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    • 35. 发明授权
    • 미세 패턴 형성 방법 및 그 장치
    • 精细图案方法及其装置
    • KR101321103B1
    • 2013-10-23
    • KR1020130013422
    • 2013-02-06
    • 한국기계연구원
    • 조정대김광영강동우최영만
    • H01L21/027
    • H01L21/0273B81C1/00023
    • PURPOSE: A fine patterning method and an apparatus thereof are provided to easily form a fine thin film pattern by forming a conductive thin film on a substrate and patterning the conductive thin film. CONSTITUTION: A substrate is prepared (ST1). A conductive thin layer is formed on the substrate. The conductive thin layer is patterned (ST2). The conductive thin layer is coated with a photoresist. A photoresist layer is formed on the conductive thin layer. [Reference numerals] (ST1) Substrate with a conductive thin layer (and a photoresist layer) is prepared; (ST2) Conductive thin layer is patterned
    • 目的:提供精细图案化方法及其装置,通过在基板上形成导电薄膜并图案化导电薄膜来容易地形成精细的薄膜图案。 构成:制备底物(ST1)。 在基板上形成导电薄层。 导电薄层被图案化(ST2)。 导电薄层被光致抗蚀剂涂覆。 在导电薄层上形成光致抗蚀剂层。 (附图标记)(ST1)准备具有导电薄层(和光致抗蚀剂层)的基板; (ST2)导电薄层被图案化
    • 36. 发明授权
    • 접착개선된 비정질탄소막을 이용한 MEMS 디바이스 제조방법
    • 使用不规则碳层制造MEMS器件与促进粘合剂的方法
    • KR101388927B1
    • 2014-04-25
    • KR1020130027538
    • 2013-03-14
    • 한국과학기술원
    • 임성규김영수김한흥박상현황욱중이귀로
    • B81C1/00H01L21/027
    • B81C1/00023B81C3/007H01L21/0274
    • Provided is a method for producing an MEMS device using an amorphous carbon film as a sacrificial layer. According to an embodiment of the present invention, the method comprises the steps of: producing a bottom structure including metallic patterns; producing an adhesion reinforcing layer that covers the metallic patterns of the bottom structure and includes at least one among an oxide film, a nitride film, a nitrifying film, and an amorphous silicon film; producing an amorphous carbon film as a sacrificial layer on the adhesion reinforcing layer; producing an insulating and supporting layer on the amorphous carbon film; producing via holes formed in order to penetrate through the insulating and supporting layer and amorphous carbon film and make the bottom structure exposed therethrough sequentially by forming an etching protection film on the insulating and supporting layer, by performing only one photolithography procedure, and by etching the insulating and supporting layer and the amorphous carbon film at a time; producing a top structure including a sensor structure on the insulating and supporting layer; producing at least one through-hole that penetrates through the insulating and supporting layer; and removing the amorphous carbon film through the through-hole so that the bottom structure and top structure are disposed to be separated from each other.
    • 提供了使用非晶碳膜作为牺牲层来制造MEMS器件的方法。 根据本发明的实施例,该方法包括以下步骤:产生包括金属图案的底部结构; 制造覆盖底部结构的金属图案并且包括氧化膜,氮化物膜,硝化膜和非晶硅膜中的至少一种的粘合增强层; 在粘合增强层上制造作为牺牲层的无定形碳膜; 在无定形碳膜上产生绝缘和支撑层; 产生通孔,以穿透绝缘支撑层和非晶碳膜,并通过仅在一个光刻步骤上形成蚀刻保护膜,使底部结构依次暴露于其中,并通过蚀刻 绝缘和支撑层和无定形碳膜; 在绝缘和支撑层上产生包括传感器结构的顶部结构; 产生穿过绝缘支撑层的至少一个通孔; 并且通过所述通孔去除所述无定形碳膜,使得所述底部结构和顶部结构被设置成彼此分离。
    • 37. 发明公开
    • 마이크로 유체 채널 제조 방법 및 그 방법으로 제조되는 마이크로 유체 채널
    • 微流通道及其使用印刷技术的制造
    • KR1020130111802A
    • 2013-10-11
    • KR1020120033985
    • 2012-04-02
    • 한국생산기술연구원
    • 유준호이상호강경태
    • H01L21/027
    • H01L21/0273B81B1/006B81C1/00023B81C1/00119B81C1/00388
    • PURPOSE: A method for manufacturing a microfluidic channel and the microfluidic channel manufactured by the same are provided to easily change designs by dispensing. CONSTITUTION: A predetermined porous medium receives a cutting control command. The cutting line of a predetermined shape is formed (S21). A dispensing control command is received. At least one hydrophobic barrier line is formed along the cutting line (S22). A curing process is performed on the porous medium (S23). [Reference numerals] (S21) Cutting line of a predetermined shape is formed on a porous medium using a cutting line forming tool upon a cutting control command; (S22) At least one hydrophobic barrier line is formed along the cutting line using a hydrophobic barrier line forming tool upon a dispensing control command; (S23) Curing process is performed on the porous medium with hydrophobic barrier line formed
    • 目的:提供用于制造微流体通道的方法和由其制造的微流体通道,以便通过分配容易地改变设计。 构成:预定的多孔介质接收切割控制命令。 形成预定形状的切割线(S21)。 接收分配控制命令。 沿着切割线形成至少一个疏水屏障线(S22)。 在多孔介质上进行固化处理(S23)。 (附图标记)(S21)切割控制命令使用切割线形成工具在多孔介质上形成预定形状的切割线; (S22)使用疏水屏障线形成工具,在分配控制命令上沿着切割线形成至少一个疏水屏障线; (S23)在形成有疏水性屏障线的多孔介质上进行固化处理
    • 40. 发明公开
    • 배리어가 포함된 전자력 추진 마이크로 믹서(MHDBEM) 및 그 제조방법
    • 磁网阻尼器嵌入式微型混合器及其制造方法
    • KR1020040009106A
    • 2004-01-31
    • KR1020020042939
    • 2002-07-22
    • 학교법인 포항공과대학교
    • 김동성이석우권태헌이승섭
    • B81C99/00
    • B81B3/0018B01F13/0059B81B2201/051B81C1/00023B81C1/00071
    • PURPOSE: A magnetohydrodynamic barrier embedded micro mixer and a method for manufacturing the same are provided to achieve superior chaotic mixing by periodically creating and extinguishing a hyperbolic point based on a spiral flow formed in a micro channel. CONSTITUTION: At least one barrier(161) is aligned on an upper channel plate(162) so as to achieve superior chaotic mixing, thereby forming a magnetohydrodynamic barrier embedded micro mixer(160). Metal is deposited on the surface of a first substrate through thermal deposition. Then, an electrode is formed through an ultraviolet photo process. A protective layer is formed on a surface of the first substrate. A micro channel wall is formed on the protective layer through a photo process. An aluminum film is formed on the micro channel through a sputtering process. After coating photosensitive material on a second substrate, a space for forming a barrier is formed through an ultraviolet photo process. An upper micro channel plate is formed on the second substrate.
    • 目的:提供一种磁流体动力学屏障嵌入式微型混合器及其制造方法,以通过基于在微通道中形成的螺旋流周期性地创建和熄灭双曲线点来获得优异的混沌混合。 构成:至少一个屏障(161)在上通道板(162)上对准,以实现优异的混沌混合,由此形成磁流体动力学屏障嵌入式微混合器(160)。 金属通过热沉积沉积在第一衬底的表面上。 然后,通过紫外线照相工艺形成电极。 在第一基板的表面上形成保护层。 通过照相工艺在保护层上形成微通道壁。 通过溅射工艺在微通道上形成铝膜。 在第二基板上涂布感光材料之后,通过紫外线照相工艺形成用于形成屏障的空间。 在第二基板上形成上部微通道板。