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31. 发明授权

US07361894B2 Method of forming a sample image and charged particle beam apparatus 失效
标题翻译：形成样品图像和带电粒子束装置的方法
公开(公告)号：US07361894B2
公开(公告)日：2008-04-22
申请号：US11501229
申请日：2006-08-09
申请人： Mitsugu Sato , Atsushi Takane , Takashi Iizumi , Tadashi Otaka , Hideo Todokoro , Satoru Yamaguchi , Kazutaka Nimura
发明人： Mitsugu Sato , Atsushi Takane , Takashi Iizumi , Tadashi Otaka , Hideo Todokoro , Satoru Yamaguchi , Kazutaka Nimura
IPC分类号： G01N23/22 , H01J37/26 , H01J37/28 , G21K7/00
CPC分类号： H01J37/28 , G06T5/50 , G06T7/30 , G06T2207/10056 , H01J37/222 , H01J2237/221 , H01J2237/226
摘要： An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.
摘要翻译：本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下，能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置。为了实现上述目的，本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法，该方法包括以下步骤：形成多个通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像，以及用于实现上述方法的带电粒子束装置。

32. 发明授权

US07348559B2 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US07348559B2
公开(公告)日：2008-03-25
申请号：US11498125
申请日：2006-08-03
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/00
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

33. 发明授权

US07232996B2 Method and an apparatus of an inspection system using an electron beam 失效
标题翻译：使用电子束的检查系统的方法和装置
公开(公告)号：US07232996B2
公开(公告)日：2007-06-19
申请号：US11319279
申请日：2005-12-29
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

34. 发明申请

US20060289755A1 Electron microscope application apparatus and sample inspection method 失效
公开(公告)号：US20060289755A1
公开(公告)日：2006-12-28
申请号：US11442566
申请日：2006-05-30
申请人： Hikaru Koyama , Hiroshi Makino , Mitsugu Sato
发明人： Hikaru Koyama , Hiroshi Makino , Mitsugu Sato
IPC分类号： G21K7/00
CPC分类号： H01J37/026 , H01J2237/0042 , H01J2237/0047 , H01J2237/2817
摘要： A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to the wafer through the charge control electrode. Specifically, a metal plate which is formed in mesh or includes one or plural holes is used as the charge control electrode. By disposing the charge control electrode just above the sample in parallel thereto, when negative voltage is applied to the electrode, electric field approximately perpendicular to the wafer is generated. Therefore, photoelectrons are efficiently absorbed in the wafer. Also, by using the charge control electrode having approximately the same size as that of the wafer, charges on a whole surface of the wafer can be removed collectively and uniformly. Therefore, time required for the process can be reduced.

35. 发明申请

US20060284093A1 Electron beam device 有权
公开(公告)号：US20060284093A1
公开(公告)日：2006-12-21
申请号：US11499640
申请日：2006-08-07
申请人： Chisato Kamiya , Masahiro Akatsu , Mitsugu Sato
发明人： Chisato Kamiya , Masahiro Akatsu , Mitsugu Sato
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/244
摘要： Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose. A dark-field detector is disposed closely to the objective lens magnetic pole. The microscope is provided with means for moving the dark-field detector along a light axis so as to control the scattering angle of each detected dark-field signal.

36. 发明授权

US07109485B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US07109485B2
公开(公告)日：2006-09-19
申请号：US11108731
申请日：2005-04-19
申请人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
发明人： Atsushi Takane , Haruo Yoda , Hideo Todokoro , Fumio Mizuno , Shoji Yoshida , Mitsuji Ikeda , Mitsugu Sato , Makoto Ezumi
IPC分类号： H01J37/21
CPC分类号： G06T5/002 , G06T5/003 , G06T5/20 , G06T5/50 , G06T7/13 , G06T7/62 , G06T2207/10061 , G06T2207/30148 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/216 , H01J2237/221 , H01J2237/226 , H01J2237/281 , H01J2237/2815 , H01J2237/2817
摘要： It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.
摘要翻译：本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器，发射的带电粒子束，以及用于基于所述带电粒子束聚焦的信号来组合样品的表面部分的二维图像的装置，所述信号在从带电粒子检测器输出的信号中。

37. 发明申请

US20060151697A1 Charged particle beam equipment and charged particle microscopy 有权
标题翻译：带电粒子束设备和带电粒子显微镜
公开(公告)号：US20060151697A1
公开(公告)日：2006-07-13
申请号：US11302323
申请日：2005-12-14
申请人： Hiromi Inada , Mitsugu Sato , Atsushi Takane
发明人： Hiromi Inada , Mitsugu Sato , Atsushi Takane
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/265 , H01J2237/223 , H01J2237/2826 , H01J2237/3045
摘要： On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.
摘要翻译：基于从包括通过使带电粒子束偏转预定量而记录的视野的位移的第一标本图像提取的带电粒子束的偏转之前和之后的视场位移的基础上，通过在通过使用样本的样本放大图像作为放大标准校准的第一倍率捕获样本图像的图像中的光束偏转器，以及在充电的偏转之前和之后的视场位移从第二标本图像中提取出的粒子束，包括通过使带电粒子束在第二放大倍数下拍摄样本图像的图像中的光束偏转器偏转预定量而记录的视野的位移，校准第二放大倍数。

38. 发明申请

US20060071166A1 Charged particle beam apparatus and dimension measuring method 有权
标题翻译：带电粒子束装置和尺寸测量方法
公开(公告)号：US20060071166A1
公开(公告)日：2006-04-06
申请号：US11242129
申请日：2005-10-04
申请人： Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
发明人： Mitsugu Sato , Katsuhiko Sakai , Atsushi Takane , Yoshihiko Nakayama
IPC分类号： G21K7/00
CPC分类号： H01J37/244 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/221 , H01J2237/24578 , H01J2237/24592 , H01J2237/2816 , H01J2237/2817
摘要： There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.
摘要翻译：提供了一种带电粒子束装置，即使在样品的表面上存在高差也允许实现高可靠性和高精度尺寸测量。带电粒子束装置包括以下配置部件：用于获取与焦点深度相对应的聚焦宽度变化的多个SEM图像的获取单元，确定单元，用于从所获取的多个SEM图像中确定SEM图像包括尺寸测量区域的部分域的图像清晰度变为最大值;以及测量单元，用于从图像锐度度为最大值的SEM图像测量预定域的尺寸。

39. 发明申请

US20050263702A1 Defect inspection and charged particle beam apparatus 有权
标题翻译：缺陷检查和带电粒子束装置
公开(公告)号：US20050263702A1
公开(公告)日：2005-12-01
申请号：US11139609
申请日：2005-05-31
申请人： Toshihide Agemura , Mitsugu Sato
发明人： Toshihide Agemura , Mitsugu Sato
IPC分类号： G01N23/225 , G01N23/00 , G01N27/00 , G01R31/302 , G01R31/307 , H01J37/147 , H01J37/153 , H01J37/22 , H01J37/28 , H01L21/66
CPC分类号： G01R31/307 , G01N23/2251 , H01J37/28 , H01J2237/15 , H01J2237/24564 , H01J2237/24592 , H01J2237/2487 , H01J2237/28 , H01J2237/2817
摘要： In a defect inspection apparatus which combines a plurality of probes for measuring electric properties of a specimen including a fine circuit line pattern with a charged particle beam apparatus, the charged particle beam apparatus reduces a degradation in resolution even with an image-shift of ±75 μm or more. The defect inspection apparatus has a CAD navigation function associated with an image-shift function. The CAD navigation function uses coordinates for converting an image-shift moving amount to a DUT stage moving amount in communications between an image processing unit for processing charged particle beam images and a memory for storing information on circuit line patterns. The defect inspection provides the user with significantly improved usability.
摘要翻译：在将包含精细电路线图案的样本的电特性的多个探针与带电粒子束装置组合的缺陷检查装置中，带电粒子束装置即使图像偏移为±75，也降低了分辨率的劣化妈妈还是更多缺陷检查装置具有与图像移位功能相关联的CAD导航功能。 CAD导航功能在用于处理带电粒子束图像的图像处理单元和用于存储关于电路线图案的信息的存储器之间的通信中使用用于将图像移位移动量转换为DUT阶段移动量的坐标。缺陷检查为用户提供了显着提高的可用性。

40. 发明申请

US20050253083A1 Charged particle beam apparatus and charged particle beam irradiation method 有权
公开(公告)号：US20050253083A1
公开(公告)日：2005-11-17
申请号：US11185871
申请日：2005-07-21
申请人： Mitsugu Sato , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
发明人： Mitsugu Sato , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
IPC分类号： G01Q10/00 , G01Q20/02 , G01Q30/02 , H01J3/14 , H01J29/70 , H01J37/153 , H01J37/28
CPC分类号： H01J37/153 , H01J2237/1506 , H01J2237/1534 , H01J2237/28
摘要： A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.

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