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31. 发明授权

US07210924B2 Heat treatment system and a method for cooling a loading chamber 有权
标题翻译：热处理系统和冷却装载室的方法
公开(公告)号：US07210924B2
公开(公告)日：2007-05-01
申请号：US10939432
申请日：2004-09-14
申请人： Shinya Mochizuki , Motoki Akimoto
发明人： Shinya Mochizuki , Motoki Akimoto
IPC分类号： F27D5/00
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： There is provided a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and of contributing to space saving, when an object to be treated is carried in the vertical heat treatment system through the opening to carry out a predetermined treatment.In a vertical heat treatment system for carrying an object W to be treated, which is housed in a treating-object housing box 2 closed by an opening/closing lid 10, in a treating-object transfer area 46 via an opening 28, which is formed in a partition wall 26 separating a housing-box transfer area 44 for transferring the treating-object housing box from the treating-object transfer area 46 in an atmosphere of an inert gas, to carry out a predetermined treatment, a standby box transfer means 60 is provided in the housing-box transfer area for holding a treating-object housing box, which houses therein the next object to be carried in the treating-object transfer area, in the vicinity of the opening to cause the treating-object housing box to stand by. Thus, when the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.
摘要翻译：提供了一种垂直式热处理系统，其能够简化形成在将箱体搬送区域从处理对象搬送区域（晶片转移区域）分离的分隔壁的开口附近的各种机构的结构，并且当通过开口在垂直热处理系统中承载待处理物体时，有助于节省空间，以进行预定处理。在用于承载被打开/关闭盖10封闭的处理对象收纳箱2中的待处理对象物W的立式热处理系统经由开口28在处理对象转移区域46中形成在隔离壁26中，隔离箱26分离用于在惰性气体气氛中将处理对象收纳箱从处理对象转移区域46传送的收纳箱传送区域44，以执行预定处理;待机箱传送装置 60设置在用于保持处理对象收纳箱的收纳箱传送区域中，处理对象收纳箱在其内容纳有待处理对象转移区域中的下一个物体的开口附近，从而使处理对象收纳箱待命因此，当待处理物体经由将箱体转移区域从处理对象转移区域（晶片转移区域）分离的分隔壁的开口进行预定处理时，结构简化了开口附近的各种机构，节省了空间。

32. 发明授权

US07819658B2 Heat treatment system and method therefore 有权
标题翻译：热处理系统和方法因此
公开(公告)号：US07819658B2
公开(公告)日：2010-10-26
申请号：US11705443
申请日：2007-02-13
申请人： Kazunari Sakata , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
发明人： Kazunari Sakata , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
IPC分类号： F27D5/00
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： Disclosed herein is a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and of contributing to space saving, when an object to be treated is carried in the vertical heat treatment system through the opening to carry out a predetermined treatment. In a vertical heat treatment system for carrying an object W to be treated, which is housed in a treating-object housing box closed by an opening/closing lid, in a treating-object transfer area via an opening, which is formed in a partition wall 26 separating a housing-box transfer area for transferring the treating-object housing box from the treating-object transfer area 46 in an atmosphere of an inert gas, to carry out a predetermined treatment, a standby box transfer means is provided in the housing-box transfer area for holding a treating-object housing box, which houses therein the next object to be carried in the treating-object transfer area, in the vicinity of the opening to cause the treating-object housing box to stand by.
摘要翻译：本发明公开了一种立式热处理系统，其能够简化形成在将箱体转移区域从处理对象转移区域（晶片转移区域）分离的分隔壁的开口附近的各种机构的结构，并且当通过开口在垂直热处理系统中承载待处理物体时，有助于节省空间，以进行预定处理。在用于承载待处理对象物W的垂直热处理系统中，所述待处理物体被容纳在由打开/关闭盖关闭的处理对象收容箱中的处理对象转移区域中，所述开口形成在隔板分离用于在惰性气体气氛中将处理对象收纳箱从处理对象转移区域46传送的收容箱传送区域的壁26，进行预定处理，待机盒传送装置设置在壳体用于保持处理对象收纳箱的箱传送区域，其中容纳处理对象传送区域中的下一物体被放置在处理对象容纳箱中，使得处理对象收纳箱待机。

33. 发明申请

US20080247845A1 PROCESSING APPARATUS AND ATMOSPHERE EXCHANGE METHOD 有权
标题翻译：处理装置和大气交换方法
公开(公告)号：US20080247845A1
公开(公告)日：2008-10-09
申请号：US12057468
申请日：2008-03-28
申请人： Shinya Mochizuki , Takashi Kamono
发明人： Shinya Mochizuki , Takashi Kamono
IPC分类号： H01L21/677 , B08B3/00
CPC分类号： H01L21/67248 , H01L21/67017
摘要： A processing apparatus configured to process a substrate under a vacuum environment includes a holding unit configured to hold the substrate, a dust collection part having a surface opposite to the substrate held by the holding unit, a vacuum chamber configured to accommodate the holding unit and to have an internal space that can be decompressed, a temperature controlling unit configured to control a temperature of the surface of the dust collection part opposite to the substrate to a temperature lower than a temperature of the substrate, and a driving unit configured to bring one of the holding unit and the dust collection part close to the other after the temperature controlling unit controls the temperature of the surface of the dust collection part opposite to the substrate.
摘要翻译：一种被配置为在真空环境下处理基板的处理装置包括：保持单元，其构造成保持基板;灰尘收集部，其具有与由所述保持单元保持的基板相对的表面;真空室，其构造成容纳所述保持单元，具有能够减压的内部空间;温度控制单元，被配置为将与所述基板相对的所述集尘部的表面的温度控制为低于所述基板的温度的温度;以及驱动单元，在温度控制单元控制与基板相对的集尘部的表面的温度之后，保持单元和灰尘收集部分彼此靠近。

34. 发明申请

US20070166657A1 Heat treatment system and method therefore 有权
标题翻译：热处理系统和方法因此
公开(公告)号：US20070166657A1
公开(公告)日：2007-07-19
申请号：US11705443
申请日：2007-02-13
申请人： Kazunari Sakata , Koyu Hasegawa , Keiichi Katabuchi , Shingo Watanabe , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
发明人： Kazunari Sakata , Koyu Hasegawa , Keiichi Katabuchi , Shingo Watanabe , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
IPC分类号： F27D1/18
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： There is provided a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and of contributing to space saving, when an object to be treated is carried in the vertical heat treatment system through the opening to carry out a predetermined treatment. In a vertical heat treatment system for carrying an object W to be treated, which is housed in a treating-object housing box 2 closed by an opening/closing lid 10, in a treating-object transfer area 46 via an opening 28, which is formed in a partition wall 26 separating a housing-box transfer area 44 for transferring the treating-object housing box from the treating-object transfer area 46 in an atmosphere of an inert gas, to carry out a predetermined treatment, a standby box transfer means 60 is provided in the housing-box transfer area for holding a treating-object housing box, which houses therein the next object to be carried in the treating-object transfer area, in the vicinity of the opening to cause the treating-object housing box to stand by. Thus, when the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.
摘要翻译：提供了一种垂直式热处理系统，其能够简化形成在将箱体搬送区域从处理对象搬送区域（晶片转移区域）分离的分隔壁的开口附近的各种机构的结构，并且当通过开口在垂直热处理系统中承载待处理物体时，有助于节省空间，以进行预定处理。在用于承载被打开/关闭盖10封闭的处理对象收纳箱2中的待处理对象物W的立式热处理系统经由开口28在处理对象转移区域46中形成在隔离壁26中，隔离箱26分离用于在惰性气体气氛中将处理对象收纳箱从处理对象转移区域46传送的收纳箱传送区域44，以执行预定处理;待机箱传送装置 60设置在用于保持处理对象收纳箱的收纳箱传送区域中，处理对象收纳箱在其内容纳有待处理对象转移区域中的下一个物体的开口附近，从而使处理对象收纳箱待命因此，当待处理物体经由将箱体转移区域从处理对象转移区域（晶片转移区域）分离的分隔壁的开口进行预定处理时，结构简化了开口附近的各种机构，节省了空间。

35. 发明授权

US08079375B2 Processing apparatus and atmosphere exchange method 有权
标题翻译：处理装置和大气交换方法
公开(公告)号：US08079375B2
公开(公告)日：2011-12-20
申请号：US12057468
申请日：2008-03-28
申请人： Shinya Mochizuki , Takashi Kamono
发明人： Shinya Mochizuki , Takashi Kamono
IPC分类号： B08B11/00
CPC分类号： H01L21/67248 , H01L21/67017
摘要： A processing apparatus configured to process a substrate under a vacuum environment includes a holding unit configured to hold the substrate, a dust collection part having a surface opposite to the substrate held by the holding unit, a vacuum chamber configured to accommodate the holding unit and to have an internal space that can be decompressed, a temperature controlling unit configured to control a temperature of the surface of the dust collection part opposite to the substrate to a temperature lower than a temperature of the substrate, and a driving unit configured to bring one of the holding unit and the dust collection part close to the other after the temperature controlling unit controls the temperature of the surface of the dust collection part opposite to the substrate.
摘要翻译：一种被配置为在真空环境下处理基板的处理装置包括：保持单元，其构造成保持基板;灰尘收集部，其具有与由所述保持单元保持的基板相对的表面;真空室，其构造成容纳所述保持单元，具有能够减压的内部空间;温度控制单元，被配置为将与所述基板相对的所述集尘部的表面的温度控制为低于所述基板的温度的温度;以及驱动单元，在温度控制单元控制与基板相对的集尘部的表面的温度之后，保持单元和灰尘收集部分彼此靠近。

36. 发明授权

US07059849B2 Heat treatment system and a method for cooling a loading chamber 有权
标题翻译：热处理系统和冷却装载室的方法
公开(公告)号：US07059849B2
公开(公告)日：2006-06-13
申请号：US09934756
申请日：2001-08-23
申请人： Kazunari Sakata , Koyu Hasegawa , Keiichi Katabuchi , Shingo Watanabe , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
发明人： Kazunari Sakata , Koyu Hasegawa , Keiichi Katabuchi , Shingo Watanabe , Shinya Mochizuki , Motoki Akimoto , Hiroshi Motono
IPC分类号： F27D9/00
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： A heat treatment system and method for cooling a loading chamber that includes a heat treatment furnace for heat-treating an object to be treated. The heat treatment furnace includes a throat for carrying the object in and out, and a cooling mechanism for cooling the vicinity of the throat. The cooling mechanism has a ventilating unit with a ventilating port for sending a cooling fluid toward the vicinity of the throat and a heat exchanger arranged so as to face the ventilating port in the vicinity of the throat. The cooling mechanism also has an intake fan for sucking the cooling fluid in the vicinity of the throat over the heat exchanger. When the object to be treated is carried in, the structure of various mechanisms in the vicinity of the throat is simplified, and space is saved.
摘要翻译：一种用于冷却装载室的热处理系统和方法，其包括用于对待处理物体进行热处理的热处理炉。热处理炉包括用于输入和输出物体的喉部和用于冷却喉部附近的冷却机构。冷却机构具有通风单元，其具有用于向喉部附近发送冷却流体的通风口和布置成面对喉部附近的通气口的热交换器。冷却机构还具有用于吸引热交换器上的喉部附近的冷却流体的进气扇。当被处理物被携带时，喉部附近的各种机构的结构被简化，节省了空间。

37. 发明申请

US20050053891A1 Heat treatment system and a method for cooling a loading chamber 有权
标题翻译：热处理系统和冷却装载室的方法
公开(公告)号：US20050053891A1
公开(公告)日：2005-03-10
申请号：US10939432
申请日：2004-09-14
申请人： Shinya Mochizuki , Motoki Akimoto
发明人： Shinya Mochizuki , Motoki Akimoto
IPC分类号： H01L21/324 , H01L21/00 , H01L21/673 , H01L21/677 , F27D1/18
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： There is provided a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and of contributing to space saving, when an object to be treated is carried in the vertical heat treatment system through the opening to carry out a predetermined treatment. In a vertical heat treatment system for carrying an object W to be treated, which is housed in a treating-object housing box 2 closed by an opening/closing lid 10, in a treating-object transfer area 46 via an opening 28, which is formed in a partition wall 26 separating a housing-box transfer area 44 for transferring the treating-object housing box from the treating-object transfer area 46 in an atmosphere of an inert gas, to carry out a predetermined treatment, a standby box transfer means 60 is provided in the housing-box transfer area for holding a treating-object housing box, which houses therein the next object to be carried in the treating-object transfer area, in the vicinity of the opening to cause the treating-object housing box to stand by. Thus, when the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.
摘要翻译：提供了一种垂直式热处理系统，其能够简化形成在将箱体搬送区域从处理对象搬送区域（晶片转移区域）分离的分隔壁的开口附近的各种机构的结构，并且当通过开口在垂直热处理系统中承载待处理物体时，有助于节省空间，以进行预定处理。在用于承载被打开/关闭盖10封闭的处理对象收纳箱2中的待处理对象物W的立式热处理系统经由开口28在处理对象转移区域46中形成在隔离壁26中，隔离箱26分离用于在惰性气体气氛中将处理对象收纳箱从处理对象转移区域46传送的收纳箱传送区域44，以执行预定处理;待机箱传送装置 60设置在用于保持处理对象收纳箱的收纳箱传送区域中，处理对象收纳箱在其内容纳有待处理对象转移区域中的下一个物体的开口附近，从而使处理对象收纳箱待命因此，当待处理物体经由将箱体转移区域从处理对象转移区域（晶片转移区域）分离的分隔壁的开口进行预定处理时，结构简化了开口附近的各种机构，节省了空间。

38. 发明授权

US08216386B2 Atmosphere exchange method 有权
标题翻译：大气交换法
公开(公告)号：US08216386B2
公开(公告)日：2012-07-10
申请号：US12062649
申请日：2008-04-04
申请人： Shinya Mochizuki
发明人： Shinya Mochizuki
IPC分类号： B08B17/00
CPC分类号： H01L21/67017 , H01L21/67248
摘要： There is provided a method for exchanging an atmosphere of a vacuum chamber of a processing apparatus configured to process a substrate under a vacuum environment. The method includes the steps of holding the substrate using a holding unit provided in the vacuum chamber, and exchanging the atmosphere of the vacuum chamber through exhaustion or air supply, wherein the exchanging step maintains a pressure of the vacuum chamber in a range between 10 Pa and 10000 Pa for a period between 10 seconds and 600 seconds while controlling a temperature of a dust collection unit provided in the vacuum chamber lower than a temperature of the substrate.
摘要翻译：提供了一种用于交换在真空环境下处理基板的处理装置的真空室的气氛的方法。该方法包括以下步骤：使用设置在真空室中的保持单元来保持基板，并且通过排气或空气供给来更换真空室的气氛，其中，所述交换步骤将真空室的压力保持在10Pa 并且在10秒至600秒之间的时间内，10000Pa，同时控制设置在真空室中的灰尘收集单元的温度低于基板的温度。

39. 发明授权

US08147241B2 Method of object transfer for a heat treatment system 有权
标题翻译：热处理系统物体转移方法
公开(公告)号：US08147241B2
公开(公告)日：2012-04-03
申请号：US12849317
申请日：2010-08-03
申请人： Shinya Mochizuki , Motoki Akimoto
发明人： Shinya Mochizuki , Motoki Akimoto
IPC分类号： F27D3/00
CPC分类号： H01L21/67373 , F27B5/04 , F27B17/0025 , F27D3/0084 , F27D5/0037 , H01L21/67017 , H01L21/67109 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67739 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/68707 , Y10S269/903 , Y10S414/135 , Y10S414/137
摘要： Disclosed herein is method for use in a vertical heat treatment system which has an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and and through which an object to be treated is carried in the vertical heat treatment system to carry out a predetermined treatment. When the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.
摘要翻译：本文公开了一种在垂直热处理系统中使用的方法，该立式热处理系统具有开口，该开口形成在将收纳箱传送区域与处理对象传送区域（晶片传送区域）分隔开的分隔壁中，并且通过该开口在立式热处理系统中进行处理，进行规定的处理。当待处理物体通过将收纳箱传送区域与处理对象传送区域（晶片传送区域）分离的分隔壁的开口进行预定处理时，各种机构的结构在开口附近被简化，节省空间。

40. 发明申请

US20080247846A1 ATMOSPHERE EXCHANGE METHOD 有权
标题翻译：大气交换方法
公开(公告)号：US20080247846A1
公开(公告)日：2008-10-09
申请号：US12062649
申请日：2008-04-04
申请人： Shinya Mochizuki
发明人： Shinya Mochizuki
IPC分类号： H01L21/677
CPC分类号： H01L21/67017 , H01L21/67248
摘要： There is provided a method for exchanging an atmosphere of a vacuum chamber of a processing apparatus configured to process a substrate under a vacuum environment. The method includes the steps of holding the substrate using a holding unit provided in the vacuum chamber, and exchanging the atmosphere of the vacuum chamber through exhaustion or air supply, wherein the exchanging step maintains a pressure of the vacuum chamber in a range between 10 Pa and 10000 Pa for a period between 10 seconds and 600 seconds while controlling a temperature of a dust collection unit provided in the vacuum chamber lower than a temperature of the substrate.
摘要翻译：提供了一种用于交换在真空环境下处理基板的处理装置的真空室的气氛的方法。该方法包括以下步骤：使用设置在真空室中的保持单元来保持基板，并且通过排气或空气供给来更换真空室的气氛，其中，所述交换步骤将真空室的压力保持在10Pa 并且在10秒至600秒之间的时间内，10000Pa，同时控制设置在真空室中的灰尘收集单元的温度低于基板的温度。

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