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31. 发明申请

US20120313069A1 WORK FUNCTION TAILORING FOR NONVOLATILE MEMORY APPLICATIONS 有权
标题翻译：用于非易失性存储器应用的工作功能定制
公开(公告)号：US20120313069A1
公开(公告)日：2012-12-13
申请号：US13156624
申请日：2011-06-09
申请人： Yun Wang , Tony Chiang , Imran Hashim
发明人： Yun Wang , Tony Chiang , Imran Hashim
IPC分类号： H01L47/00
CPC分类号： H01L45/1608 , H01L27/2463 , H01L45/04 , H01L45/065 , H01L45/10 , H01L45/12 , H01L45/1233 , H01L45/146 , H01L45/16 , H01L45/1616 , H01L45/1633 , H01L45/1641
摘要： Embodiments of the invention generally relate to a resistive switching nonvolatile memory device having an interface layer structure disposed between at least one of the electrodes and a variable resistance layer formed in the nonvolatile memory device, and a method of forming the same. Typically, resistive switching memory elements may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices, such as digital cameras, mobile telephones, handheld computers, and music players. In one configuration of the resistive switching nonvolatile memory device, the interface layer structure comprises a passivation region, an interface coupling region, and/or a variable resistance layer interface region that are configured to adjust the nonvolatile memory device's performance, such as lowering the formed device's switching currents and reducing the device's forming voltage, and reducing the performance variation from one formed device to another.
摘要翻译：本发明的实施例一般涉及具有设置在至少一个电极和形成在非易失性存储器件中的可变电阻层之间的界面层结构的电阻式开关非易失性存储器件及其形成方法。通常，电阻式开关存储器元件可以形成为可用于各种电子设备（例如数码相机，移动电话，手持式计算机和音乐播放器）的大容量非易失性存储器集成电路的一部分。在电阻式开关非易失性存储器件的一种结构中，界面层结构包括钝化区域，界面耦合区域和/或可变电阻层接口区域，其被配置为调整非易失性存储器件的性能，例如降低形成器件的开关电流并降低器件的成型电压，并降低从一个成形器件到另一个器件的性能变化。

32. 发明授权

US08866121B2 Current-limiting layer and a current-reducing layer in a memory device 有权
标题翻译：存储器件中的限流层和电流减少层
公开(公告)号：US08866121B2
公开(公告)日：2014-10-21
申请号：US13399530
申请日：2012-02-17
申请人： Yun Wang , Tony P. Chiang , Imran Hashim
发明人： Yun Wang , Tony P. Chiang , Imran Hashim
IPC分类号： H01L47/00 , H01L29/02 , H01L29/04 , G11C13/00 , H01L45/00 , H01L27/24 , G11C11/00
CPC分类号： H01L45/145 , G11C11/00 , G11C13/00 , G11C13/0007 , G11C2213/72 , H01L27/2409 , H01L27/2463 , H01L45/08 , H01L45/12 , H01L45/1233 , H01L45/146 , H01L45/1608 , H01L45/1616 , H01L45/1641
摘要： A current-limiting layer and a current-reducing layer are incorporated into a resistive switching memory device to form memory arrays. The incorporated current-limiting layer reduces the occurrence of current spikes during the programming of the resistive switching memory device and the incorporated current-reducing layer minimizes the overall current levels that can flow through the resistive switching memory device. Together, the two incorporated layers help improve device performance and lifetime.
摘要翻译：电流限制层和电流减少层被并入到电阻式开关存储器件中以形成存储器阵列。结合的限流层在电阻式开关存储器件的编程期间减少了电流尖峰的发生，并且并入的电流降低层使可流过电阻式开关存储器件的总体电流水平最小化。合并在一起的两个层次有助于提高设备性能和使用寿命。

33. 发明授权

US08698119B2 Nonvolatile memory device using a tunnel oxide as a current limiter element 有权
标题翻译：使用隧道氧化物作为电流限制器元件的非易失性存储器件
公开(公告)号：US08698119B2
公开(公告)日：2014-04-15
申请号：US13354006
申请日：2012-01-19
申请人： Mihir Tendulkar , Imran Hashim , Yun Wang
发明人： Mihir Tendulkar , Imran Hashim , Yun Wang
IPC分类号： H01L29/04 , H01L47/00 , H01L21/20 , G11C11/00
CPC分类号： H01L45/08 , H01L27/2409 , H01L27/2463 , H01L45/12 , H01L45/1233 , H01L45/146 , H01L45/1608 , H01L45/1616
摘要： Embodiments of the invention generally include a method of forming a nonvolatile memory device that contains a resistive switching memory element that has improved device switching performance and lifetime, due to the addition of a current limiting component disposed therein. The electrical properties of the current limiting component are configured to lower the current flow through the variable resistance layer during the logic state programming steps by adding a fixed series resistance in the resistive switching memory element of the nonvolatile memory device. In one embodiment, the current limiting component comprises a tunnel oxide that is a current limiting material disposed within a resistive switching memory element in a nonvolatile resistive switching memory device. Typically, resistive switching memory elements may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices, such as digital cameras, mobile telephones, handheld computers, and music players.
摘要翻译：本发明的实施例通常包括形成非易失性存储器件的方法，该非易失性存储器件包含由于添加限定在其中的限流部件的添加而具有改进的器件切换性能和寿命的电阻式开关存储元件。限流部件的电气特性被配置为在逻辑状态编程步骤期间通过在非易失性存储器件的电阻式开关存储器元件中添加固定串联电阻来降低通过可变电阻层的电流。在一个实施例中，限流部件包括隧道氧化物，隧道氧化物是设置在非易失性电阻式开关存储器件中的电阻式开关存储器元件内的限流材料。通常，电阻式开关存储器元件可以形成为可用于各种电子设备（例如数码相机，移动电话，手持式计算机和音乐播放器）的大容量非易失性存储器集成电路的一部分。

34. 发明授权

US08686386B2 Nonvolatile memory device using a varistor as a current limiter element 有权
标题翻译：使用压敏电阻作为限流元件的非易失性存储器件
公开(公告)号：US08686386B2
公开(公告)日：2014-04-01
申请号：US13399815
申请日：2012-02-17
申请人： Mihir Tendulkar , Imran Hashim , Yun Wang
发明人： Mihir Tendulkar , Imran Hashim , Yun Wang
IPC分类号： H01L29/02 , H01L47/00 , H01L29/04 , H01L29/06
CPC分类号： H01L45/1608 , H01L27/2409 , H01L27/2463 , H01L45/08 , H01L45/12 , H01L45/1233 , H01L45/146 , H01L45/1616
摘要： Embodiments of the invention include a method of forming a nonvolatile memory device that contains a resistive switching memory element that has improved device switching performance and lifetime, due to the addition of a current limiting component disposed therein. The electrical properties of the current limiting component are configured to lower the current flow through the variable resistance layer during the logic state programming steps by adding a fixed series resistance in the resistive switching memory element of the nonvolatile memory device. In some embodiments, the current limiting component comprises a varistor that is a current limiting material disposed within a resistive switching memory element in a nonvolatile resistive switching memory device. Typically, resistive switching memory elements may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices, such as digital cameras, mobile telephones, handheld computers, and music players.
摘要翻译：本发明的实施例包括一种形成非易失性存储器件的方法，该非易失性存储器件包含由于添加设置在其中的限流部件而具有改进的器件切换性能和寿命的电阻式开关存储元件。限流部件的电气特性被配置为在逻辑状态编程步骤期间通过在非易失性存储器件的电阻式开关存储器元件中添加固定串联电阻来降低通过可变电阻层的电流。在一些实施例中，限流部件包括变阻器，其是设置在非易失性电阻式开关存储器件中的电阻式开关存储器元件内的限流材料。通常，电阻式开关存储器元件可以形成为可用于各种电子设备（例如数码相机，移动电话，手持式计算机和音乐播放器）的大容量非易失性存储器集成电路的一部分。

35. 发明申请

US20120313063A1 NONVOLATILE MEMORY DEVICE HAVING AN ELECTRODE INTERFACE COUPLING REGION 有权
标题翻译：具有电极接口连接区域的非易失性存储器件
公开(公告)号：US20120313063A1
公开(公告)日：2012-12-13
申请号：US13156722
申请日：2011-06-09
申请人： Yun Wang , Tony Chiang , Imran Hashim
发明人： Yun Wang , Tony Chiang , Imran Hashim
IPC分类号： H01L47/00
CPC分类号： H01L45/1608 , H01L27/2409 , H01L27/2436 , H01L27/2463 , H01L45/065 , H01L45/08 , H01L45/10 , H01L45/12 , H01L45/1226 , H01L45/1233 , H01L45/1253 , H01L45/145 , H01L45/146 , H01L45/1616 , H01L45/1625
摘要： Embodiments of the invention generally relate to a resistive switching nonvolatile memory device having an interface layer structure disposed between at least one of the electrodes and a variable resistance layer formed in the nonvolatile memory device, and a method of forming the same. Typically, resistive switching memory elements may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices, such as digital cameras, mobile telephones, handheld computers, and music players. In one configuration of the resistive switching nonvolatile memory device, the interface layer structure comprises a passivation region, an interface coupling region, and/or a variable resistance layer interface region that are configured to adjust the nonvolatile memory device's performance, such as lowering the formed device's switching currents and reducing the device's forming voltage, and reducing the performance variation from one formed device to another.
摘要翻译：本发明的实施例一般涉及具有设置在至少一个电极和形成在非易失性存储器件中的可变电阻层之间的界面层结构的电阻式开关非易失性存储器件及其形成方法。通常，电阻式开关存储器元件可以形成为可用于各种电子设备（例如数码相机，移动电话，手持式计算机和音乐播放器）的大容量非易失性存储器集成电路的一部分。在电阻式开关非易失性存储器件的一种结构中，界面层结构包括钝化区域，界面耦合区域和/或可变电阻层接口区域，其被配置为调整非易失性存储器件的性能，例如降低形成器件的开关电流并降低器件的成型电压，并降低从一个成形器件到另一个器件的性能变化。

36. 发明申请

US20130134373A1 NONVOLATILE RESISTIVE MEMORY ELEMENT WITH A NOVEL SWITCHING LAYER 审中-公开
标题翻译：具有新开关层的非易失性电阻记忆元件
公开(公告)号：US20130134373A1
公开(公告)日：2013-05-30
申请号：US13305568
申请日：2011-11-28
申请人： Yun Wang , Imran Hashim , Tony Chiang
发明人： Yun Wang , Imran Hashim , Tony Chiang
IPC分类号： H01L45/00
CPC分类号： G11C13/0007 , H01L27/2409 , H01L27/2463 , H01L45/04 , H01L45/1233 , H01L45/146 , H01L45/147
摘要： A nonvolatile resistive memory element has a novel variable resistance layer comprising one or more rare-earth oxides. The rare-earth oxide has a high k value, a high bandgap energy, and the ability to maintain an amorphous structure after thermal anneal processes. Thus, the novel variable resistance layer facilitates improved switching performance and reliability of the resistive memory element.
摘要翻译：非易失性电阻存储元件具有包含一种或多种稀土氧化物的新颖的可变电阻层。稀土氧化物具有高k值，高带隙能，以及热退火工艺后保持非晶结构的能力。因此，新颖的可变电阻层有助于提高电阻式存储元件的开关性能和可靠性。

37. 发明授权

US09299926B2 Nonvolatile memory device using a tunnel oxide layer and oxygen blocking layer as a current limiter element 有权
标题翻译：使用隧道氧化物层和氧阻挡层作为限流元件的非易失性存储器件
公开(公告)号：US09299926B2
公开(公告)日：2016-03-29
申请号：US13399728
申请日：2012-02-17
申请人： Mihir Tendulkar , Imran Hashim , Yun Wang , Tim Minvielle , Takeshi Yamaguchi
发明人： Mihir Tendulkar , Imran Hashim , Yun Wang , Tim Minvielle , Takeshi Yamaguchi
IPC分类号： H01L21/02 , H01L45/00
CPC分类号： H01L45/08 , G11C2213/51 , H01L45/12 , H01L45/1233 , H01L45/1246 , H01L45/146 , H01L45/16
摘要： Embodiments of the invention include a method of forming a nonvolatile memory device that contains a resistive switching memory element with improved device switching performance and lifetime, due to the addition of a current limiting component. In one embodiment, the current limiting component comprises a resistive material configured to improve the switching performance and lifetime of the resistive switching memory element. The electrical properties of the current limiting layer are configured to lower the current flow through the variable resistance layer during the logic state programming steps by adding a fixed series resistance in the resistive switching memory element found in the nonvolatile memory device. In one embodiment, the current limiting component comprises a tunnel oxide layer that is a current limiting material and an oxygen barrier layer that is an oxygen deficient material disposed within a resistive switching memory element in a nonvolatile resistive switching memory device.
摘要翻译：本发明的实施例包括一种形成非易失性存储器件的方法，该非易失性存储器件包含由于添加限流部件而具有改进的器件切换性能和寿命的电阻式开关存储元件。在一个实施例中，限流部件包括被配置为改善电阻式开关存储器元件的开关性能和寿命的电阻材料。电流限制层的电气特性被配置为在逻辑状态编程步骤期间通过在非易失性存储器件中存在的电阻式开关存储器元件中增加固定串联电阻来降低通过可变电阻层的电流。在一个实施例中，限流部件包括作为限流材料的隧道氧化物层和作为设置在非易失性电阻式开关存储器件中的电阻式开关存储器元件内的缺氧材料的氧阻挡层。

38. 发明申请

US20130056700A1 DEFECT GRADIENT TO BOOST NONVOLATILE MEMORY PERFORMANCE 有权
标题翻译：缺陷增强非易失性存储器性能
公开(公告)号：US20130056700A1
公开(公告)日：2013-03-07
申请号：US13223950
申请日：2011-09-01
申请人： Yun Wang , Tony Chiang , Imran Hashim
发明人： Yun Wang , Tony Chiang , Imran Hashim
IPC分类号： H01L45/00
CPC分类号： H01L45/122 , H01L27/2463 , H01L45/08 , H01L45/146 , H01L45/1608
摘要： Embodiments of the present invention generally relate to a resistive switching nonvolatile memory element that is formed in a resistive switching memory device that may be used in a memory array to store digital data. The memory element is generally constructed as a metal-insulator-metal stack. The resistive switching portion of the memory element includes a getter portion and/or a defect portion. In general, the getter portion is an area of the memory element that is used to help form, during the resistive switching memory device's fabrication process, a region of the resistive switching layer that has a greater number of vacancies or defects as compared to the remainder of resistive switching layer. The defect portion is an area of the memory element that has a greater number of vacancies or defects as compared to the remainder of the resistive switching layer, and is formed during the resistive switching memory device's fabrication process. The addition of the getter or defect portions in a formed memory device generally improves the reliability of the resistive switching memory device, improves the switching characteristics of the formed memory device and can eliminate or reduce the need for the time consuming additional post fabrication “burn-in” or pre-programming steps.
摘要翻译：本发明的实施例一般涉及一种电阻式开关非易失性存储元件，其形成在电阻式开关存储器件中，其可用于存储阵列中以存储数字数据。存储元件通常构造为金属 - 绝缘体 - 金属叠层。存储元件的电阻开关部分包括吸气部分和/或缺陷部分。通常，吸气剂部分是存储元件的区域，其用于帮助在电阻式开关存储器件的制造过程期间形成与其余部分相比具有更多数量的空位或缺陷的电阻式开关层的区域的电阻式开关层。缺陷部分是与电阻开关层的其余部分相比具有更多数量的空位或缺陷的存储元件的区域，并且在电阻式开关存储器件的制造过程期间形成。吸收剂或缺陷部分在形成的存储器件中的添加通常提高了电阻式开关存储器件的可靠性，改进了所形成的存储器件的开关特性，并且可以消除或减少对耗时的附加后制造烧坏的需要或预编程步骤。

39. 发明申请

US20130028003A1 NONVOLATILE MEMORY DEVICE HAVING A CURRENT LIMITING ELEMENT 有权
标题翻译：具有电流限制元件的非易失性存储器件
公开(公告)号：US20130028003A1
公开(公告)日：2013-01-31
申请号：US13353000
申请日：2012-01-18
申请人： Yun Wang , Imran Hashim , Tony Chiang
发明人： Yun Wang , Imran Hashim , Tony Chiang
IPC分类号： H01L45/00 , H01L21/8239 , G11C11/21
CPC分类号： H01L45/1253 , G11C13/0007 , G11C13/003 , G11C2213/56 , G11C2213/76 , H01L27/2409 , H01L27/2436 , H01L27/2463 , H01L45/08 , H01L45/12 , H01L45/1233 , H01L45/145 , H01L45/146 , H01L45/148 , H01L45/1616
摘要： Embodiments of the invention generally include a method of forming a nonvolatile memory device that contains a resistive switching memory element that has an improved device switching performance and lifetime, due to the addition of a current limiting component disposed therein. In one embodiment, the current limiting component comprises at least one layer of resistive material that is configured to improve the switching performance and lifetime of the formed resistive switching memory element. The electrical properties of the formed current limiting layer, or resistive layer, are configured to lower the current flow through the variable resistance layer during the logic state programming steps (i.e., “set” and “reset” steps) by adding a fixed series resistance in the formed resistive switching memory element found in the nonvolatile memory device.
摘要翻译：本发明的实施例通常包括一种形成非易失性存储器件的方法，该非易失性存储器件包含由于添加限定在其中的限流部件而具有改进的器件切换性能和寿命的电阻式开关存储元件。在一个实施例中，限流部件包括至少一层电阻材料，其被配置为提高所形成的电阻式开关存储元件的开关性能和寿命。形成的限流层或电阻层的电性能被配置为通过在形成的电阻中添加固定的串联电阻来在逻辑状态编程步骤（即，设置和复位步骤）期间降低通过可变电阻层的电流在非易失性存储器件中发现的切换存储器元件。

40. 发明申请

US20100048419A1 Combinatorial Screening Method and Apparatus 有权
标题翻译：组合筛选方法和装置
公开(公告)号：US20100048419A1
公开(公告)日：2010-02-25
申请号：US12504232
申请日：2009-07-16
申请人： Imran Hashim , Sandra Malhotra , Ryan Clarke , Sunil Shanker , Yun Wang , Yoram Schwarz
发明人： Imran Hashim , Sandra Malhotra , Ryan Clarke , Sunil Shanker , Yun Wang , Yoram Schwarz
IPC分类号： C40B30/10 , C40B60/12
CPC分类号： H01L22/20 , H01L22/14 , H01L45/06 , H01L45/1233 , H01L45/126 , H01L45/144 , H01L45/16
摘要： A combinatorial screening method and system are provided. The combinatorial system and method provide rapid data generation for characterization of phase change material. The characterization data is collected through a multipoint probe card where multiple regions are characterized in a single annealing cycle.
摘要翻译：提供组合筛选方法和系统。组合系统和方法提供用于表征相变材料的快速数据生成。通过多点探针卡收集特征数据，其中多个区域在单个退火循环中表征。

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