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    • 34. 发明授权
    • Method for cleaning photo mask
    • 清洁光罩的方法
    • US07718008B2
    • 2010-05-18
    • US11839655
    • 2007-08-16
    • Shu ShimadaNoriyuki TakahashiHiroko TanakaHiroyuki IshiiYusuke ShojiMasashi Ohtsuki
    • Shu ShimadaNoriyuki TakahashiHiroko TanakaHiroyuki IshiiYusuke ShojiMasashi Ohtsuki
    • B08B7/00G01N21/00
    • G03F7/70925G03F1/64G03F1/82
    • The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost. The method for cleaning a photo mask with a pellicle mounted, in which the pellicle frame has a gas introducing hole and a gas discharging hole, comprises: a step of introducing a gaseous substituting substance from the gas introducing hole in a pellicle inner space surrounded by the photo mask and the pellicle, substituting foreign substances on the photo mask, and discharging the foreign substances from the gas discharging hole; and a step of irradiating an ultraviolet ray to the photo mask, while an air or a nitrogen gas or a rare gas is introduced from the gas introducing hole, for degrading the substituted substituting substance so as to be gaseous, and discharging the same from the gas discharging hole.
    • 本发明提供了一种清洁光掩模的方法,而不需要除去安装在光掩模上的防护薄膜组件,而不需要用溶液洗涤的大规模设备,具有少量用于清洁和检查的步骤,并且没有 增加生产成本。 用防护薄膜组件清洁光罩的方法,其中防护薄膜组件框架具有气体导入孔和气体排出孔,包括:将气体取代物质从气体导入孔引入防护薄膜组件内部空间的步骤, 光掩模和防护薄膜组件,在光掩模上代替异物,并从排气孔排出异物; 以及从气体导入孔导入空气或氮气或稀有气体而将紫外线照射到光掩模的步骤,使取代的取代物质降解成气态,并将其从 气体排放孔。