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    • 31. 发明授权
    • Non-volatile memory
    • 非易失性存储器
    • US07804122B2
    • 2010-09-28
    • US12434828
    • 2009-05-04
    • Chin-Hsien ChenYing-Tso ChenChien-Hung LiuShou-Wei Huang
    • Chin-Hsien ChenYing-Tso ChenChien-Hung LiuShou-Wei Huang
    • H01L31/119
    • H01L27/115H01L27/11521H01L27/11568H01L29/7881H01L29/792
    • A non-volatile memory includes a substrate having two openings, a stacked gate structure disposed on the substrate between the two openings, a liner disposed on a bottom of each of the two openings and parts of a sidewall of each of the two openings, a second conductive layer disposed on the liner at the bottom of each of the two openings, and a third conductive layer on the second conductive layer and the liner. The stacked gate structure includes a first dielectric layer, a charge storage layer, a second dielectric layer, and a first conductive layer. The liner has a top surface lower than that of the substrate. The second conductive layer has a top surface co-planar with that of the liner. The third conductive layer has a top surface at least co-planar with that of the substrate and lower than that of the first dielectric layer.
    • 非易失性存储器包括具有两个开口的衬底,设置在两个开口之间的衬底上的堆叠栅极结构,设置在两个开口中的每一个的底部和两个开口中的每一个的侧壁的一部分的衬垫, 设置在两个开口中的每一个的底部的衬垫上的第二导电层,以及在第二导电层和衬垫上的第三导电层。 层叠栅极结构包括第一介电层,电荷存储层,第二介电层和第一导电层。 衬垫具有比衬底更低的顶表面。 第二导电层具有与衬垫的顶表面共面的顶表面。 第三导电层具有至少与基底的共面的顶表面,并且低于第一介电层的顶表面。
    • 36. 发明授权
    • Method for forming embedded non-volatile memory
    • 嵌入式非易失性存储器的形成方法
    • US06559010B1
    • 2003-05-06
    • US10003320
    • 2001-12-06
    • Tung-Cheng KuoShou-Wei HwangChien-Hung LiuShyi-Shuh Pan
    • Tung-Cheng KuoShou-Wei HwangChien-Hung LiuShyi-Shuh Pan
    • H01L218247
    • H01L27/11568H01L27/105H01L27/11573
    • A method is described for forming a non-volatile memory comprising dividing a substrate into at least a memory array area and a logic device area. An oxide/nitride/oxide (ONO) layer is firstly formed on the substrate, and a photoresist layer is formed on the ONO layer by bit line photo process, and a bit line ion implantation process is performed on the substrate to form the plurality of bit lines structure. Then, a first polysilicon layer is deposited to form a plurality of word lines by word line photo condition. The complementary metal-oxide-semiconductor (CMOS) ONO layer is used to store the charge and the ONO layer is only touched by the photoresist layer once. Furthermore, the separated adjust photo condition of the memory array area and the logic device area can create a safe oxide thickness to solve the problem of leakage path between bit lines to bit lines by using a self-aligned silicide process.
    • 描述了一种用于形成非易失性存储器的方法,包括将衬底划分成至少存储器阵列区域和逻辑器件区域。 首先在衬底上形成氧化物/氮化物/氧化物(ONO)层,并且通过位线光刻工艺在ONO层上形成光致抗蚀剂层,并在衬底上进行位线离子注入工艺以形成多个 位线结构。 然后,通过字线照片条件沉积第一多晶硅层以形成多个字线。 互补金属氧化物半导体(CMOS)ONO层用于存储电荷,并且ONO层仅被光致抗蚀剂层触及一次。 此外,存储器阵列区域和逻辑器件区域的分离的调整照相条件可以产生安全的氧化物厚度,以通过使用自对准硅化物处理来解决位线到位线之间的泄漏路径的问题。