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    • 31. 发明授权
    • Process for improving cellulose fiber properties and for dyeing the same
    • 改善纤维素纤维性能并进行染色的方法
    • US4142853A
    • 1979-03-06
    • US696709
    • 1976-06-16
    • Yasuhiko TeradaJun YasudaMasao Kuriyama
    • Yasuhiko TeradaJun YasudaMasao Kuriyama
    • D06P5/00D06M13/02D06M13/184D06M101/00D06M101/02D06M101/06D06M101/08D06P5/22D06P5/28D06M13/20
    • D06P5/005D06M13/184D06P5/22
    • A process for improving the properties, particularly the dyeing properties, of cellulose fibers. The process comprises impregnating cellulose fiber with an aromatic acyl halide and thereafter immersing the impregnated fiber into an aqueous solution containing more than about 10% by weight of an alkali hydroxide to acylate the cellulose fiber on the surface portion thereof. In another embodiment of the invention, a continuous process for improving the properties of cellulose fiber yarn or fabric is provided. According to the continuous process, uniform acylation is achieved by maintaining the yarn or fabric in a stretched state during impregnation with the aromatic acyl halide and during the initial stages of immersion in the aqueous alkali hydroxide. The acylated cellulose fiber produced according to the invention may be dyed with good color fastness with disperse dyes and still retain the soft tactility characteristic of the fiber.
    • 用于改善纤维素纤维的性能,特别是染色性能的方法。 该方法包括用芳族酰卤浸渍纤维素纤维,然后将浸渍的纤维浸入含有大于约10重量%的碱金属氢氧化物的水溶液中以在其表面部分上酰化纤维素纤维。 在本发明的另一个实施方案中,提供了用于改善纤维素纤维纱线或织物的性能的连续方法。 根据连续方法,通过在用芳族酰卤浸渍过程中和在浸入碱性氢氧化碱水溶液的初始阶段期间将纱线或织物保持在拉伸状态来实现均匀酰化。 根据本发明生产的酰化纤维素纤维可以用分散染料染色,具有良好的色牢度,并且仍保留纤维的柔软的触感特性。
    • 36. 发明授权
    • Nonvolatile semiconductor memory
    • 非易失性半导体存储器
    • US06711066B2
    • 2004-03-23
    • US10198170
    • 2002-07-19
    • Toru TanzawaTadayuki TauraMasao Kuriyama
    • Toru TanzawaTadayuki TauraMasao Kuriyama
    • G11C700
    • G11C16/107G11C16/30G11C16/3409G11C16/344G11C16/3445G11C16/3459G11C16/3477
    • A potential generating circuit generates two types of erase verify threshold values EVT1 and EVT2. These values satisfy the relationship of EVT2=EVT1+(OEVT−EVTL). OEVT is an over-erase verify threshold value. While the erase verify threshold value is set at EVT2, the lower limit of a threshold voltage distribution after data erase is higher than OEVT. EVTL is the lower limit of the threshold voltage distribution after data erase while the erase verify threshold value is set at EVT1 and is lower than OEVT. The erase verify threshold values EVT1 and EVT2 are switched according to an operation mode. During a write/erase test, for example, the erase verify threshold value is set at EVT2. On the other hand, during the normal operation, the erase verify threshold value is set at EVT1.
    • 电位产生电路产生两种类型的擦除验证阈值EVT1和EVT2。 这些值满足EVT2 = EVT1 +(OEVT-EVTL)的关系。 OEVT是过擦除验证阈值。 当擦除验证阈值设定为EVT2时,数据擦除后阈值电压分布的下限高于OEVT。 EVTL是数据擦除后的阈值电压分布的下限,擦除验证阈值设定为EVT1,低于OEVT。 根据操作模式切换擦除验证阈值EVT1和EVT2。 在写入/擦除测试期间,例如,擦除验证阈值被设置为EVT2。 另一方面,在正常操作期间,将擦除验证阈值设置为EVT1。
    • 38. 发明授权
    • Nonvolatile semiconductor memory
    • 非易失性半导体存储器
    • US06442080B2
    • 2002-08-27
    • US09812572
    • 2001-03-21
    • Toru TanzawaTadayuki TauraMasao Kuriyama
    • Toru TanzawaTadayuki TauraMasao Kuriyama
    • G11C1140
    • G11C16/107G11C16/30G11C16/3409G11C16/344G11C16/3445G11C16/3459G11C16/3477
    • A potential generating circuit generates two types of erase verify threshold values EVT1 and EVT2. These values satisfy the relationship of EVT2=EVT1+(OEVT−EVTL). OEVT is an over-erase verify threshold value. While the erase verify threshold value is set at EVT2, the lower limit of a threshold voltage distribution after data erase is higher than OEVT. EVTL is the lower limit of the threshold voltage distribution after data erase while the erase verify threshold value is set at EVT1 and is lower than OEVT. The erase verify threshold values EVT1 and EVT2 are switched according to an operation mode. During a write/erase test, for example, the erase verify threshold value is set at EVT2. On the other hand, during the normal operation, the erase verify threshold value is set at EVT1.
    • 电位产生电路产生两种类型的擦除验证阈值EVT1和EVT2。 这些值满足EVT2 = EVT1 +(OEVT-EVTL)的关系。 OEVT是过擦除验证阈值。 当擦除验证阈值设定为EVT2时,数据擦除后阈值电压分布的下限高于OEVT。 EVTL是数据擦除后的阈值电压分布的下限,擦除验证阈值设定为EVT1,低于OEVT。 根据操作模式切换擦除验证阈值EVT1和EVT2。 在写入/擦除测试期间,例如,擦除验证阈值被设置为EVT2。 另一方面,在正常操作期间,将擦除验证阈值设置为EVT1。
    • 40. 发明授权
    • Hard x-ray magnification apparatus and method with submicrometer spatial
resolution of images in more than one dimension
    • 硬X射线放大装置和方法,具有亚微米尺度多维图像中的空间分辨率
    • US5259013A
    • 1993-11-02
    • US808850
    • 1991-12-17
    • Masao KuriyamaRonald C. DobbynRichard D. Spal
    • Masao KuriyamaRonald C. DobbynRichard D. Spal
    • G21K1/06G21K7/00
    • G21K1/06G21K7/00
    • An apparatus and a method are provided for employing hard monochromatic x-rays to generate high resolution, dimensionally altered undistorted images of either the internal structure or surface feature details of a specimen at the submicron level in up to three-dimensions. A monochromatic hard x-ray beam is applied to the specimen and thereafter is directed to arrive at a small angle of incidence at a preferably flat, optically polished surface of a nearly perfect crystal, to be diffracted at the surface thereof to carry a first one-dimensional alteration of the image of the observed structure of the specimen. This x-ray beam is then directed, at a small angle of incidence, to the surface of a second nearly perfect crystal, the receiving surface being oriented orthogonal to the surface of the first nearly perfect crystal, to generate a further diffracted beam containing an undistorted two-dimensionally altered inverted image of the specimen with micrometer spatial resolution. The "magnification factor" of the same set of highly-perfect crystals can be varied by zooming by changing the x-ray energy of the incident beam. This last beam is received on a CCD array for direct conversion of x-ray photons into electrical charges and storage and processing of the resultant data in digitized form. By a small controlled rotation to the specimen relative to the apparatus, additional two-dimensional data are obtained and may be processed to generate high resolution three-dimensional images of the specimen structure.
    • 提供了一种装置和方法,用于使用硬单色x射线以最多三维的方式在亚微米级别产生样品的内部结构或表面特征细节的高分辨率,尺寸改变的未失真图像。 将单色硬x射线束施加到样本上,然后被引导到在几乎完美的晶体的优选平坦的,光学抛光的表面上以小的入射角度到达,以在其表面衍射以携带第一个 观察到的样本结构的图像的维度改变。 然后将该X射线束以小的入射角被引导到第二接近完美晶体的表面,接收表面定向成与第一近似完美的晶体的表面正交,以产生另外的衍射光束,其包含 用千分尺空间分辨率进行未失真的二维改变的样本倒置图像。 通过改变入射光束的X射线能量,可以通过变焦来改变同一组高度完美的晶体的“放大系数”。 该最后一个光束被接收在CCD阵列上,用于将x射线光子直接转换成电荷并以数字形式存储和处理所得数据。 通过相对于装置对样本的小的受控旋转,获得额外的二维数据,并且可以处理以产生样本结构的高分辨率三维图像。