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31. 发明公开

EP0996142A2 Electron-beam lithography method and electron-beam lithography system 审中-公开
标题翻译：电子束光刻法和电子束光刻设备
公开(公告)号：EP0996142A2
公开(公告)日：2000-04-26
申请号：EP99119095.0
申请日：1999-10-04
申请人： Advantest Corporation
发明人： Kawakami, Kenichi
IPC分类号： H01J37/317 , H01J37/304
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J2237/30455 , H01J2237/31766
摘要： Disclosed are an electron-beam lithography method and system having precision in exposure improved by correcting a beam drift even within the same column of chips, and an electron-beam lithography system having the frequency of correcting a beam drift minimized without causing degradation of precision. In the electron-beam lithography method and electron-beam lithography system, a beam drift is measured frequently. When a beam drift is measured during exposure of each column of chips, a positional deviation is not corrected at the time but is corrected, step by step, while a plurality of stripes is defined. It is thus prevented that a misalignment between adjoining stripes gets larger. Moreover, a beam drift is measured a plurality of times in order to measure a variation in beam drift. If a beam drift is small, a measurement interval is extended. If a beam drift is large, the measurement interval is shortened.

32. 发明公开

EP0936505A1 METHOD OF PRODUCING PHASE MASK FOR FABRICATING OPTICAL FIBER AND OPTICAL FIBER WITH BRAGG'S DIFFRACTION GRATING PRODUCED BY USING THE PHASE MASK 审中-公开
标题翻译：方法用于生产相位掩膜的用于生产光纤和光纤相位模板的方法生产的布拉格衍射众神
公开(公告)号：EP0936505A1
公开(公告)日：1999-08-18
申请号：EP98941678.9
申请日：1998-09-02
申请人： DAI NIPPON PRINTING CO., LTD. , Nippon Telegraph and Telephone Corporation
发明人： KURIHARA, Masaaki Dai Nippon Printing Co., Ltd. , SEGAWA, Toshikazu Dai Nippon Printing Co., Ltd. , KOMUKAI, Tetsuro Nippon Telegraph and Telephone , NAKAZAWA, Masataka Nippon Telegraph and Telephone
IPC分类号： G03F7/22 , G02B5/18 , G03F1/08 , G02B6/10 , G02B6/00
CPC分类号： G02B6/02138 , G03F1/34 , G03F7/001 , G03F7/70283 , G03F7/7035 , G03F7/704 , G03F7/70475 , H01J2237/31766
摘要： The invention relates to a method of fabricating an optical fiber-processing phase mask in which a stitching error ascribable to a deterioration in the wavelength selectivity of the optical fiber diffraction grating to be fabricated is reduced. At an exposure step, a writing stage 5 with a phase mask blank 10 placed thereon is continuously fed in one direction while portions of the phase mask blank corresponding to grooves 26 or strips 27 in a direction perpendicular to the direction of feeding are sequentially scanned with writing beams 14, whereby the entire area of the phase mask blank 10 to be written is continuously written.
摘要翻译：本发明涉及对光纤处理相掩码，其中归因于在光纤衍射光栅要制造的波长选择性的劣化的缝合误差被减小的制造方法。在曝光步骤中，与相位的写入阶段5掩模坯件放置在其上10被连续地供给在一个方向上，而在相位掩模坯件的部分相对应的槽26或在一个方向上条27垂直于馈送的依次扫描与所述方向写入光束14，由此被写入相位掩模坯件10的整个区域被连续地写入。

33. 发明公开

EP0307906A1 Compensating eddy current effects in charged particle beam systems 失效
标题翻译：在Ionenstrahlsystemen的冯Wirbelstromeffekten的补偿。
公开(公告)号：EP0307906A1
公开(公告)日：1989-03-22
申请号：EP88115117.9
申请日：1988-09-15
申请人： FUJITSU LIMITED
发明人： Yasuda, Hiroshi c/o Fujitsu Limited , Suzuki, Masahiko c/o Fujitsu Limited
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/0209 , H01J2237/30461 , H01J2237/31766
摘要： Methods of avoiding or mitigating effects of eddy currents due to leakage flux of a magnetic lens (2) in a charged particle beam exposure system, and systems (apparatuses) which can expose a substrate to a charged particle beam (8) while a stage (1) carrying the substrate is moving. A step and repeat exposure system can be operated while the stage (1) is moving, so that the throughput of the system is improved. Deviation of the charged particle beam (8) caused by eddy currents is proportional to the velocity of the stage (V x , V y ). Proportional constants (A, B, C, D) of the beam deviation to the velocity of the stage (1) are therefore measured in advance, and a correction term which is a product of the speed of the stage and the proportional constant is fed back to a deflector (33) of the charged particle beam (8). The proportional constants, for example, are obtained from the shift of an image of a test pattern viewed on a CRT in a SEM mode, from a first image position when the stage is not moving to a second position when the stage is moving with a constant speed.
摘要翻译：避免或减轻由于带电粒子束曝光系统中的磁性透镜（2）的漏磁通导致的涡流效应的方法，以及可将基板暴露于带电粒子束（8）的系统（装置） 1）携带衬底正在移动。在阶段（1）移动时可以操作步骤和重复曝光系统，从而提高系统的吞吐量。由涡流引起的带电粒子束（8）的偏差与载物台（Vx，Vy）的速度成比例。因此，预先测量光束偏离与舞台（1）的速度的比例常数（A，B，C，D），并且馈送作为舞台速度与比例常数的乘积的校正项返回到带电粒子束（8）的偏转器（33）。例如，比例常数是从扫描模式观察到的测试图形的图像的位移从第一图像位置从平台未移动到第二位置时移动得到的恒速。

34. 发明申请

WO2007019118A3 SYSTEMS, CONTROL SUBSYSTEMS, AND METHODS FOR PROJECTING AN ELECTRON BEAM ONTO A SPECIMEN 审中-公开
标题翻译：用于将电子束投射到样本上的系统，控制子系统和方法
公开(公告)号：WO2007019118A3
公开(公告)日：2008-01-03
申请号：PCT/US2006029807
申请日：2006-08-01
申请人： KLA TENCOR TECH CORP , ZYWNO MAREK , MANKOS MARIAN , HESS HARALD , LEVI SHEM-TOV
发明人： ZYWNO MAREK , MANKOS MARIAN , HESS HARALD , LEVI SHEM-TOV
IPC分类号： A61N5/00
CPC分类号： H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/2817 , H01J2237/31766
摘要： Systems, control subsystems, and methods for projecting an electron beam onto a specimen are provided. One system includes a stage configured to move the specimen with a non-uniform velocity. The system also includes a projection subsystem configured to project the electron beam onto the specimen while the stage is moving the specimen at the non-uniform velocity. In addition, the system includes a control subsystem configured to alter one or more characteristics of the electron beam while the projection subsystem is projecting the electron beam onto the specimen based on the non-uniform velocity. One method includes moving the specimen with a non-uniform velocity and projecting the electron beam onto the specimen during movement of the specimen. In addition, the method includes altering one or more characteristics of the electron beam during projection of the electron beam onto the specimen based on the non-uniform velocity.
摘要翻译：提供了将电子束投射到试样上的系统，控制子系统和方法。一个系统包括配置成以不均匀的速度移动样本的台。该系统还包括一个投影子系统，配置成将电子束投影到样本上，同时舞台以不均匀的速度移动样本。另外，该系统包括控制子系统，该控制子系统被配置为改变电子束的一个或多个特性，同时投影子系统基于非均匀速度将电子束投影到样本上。一种方法包括以不均匀的速度移动样品并在样品移动期间将电子束投射到样品上。此外，该方法包括在基于非均匀速度将电子束投影到样本上时改变电子束的一个或多个特性。

35. 发明申请

WO2007112465A1 PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTERNED BEAM 审中-公开
标题翻译：颗粒光束曝光装置，具有整体调制的图案
公开(公告)号：WO2007112465A1
公开(公告)日：2007-10-11
申请号：PCT/AT2007/000132
申请日：2007-03-16
申请人： IMS NANOFABRICATION AG , PLATZGUMMER, Elmar
发明人： PLATZGUMMER, Elmar
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/3175 , H01J37/3177 , H01J2237/0435 , H01J2237/1506 , H01J2237/31766 , H01J2237/31774 , H01J2237/31777
摘要： In a charged-particle exposure apparatus (100) for exposure of a target (41) with a beam of electrically charged particles, the illumination system (101) comprises a deflector means (401) adapted to vary the direction of incidence of the illuminating beam upon the pattern definition means, the pattern definition means (20) forms the shape of the illuminating beam into a desired pattern, and the projection optics system (103) projects an image of the beam shape defined in the pattern definition means onto the target (41); the projection optics system comprises a blocking aperture means (204) having an opening and being adapted to block passage of beams traversing outside said opening, namely when the deflector means (401) is activated to tilt the beamlet by a sufficient angle from its non-deflected path, e.g., for blanking out during the process of loading a pattern into the pattern definition means.
摘要翻译：在用于用带电粒子束照射目标（41）的带电粒子曝光装置（100）中，照明系统（101）包括偏转装置（401），该偏转装置适于改变照明光束的入射方向在图案定义装置上，图案定义装置（20）将照明光束的形状形成为期望的图案，并且投影光学系统（103）将在图案定义装置中限定的光束形状的图像投射到目标（ 41）; 投影光学系统包括具有开口的阻挡孔口装置（204），并且适于阻挡穿过所述开口外侧的梁的通过，即当偏转装置（401）被启动以使子束从其非易失性位置倾斜足够的角度时，偏转路径，例如，在将图案加载到图案定义装置的过程中用于消隐。

36. 发明申请

WO2007008792A2 APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING 审中-公开
标题翻译：用于控制粒子束制造的装置和方法
公开(公告)号：WO2007008792A2
公开(公告)日：2007-01-18
申请号：PCT/US2006026725
申请日：2006-07-10
申请人： NEXGENSEMI HOLDINGS CORP , ZANI MICHAEL JOHN , SCOTT JEFFREY WINFIELD , BENNAHMIAS MARK JOSEPH , MAYSE MARK ANTHONY
发明人： ZANI MICHAEL JOHN , SCOTT JEFFREY WINFIELD , BENNAHMIAS MARK JOSEPH , MAYSE MARK ANTHONY
IPC分类号： A61N5/00
CPC分类号： H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
摘要： A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
摘要翻译：用于将工件暴露于带电粒子的室包括用于产生带电粒子流的带电粒子源，准直器，被配置为沿着轴准直和引导带电粒子流从带电粒子源流出，准直器下游的光束数字化器被配置为通过调整沿着轴的带电粒子之间的纵向间隔来创建包括至少一个带电粒子的组的数字光束，所述光束数字转换器的下游的偏转器包括沿轴线纵向设置以偏转数字光束的一系列偏转级，以及构造成保持工件的偏转器下游的工件台。

37. 发明申请

WO2004095548A1 ステージ装置及び露光装置审中-公开
标题翻译：阶段装置和曝光装置
公开(公告)号：WO2004095548A1
公开(公告)日：2004-11-04
申请号：PCT/JP2004/001765
申请日：2004-02-18
申请人：株式会社アドバンテスト , 上野雅史
发明人：上野雅史
IPC分类号： H01L21/027
CPC分类号： H01J37/3045 , G03F7/70725 , H01J2237/31766
摘要：　被駆動体を駆動して移動させるステージ装置であって、被駆動体を載置させて移動する可動スライダと、可動スライダを駆動する可動スライダ駆動部と、可動スライダの出発位置、及び可動スライダが移動すべき目標位置に基づいて、可動スライダが出発位置から目標位置まで移動するときの各時刻における可動スライダ駆動部による駆動量を算出するフィードフォアワード補償器と、可動スライダの位置を検出する可動スライダ位置センサと、可動スライダが出発位置から目標位置まで移動するときの各時刻において、可動スライダが移動すべき目標位置、及び可動スライダ位置センサが検出した可動スライダの位置に基づいて、可動スライダ駆動部による駆動量を算出するフィードバック補償器とを備える。
摘要翻译：一种用于驱动从动主体移动的平台装置，包括一个可移动的滑块，在其上携带被驱动体的同时运动;可移动的滑动器驱动部件，用于驱动可动滑块;前馈补偿器，其在可动滑块驱动部分计算驱动量时，可移动滑动器基于可移动滑块的开始位置和可移动滑块要移动的目标位置从起始位置移动到目标位置，检测可移动滑块的位置的可移动滑动器位置传感器和反馈补偿器，通过可移动滑动器驱动部，基于可移动滑动件移动到的目标位置和可移动滑块位置传感器检测到的可动滑动件的位置，计算驱动量起始位置到目标位置。

38. 发明申请

WO98033198A1 RASTER SHAPED BEAM WRITING STRATEGY SYSTEM AND METHOD FOR PATTERN GENERATION 审中-公开
标题翻译： RASTER形状波束写作策略系统及其模式生成方法
公开(公告)号：WO98033198A1
公开(公告)日：1998-07-30
申请号：PCT/US1998/000905
申请日：1998-01-23
IPC分类号： H01J37/302 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J37/3174 , H01J2237/31764 , H01J2237/31766 , H01J2237/31776 , Y10S430/143
摘要： A hybrid exposure strategy for pattern generation uses wide field raster scan deflection and a uniformly moving stage to expose long stripes. Periodic analog wide field magnetic scan is augmented by a high speed electrostatic retrograde scan to keep the beam stationary during exposure of rectangular flash fields. The system's data path utilizes a pattern represented in a rasterized format. Intermediate vector data bases are created using fracture rules that limit feature and hierarchical cell size to be smaller than overlapping fringes of stripe data fields. Rectangular flash fields are employed with each field being a 1 by n array of writing pixels. The length, origin position and dose of line shaped beam flashes can be varied to allow patterns to be exposed on a design grid much smaller than a writing pixel. The length, origin position and dose data for each flash is derived from a rasterized data format using a decoder device. In this manner multiple writing pixels are exposed simultaneously without compromising resolution or diagonal line edge roughness, thus enhancing exposure rate. A high flash rate is assured by including astigmatic illumination to maximize beam current, and leveraged co-planar blanking and shaping deflection to minimize drive voltages.
摘要翻译：用于图案生成的混合曝光策略使用宽场光栅扫描偏转和均匀移动的阶段来暴露长条纹。通过高速静电逆行扫描来增加定期的模拟广域磁扫描，以在矩形闪光场的曝光期间保持光束的平稳。系统的数据路径使用以光栅格式表示的模式。使用将特征和分层单元大小限制为小于条带数据域的重叠条纹的断裂规则创建中间向量数据库。采用矩形闪光场，每个场是1×n个写入像素阵列。可以改变线形光束闪光的长度，原点位置和剂量，以允许图案暴露在比写入像素小得多的设计网格上。每个闪存的长度，原始位置和剂量数据都是使用解码器设备从光栅化数据格式导出的。以这种方式，同时曝光多个写入像素而不损害分辨率或对角线边缘粗糙度，从而提高曝光率。通过包括散光照明以最大限度地提高束电流，并利用共面消隐和成形偏转来最小化驱动电压，可确保高闪速。

39. 发明公开

EP3096344A3 EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
标题翻译：曝光装置和曝光方法
公开(公告)号：EP3096344A3
公开(公告)日：2017-02-01
申请号：EP16157112.0
申请日：2016-02-24
申请人： ADVANTEST CORPORATION
发明人： YAMADA, Akio , SEYAMA, Masahiro , NASUNO, Hideki
IPC分类号： H01J37/317
CPC分类号： H01J37/3045 , H01J37/20 , H01J37/244 , H01J37/3177 , H01J2237/043 , H01J2237/0435 , H01J2237/15 , H01J2237/2025 , H01J2237/20285 , H01J2237/30455 , H01J2237/31766 , H01J2237/31774
摘要： Objective: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage.
Means for Achieving the Objective: an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section (110) that has a sample (10) mounted thereon and moves the sample relative to the beam generating section; a detecting section (114) that detects a position of the stage section; a predicting section (1000) that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section (170) that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.
摘要翻译：目标：通过减少舞台的移动误差，使用带电粒子束形成复杂而精细的图案。用于实现该目的的手段：一种曝光装置，包括：束生成部，生成带电粒子束; 台部（110），其具有安装在其上的样品（10）并相对于所述束产生部移动所述样品; 检测部（114），其检测台部的位置; 预测部（1000），基于检测出的所述载物台部的位置，生成通过预测所述载物台部的驱动量而得到的预测驱动量; 以及照射控制部（170），基于预测的驱动量，进行用于照射带电粒子束的试样的照射控制。还提供了一种曝光方法。

40. 发明公开

EP3096344A2 EXPOSURE APPARATUS AND EXPOSURE METHOD 审中-公开
标题翻译： BELICHTUNGSVORRICHTUNG UND BELICHTUNGSVERFAHREN
公开(公告)号：EP3096344A2
公开(公告)日：2016-11-23
申请号：EP16157112.0
申请日：2016-02-24
申请人： ADVANTEST CORPORATION
发明人： YAMADA, Akio , SEYAMA, Masahiro , NASUNO, Hideki
IPC分类号： H01J37/317
CPC分类号： H01J37/3045 , H01J37/20 , H01J37/244 , H01J37/3177 , H01J2237/043 , H01J2237/0435 , H01J2237/15 , H01J2237/2025 , H01J2237/20285 , H01J2237/30455 , H01J2237/31766 , H01J2237/31774
摘要： Objective: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage.
Means for Achieving the Objective: an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section (110) that has a sample (10) mounted thereon and moves the sample relative to the beam generating section; a detecting section (114) that detects a position of the stage section; a predicting section (1000) that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section (170) that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.
摘要翻译：目的：通过减少一个阶段的运动误差，使用带电粒子束形成复杂和精细的图案。实现目的的手段：一种曝光装置，包括产生带电粒子束的光束产生部分; 具有安装在其上的样品（10）的台阶段（110），并使样本相对于束生成部分移动; 检测部，其检测所述台部的位置; 预测部（1000），其基于所述舞台部的检测位置生成预测所述舞台部的驱动量而获得的预测驱动量; 以及照射控制部（170），其根据预测的驱动量，对带电粒子束照射样品进行照射控制。还提供了曝光方法。

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