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31. 发明授权

US06940034B2 Long life welding electrode and its fixing structure, welding head, and welding method 失效
标题翻译：长寿命焊接电极及其固定结构，焊接头和焊接方法
公开(公告)号：US06940034B2
公开(公告)日：2005-09-06
申请号：US10640105
申请日：2003-08-12
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B23K9/24 , B23K9/28 , B23K35/02 , B23K35/22 , B23K35/38 , B23K9/167
CPC分类号： B23K9/28 , B23K9/24 , B23K35/0205 , B23K35/222 , B23K35/383
摘要： A fixing structure for a welding electrode and a welding head is shown which enable improvement of durability of a welding electrode, improvement of work efficiency in welding, and a reduction of time required for welding and also which make it possible to execute welding for an extended time with high reliability. In the fixing structure, a fixed section of a welding electrode is inserted via a thermally conductive material into an inserting section of a fixing base and a peripheral surface of the fixed section of the welding electrode is uniformly contacted to the fixing base to affix the welding electrode to the fixing base.
摘要翻译：示出了用于焊接电极和焊接头的固定结构，其能够提高焊接电极的耐久性，提高焊接中的工作效率，并且减少焊接所需的时间，并且还可以执行用于扩展的焊接时间高可靠性。在固定结构中，焊接电极的固定部分经由导热材料插入到固定基座的插入部分中，并且焊接电极的固定部分的周面与固定基座均匀接触以固定焊接电极到固定基座。

32. 发明申请

US20050098543A1 Long life welding electrode and its fixing structure, welding head , and welding method 失效
标题翻译：长寿命焊接电极及其固定结构，焊接头和焊接方法
公开(公告)号：US20050098543A1
公开(公告)日：2005-05-12
申请号：US10640105
申请日：2003-08-12
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B23K9/24 , B23K9/28 , B23K35/02 , B23K35/22 , B23K35/38 , B23K9/167
CPC分类号： B23K9/28 , B23K9/24 , B23K35/0205 , B23K35/222 , B23K35/383
摘要： A fixing structure for a welding electrode and a welding head is shown which enable improvement of durability of a welding electrode, improvement of work efficiency in welding, and a reduction of time required for welding and also which make it possible to execute welding for an extended time with high reliability. In the fixing structure, a fixed section of a welding electrode is inserted via a thermally conductive material into an inserting section of a fixing base and a peripheral surface of the fixed section of the welding electrode is uniformly contacted to the fixing base to affix the welding electrode to the fixing base.
摘要翻译：示出了用于焊接电极和焊接头的固定结构，其能够提高焊接电极的耐久性，提高焊接中的工作效率，并且减少焊接所需的时间，并且还可以执行用于扩展的焊接时间高可靠性。在固定结构中，焊接电极的固定部分经由导热材料插入到固定基座的插入部分中，并且焊接电极的固定部分的周面与固定基座均匀地接触以固定焊接电极到固定基座。

33. 发明授权

US5858106A Cleaning method for peeling and removing photoresist 失效
标题翻译：去除光刻胶的清洗方法
公开(公告)号：US5858106A
公开(公告)日：1999-01-12
申请号：US781229
申请日：1997-01-10
申请人： Tadahiro Ohmi , Senri Ojima , Takahisa Nitta
发明人： Tadahiro Ohmi , Senri Ojima , Takahisa Nitta
IPC分类号： B08B3/02 , B08B3/10 , B08B3/12 , G03F7/42 , H01L21/00 , H01L21/304 , H01L21/306 , H01L21/308
CPC分类号： H01L21/67057 , B08B3/02 , B08B3/10 , B08B3/12 , G03F7/42 , H01L21/67051 , B08B2203/002
摘要： A cleaning method for peeling and removing photoresists from a semiconductor by applying ultrasound to a cleaning solution comprising a mixture of an organic solvent diluted with pure water and halogenated alkali metal salts, hydrofluoric acid, or ammonium fluoride. The cleaning method removes organic film such as a photoresist or the like at room temperature, not by dissolving, but rather by peeling. The cleaning liquid does not degrade over a long period of time and, moreover, has a strong cleaning effect yet chemical vapors and water vapors are essentially not generated.
摘要翻译：一种通过对包含用纯水稀释的有机溶剂和卤化碱金属盐，氢氟酸或氟化铵的混合物的清洗溶液应用超声波来从半导体剥离和除去光致抗蚀剂的清洁方法。清洁方法在室温下除去光致抗蚀剂等有机膜，而不是通过溶解而是通过剥离。清洗液长时间不会降解，而且具有很强的清洁效果，但本质上不产生化学蒸汽和水蒸汽。

34. 发明申请

US20050045207A1 Chemical supply system 失效
标题翻译：化学供应系统
公开(公告)号：US20050045207A1
公开(公告)日：2005-03-03
申请号：US10849836
申请日：2004-05-21
申请人： Takahisa Nitta , Nobuhiro Miki , Yoshiaki Yamaguchi
发明人： Takahisa Nitta , Nobuhiro Miki , Yoshiaki Yamaguchi
IPC分类号： H01L21/304 , B01F5/04 , B01F5/12 , B01F15/02 , B01F15/04 , B01J4/02 , F04B13/02 , F04B43/00 , F04B43/02 , F04B43/04 , F04F7/00 , F16K7/12 , G05D11/13 , B08B3/02
CPC分类号： B01F15/042 , B01F5/0471 , B01F5/0475 , B01F15/0203 , B01F15/024 , B01F15/0244 , B01F2215/0096 , F04B43/0054 , F04B43/02 , F04B43/046 , F04F7/00 , F16K7/123 , G05D11/138 , H01L21/67051
摘要： A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.
摘要翻译：作为主要要素的化学品供给系统包括：化学品储罐，其中用于清洗的液体化学品以其配制的浓缩物的状态储存;化学品供应装置，连接到化学品储存罐用于积极地进行化学品供应;管道系统连接到化学物质供给装置，形成作为液体化学品混合的超纯水通道的供给流路，配置在管道系统的端部的一对排出喷嘴，以与晶片的表面相对设置在清洁室中以将清洁液体供应到表面上。因此，旨在使包含化学池的清洗液供给系统显着的小型化/简化，可以容易且快速地将化学浓度精确化合并提供清洁液，并且在清洁中产生和混合液体，被压制到肢体。

35. 发明授权

US06630031B1 Surface purification apparatus and surface purification method 失效
标题翻译：表面净化装置和表面净化方法
公开(公告)号：US06630031B1
公开(公告)日：2003-10-07
申请号：US09417009
申请日：1999-10-12
申请人： Nobuhiro Miki , Takahisa Nitta
发明人： Nobuhiro Miki , Takahisa Nitta
IPC分类号： B08B702
CPC分类号： H01L21/67051 , B08B3/00 , B08B7/0057 , B08B2230/01 , Y10S134/902 , Y10S438/906
摘要： By a simple apparatus construction and process, it is made possible to “clean precisely” a surface at the molecular/atomic level, and the purification degree of the surface processed minutely is made into 1012 molecules/cm2 or less. A steam-spraying nozzle is disposed such that a line slit nozzle is in a diameter direction, and mist-containing steam is sprayed onto the surface of a substrate. Thereby, particles in the steam-spraying surface (the particles were made to adhere by dipping the substrate in a solution containing polystyrene (particle diameter of 0.6 &mgr;m) or alumina (particle diameter of 0.3 &mgr;m to 0.5 &mgr;m) particles at 105 particles/ml.) are removed by about 90% to 95% after ten-seconds spraying, and by 99% or more, that is, to less than the detection limit of a wafer inspection device, after twenty-seconds spraying.
摘要翻译：通过简单的装置结构和工艺，能够以分子/原子水平“精确地”清洁表面，并且精细加工的表面的净化度为10分/厘米2以下。蒸汽喷嘴被设置为使得线狭缝喷嘴处于直径方向，并且含雾蒸汽喷射到基板的表面上。由此，蒸气喷射表面中的颗粒（通过在10 5℃下将基材浸渍在含有聚苯乙烯（粒径0.6μm）或氧化铝（粒径为0.3μm〜0.5μm）的颗粒的溶液中而使颗粒粘附。颗粒/毫升）在喷雾十秒后除去约90％至95％，并且在二十秒喷雾之后除去99％或更多，即小于晶片检查装置的检测限。

36. 发明授权

US06610168B1 Resist film removal apparatus and resist film removal method 有权
标题翻译：抗蚀膜去除装置和抗蚀膜去除方法
公开(公告)号：US06610168B1
公开(公告)日：2003-08-26
申请号：US09636821
申请日：2000-08-14
申请人： Nobuhiro Miki , Takahisa Nitta
发明人： Nobuhiro Miki , Takahisa Nitta
IPC分类号： B08B500
CPC分类号： H01L21/6715 , B08B3/00 , B08B3/02 , B08B7/0057 , B08B2203/0288 , B08B2230/01 , G03F7/422 , G03F7/427 , Y10T156/11 , Y10T156/1116 , Y10T156/1121
摘要： A line slit nozzle for spraying steam is disposed along a diameter of a resist film. Steam containing a mist is sprayed onto a surface of the resist film. The film is thereby peeled off and removed. By using a change in physical properties (swelling, etc.) of the resist film by water, the film is easily and surely peeled off. Breakaway from much resources/energy consumption type techniques is realized. In other words, realized are environment-symbiosis type techniques by which resist films can be removed independently of the quantity of energy and kinds of chemical solvents.
摘要翻译：沿着抗蚀剂膜的直径设置用于喷射蒸汽的线狭缝喷嘴。含有雾的蒸汽喷涂在抗蚀膜的表面上。由此剥离和除去膜。通过使用水的抗蚀剂膜的物理性质（溶胀等）的变化，膜容易且可靠地剥离。实现了大量资源/能源消耗类型技术的分离。换句话说，实现了环境共生型技术，通过其可以独立于能量和化学溶剂的种类去除抗蚀剂膜。

37. 发明授权

US06533902B1 Ultraviolet processing apparatus and ultraviolet processing method 失效
公开(公告)号：US06533902B1
公开(公告)日：2003-03-18
申请号：US09817158
申请日：2001-03-27
申请人： Nobuhiro Miki , Takahisa Nitta
发明人： Nobuhiro Miki , Takahisa Nitta
IPC分类号： B08B300
CPC分类号： H01L21/67028 , A61L2/10 , A61L9/20 , B01J19/123 , C02F1/325 , C02F2103/04 , C02F2201/3228
摘要： An ultraviolet light reaction system is constructed for surface cleaning/surface processing, a processing speed and an apparatus size that can not be attained by any conventional chemical reaction system, are realized, and realization of a time-sharing performance/a high-throughput performance/a compact size is intended. Using an excimer ultraviolet lamp whose light source is excimer ultraviolet rays of a wavelength that transmissive distances to air, gas, and water are 2 mm or more, respectively, surface processing (such as a surface cleaning process) of a substrate disposed in a one-by-one substrate chamber is preformed.

38. 发明授权

US07195024B2 Chemical supply system 失效
公开(公告)号：US07195024B2
公开(公告)日：2007-03-27
申请号：US10849836
申请日：2004-05-21
申请人： Takahisa Nitta , Nobuhiro Miki , Yoshiaki Yamaguchi
发明人： Takahisa Nitta , Nobuhiro Miki , Yoshiaki Yamaguchi
IPC分类号： B08B3/08
CPC分类号： B01F15/042 , B01F5/0471 , B01F5/0475 , B01F15/0203 , B01F15/024 , B01F15/0244 , B01F2215/0096 , F04B43/0054 , F04B43/02 , F04B43/046 , F04F7/00 , F16K7/123 , G05D11/138 , H01L21/67051
摘要： A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.

39. 发明授权

US06764212B1 Chemical supply system 失效
标题翻译：化学供应系统
公开(公告)号：US06764212B1
公开(公告)日：2004-07-20
申请号：US09436637
申请日：1999-11-09
申请人： Takahisa Nitta , Nobuhiro Miki , Yoshiaki Yamaguchi
发明人： Takahisa Nitta , Nobuhiro Miki , Yoshiaki Yamaguchi
IPC分类号： B01F1504
CPC分类号： B01F15/042 , B01F5/0471 , B01F5/0475 , B01F15/0203 , B01F15/024 , B01F15/0244 , B01F2215/0096 , F04B43/0054 , F04B43/02 , F04B43/046 , F04F7/00 , F16K7/123 , G05D11/138 , H01L21/67051
摘要： A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.
摘要翻译：作为主要要素的化学品供给系统包括：化学品储罐，其中用于清洗的液体化学品以其配制的浓缩物的状态储存;化学品供应装置，连接到化学品储存罐用于积极地进行化学品供应;管道系统连接到化学物质供给装置，形成作为液体化学品混合的超纯水通道的供给流路，配置在管道系统的端部的一对排出喷嘴，以与晶片的表面相对设置在清洁室中以将清洁液体供应到表面上。因此，旨在使包含化学池的清洗液供给系统显着的小型化/简化，可以容易且快速地将化学浓度精确化合并提供清洗液，并在清洁中产生和混合液体，被压制到肢体。

40. 发明授权

US4219369A Method of making semiconductor integrated circuit device 失效
标题翻译：制造半导体集成电路器件的方法
公开(公告)号：US4219369A
公开(公告)日：1980-08-26
申请号：US931007
申请日：1978-08-04
申请人： Katsumi Ogiue , Takahisa Nitta , Kazumichi Mitsusada , Masato Iwabuchi , Masanori Odaka
发明人： Katsumi Ogiue , Takahisa Nitta , Kazumichi Mitsusada , Masato Iwabuchi , Masanori Odaka
IPC分类号： H01L21/033 , H01L21/308 , H01L21/32 , H01L21/388 , H01L21/762 , H01L21/8222 , H01L21/26
CPC分类号： H01L21/388 , H01L21/033 , H01L21/308 , H01L21/32 , H01L21/7621 , H01L21/76216 , H01L21/76232 , H01L21/8222 , Y10S148/117 , Y10S148/143
摘要： The invention relates to a method of making a semiconductor integrated circuit device, and aims at diminishing the size of the isolating region which isolates the adjacent semiconductor elements from each other. The method of the invention has the steps of forming on a substrate a deposition layer of diffused impurities of different conductivity type from that of the substrate, forming a masking film having apertures on the deposition layer, effecting an etching through making use of the masking film as the diffusion mask, so as to etch the portions of the deposition layer and the substrate under the apertures, thereby to form grooves which divide the deposition layer into island-like deposition layer sections, and stretching and diffusing the impurities in each island-like deposition layer section to form a diffusion layer which constitutes a part of a semiconductor element.
摘要翻译：本发明涉及一种制造半导体集成电路器件的方法，其目的在于减小将相邻半导体元件彼此隔离的隔离区的尺寸。本发明的方法具有以下步骤：在衬底上形成不同导电类型的扩散杂质的沉积层与衬底的沉积层，在沉积层上形成具有孔的掩模膜，通过使用掩模膜进行蚀刻作为扩散掩模，以蚀刻沉积层和基板下面的部分，从而形成将沉积层分成岛状沉积层部分的凹槽，并且将每个岛状沉积层中的杂质拉伸和扩散沉积层部分以形成构成半导体元件的一部分的扩散层。

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