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    • 32. 发明申请
    • IMAGE FORMING APPARATUS
    • 图像形成装置
    • US20090263159A1
    • 2009-10-22
    • US12420091
    • 2009-04-08
    • Kenichi IsomiTetsushi ItoHirotsugu AkamatsuTetsuya YamaguchiShuichi Mochizuki
    • Kenichi IsomiTetsushi ItoHirotsugu AkamatsuTetsuya YamaguchiShuichi Mochizuki
    • G03G15/00
    • G03G15/0105G03G15/5008G03G2215/0132
    • An image forming apparatus including: a first and a second photoconductor groups constituted of one or more photoconductors respectively; a first and a second drive control sections for controlling the drive of the first and the second photoconductor groups respectively to rotate the photoconductors thereof, wherein the rotational phases of the first photoconductor group and the second photoconductor group are adjusted to be matched therebetween; and the first and the second drive control sections control so that the first and the second photoconductor groups are driven simultaneously with an equal target speed during a formation of a image, wherein an initial drive speed is lower than a predetermined speed for image-formation, and after the first and the second photoconductor groups reaches the initial drive speed, the target speed is changed from the initial drive speed to the speed for image-formation.
    • 一种图像形成装置,包括:分别由一个或多个感光体构成的第一和第二光电导体组; 第一和第二驱动控制部分,用于分别控制第一和第二光电导体组的驱动以旋转其感光体,其中调节第一光电导体组和第二光电导体组的旋转相位以使其匹配; 第一驱动控制部和第二驱动控制部进行控制,使得在形成图像期间以相同的目标速度同时驱动第一和第二光电导体组,其中初始驱动速度低于用于图像形成的预定速度, 并且在第一和第二光电导体组达到初始驱动速度之后,目标速度从初始驱动速度变为图像形成速度。
    • 34. 发明授权
    • Solid state imaging device
    • 固态成像装置
    • US07259412B2
    • 2007-08-21
    • US11095592
    • 2005-04-01
    • Tetsuya YamaguchiHiroshige GotoMasayuki AyabeHisanori Ihara
    • Tetsuya YamaguchiHiroshige GotoMasayuki AyabeHisanori Ihara
    • H01L29/76
    • H01L27/14609H01L27/14601H01L27/14643
    • A solid state imaging device includes a substrate of a first conductivity type. A transistor, which includes a first gate electrode and a first and second impurity areas, is provided on a surface of the substrate. The first and second impurity areas are formed in the surface of the substrate and sandwich a region under the first gate electrode. A third impurity area of a second conductivity type is formed in the surface of the substrate and spaced from the second impurity area at an opposite side to the first gate electrode. A fourth impurity area is formed under the second impurity area and connected to the third impurity area. A second gate electrode is provided above the substrate. A fifth impurity area of the second conductivity type is formed in the surface of the substrate. The third and fifth impurity areas sandwich a region under the second gate electrode.
    • 固态成像装置包括第一导电类型的衬底。 在衬底的表面上设置包括第一栅极电极和第一和第二杂质区域的晶体管。 第一和第二杂质区域形成在衬底的表面中并夹着第一栅电极下的区域。 第二导电类型的第三杂质区域形成在衬底的表面中,并且与第一栅电极相对的一侧与第二杂质区隔开。 在第二杂质区下方形成第四杂质区,并与第三杂质区连接。 在基板上设置第二栅电极。 第二导电类型的第五杂质区域形成在衬底的表面中。 第三和第五杂质区夹在第二栅电极下方的区域。