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31. 发明申请

US20090257647A1 Method and Apparatus for Inspecting Defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20090257647A1
公开(公告)日：2009-10-15
申请号：US12420932
申请日：2009-04-09
申请人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
发明人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
IPC分类号： G06K9/00 , H04N5/335
CPC分类号： G06K9/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148 , H04N5/341 , H04N5/3743 , H04N5/378
摘要： A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.
摘要翻译：将二维传感器安装成倾斜预定角度，使其与安装被检查物体的平台的移动方向倾斜，并且与舞台的移动同步，拾取图像被重新排列，使得可以以相对于晶片的二维传感器的像素大小或更小的高密度采样获得图像。因此，位置对准中的插补计算变得不必要，可以高精度地执行缺陷的尺寸计算和分类。

32. 发明申请

US20080068593A1 METHOD AND APPARATUS FOR DETECTING DEFECTS 审中-公开
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20080068593A1
公开(公告)日：2008-03-20
申请号：US11853050
申请日：2007-09-11
申请人： HIROYUKI NAKANO , Yasuhiro Yoshitake , Toshihiko Nakata , Taketo Ueno
发明人： HIROYUKI NAKANO , Yasuhiro Yoshitake , Toshihiko Nakata , Taketo Ueno
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/21 , G01N21/95607 , G01N2201/0655
摘要： A defect detecting apparatus for detecting defects on a substrate sample (wafer) having circuit patterns such as interconnections. The defect detecting apparatus is provided with stages that can be moved arbitrarily in each of the X, Y, Z, and θ directions in a state that the substrate sample is mounted thereon, an illumination optical system for illuminating the circuit patterns from one or plural directions, and a detection optical system for detecting reflection light, diffraction light, or scattered light coming from an inspection region being illuminated through almost the entire hemispherical surface having the substrate sample as the bottom surface. The NA (numerical aperture) thereby falls within a range of 0.7 to 1.0. Harmful defects or foreign substances can be detected so as to be separated from non-defects such as surface roughness of interconnections.
摘要翻译：一种用于检测具有诸如互连之类的电路图案的衬底样品（晶片）上的缺陷的缺陷检测装置。该缺陷检测装置设置有可以在其上安装衬底样品的状态下在X，Y，Z和θ方向中的任一个中任意移动的阶段，用于从一个或多个照明电路图案的照明光学系统方向，以及用于检测来自检查区域的反射光，衍射光或散射光的检测光学系统，该检查区域被基底样品的几乎整个半球形表面照射作为底面。 NA（数值孔径）因此落在0.7至1.0的范围内。可以检测有害的缺陷或异物，以便与诸如互连的表面粗糙度的无缺陷分离。

33. 发明申请

US20070109557A1 Method for optically detecting height of a specimen and charged particle beam apparatus using the same 有权
标题翻译：用于光学检测样品的高度的方法和使用其的带电粒子束装置的方法
公开(公告)号：US20070109557A1
公开(公告)日：2007-05-17
申请号：US11591563
申请日：2006-11-02
申请人： Keiya Saito , Masahiro Watanabe , Yasuhiro Yoshitake
发明人： Keiya Saito , Masahiro Watanabe , Yasuhiro Yoshitake
IPC分类号： G01B11/24
CPC分类号： G01B11/0608 , H01J37/20 , H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/20292 , H01J2237/216 , H01J2237/2482 , H01J2237/2817
摘要： The present invention provides an optical height detection method and electron beam apparatus to which the method is applied, in which the focusing accuracy of the CD-SEM apparatus, a SEM inspection apparatus, and others is improved by reducing detection errors and improving detection accuracy so as to improve the accuracy of the optical height detection method, and throughput of a CD-SEM apparatus or others is improved by reducing the processing time of automatic focus control performed based on the detected height according to the optical height detection method. An optical detection optical system projects two-dimensional slit light to a measurement object from diagonally above it, detects the light reflected by the measurement object, converts a detected two-dimensional slit image into an electrical signal by a two-dimensional area sensor, eliminates slit parts having a large detection error from the electrical signal, and detects the height of the measurement object.
摘要翻译：本发明提供了采用该方法的光学高度检测方法和电子束装置，其中通过降低检测误差并提高检测精度来提高CD-SEM装置，SEM检查装置等的聚焦精度为了提高光学高度检测方法的精度，通过根据光学高度检测方法减少基于检测到的高度进行的自动聚焦控制的处理时间来提高CD-SEM装置等的生产量。光学检测光学系统将二维狭缝光从对角线投射到测量对象上，检测由测量对象反射的光，通过二维区域传感器将检测到的二维狭缝图像转换为电信号，消除狭缝部分具有来自电信号的大的检测误差，并且检测测量对象的高度。

34. 发明申请

US20060215171A1 Method and apparatus for measuring displacement of a sample 有权
公开(公告)号：US20060215171A1
公开(公告)日：2006-09-28
申请号：US11188732
申请日：2005-07-26
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.

35. 发明申请

US20060108524A1 Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method 有权
标题翻译：尺寸测量SEM系统，电路图案形状评估方法和执行该方法的系统
公开(公告)号：US20060108524A1
公开(公告)日：2006-05-25
申请号：US11260082
申请日：2005-10-28
申请人： Wataru Nagatomo , Ryoichi Matsuoka , Takumichi Sutani , Akiyuki Sugiyama , Yasuhiro Yoshitake , Hideaki Sasazawa
发明人： Wataru Nagatomo , Ryoichi Matsuoka , Takumichi Sutani , Akiyuki Sugiyama , Yasuhiro Yoshitake , Hideaki Sasazawa
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , G03F1/36 , G03F1/68 , G03F7/70625 , H01J37/222 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817
摘要： The present invention relates to a dimension measuring SEM system and a circuit pattern evaluating system capable of achieving accurate, minute OPC evaluation, the importance of which increase with the progressive miniaturization of design pattern of a circuit pattern for a semiconductor device, and a circuit pattern evaluating method. Design data and measured data on an image of a resist pattern formed by photolithography are superposed for the minute evaluation of differences between a design pattern defined by the design data and the image of the resist pattern, and one- or two-dimensional geometrical features representing differences between the design pattern and the resist pattern are calculated. In some cases, the shape of the resist pattern differs greatly from the design pattern due to OPE effect (optical proximity effect). To superpose the design data and the measured data on the resist pattern stably and accurately, an exposure simulator calculates a simulated pattern on the basis of photomask data on a photomask for an exposure process and exposure conditions and superposes the simulated pattern and the image of the resist pattern.
摘要翻译：本发明涉及一种尺寸测量SEM系统和电路图案评估系统，其能够实现精确的分钟OPC评估，其随着半导体器件的电路图案的设计图案的逐渐小型化以及电路图案的增加而增加的重要性评估方法。将通过光刻形成的抗蚀剂图案的图像上的设计数据和测量数据叠加以便对由设计数据定义的设计图案与抗蚀剂图案的图像之间的差异进行微分评估，以及表示一维或二维几何特征计算设计图案和抗蚀剂图案之间的差异。在某些情况下，由于OPE效应（光学邻近效应），抗蚀剂图案的形状与设计图案有很大的不同。为了稳定准确地将设计数据和测量数据叠加在抗蚀剂图案上，曝光模拟器基于用于曝光处理和曝光条件的光掩模上的光掩模数据计算模拟图案，并将模拟图案和图像抗蚀图案

36. 发明申请

US20050225695A1 Apparatus for optically arranging surface of alignment film and method for manufacturing liquid crystal display device using the same 有权
标题翻译：用于光学配置取向膜表面的装置及使用其制造液晶显示装置的方法
公开(公告)号：US20050225695A1
公开(公告)日：2005-10-13
申请号：US11103491
申请日：2005-04-12
申请人： Takeshi Arai , Yasuhiro Yoshitake , Shigeru Matsuyama
发明人： Takeshi Arai , Yasuhiro Yoshitake , Shigeru Matsuyama
IPC分类号： G02B5/30 , G02B27/28 , G02F1/1337 , G02F1/1347
CPC分类号： G02F1/133788 , G02B27/28
摘要： Work is irradiated with polarized light generated by configuring in such a manner as to have a polarizer using a grating that separates polarized light from non-polarized light, a lamp and a condenser mirror that allow light to fall on the polarizer, a collimator lens that converts the incoming light into parallel beams, an integrator lens that uniformizes intensity distribution of light radiated from the polarizer, and a diffusion lens with functions to enlarge or contract the irradiated range to the work size, and by forming protrusions and recesses of the shape, material, and size that fit to the desired wavelength on a substrate such as quartz, etc. that transmit ultraviolet light, and by providing the light-polarizing performance by appropriately providing an incident angle. By carrying out this processing, the alignment film in the liquid crystal display element can be photo-aligned at high accuracy and uniformly.
摘要翻译：用通过配置的偏振光照射产生的偏振光，使得具有使偏振光与非偏振光分离的光栅的偏振器，允许光落在偏振器上的灯和聚光镜，准直透镜将入射光转换为平行光束，使从偏振器辐射的光的强度分布均匀的积分透镜和具有将照射范围扩大或收缩至工作尺寸的功能的漫射透镜，并且通过形成形状的突起和凹部，材料和尺寸，其适合于透射紫外光的基板（例如石英等）上的期望波长，并且通过适当地提供入射角提供光偏振性能。通过进行这种处理，液晶显示元件中的取向膜可以高精度和均匀地光取向。

37. 发明授权

US08416402B2 Method and apparatus for inspecting defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US08416402B2
公开(公告)日：2013-04-09
申请号：US13483104
申请日：2012-05-30
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N2021/9563 , G03F7/7065
摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
摘要翻译：提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽二维数组。

38. 发明授权

US08148705B2 Method and apparatus for inspecting defects of patterns formed on a hard disk medium 有权
标题翻译：用于检查形成在硬盘介质上的图案的缺陷的方法和装置
公开(公告)号：US08148705B2
公开(公告)日：2012-04-03
申请号：US12314938
申请日：2008-12-19
申请人： Takenori Hirose , Masahiro Watanabe , Yasuhiro Yoshitake
发明人： Takenori Hirose , Masahiro Watanabe , Yasuhiro Yoshitake
IPC分类号： G01N21/86 , G01V8/00
CPC分类号： G11B5/82 , B82Y10/00 , G01N21/55 , G01N21/95607 , G01N2021/95615 , G11B5/743 , G11B5/855 , G11B20/18 , G11B2220/2516
摘要： If an inspection method for inspecting a patterned medium is intended for the nanoimprint process control, it is necessary to measure a correct shape of each pattern element. On the other hand, if the inspection method is intended for the quality control of products, it is necessary to inspect the products on a I00 percent basis. However, the conventional method which uses SEM or AFM could not satisfy these requirements. According to the present invention, IO0-percent inspection of products becomes possible by a method including the steps of: irradiating a surface of a hard disk medium, on which a magnetic material pattern is formed, with a light beam including a plurality of wavelengths; detecting the intensity of a reflected light beam from the hard disk medium on a wavelength basis; calculating a spectral reflectance from the detected intensity of the reflected light beam; and detecting a shape of each pattern element formed on the hard disk medium on the basis of the calculated spectral reflectance.
摘要翻译：如果用于检查图案化介质的检查方法用于纳米压印过程控制，则需要测量每个图案元件的正确形状。另一方面，如果检验方法是为了产品的质量控制，则以百分之百为基础检查产品是必要的。然而，使用SEM或AFM的常规方法不能满足这些要求。根据本发明，通过包括以下步骤的方法可以进行产品的IO0百分比检查：用形成有多个波长的光束照射形成有磁性材料图案的硬盘介质的表面; 以波长为基础检测来自硬盘介质的反射光束的强度; 根据所检测的反射光束的强度计算光谱反射率; 并根据计算出的光谱反射率检测形成在硬盘介质上的每个图形元素的形状。

39. 发明申请

US20120062903A1 METHOD AND APPARATUS FOR MEASURING DISPLACEMENT OF A SAMPLE TO BE INSPECTED USING AN INTERFERENCE LIGHT 有权
标题翻译：用于测量使用干扰光检测样品的位移的方法和装置
公开(公告)号：US20120062903A1
公开(公告)日：2012-03-15
申请号：US13302948
申请日：2011-11-22
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.
摘要翻译：在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

40. 发明申请

US20120019816A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS 审中-公开
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120019816A1
公开(公告)日：2012-01-26
申请号：US13145138
申请日：2010-01-06
申请人： Yukihiro Shibata , Toshihiko Nakata , Toshifumi Honda , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Toshihiko Nakata , Toshifumi Honda , Yasuhiro Yoshitake
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N21/21 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N21/95607
摘要： The present invention provides a spatial filtering technology for exposing a defect image independently of polarization properties of defect scattered light, a defect inspection method for increasing a defect capture rate by suppressing the brightness saturation of a normal pattern, and a defect inspection apparatus that uses the defect inspection method. An array of spatial filters is disposed in one or more optical paths, which are obtained by polarizing and splitting a detection optical path, to filter diffracted light and scattered light emitted from the normal pattern. An image whose brightness saturation is suppressed is obtained by controlling an illumination light amount and/or detection efficiency during image detection in accordance with the amount of scattered light from the normal pattern.
摘要翻译：本发明提供了一种独立于缺陷散射光的偏振特性曝光缺陷图像的空间滤波技术，通过抑制正常图案的亮度饱和来增加缺陷捕获率的缺陷检查方法，以及使用缺陷检查方法。空间滤波器阵列设置在通过偏振和分离检测光路获得的一个或多个光路中，以滤除衍射光和从正常图案发射的散射光。根据来自正常图案的散射光的量，通过控制图像检测期间的照明光量和/或检测效率来获得亮度饱和度被抑制的图像。

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