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    • 36. 发明授权
    • Method of measuring a deviation of an optical surface from a target shape
    • 测量光学表面与目标形状的偏差的方法
    • US08264695B2
    • 2012-09-11
    • US13030748
    • 2011-02-18
    • Ralf ArnoldStefan SchulteBernd Doerband
    • Ralf ArnoldStefan SchulteBernd Doerband
    • G01B11/02
    • G01B9/021G01B9/02039G01B11/2441G01M11/025G01M11/0271Y10T29/49771
    • A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
    • 对准至少两个波形整形元件的方法,测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法,其中每个波形整形元件具有衍射测量结构,用于将入射光的一部分波前适应到目标形状的相应部分,包括:提供第一波 具有衍射对准结构的成形元件,将波形整形元件相对于彼此布置,使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过,并且对准第一波形整形 元件和第二波形成形元件相对于彼此,通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。
    • 37. 发明授权
    • Method of measuring a deviation of an optical surface from a target shape
    • 测量光学表面与目标形状的偏差的方法
    • US07936521B2
    • 2011-05-03
    • US12684600
    • 2010-01-08
    • Ralf ArnoldStefan SchulteBernd Doerband
    • Ralf ArnoldStefan SchulteBernd Doerband
    • G02B13/18
    • G01B9/021G01B9/02039G01B11/2441G01M11/025G01M11/0271Y10T29/49771
    • A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
    • 对准至少两个波形整形元件的方法,测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法,其中每个波形整形元件具有衍射测量结构,用于将入射光的一部分波前适应到目标形状的相应部分,包括:提供第一波 具有衍射对准结构的成形元件,将波形整形元件相对于彼此布置,使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过,并且对准第一波形整形 元件和第二波形成形元件相对于彼此,通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。
    • 38. 发明申请
    • Methods of testing and manufacturing optical elements
    • 测试和制造光学元件的方法
    • US20080316500A1
    • 2008-12-25
    • US12216106
    • 2008-06-30
    • Stefan SchulteUlrich Andiel
    • Stefan SchulteUlrich Andiel
    • G01B9/02B29D11/00
    • G01B9/02039G01B9/02057G01B11/2441G01B2290/20G01M11/0264G01M11/0271
    • A method of manufacturing an optical element having an optical surface of a non-rotationally symmetric shape is described. Measuring light is generated using an interferometer optics, wherein the interferometer optics has at least one diffractive component having a grating. The optical surface is positioned at a first position relative to the diffractive component, wherein first measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one first interference pattern generated from first measuring light reflected from the optical surface is detected. The optical surface is positioned at a second position relative to the at least one diffractive component, wherein second measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one second interference pattern generated from second measuring light reflected from the optical surface is detected.
    • 描述了具有非旋转对称形状的光学表面的光学元件的制造方法。 使用干涉仪光学器件生成测量光,其中干涉仪光学器件具有至少一个具有光栅的衍射元件。 光学表面位于相对于衍射部件的第一位置处,其中在衍射部件处衍射的第一测量光在其多个位置处入射到光学表面上,并且从第一测量光产生的至少一个第一干涉图案从 检测光学表面。 光学表面位于相对于至少一个衍射部件的第二位置,其中在衍射部件处衍射的第二测量光在其多个位置处入射到光学表面上,并且从第二测量光产生的至少一个第二干涉图案 检测从光学表面反射的光。