cooling air to be directed specifically toward an upper side 11a in a direction of gravity of a lamp bulb of the discharge lamp to eliminate a temperature difference, even if a mounting style of the discharge lamp is varied among desk mounting, ceiling mounting, and vertical mounting.
摘要翻译：通过冷却管道3输送的冷却空气经由具有由隔板22分隔的多个流路23a〜23c的冷却风出口21供给到放电灯10.空气流动方向切换部24改变流路，放电灯从冷却空气出口被供给冷却空气。空气流动方向切换部分中的气流阻塞球25通过引导部分26自身移动，从而阻挡冷却空气出口的流动路径。由此，即使在台式安装，天花板安装之间，放电灯的安装方式不同，也可以将冷却空气朝着放电灯的灯泡的重力方向的上侧11a朝向上侧11a排除温度差，垂直安装。

43. 发明授权

US07019043B2 Decomposable resin composition and method for producing the same 失效
公开(公告)号：US07019043B2
公开(公告)日：2006-03-28
申请号：US10611949
申请日：2003-07-03
申请人： Hiroshi Maehara
发明人： Hiroshi Maehara
IPC分类号： C08J3/00 , C09F2/46
CPC分类号： C08J11/12 , C08G63/672 , C08G63/916 , C08J2367/04 , C08K5/0033 , Y02W30/703 , C08L67/00
摘要： The invention provides a decomposable resin composition, which is stable at the time of use and which quickly decomposes when discarded. According to the present invention, there is provided a resin composition comprising an agent generating an acid or a base upon response to light or heat together with a hydrolyzable and biodegradable resin. The decomposable resin composition can promote decomposition of the polymer by generating an acid or a base in the resin by carrying out light irradiation and/or a heat treatment at a desired time and can control the decomposition speed of the polymer by controlling the generation amount of an acid or a base.

44. 发明申请

US20060030675A1 Recyclable polymer and process for production thereof 失效
标题翻译：可回收聚合物及其生产方法
公开(公告)号：US20060030675A1
公开(公告)日：2006-02-09
申请号：US11246110
申请日：2005-10-11
申请人： Hiroshi Maehara , Chieko Mihara , Yoshihiko Kikuchi
发明人： Hiroshi Maehara , Chieko Mihara , Yoshihiko Kikuchi
IPC分类号： C08C19/22 , C08F110/00
CPC分类号： C08J11/10 , C08F8/14 , C08F8/32 , C08F2810/40 , C08G81/021 , Y02W30/702 , C08F112/08
摘要： A novel resin is provided which is renewable with less energy. A process for renewing the resin is also provided. The present invention includes a polymer having the repeating unit represented by Structural Formula (1) below, and a process for producing the polymer: [—P1—R—]n (1). In the formula, P1 indicates an addition polymer moiety having a continuous hydrocarbon chain as the skeleton containing no condensation system, and is a polymer or oligomer prepared by addition polymerization of one or more monomers having a double bond; R indicates a linking group constituted of a condensation system for linking the polymer moieties P; and n is a number of repeating units and is an integer of 2 or more.
摘要翻译：提供了一种新型树脂，可以以更少的能量再生。还提供了更新树脂的方法。本发明包括具有下述结构式（1）表示的重复单元的聚合物和聚合物的制备方法：[-P R - ] n < （1）。在该式中，P 1'表示具有连续烃链作为不含缩合体系的骨架的加成聚合物部分，是通过一种或多种具有双键的单体的加成聚合制备的聚合物或低聚物 ; R表示由用于连接聚合物部分P的缩合体系构成的连接基团; n为重复单元数，为2以上的整数。

45. 发明授权

US06829091B2 Optical system and optical instrument with diffractive optical element 失效
$Optical system and optical instrument with diffractive optical element$
标题翻译：具有衍射光学元件的光学系统和光学仪器
公开(公告)号：US06829091B2
公开(公告)日：2004-12-07
申请号：US09362698
申请日：1999-07-29
申请人： Takashi Kato , Kenji Saitoh , Hiroshi Maehara , Makoto Ogusu , Keiko Chiba
发明人： Takashi Kato , Kenji Saitoh , Hiroshi Maehara , Makoto Ogusu , Keiko Chiba
IPC分类号： G02B518
CPC分类号： G02B5/1814 , G02B5/1838 , G02B5/1857 , G02B5/1895 , G02B7/00 , G02B27/4222 , G03F7/70316 , G03F7/70825
摘要： An optical system for forming an image of an object. The optical system includes an optical element, which is deformed by the weight thereof, and at least one optical member for preventing a change in optical performance of the optical system due to deformation of the optical element, when the optical element is provided in the optical system.
摘要翻译：一种用于形成物体的图像的光学系统。该光学系统包括光学元件，该光学元件由于其重量而变形，并且至少一个光学构件用于防止当光学元件设置在光学元件中时由于光学元件的变形而导致的光学系统的光学性能的变化系统。

46. 发明授权

US06476968B1 Optical element 失效
标题翻译：光学元件
公开(公告)号：US06476968B1
公开(公告)日：2002-11-05
申请号：US09672316
申请日：2000-09-29
申请人： Hideo Kato , Hiroshi Maehara
发明人： Hideo Kato , Hiroshi Maehara
IPC分类号： G02B2744
CPC分类号： G02B5/1876 , G02B1/02
摘要： Disclosed is an optical element including a substrate made of a monocrystal of a fluoride compound, and a fine structure formed on the substrate and made of a non-monocrystal of metal fluoride. Also disclosed are an optical system having such optical element, and an exposure apparatus having such optical system incorporated therein.
摘要翻译：公开了一种光学元件，包括由氟化物的单晶制成的基板和形成在基板上并由金属氟化物的非单晶构成的微细结构。还公开了具有这种光学元件的光学系统，以及其中并入有这种光学系统的曝光装置。

47. 发明授权

US06337161B2 Mask structure exposure method 有权
标题翻译：面膜结构曝光方法
公开(公告)号：US06337161B2
公开(公告)日：2002-01-08
申请号：US09161372
申请日：1998-09-28
申请人： Keiko Chiba , Hideo Kato , Hiroshi Maehara
发明人： Keiko Chiba , Hideo Kato , Hiroshi Maehara
IPC分类号： G03F900
CPC分类号： G03F1/22 , G03F1/62
摘要： A mask structure to be used for X-ray exposure or the like in manufacturing semiconductor devices prevents contaminants from adhering and accumulating on the surface of a mask, thereby extending the life of the mask. In this mask structure, titanium oxide films are formed on front and back pellicles that protect a mask, composed of a support film and an X-ray absorber, from dust or the like. Titanium oxide decomposes contaminants by functioning as a photocatalyst, and prevents the adhesion and accumulation of contaminants by an antistatic function based on photoconductivity. When a titanium oxide film is formed on the surface of the mask itself, it is preferable that the film be formed outside the exposure area or the like.
摘要翻译：在制造半导体器件中用于X射线曝光等的掩模结构防止污染物粘附并积聚在掩模的表面上，从而延长掩模的使用寿命。在该掩模结构中，在保护由支撑膜和X射线吸收体构成的掩模的灰尘等上的前面和后面防护薄膜上形成氧化钛膜。氧化钛通过作为光催化剂起作用来分解污染物，并且通过基于光电导性的抗静电功能来防止污染物的粘附和积累。当在掩模本身的表面上形成氧化钛膜时，优选将膜形成在曝光区域等之外。

48. 发明授权

US6101237A X-ray mask and X-ray exposure method using the same 失效
标题翻译： X射线掩模和使用其的X射线曝光方法
公开(公告)号：US6101237A
公开(公告)日：2000-08-08
申请号：US917854
申请日：1997-08-27
申请人： Takeshi Miyachi , Keiko Chiba , Hiroshi Osawa , Koichi Sentoku , Hiroshi Maehara
发明人： Takeshi Miyachi , Keiko Chiba , Hiroshi Osawa , Koichi Sentoku , Hiroshi Maehara
IPC分类号： G03F1/22 , G03F1/62 , G03F7/20 , G21K1/10 , G21K5/00
CPC分类号： G03F1/22 , G03F1/62 , G03F7/70691 , G21K1/10
摘要： An X-ray mask includes a holding frame, a membrane held by the holding frame, a pattern formed on a surface of the membrane by an X-ray absorptive material, the surface being disposed opposed to a workpiece to which the pattern is to be transferred when the mask is mounted in an exposure apparatus, a member for reinforcing the holding frame and having a portion placed closer to the workpiece than to the membrane and a pellicle provided at a side where the pattern is formed, the pellicle being attached to the portion of the member so that the pellicle is placed at the workpiece side of the membrane.
摘要翻译： X射线掩模包括保持框架，由保持框架保持的膜，通过X射线吸收材料形成在膜的表面上的图案，该表面设置成与图案所在的工件相对当掩模安装在曝光装置中时转印，用于加强保持框架并且具有比膜更靠近工件的部分的膜和设置在图案形成侧的防护薄膜组件，防护薄膜组件附接到部件，使防护薄膜组件放置在膜的工件侧。

49. 发明授权

US5593800A Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus 失效
标题翻译：掩模制造方法和使用由该方法或装置制造的掩模的装置和装置制造方法
公开(公告)号：US5593800A
公开(公告)日：1997-01-14
申请号：US367856
申请日：1995-01-03
申请人： Hidehiko Fujioka , Noriyuki Nose , Ryuichi Ebinuma , Shinichi Hara , Hiroshi Maehara
发明人： Hidehiko Fujioka , Noriyuki Nose , Ryuichi Ebinuma , Shinichi Hara , Hiroshi Maehara
IPC分类号： G03F1/00 , G03F1/22 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70475 , G03F1/22 , G03F7/70358
摘要： A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.
摘要翻译：掩模制造方法包括：通过第一阶段保持具有图案的主掩模版，通过第二阶段保持掩模基板，将曝光光束投射到由第一平台保持的主光栅的图案上，并将图案投影到掩模上基板以预定的缩小倍率保持第二阶段，并以定时关系和预定的速度比扫描第一和第二阶段，从而将主标线的图案转印到掩模基板。

50. 发明授权

US5553110A X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method 失效
标题翻译： X射线掩模结构，其制造方法，用X射线掩模结构X射线曝光的装置和方法以及通过X射线曝光方法制造的半导体器件
公开(公告)号：US5553110A
公开(公告)日：1996-09-03
申请号：US345395
申请日：1994-11-18
申请人： Koichi Sentoku , Kenji Saito , Keiko Chiba , Hiroshi Maehara
发明人： Koichi Sentoku , Kenji Saito , Keiko Chiba , Hiroshi Maehara
IPC分类号： G03F7/20 , C30B33/00 , G03F1/22 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L39/00
CPC分类号： G03F1/22 , Y10S430/167 , Y10S430/168
摘要： An X-ray mask structure for X-ray lithography comprises a pattern, an X-ray transmissive film for holding the pattern, and a frame for supporting the X-ray transmissive film, wherein a light-scattering prevention film is formed on at least a part of the surface of the X-ray transmissive film and/or of the pattern, and the light scattering prevention film may be a flat coating film formed on at least one of the top face and the back face of the X-ray transmissive film and having a refractive index substantially equal to the refractive index of the X-ray transmissive film. A process for producing the X-ray mask structure comprises steps of forming a flat coating film having a refractive index substantially the same as that of the X-ray transmissive film on at least one of the top face and the back face of the X-ray transmissive film, and forming a pattern at least on the top face of the X-ray transmissive film. An X-ray exposure apparatus comprises an X-ray source, and the X-ray mask structure, and conducts transcription of the pattern formed on the x-ray mask structure onto a transcription-receiving member by projecting X-rays through the X-ray mask structure to the transcription receiving member.
摘要翻译：用于X射线光刻的X射线掩模结构包括图案，用于保持图案的X射线透射膜和用于支撑X射线透射膜的框架，其中至少形成光散射防止膜 X射线透过膜表面的一部分和/或图案的一部分，光散射防止膜可以是形成在X射线透射性的上表面和背面的至少一面上的平坦的涂膜并且具有基本上等于X射线透射膜的折射率的折射率。一种X射线掩模结构体的制造方法，其特征在于，在上述X射线掩模结构的上表面和背面的至少一面上，形成与X射线透过膜的折射率基本相同的折射率的平面涂膜，并且至少在X射线透射膜的顶面上形成图案。 X射线曝光装置包括X射线源和X射线掩模结构，并且通过X射线X射线透过X射线掩模结构将X射线掩模结构上形成的图案转印到转录接收部件上，射线掩模结构。

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