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31. 发明授权

US06927356B2 Enclosed switchgear 失效
标题翻译：封闭式开关柜
公开(公告)号：US06927356B2
公开(公告)日：2005-08-09
申请号：US10753080
申请日：2004-01-08
申请人： Shinji Sato , Kenichi Koyama , Masahiro Arioka
发明人： Shinji Sato , Kenichi Koyama , Masahiro Arioka
IPC分类号： H02B13/02 , H01H33/56 , H01H33/66 , H01H33/666
CPC分类号： H01H33/666 , H01H33/565 , H01H33/6661 , H01H2033/6667
摘要： In a switchgear, oscillation of a moving current-carrying shaft and a moving contact of a vacuum valve is minimized, offset load on the contact surface is reduced, and friction the portion supporting the moving current-carrying shaft is reduced. A vacuum valve is disposed in a gas tank, one end of a moving current-carrying shaft integrally includes a moving contact of the vacuum valve, and a contact pressure adjusting spring is disposed on the other end of the moving current-carrying shaft. An operating rod extends through the gas tank, an operation mechanism is mounted on the operating rod outside the gas tank, an insulating rod is mounted inside the gas tank, and the contact pressure adjusting spring is joined to the insulating rod.
摘要翻译：在开关装置中，移动载流轴的振荡和真空阀的移动接触被最小化，接触表面上的偏移负载减小，并且支撑移动载流轴的部分的摩擦减小。真空阀设置在气罐中，移动载流轴的一端一体地包括真空阀的移动触点，并且接触压力调节弹簧设置在移动载流轴的另一端。操作杆延伸穿过气罐，操作机构安装在气罐外侧的操作杆上，绝缘杆安装在气罐内，接触压力调节弹簧与绝缘杆接合。

32. 发明授权

US06835942B2 Method for correcting a proximity effect, an exposure method, a manufacturing method of a semiconductor device and a proximity correction module 有权
公开(公告)号：US06835942B2
公开(公告)日：2004-12-28
申请号：US10602670
申请日：2003-06-25
申请人： Shunko Magoshi , Shinji Sato
发明人： Shunko Magoshi , Shinji Sato
IPC分类号： H01J37302
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J2237/31769
摘要： A method for correcting a proximity effect applied to a dose of an electron beam exposure, includes classifying an underlying pattern of a level underlying a thin film layer; dividing a processing pattern to be transferred on the thin film layer into a first pattern overlapping with the underlying pattern and a second pattern which does not overlap with the underlying pattern according to the classified underlying pattern; calculating a pattern area density for the first and second patterns in a unit region; and calculating a corrected dose for the processing pattern according to the pattern area density.

33. 发明授权

US6142016A Apparatus for detecting residual quantity of toners 失效
标题翻译：用于检测调色剂剩余量的装置
公开(公告)号：US6142016A
公开(公告)日：2000-11-07
申请号：US338194
申请日：1994-11-09
申请人： Kouji Kobayashi , Shinji Sato , Takeo Kojima , Nobuyuki Tanaka , Michio Shimura
发明人： Kouji Kobayashi , Shinji Sato , Takeo Kojima , Nobuyuki Tanaka , Michio Shimura
IPC分类号： G01F23/22 , G03G15/08 , G01F23/00 , G03G21/00
CPC分类号： G01F23/22 , G03G15/0848 , G03G15/0856
摘要： Disclosed is a toner residual quantity detecting apparatus for detecting a residual quantity of toners in a developing unit. This toner residual quantity detecting apparatus has a temperature sensor, provided in the bottom of the developing unit, for generating an output proportional to a detected temperature and a detecting circuit for detecting the toner residual quantity from the output of the temperature sensor. This temperature sensor detects a difference between temperatures when covered with the toners and when not covered with the toners, thereby detecting the toner residual quantity.
摘要翻译：公开了一种用于检测显影单元中的调色剂的剩余量的调色剂剩余量检测装置。该调色剂剩余量检测装置具有设置在显影单元的底部的用于产生与检测温度成比例的输出的温度传感器和用于从温度传感器的输出检测调色剂剩余量的检测电路。该温度传感器检测到当用调色剂覆盖时的温度差异，并且当不被调色剂覆盖时，检测调色剂剩余量。

34. 发明授权

US6121178A Sintered ITO and an ITO sputtering target 失效
标题翻译：烧结ITO和ITO溅射靶
公开(公告)号：US6121178A
公开(公告)日：2000-09-19
申请号：US944095
申请日：1997-10-02
申请人： Kohichiro Eshima , Kouki Toishi , Katsuaki Okabe , Tsuyoshi Nishimura , Shinji Sato , Choju Nagata
发明人： Kohichiro Eshima , Kouki Toishi , Katsuaki Okabe , Tsuyoshi Nishimura , Shinji Sato , Choju Nagata
IPC分类号： C04B35/64 , C01G19/00 , C04B35/457 , C23C14/08 , C23C14/34 , C30B29/22 , C04B35/453
CPC分类号： C23C14/3414 , C04B35/457
摘要： Sintered ITO having a relative density of at least 88% and an oxygen content of 15.5-17.0 wt %, as well as an ITO sputtering target made of this sintered ITO. Using the target, an optimal range for the proportion of oxygen in a mixture of argon and oxygen gases used as a sputtering atmosphere is sufficiently expanded to permit the consistent formation of ITO films.
摘要翻译：具有至少88％的相对密度和15.5-17.0重量％的氧含量的烧结ITO以及由该烧结的ITO制成的ITO溅射靶。使用目标，用作溅射气氛的氩气和氧气的混合物中的氧气比例的最佳范围被充分地扩大以允许ITO膜的一致的形成。

35. 发明授权

US6038244A Semiconductor excitation solid-state laser apparatus 失效
标题翻译：半导体激光固态激光装置
公开(公告)号：US6038244A
公开(公告)日：2000-03-14
申请号：US16282
申请日：1998-01-30
申请人： Akaru Usui , Shinji Sato , Hisao Tanaka
发明人： Akaru Usui , Shinji Sato , Hisao Tanaka
IPC分类号： H01S3/094 , H01S3/0941 , H01S3/091
CPC分类号： H01S3/0941 , H01S3/025 , H01S3/094057 , H01S3/094084
摘要： A semiconductor excitation solid-state laser apparatus, in which a cross-sectional area of an optical guide plate leading an excited beam emitted from a semiconductor laser element to a solid-state laser medium is made larger in the side of the semiconductor laser element thereof, while a cross-sectional area thereof is made smaller in the side of the solid-state laser medium.
摘要翻译：半导体激光固态激光装置，其中将从半导体激光元件发射的激发光束引导到固态激光介质的导光板的横截面积在其半导体激光元件的侧面较大而在固态激光介质的侧面的横截面积较小。

36. 发明授权

US5994030A Pattern-forming method and lithographic system 失效
公开(公告)号：US5994030A
公开(公告)日：1999-11-30
申请号：US30888
申请日：1998-02-26
申请人： Kazuyoshi Sugihara , Hiromi Niiyama , Shunko Magoshi , Atsushi Ando , Tetsuro Nakasugi , Shinji Sato , Yumi Watanabe , Yosimitu Kato , Toru Shibata , Katsuya Okumura
发明人： Kazuyoshi Sugihara , Hiromi Niiyama , Shunko Magoshi , Atsushi Ando , Tetsuro Nakasugi , Shinji Sato , Yumi Watanabe , Yosimitu Kato , Toru Shibata , Katsuya Okumura
IPC分类号： H01L21/027 , G03F7/20 , H01J37/317 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/203 , G03F7/2059 , G03F7/7045 , H01J37/3174
摘要： A rough pattern exceeding the resolution limit of light exposure is formed by light resolution. A fine pattern not exceeding the resolution limit of light exposure is formed by charge-beam exposure. Combining the rough pattern and the fine pattern produces a desired pattern. The sharing of the work between light exposure and charge-beam exposure exhibits the high throughput of light exposure and the excellent resolving power of charge-beam exposure.

37. 发明授权

US5841645A Multi-level inverter with low loss snubbing circuits 失效
标题翻译：具有低损耗缓冲电路的多电平逆变器
公开(公告)号：US5841645A
公开(公告)日：1998-11-24
申请号：US841388
申请日：1997-04-30
申请人： Shinji Sato
发明人： Shinji Sato
IPC分类号： H02M1/00 , H02M7/48 , H02M7/483 , H02M1/12
CPC分类号： H02M7/487
摘要： A multi-level inverter, including an AC output terminal, at least four DC input terminals with different potentials having a first DC input terminal with a maximum potential and a second DC input terminal with a minimum potential, a positive arm connected between the first DC input terminal and the AC output terminal, and a negative arm connected between the second DC input terminal and the AC output terminal. Each of the positive and negative arms is composed of a plurality of series connected switching devices, respectively. The multi-level inverter further includes a plurality of clamp diodes, each connected between one of the DC input terminals other than the first and second DC input terminals and one of the positive and negative arms, respectively, a plurality of first snubber circuits, each composed of a series circuit of a snubber capacitor and a snubber diode and connected in parallel with one of the switching devices, respectively, and a plurality of discharging circuits, each composed of at least a resistor and connected between one of the first snubber circuits and the DC input terminals, respectively.
摘要翻译：一种包括AC输出端子的多电平逆变器，具有不同电位的至少四个DC输入端子，具有具有最大电位的第一DC输入端子和具有最小电位的第二DC输入端子，正极臂连接在第一DC 输入端子和交流输出端子，以及连接在第二直流输入端子和交流输出端子之间的负极。正极和负极中的每一个分别由多个串联连接的开关装置组成。多电平逆变器还包括多个钳位二极管，每个钳位二极管分别连接在除了第一和第二DC输入端子之外的一个DC输入端子和正极和负极臂中的一个之间，多个第一缓冲电路，每个由缓冲电容器和缓冲二极管的串联电路分别与一个开关装置并联连接的多个放电电路，以及多个放电电路，每个放电电路由至少一个电阻器组成，并连接在第一缓冲电路之一和直流输入端子。

38. 发明授权

US5768325A Time-adjustable delay circuit 失效
标题翻译：时间可调延时电路
公开(公告)号：US5768325A
公开(公告)日：1998-06-16
申请号：US591129
申请日：1996-01-25
申请人： Rieko Yamamoto , Shinji Sato
发明人： Rieko Yamamoto , Shinji Sato
IPC分类号： G11C7/00 , G06F5/06 , H03K5/135 , H04J3/06 , H04L25/36
CPC分类号： G06F5/06 , H03K5/135 , H04J3/062
摘要： A delay circuit externally adjustable for the delay time "n" as desired, which comprises a FIFO (FIRST-IN, FIRST-OUT) type memory, a self-load counter, and a decoder circuit. In addition to a data signal, an input clock is inputted to the memory as the write clock and the read clock. The self-load counter operates in synchronization with the input clock, and loads a setting of a load value-designating signal at a prescribed number of counts. The decoder circuit receives the output of the self-load counter which has a prescribed cycle, and outputs a reset signal with the same cycle to the memory. This cycle determines the delay time. The delay circuit allows a greatly reduced number of ICs used as compared with the prior art, even for increased delay times.
摘要翻译：延迟电路根据需要外部可调节延迟时间“n”，其包括FIFO（FIRST-IN，FIRST-OUT）型存储器，自负载计数器和解码器电路。除了数据信号之外，输入时钟作为写时钟和读时钟输入到存储器。自负载计数器与输入时钟同步工作，并以规定数量的计数加载负载值指定信号的设置。解码器电路接收具有规定周期的自负载计数器的输出，并将相同周期的复位信号输出到存储器。该周期决定延迟时间。与现有技术相比，延迟电路允许大大减少使用的IC数量，即使增加延迟时间。

39. 发明授权

US5563122A Stabilized parathyroid hormone composition 失效
标题翻译：稳定甲状旁腺激素组成
公开(公告)号：US5563122A
公开(公告)日：1996-10-08
申请号：US244758
申请日：1994-09-06
申请人： Ken Endo , Shinji Sato , Yoshinori Sugiyama , Masaru Ohno , Hideo Sakakibara
发明人： Ken Endo , Shinji Sato , Yoshinori Sugiyama , Masaru Ohno , Hideo Sakakibara
IPC分类号： A61K9/00 , A61K9/19 , A61K38/29 , A61K47/02 , A61K47/26
CPC分类号： A61K9/0019 , A61K38/29 , A61K47/02 , A61K47/26 , A61K9/19 , Y10S514/97
摘要： A safe, stabilized lyophilized preparation comprising parathyroid hormone (PTH) as an active ingredient and effective amounts of sugar and sodium chloride to provide a stable preparation of parathyroid hormone.
摘要翻译： PCT No.PCT / JP92 / 01599 Sec。 371日期：1994年9月26日 102（e）日期1994年9月26日PCT提交1992年12月8日PCT公布。第WO92 / 01599号公报日期1993年6月24日一种安全，稳定的冻干制剂，其包含甲状旁腺激素（PTH）作为活性成分和有效量的糖和氯化钠以提供甲状旁腺激素的稳定制备。

40. 发明授权

US5246528A Automatic wafer etching method and apparatus 失效
标题翻译：自动波形蚀刻方法和装置
公开(公告)号：US5246528A
公开(公告)日：1993-09-21
申请号：US890195
申请日：1992-05-29
申请人： Fumihiko Hasegawa , Shinji Sato
发明人： Fumihiko Hasegawa , Shinji Sato
IPC分类号： H01L21/00
CPC分类号： H01L21/67086 , H01L21/67023 , H01L21/67075
摘要： An automatic wafer etching apparatus including a first elevator and a second elevator each having a top surface whose vertical cross-section is circularly concaved having a curvature equal to that of the wafers and adapted to reciprocate vertically such that the top surface can pass through the etching drum, and an etching drum having a main housing consisting of a pair of vertical parallel side plates opposing each other, a horizontal shaft integral with the main housing side plates; a plurality of rollers borne between the main housing side plates in a manner such that they are freely rotatory; the rollers having annular grooves in their surfaces to receive edges of wafers in a manner such that the wafers are supported vertically at suitable intervals in a horizontal row; small-diameter gears locked at those ends of the rollers.

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