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    • 31. 发明专利
    • ELECTROLYTIC POLISHING AND DECONTAMINATING DEVICE
    • JPS58157999A
    • 1983-09-20
    • JP4005182
    • 1982-03-13
    • TOKYO SHIBAURA ELECTRIC CONIPPON ATOMIC IND GROUP CO
    • HIOKI HIDEAKI
    • C25F7/00
    • PURPOSE:To prevent the generation of electrolyte mists in the stage of decontaminating the metallic parts contaminated with radioactive materials by electrolytic polishing by providing an air permeable defoaming layer consisting of a specific material on the surface of the electrolyte in an electrolytic cell. CONSTITUTION:Metallic parts 3 contaminated with radioactive materials are immersed in the electrolyte 2 in an electrolytic cell 1, and voltage is impressed between said parts and an electrode 5 to remove the contaminating materials on the surfaces of the parts 3 by electrolytic polishing. Electrolyte mists are generated by the gases consisting essentially of oxygen and hydrogen generated from both electrodes 3, 5 in this stage, and scatter from the surface of the electrolyte to pollute the working environment and to corrode the device. In order to prevent the generation of such mists, an air permeable defoaming layer 7 constituted of wire-net-like or floatable granular materials made of a material having high corrosion resistance such as ''Teflon '', PVC, PE or the like is placed on the surface of the electrolyte 2. The generation of the electrolyte mists is suppressed by the layer 7.