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    • 32. 发明授权
    • Production of stable aqueous silica sol
    • 生产稳定的水性硅胶
    • US5196177A
    • 1993-03-23
    • US641709
    • 1991-01-15
    • Yoshitane WatanabeYoshiyuki KashimaKenji Tanimoto
    • Yoshitane WatanabeYoshiyuki KashimaKenji Tanimoto
    • C01B33/149
    • C01B33/149
    • A sol of flat silica particles (100-1000 nm in size) is produced by the following steps (a) to (d) from an acidic aqueous sol (S.sub.0) of negatively charged silica particles (7-30 nm in diameter) and an aqueous solution (B) of basic aluminum or zirconium salt.(a) mixing 100 parts by weight (as SiO.sub.2) of the sol (S.sub.0) with 0.2-10 parts by weight (as Al.sub.2 O.sub.3 or ZrO.sub.2) of the aqueous solution (B), and adjusting the resulting sol to pH 4-7, thereby yielding a sol (S.sub.1),(b) mixing 100 parts by weight (as SiO.sub.2) of the sol (S.sub.1) with 20-200 parts by weight (as SiO.sub.2) of the sol (S.sub.0), and adjusting the resulting sol to pH 4-7, thereby yielding a sol (S.sub.2),(c) mixing 100 parts by weight (as SiO.sub.2) of the sol (S.sub.2) with the aqueous solution (B) in an amount corresponding to 2-50% of the amount (as Al.sub.2 O.sub.3 or ZrO.sub.2 in parts by weight) added to 100 parts by weight (as SiO.sub.2) of the sol (S.sub.0) used in step (a), and adjusting the resulting sol to pH 4-7, thereby yielding a sol (S.sub.3), and(d) mixing 100 parts by weight (as SiO.sub.2) of the sol (S.sub.3) with the sol (S.sub.0) in an amount corresponding to 10-95% of the amount (as SiO.sub.2 in parts by weight) added to 100 parts by weight (as SiO.sub.2) of the sol (S.sub.1) in step (b), and adjusting the resulting sol to pH 4-7, thereby yielding a sol (S.sub.4).
    • 36. 发明授权
    • Moniliform silica sol, process for producing the same, and ink-jet recording medium
    • 单晶硅溶胶,其制造方法和喷墨记录介质
    • US06632489B1
    • 2003-10-14
    • US09763965
    • 2001-02-28
    • Yoshitane WatanabeYoshiyuki KashimaKiyomi EmaYutaka Ohmori
    • Yoshitane WatanabeYoshiyuki KashimaKiyomi EmaYutaka Ohmori
    • B32B300
    • B41M5/5218B41M2205/12C01B33/1485
    • A stable silica sol having an SiO2 concentration of 1 to 50% by weight and containing liquid-medium dispersed moniliform colloidal silica particles each having 3 or more as a ratio of D1/D2 of a particle diameter (D1 nm) measured by a dynamic light scattering method to a mean particle diameter (a particle diameter measured by a nitrogen absorption method: D2 nm) where D1 is 50 to 500 nm, and which are comprised by spherical colloidal silica particles having a mean particle diameter of 10 to 80 nm and metal oxide-containing silica bonding these spherical-colloidal silica particles, and in which the spherical colloidal silica particles link in rows in only one plane, process for producing such and a coating composition for ink receiving layers containing such a silica sol and an ink jet recording medium.
    • 一种稳定的硅溶胶,其SiO 2浓度为1〜50重量%,含有液体介质分散的单状胶体二氧化硅粒子,其分别具有3个以上的D < 具有粒径(D 1 nm的HIL> 1 / D 2 )通过动态光散射法测量为平均粒径(通过氮吸收法测量的粒径:D 2 PDAT> nm)其中D 1 为50〜500nm,由平均粒径为10〜80nm的球形胶体二氧化硅粒子和与这些球状胶体二氧化硅粒子结合的含金属氧化物的二氧化硅粒子构成, 球形胶体二氧化硅颗粒仅在一个平面中成行排列,制备方法和用于含有这种二氧化硅溶胶和喷墨记录介质的油墨接收层的涂料组合物。
    • 38. 发明授权
    • Elongated-shaped silica sol and method for preparing the same
    • 细长形硅胶及其制备方法
    • US5221497A
    • 1993-06-22
    • US746634
    • 1991-08-19
    • Yoshitane WatanabeMikio AndoKenji TanimotoTsutomu KagamimiyaMakoto Kawashima
    • Yoshitane WatanabeMikio AndoKenji TanimotoTsutomu KagamimiyaMakoto Kawashima
    • C01B33/145C01B33/148
    • C01B33/148C01B33/145
    • A method for preparing a stable silica sol having an SiO.sub.2 concentration of 40% or less, the colloidal particles of said silica having a particle size of 40 to 500 nm, as measured by dynamic light-scattering and having an elongated shape having a thickness of 5 to 40 nm and an elongation of 5 to 30 times the thickness in only one plane, the method comprising the steps (a), (b) and (c): (a) mixing an aqueous solution of Ca or Mg salt with an aqueous solution of active silicic acid having an SiO.sub.2 concentration of 1 to 6% and a pH value of 2 to 5, or with an aqueous acidic silica sol having a particle size of 3 to 30 nm, an SiO.sub.2 concentration of 0.5 to 25% and a pH value of 1 to 5 in a weight ratio of 1500 to 10000 ppm of (CaO or MgO)/SiO.sub.2 ; (b) mixing an alkali metal hydroxide with the solution obtained by step (a) in a molar ratio of 20 to 300 as SiO.sub.2 /M.sub.2 O, wherein M represents an alkali metal atom; and (c) heating the mixture obtained by step (b) at 60.degree. to 300.degree. C. for 0.5 to 40 hours.
    • 制备SiO 2浓度为40%以下的稳定的二氧化硅溶胶的方法,通过动态光散射测定的所述二氧化硅的粒径为40〜500nm的胶体粒子,其厚度为 (a),(b)和(c)的方法:(a)将Ca或Mg盐水溶液与 SiO 2浓度为1〜6%,pH值为2〜5的活性硅酸水溶液,或粒径为3〜30nm,SiO 2浓度为0.5〜25%的酸性硅酸水溶液,以及 (CaO或MgO)/ SiO 2的重量比为1500〜10000ppm的pH值为1〜5; (b)将碱金属氢氧化物与作为SiO 2 / M 2 O的摩尔比为20〜300的步骤(a)得到的溶液混合,其中M表示碱金属原子; 和(c)将步骤(b)获得的混合物在60℃至300℃下加热0.5至40小时。